TW200737393A - Heat treatment unit - Google Patents

Heat treatment unit

Info

Publication number
TW200737393A
TW200737393A TW095145644A TW95145644A TW200737393A TW 200737393 A TW200737393 A TW 200737393A TW 095145644 A TW095145644 A TW 095145644A TW 95145644 A TW95145644 A TW 95145644A TW 200737393 A TW200737393 A TW 200737393A
Authority
TW
Taiwan
Prior art keywords
heat treatment
treatment unit
monotonous
heater
substrate
Prior art date
Application number
TW095145644A
Other languages
Chinese (zh)
Other versions
TWI339872B (en
Inventor
Yasutaka Souma
Norio Wada
Shunichi Yahiro
Original Assignee
Tokyo Electron Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Tokyo Electron Ltd filed Critical Tokyo Electron Ltd
Publication of TW200737393A publication Critical patent/TW200737393A/en
Application granted granted Critical
Publication of TWI339872B publication Critical patent/TWI339872B/en

Links

Classifications

    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P72/00—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof
    • H10P72/04—Apparatus for manufacture or treatment
    • H10P72/0431—Apparatus for thermal treatment
    • H10P72/0434—Apparatus for thermal treatment mainly by convection
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P72/00—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof
    • H10P72/04—Apparatus for manufacture or treatment
    • H10P72/0451—Apparatus for manufacturing or treating in a plurality of work-stations
    • H10P72/0452—Apparatus for manufacturing or treating in a plurality of work-stations characterised by the layout of the process chambers
    • H10P72/0456—Apparatus for manufacturing or treating in a plurality of work-stations characterised by the layout of the process chambers in-line arrangement
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P72/00—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof
    • H10P72/04—Apparatus for manufacture or treatment
    • H10P72/0451—Apparatus for manufacturing or treating in a plurality of work-stations
    • H10P72/0468—Apparatus for manufacturing or treating in a plurality of work-stations comprising a chamber adapted to a particular process

Landscapes

  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
  • Control Of Resistance Heating (AREA)
  • Resistance Heating (AREA)
  • Tunnel Furnaces (AREA)

Abstract

Heat treatment unit 28 has the roller transportation mechanism 5 as the transportation path where the substrate G is transported to one direction, the casing 6 installed to enclose transportation path, and the first monotonous heater 71a~71r and the second monotonous heater 72a~72r. The first monotonous heater 71a~71r and the second monotonous heater 72a~72r are respectively set up along transportation path and adjacent to the substrate G and the both side of the substrate G.
TW095145644A 2005-12-08 2006-12-07 Heat treatment unit TWI339872B (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2005355183A JP4531690B2 (en) 2005-12-08 2005-12-08 Heat treatment device

Publications (2)

Publication Number Publication Date
TW200737393A true TW200737393A (en) 2007-10-01
TWI339872B TWI339872B (en) 2011-04-01

Family

ID=38130875

Family Applications (1)

Application Number Title Priority Date Filing Date
TW095145644A TWI339872B (en) 2005-12-08 2006-12-07 Heat treatment unit

Country Status (4)

Country Link
JP (1) JP4531690B2 (en)
KR (1) KR101269748B1 (en)
CN (1) CN100474507C (en)
TW (1) TWI339872B (en)

Families Citing this family (16)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR101055862B1 (en) * 2009-03-23 2011-08-09 주식회사 테라세미콘 Inline heat treatment equipment
JP4936567B2 (en) * 2009-09-18 2012-05-23 東京エレクトロン株式会社 Heat treatment equipment
JP2011216572A (en) * 2010-03-31 2011-10-27 Dainippon Screen Mfg Co Ltd Substrate processing apparatus
JP5226037B2 (en) * 2010-06-04 2013-07-03 東京エレクトロン株式会社 Heat treatment apparatus and heat treatment method
JP5165731B2 (en) 2010-06-30 2013-03-21 東京エレクトロン株式会社 Local exposure apparatus and local exposure method
JP5470236B2 (en) 2010-12-22 2014-04-16 東京エレクトロン株式会社 Local exposure method and local exposure apparatus
JP5369128B2 (en) * 2011-03-01 2013-12-18 東京エレクトロン株式会社 Floating coating device
JP5451798B2 (en) 2011-03-15 2014-03-26 東京エレクトロン株式会社 Local exposure method and local exposure apparatus
JP5773815B2 (en) * 2011-09-12 2015-09-02 株式会社Ｓｃｒｅｅｎホールディングス Heat treatment equipment
US11476167B2 (en) 2017-03-03 2022-10-18 SCREEN Holdings Co., Ltd. Heat treatment method and heat treatment apparatus of light irradiation type
JP7265314B2 (en) * 2017-03-03 2023-04-26 株式会社Ｓｃｒｅｅｎホールディングス Heat treatment method and heat treatment apparatus
JP7232593B2 (en) 2018-08-30 2023-03-03 東京エレクトロン株式会社 SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD
JP7232596B2 (en) * 2018-08-30 2023-03-03 東京エレクトロン株式会社 SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD
JP7186605B2 (en) 2018-12-27 2022-12-09 東京エレクトロン株式会社 SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD
JP7142566B2 (en) 2018-12-27 2022-09-27 東京エレクトロン株式会社 SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD
KR102220853B1 (en) * 2019-05-27 2021-02-26 주식회사 선코리아 Thermal processing apparatus

Family Cites Families (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS62252989A (en) * 1986-04-25 1987-11-04 日本電気株式会社 Manufacture of printed circuit board
JPH0193121A (en) * 1987-10-05 1989-04-12 Kawasaki Steel Corp Semiconductor wafer baking device
JPH0270426A (en) * 1988-09-06 1990-03-09 Kawasaki Steel Corp Composite steel plate having vibration suppressing property
JPH04243119A (en) * 1991-01-17 1992-08-31 Sharp Corp Resist heating apparatus
JPH0531223U (en) * 1991-09-30 1993-04-23 日本電気株式会社 LCD Display Active Device Manufacturing Equipment
JP3438790B2 (en) * 1994-07-28 2003-08-18 富士通株式会社 Baking equipment
JPH0953881A (en) * 1995-08-11 1997-02-25 Fuji Photo Film Co Ltd Hard substrate baking device
JPH09310198A (en) * 1996-05-20 1997-12-02 Dainippon Printing Co Ltd Electrodeposition resist dryer
JPH1147668A (en) * 1997-06-06 1999-02-23 Kansai Denshi Kk Substrate drying equipment
JP2005123284A (en) * 2003-10-15 2005-05-12 Renesas Technology Corp Semiconductor manufacturing device

Also Published As

Publication number Publication date
KR101269748B1 (en) 2013-05-30
JP4531690B2 (en) 2010-08-25
JP2007158253A (en) 2007-06-21
CN1979765A (en) 2007-06-13
KR20070061418A (en) 2007-06-13
TWI339872B (en) 2011-04-01
CN100474507C (en) 2009-04-01

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Legal Events

Date Code Title Description
MM4A Annulment or lapse of patent due to non-payment of fees