TW200818995A - Structure for attaching plasma gun to chamber - Google Patents

Structure for attaching plasma gun to chamber Download PDF

Info

Publication number: TW200818995A
Authority: TW; Taiwan
Prior art keywords: plasma; flange; chamber; positioning; hole
Prior art date: 2006-09-11

Application number

TW96127187A

Other languages

English (en)

Chinese (zh)

Inventor

Motoi Okada

Kenji Yamakawa

Takeshi Furutsuka

Yoshiro Murashita

Original Assignee

Shinmaywa Ind Ltd

Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)

2006-09-11

Filing date

2007-07-26

Publication date

2008-04-16

2007-07-26 Application filed by Shinmaywa Ind Ltd filed Critical Shinmaywa Ind Ltd

2008-04-16 Publication of TW200818995A publication Critical patent/TW200818995A/zh

Links

XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims description 6
238000010276 construction Methods 0.000 claims description 4
238000006116 polymerization reaction Methods 0.000 claims description 4
239000002002 slurry Substances 0.000 claims description 2
229920000642 polymer Polymers 0.000 claims 1
238000001816 cooling Methods 0.000 description 83
239000002826 coolant Substances 0.000 description 50
230000002093 peripheral effect Effects 0.000 description 23
230000001681 protective effect Effects 0.000 description 11
238000005192 partition Methods 0.000 description 9
238000009434 installation Methods 0.000 description 7
239000002131 composite material Substances 0.000 description 6
238000000034 method Methods 0.000 description 6
239000000463 material Substances 0.000 description 4
238000003825 pressing Methods 0.000 description 4
238000004891 communication Methods 0.000 description 3
230000005611 electricity Effects 0.000 description 3
XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 2
ZOKXTWBITQBERF-UHFFFAOYSA-N Molybdenum Chemical compound [Mo] ZOKXTWBITQBERF-UHFFFAOYSA-N 0.000 description 2
238000009833 condensation Methods 0.000 description 2
230000005494 condensation Effects 0.000 description 2
239000007789 gas Substances 0.000 description 2
210000004185 liver Anatomy 0.000 description 2
229910052750 molybdenum Inorganic materials 0.000 description 2
239000011733 molybdenum Substances 0.000 description 2
230000000149 penetrating effect Effects 0.000 description 2
WFKWXMTUELFFGS-UHFFFAOYSA-N tungsten Chemical compound [W] WFKWXMTUELFFGS-UHFFFAOYSA-N 0.000 description 2
229910052721 tungsten Inorganic materials 0.000 description 2
239000010937 tungsten Substances 0.000 description 2
244000007835 Cyamopsis tetragonoloba Species 0.000 description 1
229910025794 LaB6 Inorganic materials 0.000 description 1
244000046052 Phaseolus vulgaris Species 0.000 description 1
235000010627 Phaseolus vulgaris Nutrition 0.000 description 1
239000003708 ampul Substances 0.000 description 1
229910052786 argon Inorganic materials 0.000 description 1
210000003050 axon Anatomy 0.000 description 1
239000011324 bead Substances 0.000 description 1
230000005540 biological transmission Effects 0.000 description 1
230000015572 biosynthetic process Effects 0.000 description 1
230000009194 climbing Effects 0.000 description 1
230000008878 coupling Effects 0.000 description 1
238000010168 coupling process Methods 0.000 description 1
238000005859 coupling reaction Methods 0.000 description 1
210000004262 dental pulp cavity Anatomy 0.000 description 1
238000010586 diagram Methods 0.000 description 1
238000007599 discharging Methods 0.000 description 1
239000003814 drug Substances 0.000 description 1
238000011156 evaluation Methods 0.000 description 1
238000000605 extraction Methods 0.000 description 1
238000003780 insertion Methods 0.000 description 1
230000037431 insertion Effects 0.000 description 1
239000011810 insulating material Substances 0.000 description 1
238000009413 insulation Methods 0.000 description 1
229910052746 lanthanum Inorganic materials 0.000 description 1
FZLIPJUXYLNCLC-UHFFFAOYSA-N lanthanum atom Chemical compound [La] FZLIPJUXYLNCLC-UHFFFAOYSA-N 0.000 description 1
235000011962 puddings Nutrition 0.000 description 1
230000000717 retained effect Effects 0.000 description 1
230000033764 rhythmic process Effects 0.000 description 1
239000002689 soil Substances 0.000 description 1
238000000638 solvent extraction Methods 0.000 description 1
238000012546 transfer Methods 0.000 description 1

Classifications

- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/32431—Constructional details of the reactor
- H01J37/32458—Vessel
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
- H01J2237/06—Sources
- H01J2237/08—Ion sources

Landscapes

Physics & Mathematics (AREA)
Engineering & Computer Science (AREA)
Plasma & Fusion (AREA)
Chemical & Material Sciences (AREA)
Analytical Chemistry (AREA)
Plasma Technology (AREA)
Physical Vapour Deposition (AREA)

TW96127187A 2006-09-11 2007-07-26 Structure for attaching plasma gun to chamber TW200818995A (en)

Applications Claiming Priority (1)

Application Number	Priority Date	Filing Date	Title
JP2006245759A JP4641014B2 (ja)	2006-09-11	2006-09-11	プラズマガンのチャンバへの取り付け構造

Publications (1)

Publication Number	Publication Date
TW200818995A true TW200818995A (en)	2008-04-16

Family

ID=39183557

Family Applications (1)

Application Number	Title	Priority Date	Filing Date
TW96127187A TW200818995A (en)	2006-09-11	2007-07-26	Structure for attaching plasma gun to chamber

Country Status (3)

Country	Link
JP (1)	JP4641014B2 (ja)
TW (1)	TW200818995A (ja)
WO (1)	WO2008032489A1 (ja)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number	Priority date	Publication date	Assignee	Title
TWI554630B (zh) *	2010-07-02	2016-10-21	應用材料股份有限公司	減少沉積不對稱性的沉積設備及方法
WO2016185714A1 (ja) *	2015-05-19	2016-11-24	株式会社アルバック	マグネトロンスパッタリング装置用の回転式カソードユニット
CH712835A1 (de) *	2016-08-26	2018-02-28	Amt Ag	Plasmaspritzvorrichtung.
CN108601192B (zh) *	2018-06-25	2019-07-12	超力等离子技术(常州)有限公司	一种等离子发生器

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number	Priority date	Publication date	Assignee	Title
JPS5980469U (ja) *	1982-11-22	1984-05-31	日本電気株式会社	スパツタリング装置用タ−ゲツト
JPH05287521A (ja) *	1992-04-09	1993-11-02	Tel Varian Ltd	スパッタ装置
JPH11315371A (ja) *	1998-05-07	1999-11-16	Sumitomo Heavy Ind Ltd	真空成膜装置のプラズマ源

2006
- 2006-09-11 JP JP2006245759A patent/JP4641014B2/ja not_active Expired - Fee Related
2007
- 2007-07-23 WO PCT/JP2007/064418 patent/WO2008032489A1/ja not_active Ceased
- 2007-07-26 TW TW96127187A patent/TW200818995A/zh unknown

Also Published As

Publication number	Publication date
JP4641014B2 (ja)	2011-03-02
WO2008032489A1 (en)	2008-03-20
JP2008066240A (ja)	2008-03-21

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