TW376541B - Electron beam exposure correcting method - Google Patents

Electron beam exposure correcting method

Info

Publication number
TW376541B
TW376541B TW086112116A TW86112116A TW376541B TW 376541 B TW376541 B TW 376541B TW 086112116 A TW086112116 A TW 086112116A TW 86112116 A TW86112116 A TW 86112116A TW 376541 B TW376541 B TW 376541B
Authority
TW
Taiwan
Prior art keywords
exposure amount
mask
area
opening
electron beam
Prior art date
Application number
TW086112116A
Other languages
English (en)
Inventor
Takao Tamura
Original Assignee
Nec Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nec Corp filed Critical Nec Corp
Application granted granted Critical
Publication of TW376541B publication Critical patent/TW376541B/zh

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
    • H01J37/304—Controlling tubes by information coming from the objects or from the beam, e.g. correction signals
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P76/00—Manufacture or treatment of masks on semiconductor bodies, e.g. by lithography or photolithography
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/30—Electron or ion beam tubes for processing objects
    • H01J2237/304—Controlling tubes
    • H01J2237/30455—Correction during exposure
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/30—Electron or ion beam tubes for processing objects
    • H01J2237/317—Processing objects on a microscale
    • H01J2237/3175—Lithography

Landscapes

  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Electron Beam Exposure (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
TW086112116A 1996-08-23 1997-08-22 Electron beam exposure correcting method TW376541B (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP08222239A JP3080006B2 (ja) 1996-08-23 1996-08-23 電子ビーム露光補正方法

Publications (1)

Publication Number Publication Date
TW376541B true TW376541B (en) 1999-12-11

Family

ID=16779294

Family Applications (1)

Application Number Title Priority Date Filing Date
TW086112116A TW376541B (en) 1996-08-23 1997-08-22 Electron beam exposure correcting method

Country Status (4)

Country Link
US (1) US5825034A (zh)
JP (1) JP3080006B2 (zh)
KR (1) KR100256519B1 (zh)
TW (1) TW376541B (zh)

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100374635B1 (ko) * 2000-09-27 2003-03-04 삼성전자주식회사 포토마스크의 식각시 발생하는 로딩효과로 인한선폭변화를 보정하여 노광하는 방법 및 이를 기록한기록매체
KR100533884B1 (ko) * 2003-12-31 2005-12-07 동부아남반도체 주식회사 반도체의 테스트 마스크 패턴, 그 형성 방법 및 이를이용한 마스크 에러 증강 요소 측정방법
JP2019169362A (ja) * 2018-03-23 2019-10-03 株式会社日立製作所 電子ビーム装置
JP2019220559A (ja) 2018-06-19 2019-12-26 株式会社ニューフレアテクノロジー マルチ荷電粒子ビーム描画装置及びそのビーム評価方法
CA3215592A1 (en) * 2021-04-16 2022-10-20 Ruth Shewmon Bloom Arbitrary electron dose waveforms for electron microscopy
US12237147B2 (en) 2023-01-31 2025-02-25 Integrated Dynamic Electron Solutions, Inc. Methods and systems for event modulated electron microscopy

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3272820B2 (ja) * 1993-06-24 2002-04-08 富士通株式会社 電子ビーム露光装置及び方法

Also Published As

Publication number Publication date
JPH1064794A (ja) 1998-03-06
US5825034A (en) 1998-10-20
KR100256519B1 (ko) 2000-06-01
JP3080006B2 (ja) 2000-08-21
KR19980019015A (ko) 1998-06-05

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