TW200801833A - Exposure apparatus, exposure method and device manufacturing method - Google Patents

Exposure apparatus, exposure method and device manufacturing method

Info

Publication number
TW200801833A
TW200801833A TW096106024A TW96106024A TW200801833A TW 200801833 A TW200801833 A TW 200801833A TW 096106024 A TW096106024 A TW 096106024A TW 96106024 A TW96106024 A TW 96106024A TW 200801833 A TW200801833 A TW 200801833A
Authority
TW
Taiwan
Prior art keywords
exposure
exposure light
device manufacturing
exposure apparatus
optical system
Prior art date
Application number
TW096106024A
Other languages
English (en)
Inventor
Hiroyuki Nagasaka
Original Assignee
Nikon Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nikon Corp filed Critical Nikon Corp
Publication of TW200801833A publication Critical patent/TW200801833A/zh

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70008—Production of exposure light, i.e. light sources
    • G03F7/7005—Production of exposure light, i.e. light sources by multiple sources, e.g. light-emitting diodes [LED] or light source arrays
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/70208—Multiple illumination paths, e.g. radiation distribution devices, microlens illumination systems, multiplexers or demultiplexers for single or multiple projection systems
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70283—Mask effects on the imaging process
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70425—Imaging strategies, e.g. for increasing throughput or resolution, printing product fields larger than the image field or compensating lithography- or non-lithography errors, e.g. proximity correction, mix-and-match, stitching or double patterning
    • G03F7/70466—Multiple exposures, e.g. combination of fine and coarse exposures, double patterning or multiple exposures for printing a single feature
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
    • G03F7/7055—Exposure light control in all parts of the microlithographic apparatus, e.g. pulse length control or light interruption

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
TW096106024A 2006-02-16 2007-02-16 Exposure apparatus, exposure method and device manufacturing method TW200801833A (en)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2006039229 2006-02-16
JP2006039927 2006-02-16
JP2006039833 2006-02-16

Publications (1)

Publication Number Publication Date
TW200801833A true TW200801833A (en) 2008-01-01

Family

ID=38371646

Family Applications (1)

Application Number Title Priority Date Filing Date
TW096106024A TW200801833A (en) 2006-02-16 2007-02-16 Exposure apparatus, exposure method and device manufacturing method

Country Status (6)

Country Link
US (2) US7714982B2 (zh)
EP (1) EP1990828A4 (zh)
JP (1) JPWO2007094470A1 (zh)
KR (1) KR20080102390A (zh)
TW (1) TW200801833A (zh)
WO (1) WO2007094470A1 (zh)

Families Citing this family (22)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TW200801833A (en) * 2006-02-16 2008-01-01 Nikon Corp Exposure apparatus, exposure method and device manufacturing method
EP2009678A4 (en) * 2006-04-17 2011-04-06 Nikon Corp OPTICAL LIGHTING DEVICE, EXPOSURE DEVICE AND COMPONENT MANUFACTURING METHOD
US8665418B2 (en) * 2007-04-18 2014-03-04 Nikon Corporation Projection optical system, exposure apparatus, and device manufacturing method
US8137898B2 (en) * 2007-07-23 2012-03-20 Renesas Electronics Corporation Method for manufacturing semiconductor device
US7791723B2 (en) * 2008-01-21 2010-09-07 International Business Machines Corporation Optical measurement using fixed polarizer
US8736813B2 (en) * 2008-08-26 2014-05-27 Nikon Corporation Exposure apparatus with an illumination system generating multiple illumination beams
US8705170B2 (en) * 2008-08-29 2014-04-22 Nikon Corporation High NA catadioptric imaging optics for imaging A reticle to a pair of imaging locations
US8390786B2 (en) * 2008-09-23 2013-03-05 Pinebrook Imaging Technology, Ltd. Optical imaging writer system
US20100091257A1 (en) * 2008-10-10 2010-04-15 Nikon Corporation Optical Imaging System and Method for Imaging Up to Four Reticles to a Single Imaging Location
US20100123883A1 (en) * 2008-11-17 2010-05-20 Nikon Corporation Projection optical system, exposure apparatus, and device manufacturing method
JP2011049400A (ja) * 2009-08-27 2011-03-10 Canon Inc 位置検出装置、露光装置及びデバイスの製造方法
NL2008157A (en) * 2011-02-22 2012-08-24 Asml Netherlands Bv Lithographic apparatus and lithographic projection method.
US9219866B2 (en) * 2013-01-07 2015-12-22 Ricoh Co., Ltd. Dynamic adjustment of multimode lightfield imaging system using exposure condition and filter position
KR102099880B1 (ko) * 2013-05-06 2020-04-10 삼성전자 주식회사 유효 열 전자 강화 유닛을 갖는 리소그래피 장치 및 패턴 형성 방법
US9891529B2 (en) * 2014-03-28 2018-02-13 Taiwan Semiconductor Manufacturing Co., Ltd Light transmission device and method for semiconductor manufacturing process
KR102278879B1 (ko) * 2016-01-27 2021-07-19 주식회사 히타치하이테크 계측 장치, 방법 및 표시 장치
WO2019082311A1 (ja) * 2017-10-25 2019-05-02 株式会社ニコン 加工装置、及び、移動体の製造方法
US10757340B2 (en) 2018-03-09 2020-08-25 Pony Ai Inc. Adaptive filter system for self-driving vehicle
WO2019231518A1 (en) * 2018-05-31 2019-12-05 Applied Materials, Inc. Multi-substrate processing on digital lithography systems
JP7208728B2 (ja) * 2018-07-23 2023-01-19 キヤノン株式会社 露光装置、および物品の製造方法
CN110095948A (zh) * 2019-05-03 2019-08-06 南昌航空大学 一种基于组合dmd的光纤器件数字光刻方法
CN120522985A (zh) 2019-11-19 2025-08-22 应用材料公司 图案化层状结构的光刻设备、图案化系统与方法

Family Cites Families (71)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4666273A (en) * 1983-10-05 1987-05-19 Nippon Kogaku K. K. Automatic magnification correcting system in a projection optical apparatus
JPS6078454A (ja) 1983-10-05 1985-05-04 Nippon Kogaku Kk <Nikon> 投影露光装置
US4653903A (en) * 1984-01-24 1987-03-31 Canon Kabushiki Kaisha Exposure apparatus
US4780617A (en) * 1984-08-09 1988-10-25 Nippon Kogaku K.K. Method for successive alignment of chip patterns on a substrate
JPS6144429A (ja) 1984-08-09 1986-03-04 Nippon Kogaku Kk <Nikon> 位置合わせ方法、及び位置合せ装置
US4878086A (en) * 1985-04-01 1989-10-31 Canon Kabushiki Kaisha Flat panel display device and manufacturing of the same
JP2797250B2 (ja) * 1987-05-14 1998-09-17 株式会社ニコン 投影露光装置
JP2897355B2 (ja) * 1990-07-05 1999-05-31 株式会社ニコン アライメント方法，露光装置，並びに位置検出方法及び装置
JPH04130710A (ja) 1990-09-21 1992-05-01 Hitachi Ltd 露光装置
KR100300618B1 (ko) * 1992-12-25 2001-11-22 오노 시게오 노광방법,노광장치,및그장치를사용하는디바이스제조방법
JP3412704B2 (ja) 1993-02-26 2003-06-03 株式会社ニコン 投影露光方法及び装置、並びに露光装置
JP3379237B2 (ja) 1994-09-07 2003-02-24 株式会社ニコン 投影露光装置
JP3379238B2 (ja) 1994-09-08 2003-02-24 株式会社ニコン 走査型露光装置
US6018384A (en) * 1994-09-07 2000-01-25 Nikon Corporation Projection exposure system
US6169602B1 (en) 1995-02-12 2001-01-02 Nikon Corporation Inspection method and apparatus for projection optical systems
JP3506155B2 (ja) 1995-02-21 2004-03-15 株式会社ニコン 投影露光装置
JPH08306619A (ja) 1995-05-01 1996-11-22 Canon Inc 露光装置及びそれを用いたデバイスの製造方法
JPH08313842A (ja) 1995-05-15 1996-11-29 Nikon Corp 照明光学系および該光学系を備えた露光装置
JP3590822B2 (ja) * 1995-12-12 2004-11-17 株式会社ニコン 露光方法及び装置
JP3601174B2 (ja) * 1996-03-14 2004-12-15 株式会社ニコン 露光装置及び露光方法
JPH10116778A (ja) 1996-10-09 1998-05-06 Canon Inc スキャン露光装置
JP2953406B2 (ja) 1996-10-17 1999-09-27 日本電気株式会社 フォトマスクおよびその製造方法
SG102627A1 (en) 1996-11-28 2004-03-26 Nikon Corp Lithographic device
JP4029183B2 (ja) 1996-11-28 2008-01-09 株式会社ニコン 投影露光装置及び投影露光方法
JP4029182B2 (ja) 1996-11-28 2008-01-09 株式会社ニコン 露光方法
WO1998028665A1 (en) 1996-12-24 1998-07-02 Koninklijke Philips Electronics N.V. Two-dimensionally balanced positioning device with two object holders, and lithographic device provided with such a positioning device
US6235438B1 (en) 1997-10-07 2001-05-22 Nikon Corporation Projection exposure method and apparatus
JPH11195602A (ja) 1997-10-07 1999-07-21 Nikon Corp 投影露光方法及び装置
JP4210871B2 (ja) 1997-10-31 2009-01-21 株式会社ニコン 露光装置
US6020964A (en) 1997-12-02 2000-02-01 Asm Lithography B.V. Interferometer system and lithograph apparatus including an interferometer system
US6897963B1 (en) * 1997-12-18 2005-05-24 Nikon Corporation Stage device and exposure apparatus
JP4264676B2 (ja) 1998-11-30 2009-05-20 株式会社ニコン 露光装置及び露光方法
US6208407B1 (en) 1997-12-22 2001-03-27 Asm Lithography B.V. Method and apparatus for repetitively projecting a mask pattern on a substrate, using a time-saving height measurement
KR100841147B1 (ko) * 1998-03-11 2008-06-24 가부시키가이샤 니콘 레이저 장치, 자외광 조사 장치 및 방법, 물체의 패턴 검출장치 및 방법
WO1999049504A1 (fr) 1998-03-26 1999-09-30 Nikon Corporation Procede et systeme d'exposition par projection
JP2000021742A (ja) 1998-06-30 2000-01-21 Canon Inc 露光方法および露光装置
JP3969855B2 (ja) * 1998-07-02 2007-09-05 キヤノン株式会社 露光方法および露光装置
TW490596B (en) 1999-03-08 2002-06-11 Asm Lithography Bv Lithographic projection apparatus, method of manufacturing a device using the lithographic projection apparatus, device manufactured according to the method and method of calibrating the lithographic projection apparatus
US7116401B2 (en) 1999-03-08 2006-10-03 Asml Netherlands B.V. Lithographic projection apparatus using catoptrics in an optical sensor system, optical arrangement, method of measuring, and device manufacturing method
JP2000260684A (ja) * 1999-03-08 2000-09-22 Nikon Corp 露光装置、及び照明装置
JP4289755B2 (ja) * 2000-02-24 2009-07-01 キヤノン株式会社 露光量制御方法、デバイス製造方法および露光装置
JP2001297976A (ja) 2000-04-17 2001-10-26 Canon Inc 露光方法及び露光装置
JP2002014005A (ja) 2000-04-25 2002-01-18 Nikon Corp 空間像計測方法、結像特性計測方法、空間像計測装置及び露光装置
US20020041377A1 (en) 2000-04-25 2002-04-11 Nikon Corporation Aerial image measurement method and unit, optical properties measurement method and unit, adjustment method of projection optical system, exposure method and apparatus, making method of exposure apparatus, and device manufacturing method
EP1364257A1 (en) 2001-02-27 2003-11-26 ASML US, Inc. Simultaneous imaging of two reticles
EP1255162A1 (en) * 2001-05-04 2002-11-06 ASML Netherlands B.V. Lithographic apparatus
TW529172B (en) * 2001-07-24 2003-04-21 Asml Netherlands Bv Imaging apparatus
US6567217B1 (en) * 2001-11-06 2003-05-20 Eastman Kodak Company Image-forming system with enhanced gray levels
JP3809095B2 (ja) * 2001-11-29 2006-08-16 ペンタックス株式会社 露光装置用光源システムおよび露光装置
KR100927560B1 (ko) * 2002-01-29 2009-11-23 가부시키가이샤 니콘 이미지 형성 상태 조정 시스템, 노광 방법 및 노광 장치, 그리고 프로그램 및 정보 기록 매체
TWI298825B (en) * 2002-06-12 2008-07-11 Asml Netherlands Bv Lithographic apparatus and device manufacturing method
JP4546019B2 (ja) * 2002-07-03 2010-09-15 株式会社日立製作所 露光装置
JP2005536775A (ja) 2002-08-23 2005-12-02 株式会社ニコン 投影光学系、フォトリソグラフィ方法および露光装置、並びに露光装置を用いた方法
KR100585476B1 (ko) * 2002-11-12 2006-06-07 에이에스엠엘 네델란즈 비.브이. 리소그래피 장치 및 디바이스 제조방법
CN101382738B (zh) 2002-11-12 2011-01-12 Asml荷兰有限公司 光刻投射装置
EP1420298B1 (en) 2002-11-12 2013-02-20 ASML Netherlands B.V. Lithographic apparatus
ATE424026T1 (de) 2002-12-13 2009-03-15 Koninkl Philips Electronics Nv Flüssigkeitsentfernung in einem verfahren und einer einrichtung zum bestrahlen von flecken auf einer schicht
EP1732075A3 (en) 2002-12-19 2007-02-21 Koninklijke Philips Electronics N.V. Method and device for irradiating spots on a layer
EP2466621B1 (en) 2003-02-26 2015-04-01 Nikon Corporation Exposure apparatus, exposure method, and method for producing device
JP2004304135A (ja) 2003-04-01 2004-10-28 Nikon Corp 露光装置、露光方法及びマイクロデバイスの製造方法
US7348575B2 (en) 2003-05-06 2008-03-25 Nikon Corporation Projection optical system, exposure apparatus, and exposure method
SG10201405231YA (en) 2003-05-06 2014-09-26 Nippon Kogaku Kk Projection optical system, exposure apparatus, and exposure method
EP1491956B1 (en) * 2003-06-27 2006-09-06 ASML Netherlands B.V. Lithographic apparatus and device manufacturing method
WO2005029559A1 (ja) * 2003-09-19 2005-03-31 Nikon Corporation 露光装置及びデバイス製造方法
JP5106858B2 (ja) 2003-12-15 2012-12-26 カール・ツァイス・エスエムティー・ゲーエムベーハー 高開口数と平面状端面とを有する投影対物レンズ
WO2005059645A2 (en) 2003-12-19 2005-06-30 Carl Zeiss Smt Ag Microlithography projection objective with crystal elements
US7158208B2 (en) * 2004-06-30 2007-01-02 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US7394080B2 (en) * 2004-12-23 2008-07-01 Taiwan Semiconductor Manufacturing Company, Ltd. Mask superposition for multiple exposures
US7209217B2 (en) * 2005-04-08 2007-04-24 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method utilizing plural patterning devices
US7924406B2 (en) * 2005-07-13 2011-04-12 Asml Netherlands B.V. Stage apparatus, lithographic apparatus and device manufacturing method having switch device for two illumination channels
TW200801833A (en) * 2006-02-16 2008-01-01 Nikon Corp Exposure apparatus, exposure method and device manufacturing method

Also Published As

Publication number Publication date
US20070273858A1 (en) 2007-11-29
US20100231879A1 (en) 2010-09-16
EP1990828A1 (en) 2008-11-12
US7714982B2 (en) 2010-05-11
KR20080102390A (ko) 2008-11-25
JPWO2007094470A1 (ja) 2009-07-09
WO2007094470A1 (ja) 2007-08-23
EP1990828A4 (en) 2010-09-15

Similar Documents

Publication Publication Date Title
TW200801833A (en) Exposure apparatus, exposure method and device manufacturing method
TW200741818A (en) Exposure apparatus and device manufacturing method
EP1840945A4 (en) METHOD FOR ADJUSTING AN OPTICAL LIGHTING DEVICE, OPTICAL LIGHTING DEVICE, EXPOSURE SYSTEM AND EXPOSURE METHOD
TW200736849A (en) Exposure apparatus and device manufacturing method
TW200736850A (en) Exposure apparatus, exposure method, and device manufacturing method
EP1994802A4 (en) SYSTEM AND METHOD FOR CONTROLLING THE INTENSITY OF A LIGHT SOURCE
EP1742110A3 (en) Lithographic apparatus, contaminant trap, and device manufacturing method
EP1735811A4 (en) Method and system for ultrafast photoelectron microscope
EP1670069A4 (en) LINEAR LIGHT SOURCE AND MANUFACTURING METHOD AND SURFACE EMISSION ELEMENT
FI20020854A7 (fi) Laitteisto ja menetelmä viemäriputkien tarkastamiseksi
SG10201602750RA (en) Illumination Optical System, Exposure Apparatus, And Device Manufacturing Method
SG148015A1 (en) Lithographic apparatus and device manufacturing method
PE20120627A1 (es) Sistema para la medicion del desplazamiento de una superficie relativa a una base de referencia
EP1979744A4 (en) COMPUTER IMPLEMENTED LAND PLANNING SYSTEM AND METHOD
EP1775755A4 (en) EUV LIGHTING SOURCE, EUV EXPOSURE SYSTEM AND METHOD FOR MANUFACTURING SEMICONDUCTOR COMPONENTS
EP1953805A4 (en) OPTICAL LIGHTING SYSTEM, EXPOSURE SYSTEM AND EXPOSURE METHOD
EP1853954A4 (en) METHOD AND APPARATUS FOR EXTRACTING THE LIGHT OF AN OPTICAL WAVEGUIDE
EP2001042A4 (en) OPTICAL LIGHTING SYSTEM, EXPOSURE SYSTEM AND DEVICE MANUFACTURING METHOD
WO2008050349A3 (en) System and method for monitoring water transmission of uv light in disinfection systems
TW200731025A (en) Exposure apparatus, exposure method, and device production method
TW200741373A (en) Exposure apparatus and device production method
GB2427914B (en) Method And System For Image Processing For Profiling With Uncoded Structured Light
EP1782510A4 (en) LIGHT SOURCE BASED ON A FIBER AMPLIFIER FOR CONTROLLING SEMICONDUCTORS
EP1811544A4 (en) OPTICAL LIGHTING DEVICE, EXPOSURE SYSTEM, AND EXPOSURE METHOD
WO2006077105A3 (en) System and method for optically imaging objects on a detection device by means of a pinhole aperture