TW201005129A - Modified copper-tin electrolyte and process for the deposition of bronze layers - Google Patents
Modified copper-tin electrolyte and process for the deposition of bronze layers Download PDFInfo
- Publication number
- TW201005129A TW201005129A TW098112181A TW98112181A TW201005129A TW 201005129 A TW201005129 A TW 201005129A TW 098112181 A TW098112181 A TW 098112181A TW 98112181 A TW98112181 A TW 98112181A TW 201005129 A TW201005129 A TW 201005129A
- Authority
- TW
- Taiwan
- Prior art keywords
- electrolyte
- tin
- copper
- range
- group
- Prior art date
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D3/00—Electroplating: Baths therefor
- C25D3/02—Electroplating: Baths therefor from solutions
- C25D3/56—Electroplating: Baths therefor from solutions of alloys
- C25D3/58—Electroplating: Baths therefor from solutions of alloys containing more than 50% by weight of copper
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D17/00—Constructional parts, or assemblies thereof, of cells for electrolytic coating
- C25D17/002—Cell separation, e.g. membranes, diaphragms
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D3/00—Electroplating: Baths therefor
- C25D3/02—Electroplating: Baths therefor from solutions
- C25D3/56—Electroplating: Baths therefor from solutions of alloys
- C25D3/60—Electroplating: Baths therefor from solutions of alloys containing more than 50% by weight of tin
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Electrochemistry (AREA)
- Materials Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Electroplating And Plating Baths Therefor (AREA)
- Electroplating Methods And Accessories (AREA)
- Chemically Coating (AREA)
- Electrolytic Production Of Metals (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| EP08008637A EP2116634B1 (de) | 2008-05-08 | 2008-05-08 | Modifizierter Kupfer-Zinn-Elektrolyt und Verfahren zur Abscheidung von Bronzeschichten |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| TW201005129A true TW201005129A (en) | 2010-02-01 |
Family
ID=39639007
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| TW098112181A TW201005129A (en) | 2008-05-08 | 2009-04-13 | Modified copper-tin electrolyte and process for the deposition of bronze layers |
Country Status (11)
| Country | Link |
|---|---|
| US (1) | US20110089043A1 (de) |
| EP (1) | EP2116634B1 (de) |
| JP (1) | JP2011520037A (de) |
| KR (1) | KR20110011613A (de) |
| CN (1) | CN102016130B (de) |
| AT (1) | ATE486157T1 (de) |
| DE (1) | DE502008001647D1 (de) |
| MX (1) | MX2010012041A (de) |
| PL (1) | PL2116634T3 (de) |
| TW (1) | TW201005129A (de) |
| WO (1) | WO2009135572A2 (de) |
Families Citing this family (13)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP5569718B2 (ja) * | 2009-08-21 | 2014-08-13 | キザイ株式会社 | シアンフリー光沢銅−スズ合金めっき浴 |
| KR101236165B1 (ko) * | 2011-02-15 | 2013-02-22 | (주)지오데코 | 친환경 3원 합금 도금액 및 이를 이용한 금속 표면 처리방법 |
| DE102011121798B4 (de) | 2011-12-21 | 2013-08-29 | Umicore Galvanotechnik Gmbh | Elektrolyt und Verfahren zur elektrolytischen Abscheidung von Cu-Zn-Sn-Legierungsschichten und Verfahren zur Herstellung einer Dünnschichtsolarzelle |
| DE102011121799B4 (de) * | 2011-12-21 | 2013-08-29 | Umicore Galvanotechnik Gmbh | Elektrolyt und Verfahren zur elektrolytischen Abscheidung von Cu-Zn-Sn-Legierungsschichten und Verfahren zur Herstellung einer Dünnschichtsolarzelle |
| JP5952093B2 (ja) * | 2012-05-31 | 2016-07-13 | ローム・アンド・ハース電子材料株式会社 | 電解銅めっき液及び電解銅めっき方法 |
| JP6093143B2 (ja) * | 2012-10-19 | 2017-03-08 | 株式会社シミズ | 非シアン銅‐錫合金めっき浴 |
| CN105189831A (zh) * | 2013-03-21 | 2015-12-23 | 安美特德国有限公司 | 用于在工件上电解沉积金属层的装置和方法 |
| AR100422A1 (es) * | 2014-05-15 | 2016-10-05 | Nippon Steel & Sumitomo Metal Corp | Solución para deposición para conexión roscada para un caño o tubo y método de producción de la conexión roscada para un caño o tubo |
| CN104152955A (zh) * | 2014-07-17 | 2014-11-19 | 广东致卓精密金属科技有限公司 | 碱性溶液电镀光亮白铜锡电镀液及工艺 |
| CN111276725B (zh) * | 2017-11-19 | 2021-10-08 | 湖南辰砾新材料有限公司 | 一种阴离子交换膜燃料电池 |
| BE1027099B1 (nl) * | 2019-03-08 | 2020-10-05 | Umicore Nv | Werkwijze voor elektrolytische koperwinning |
| DE202021004169U1 (de) | 2021-07-02 | 2022-12-07 | Umicore Galvanotechnik Gmbh | Bronzeschicht als Edelmetallersatz in Smart Cards |
| DE102021117095A1 (de) | 2021-07-02 | 2023-01-05 | Umicore Galvanotechnik Gmbh | Bronzeschichten als Edelmetallersatz |
Family Cites Families (14)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US2198365A (en) * | 1938-06-29 | 1940-04-23 | Special Chemicals Corp | Electroplating |
| US3227638A (en) * | 1961-06-16 | 1966-01-04 | Robert H Burnson | Alkali cyanide bath and process for electroplating therewith |
| DE3346721A1 (de) * | 1983-12-23 | 1985-06-27 | Fa. Karl-Wilh. Hen, 5820 Gevelsberg | Alkalisches bad zum aufbringen eines hochglaenzenden galvanischen ueberzugs auf einen traeger |
| JPH02175894A (ja) * | 1988-12-28 | 1990-07-09 | Kosaku:Kk | スズ、スズ合金電気めっき方法及び同電気めっき装置 |
| US5194140A (en) * | 1991-11-27 | 1993-03-16 | Macdermid, Incorporated | Electroplating composition and process |
| DE4324995C2 (de) * | 1993-07-26 | 1995-12-21 | Demetron Gmbh | Cyanidisch-alkalische Bäder zur galvanischen Abscheidung von Kupfer-Zinn-Legierungsüberzügen |
| JP3674887B2 (ja) * | 1996-09-30 | 2005-07-27 | 日本ニュークローム株式会社 | 銅−スズ合金メッキ用ピロリン酸浴 |
| SG68083A1 (en) * | 1997-10-30 | 1999-10-19 | Sung Soo Moon | Tin alloy plating compositions |
| US6508927B2 (en) * | 1998-11-05 | 2003-01-21 | C. Uyemura & Co., Ltd. | Tin-copper alloy electroplating bath |
| JP2001181889A (ja) * | 1999-12-22 | 2001-07-03 | Nippon Macdermid Kk | 光沢錫−銅合金電気めっき浴 |
| JP3455712B2 (ja) * | 2000-04-14 | 2003-10-14 | 日本ニュークローム株式会社 | 銅−スズ合金めっき用ピロリン酸浴 |
| DE10046600C2 (de) | 2000-09-20 | 2003-02-20 | Schloetter Fa Dr Ing Max | Elektrolyt und Verfahren zur Abscheidung von Zinn-Kupfer-Legierungsschichten und Verwendung des Elektrolyten |
| JP4249438B2 (ja) * | 2002-07-05 | 2009-04-02 | 日本ニュークローム株式会社 | 銅―錫合金めっき用ピロリン酸浴 |
| ES2531163T3 (es) | 2002-10-11 | 2015-03-11 | Enthone | Procedimiento y electrolito para la deposición galvánica de bronces |
-
2008
- 2008-05-08 EP EP08008637A patent/EP2116634B1/de not_active Not-in-force
- 2008-05-08 DE DE502008001647T patent/DE502008001647D1/de active Active
- 2008-05-08 PL PL08008637T patent/PL2116634T3/pl unknown
- 2008-05-08 AT AT08008637T patent/ATE486157T1/de active
-
2009
- 2009-03-31 WO PCT/EP2009/002323 patent/WO2009135572A2/en not_active Ceased
- 2009-03-31 CN CN2009801164345A patent/CN102016130B/zh not_active Expired - Fee Related
- 2009-03-31 US US12/991,575 patent/US20110089043A1/en not_active Abandoned
- 2009-03-31 JP JP2011507800A patent/JP2011520037A/ja active Pending
- 2009-03-31 MX MX2010012041A patent/MX2010012041A/es active IP Right Grant
- 2009-03-31 KR KR1020107024999A patent/KR20110011613A/ko not_active Withdrawn
- 2009-04-13 TW TW098112181A patent/TW201005129A/zh unknown
Also Published As
| Publication number | Publication date |
|---|---|
| JP2011520037A (ja) | 2011-07-14 |
| WO2009135572A2 (en) | 2009-11-12 |
| DE502008001647D1 (de) | 2010-12-09 |
| ATE486157T1 (de) | 2010-11-15 |
| KR20110011613A (ko) | 2011-02-08 |
| HK1152352A1 (en) | 2012-02-24 |
| US20110089043A1 (en) | 2011-04-21 |
| PL2116634T3 (pl) | 2011-04-29 |
| WO2009135572A3 (en) | 2009-12-30 |
| MX2010012041A (es) | 2011-03-04 |
| CN102016130A (zh) | 2011-04-13 |
| CN102016130B (zh) | 2013-03-13 |
| EP2116634B1 (de) | 2010-10-27 |
| EP2116634A1 (de) | 2009-11-11 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| TW201005129A (en) | Modified copper-tin electrolyte and process for the deposition of bronze layers | |
| JP6534391B2 (ja) | 三価クロムを含有する電気めっき浴及びクロムを析出させる方法 | |
| CN101622379B (zh) | 铜-锡-电解液和沉积青铜层的方法 | |
| TWI441958B (zh) | 供銅-錫合金進行無氰化物沈積用之含焦磷酸鹽浴 | |
| CN102171387B (zh) | 具有改善的白度的铂-铑层的沉积方法 | |
| TWI439580B (zh) | 用於電鍍錫合金層之焦磷酸鹽基浴 | |
| CN106661753A (zh) | 离子液体电解质和电沉积金属的方法 | |
| CN103069054B (zh) | 用于沉积铜-锡合金层的电解质和方法 | |
| CN104911648A (zh) | 无氰化物的酸性亚光银电镀组合物及方法 | |
| US20030085130A1 (en) | Zinc-nickel electrolyte and method for depositing a zinc-nickel alloy therefrom | |
| WO2006052310A2 (en) | Nickel electroplating bath designed to replace monovalent copper strike solutions | |
| CA2236933A1 (en) | Electroplating of low-stress nickel | |
| WO2018234229A1 (en) | NICKEL ELECTROPLACING BATH FOR DEPOSITION OF A DECORATIVE NICKEL COATING ON A SUBSTRATE | |
| JPS6141998B2 (de) | ||
| US4465563A (en) | Electrodeposition of palladium-silver alloys | |
| KR20230113355A (ko) | 루테늄 합금 층 및 이의 층 조합 | |
| FI3415665T3 (fi) | Menetelmä sinkki-nikkeliseoskerroksien erottamiseksi galvaanisesti emäksisestä sinkki-nikkeliseoskylvystä vähemmällä lisäaineiden hajoamisella | |
| JP7121390B2 (ja) | すず合金電気めっき浴及びそれを用いためっき方法 | |
| HK1152352B (en) | Modified copper-tin electrolyte and process for the deposition of bronze layers | |
| HK1137785B (en) | Copper-tin electrolyte and method for depositing bronze layers | |
| US20120217166A1 (en) | Process for the electrolytic copper plating of zinc diecasting having a reduced tendency to blister formation |