TWI398480B - 樹脂組成物及使用其形成之光學膜 - Google Patents

樹脂組成物及使用其形成之光學膜 Download PDF

Info

Publication number
TWI398480B
TWI398480B TW098114364A TW98114364A TWI398480B TW I398480 B TWI398480 B TW I398480B TW 098114364 A TW098114364 A TW 098114364A TW 98114364 A TW98114364 A TW 98114364A TW I398480 B TWI398480 B TW I398480B
Authority
TW
Taiwan
Prior art keywords
unit
resin composition
copolymer
group
cyclic
Prior art date
Application number
TW098114364A
Other languages
English (en)
Chinese (zh)
Other versions
TW200948887A (en
Inventor
嚴準槿
李敏熙
李南貞
李宗勳
金東烈
曹沙鋎
Original Assignee
Lg化學公司
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Lg化學公司 filed Critical Lg化學公司
Publication of TW200948887A publication Critical patent/TW200948887A/zh
Application granted granted Critical
Publication of TWI398480B publication Critical patent/TWI398480B/zh

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08FMACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F220/00Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride ester, amide, imide or nitrile thereof
    • C08F220/02Monocarboxylic acids having less than ten carbon atoms; Derivatives thereof
    • C08F220/04Acids; Metal salts or ammonium salts thereof
    • C08F220/06Acrylic acid; Methacrylic acid; Metal salts or ammonium salts thereof
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08LCOMPOSITIONS OF MACROMOLECULAR COMPOUNDS
    • C08L33/00Compositions of homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical, or of salts, anhydrides, esters, amides, imides or nitriles thereof; Compositions of derivatives of such polymers
    • C08L33/04Homopolymers or copolymers of esters
    • C08L33/06Homopolymers or copolymers of esters of esters containing only carbon, hydrogen and oxygen, which oxygen atoms are present only as part of the carboxyl radical
    • C08L33/10Homopolymers or copolymers of methacrylic acid esters
    • C08L33/12Homopolymers or copolymers of methyl methacrylate
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08FMACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F212/00Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by an aromatic carbocyclic ring
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08FMACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F212/00Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by an aromatic carbocyclic ring
    • C08F212/02Monomers containing only one unsaturated aliphatic radical
    • C08F212/04Monomers containing only one unsaturated aliphatic radical containing one ring
    • C08F212/06Hydrocarbons
    • C08F212/08Styrene
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08JWORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
    • C08J5/00Manufacture of articles or shaped materials containing macromolecular substances
    • C08J5/18Manufacture of films or sheets
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08FMACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F222/00Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by a carboxyl radical and containing at least one other carboxyl radical in the molecule; Salts, anhydrides, esters, amides, imides, or nitriles thereof
    • C08F222/36Amides or imides
    • C08F222/40Imides, e.g. cyclic imides
    • C08F222/402Alkyl substituted imides
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08JWORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
    • C08J2333/00Characterised by the use of homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical, or of salts, anhydrides, esters, amides, imides, or nitriles thereof; Derivatives of such polymers
    • C08J2333/04Characterised by the use of homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical, or of salts, anhydrides, esters, amides, imides, or nitriles thereof; Derivatives of such polymers esters
    • C08J2333/06Characterised by the use of homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical, or of salts, anhydrides, esters, amides, imides, or nitriles thereof; Derivatives of such polymers esters of esters containing only carbon, hydrogen, and oxygen, the oxygen atom being present only as part of the carboxyl radical
    • C08J2333/10Homopolymers or copolymers of methacrylic acid esters
    • C08J2333/12Homopolymers or copolymers of methyl methacrylate
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08JWORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
    • C08J2425/00Characterised by the use of homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by an aromatic carbocyclic ring; Derivatives of such polymers
    • C08J2425/02Homopolymers or copolymers of hydrocarbons
    • C08J2425/04Homopolymers or copolymers of styrene
    • C08J2425/08Copolymers of styrene
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08JWORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
    • C08J2471/00Characterised by the use of polyethers obtained by reactions forming an ether link in the main chain; Derivatives of such polymers
    • C08J2471/08Polyethers derived from hydroxy compounds or from their metallic derivatives
    • C08J2471/10Polyethers derived from hydroxy compounds or from their metallic derivatives from phenols
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08LCOMPOSITIONS OF MACROMOLECULAR COMPOUNDS
    • C08L25/00Compositions of, homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by an aromatic carbocyclic ring; Compositions of derivatives of such polymers
    • C08L25/02Homopolymers or copolymers of hydrocarbons
    • C08L25/04Homopolymers or copolymers of styrene
    • C08L25/06Polystyrene

Landscapes

  • Chemical & Material Sciences (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Organic Chemistry (AREA)
  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Materials Engineering (AREA)
  • Polarising Elements (AREA)
  • Manufacture Of Macromolecular Shaped Articles (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
TW098114364A 2008-04-30 2009-04-30 樹脂組成物及使用其形成之光學膜 TWI398480B (zh)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
KR20080040843 2008-04-30
KR1020090002069A KR101105424B1 (ko) 2008-04-30 2009-01-09 수지 조성물 및 이를 이용하여 형성된 광학 필름

Publications (2)

Publication Number Publication Date
TW200948887A TW200948887A (en) 2009-12-01
TWI398480B true TWI398480B (zh) 2013-06-11

Family

ID=41255571

Family Applications (1)

Application Number Title Priority Date Filing Date
TW098114364A TWI398480B (zh) 2008-04-30 2009-04-30 樹脂組成物及使用其形成之光學膜

Country Status (7)

Country Link
US (1) US8344083B2 (de)
EP (1) EP2272879B1 (de)
JP (1) JP5335070B2 (de)
KR (1) KR101105424B1 (de)
CN (1) CN102015793B (de)
TW (1) TWI398480B (de)
WO (1) WO2009134097A2 (de)

Families Citing this family (37)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20090076753A (ko) 2008-01-08 2009-07-13 주식회사 엘지화학 투명한 수지 조성물
KR20090076754A (ko) * 2008-01-08 2009-07-13 주식회사 엘지화학 광학 필름, 위상차 필름, 보호 필름 및 이들을 포함하는액정 표시 장치
KR101091534B1 (ko) * 2008-04-30 2011-12-13 주식회사 엘지화학 광학 필름 및 이를 포함하는 정보전자 장치
US8613986B2 (en) * 2008-04-30 2013-12-24 Lg Chem, Ltd. Optical film and information technology apparatus comprising the same
KR101105424B1 (ko) 2008-04-30 2012-01-17 주식회사 엘지화학 수지 조성물 및 이를 이용하여 형성된 광학 필름
KR101270220B1 (ko) 2011-04-13 2013-05-30 주식회사 엘지화학 광학 필름용 아크릴계 공중합체 수지의 제조방법 및 이를 이용한 광학필름의 제조방법
WO2012141453A2 (en) * 2011-04-13 2012-10-18 Lg Chem, Ltd. Method of preparing resin composition for optical film by using continuous bulk polymerization and methods of preparing optical film and polarizing plate using the resin composition
KR101409208B1 (ko) * 2011-04-13 2014-06-20 주식회사 엘지화학 연속괴상중합법에 의한 광학 필름용 수지 조성물의 제조 방법, 이를 이용한 광학 필름의 제조 방법 및 편광판 제조 방법
KR101269673B1 (ko) * 2011-04-13 2013-05-30 주식회사 엘지화학 광학 필름용 수지 조성물 및 이를 이용한 광학 필름
WO2012141422A1 (en) * 2011-04-13 2012-10-18 Lg Chem, Ltd. Method for preparing acrylic copolymer resin for optical film and method for fabricating optical film using the same
WO2012141413A1 (en) * 2011-04-13 2012-10-18 Lg Chem, Ltd. Resin composition for optical film and optical film using the same
KR101347021B1 (ko) 2011-06-01 2014-01-07 주식회사 엘지화학 수지 조성물 및 이를 이용하여 형성된 광학 필름
WO2012165755A1 (en) * 2011-06-01 2012-12-06 Lg Chem, Ltd. Resin composition and optical film formed by using the same
TWI516537B (zh) * 2011-10-04 2016-01-11 Lg化學股份有限公司 樹脂組成物及使用其形成之光學補償膜
WO2013051802A1 (ko) * 2011-10-05 2013-04-11 주식회사 엘지화학 광학 필름용 수지 조성물 및 이를 이용한 보상필름
KR101418755B1 (ko) 2011-10-05 2014-07-11 주식회사 엘지화학 광학 필름용 수지 조성물 및 이를 이용한 보상필름
TWI533036B (zh) 2011-10-14 2016-05-11 Lg化學股份有限公司 兩側具有保護膜之偏光件及包含其之光學裝置
TWI607073B (zh) 2011-10-14 2017-12-01 Lg化學股份有限公司 用於偏光板之黏著劑及包含其之偏光板
US9523792B2 (en) 2011-10-14 2016-12-20 Lg Chem, Ltd. Polarizer having protection films in two sides and optical device comprising the same
KR101579646B1 (ko) 2012-05-31 2015-12-24 주식회사 엘지화학 기능성 코팅층을 포함하는 광학 필름, 이를 포함하는 편광판 및 화상표시장치
US20150203610A1 (en) * 2012-07-30 2015-07-23 Denki Kagaku Kogyo Kabushiki Kaisha Copolymer for improving methacrylic resin heat resistance
KR101627904B1 (ko) 2013-02-21 2016-06-13 주식회사 엘지화학 양면형 편광판의 제조방법 및 이로부터 제조된 양면형 편광판
US9088009B2 (en) * 2013-03-28 2015-07-21 Lg Chem, Ltd. Resin composition, optical film and organic light emitting display device
KR20140118879A (ko) 2013-03-28 2014-10-08 주식회사 엘지화학 양면형 편광판의 제조방법 및 이로부터 제조된 양면형 편광판
EP2840124B1 (de) 2013-06-18 2019-01-30 LG Chem, Ltd. Radikalisch härtbare haftstoffzusammensetzung und polarisierungsplatte damit
KR101503216B1 (ko) 2013-06-18 2015-03-17 주식회사 엘지화학 라디칼 경화형 접착제 조성물 및 이를 포함하는 편광판
WO2015046971A1 (ko) 2013-09-30 2015-04-02 주식회사 엘지화학 기능성 코팅층을 포함하는 광학 필름, 이를 포함하는 편광판 및 화상표시장치
KR101584895B1 (ko) 2013-09-30 2016-01-13 주식회사 엘지화학 편광판
KR101496617B1 (ko) 2013-09-30 2015-02-25 주식회사 엘지화학 편광판
KR101620164B1 (ko) 2013-09-30 2016-05-12 주식회사 엘지화학 라디칼 경화형 접착제 조성물 및 이를 포함하는 편광판
KR101650235B1 (ko) 2013-09-30 2016-08-22 주식회사 엘지화학 편광판
JP6075424B2 (ja) * 2014-09-30 2017-02-08 住友化学株式会社 偏光板、液晶表示装置及び有機エレクトロルミネッセンス表示装置
WO2016076357A1 (ja) * 2014-11-14 2016-05-19 株式会社クラレ メタクリル樹脂組成物および成形体
KR102417139B1 (ko) 2016-01-07 2022-07-04 삼성전자주식회사 보상 필름, 광학 필름 및 표시 장치
KR101903906B1 (ko) 2017-09-22 2018-10-02 주식회사 엘지화학 편광판 보호층용 무용제형 광경화성 수지 조성물, 이의 경화물을 포함하는 편광판 및 화상표시장치
EP3832361A4 (de) 2018-07-27 2021-09-29 Lg Chem, Ltd. Verfahren zur herstellung einer betrachtungswinkelkompensationsfolie, verfahren zur herstellung einer polarisationsplatte, betrachtungswinkelkompensationsfolie, polarisationsplatte und anzeigevorrichtung damit
EP4640759A4 (de) * 2022-12-20 2026-03-25 Mitsubishi Gas Chemical Co Harzzusammensetzung, plattenförmiger formkörper, mehrschichtiger gegenstand und formkörper

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5905554A (en) * 1994-05-27 1999-05-18 The University Of Akron Non-birefringent optical adhesives and films
TW200303451A (en) * 2002-01-09 2003-09-01 Clariant Int Ltd Negative-working photoimageable bottom antireflective coating

Family Cites Families (66)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4419399A (en) * 1981-07-06 1983-12-06 Toyo Boseki Kabushiki Kaisha Transparent conductive film
US4607079A (en) 1985-06-24 1986-08-19 General Electric Company Blend of polycarbonate, acrylate elastomeric copolymer and a phenoxy resin
US4727117A (en) 1985-08-27 1988-02-23 Rohm And Haas Company Imide polymers
US5004777A (en) 1985-08-27 1991-04-02 Rohm And Haas Company Imide polymers
JPS63122746A (ja) 1986-11-12 1988-05-26 Sumitomo Naugatuck Co Ltd 耐熱性共重合体組成物
US5049313A (en) 1989-09-05 1991-09-17 Advanced Products Inc. Thermoset polymer thick film compositions and their use as electrical circuitry
JP3118246B2 (ja) 1990-10-11 2000-12-18 綜研化学株式会社 熱硬化型接着剤
NL9002345A (nl) * 1990-10-29 1992-05-18 Stamicarbon Polymeersamenstelling.
US5200492A (en) 1990-10-29 1993-04-06 Kuraray Co., Ltd. Polymer blends
US5244862A (en) 1992-07-31 1993-09-14 Bailey David B Thermal dye transfer receiving element with modified bisphenol-A epichlorohydrin polymer dye-image receiving layer
US5344868A (en) 1993-03-23 1994-09-06 Rohm And Haas Company Polyglutarimide/glass fiber combinations
JPH07157632A (ja) 1993-12-03 1995-06-20 Sumitomo Bakelite Co Ltd フェノール樹脂組成物
DE4444378A1 (de) 1994-12-14 1996-06-20 Basf Ag Thermoplastische Formmassen auf der Basis von teilaromatischen Polyamiden und Polymethacrylimiden
JPH08248202A (ja) 1995-03-08 1996-09-27 Seizo Miyata 光学補償用フイルム、その製造方法およびそれを用いた液晶ディスプレー
JPH09152501A (ja) 1995-09-27 1997-06-10 Fuji Xerox Co Ltd 光学素子およびその製造方法、並びに光学素子用高分子液晶組成物
JPH1030048A (ja) 1996-07-15 1998-02-03 Toshiba Chem Corp フェノール樹脂成形材料およびその成形品
US6080833A (en) 1996-07-31 2000-06-27 Mitsui Chemicals, Inc. Low-birefringent organic optical component and a spirobiindan polymer
JP3695024B2 (ja) 1996-11-14 2005-09-14 Jsr株式会社 半導体デバイス製造用感放射線性樹脂組成物
US6197898B1 (en) 1997-11-18 2001-03-06 General Electric Company Melt-mixing thermoplastic and epoxy resin above Tg or Tm of thermoplastic with curing agent
JP2000256635A (ja) 1999-03-09 2000-09-19 Hitachi Chem Co Ltd アクリル樹脂を用いた接着剤層付き基材及び接着フィルム
JP2001220515A (ja) 2000-02-08 2001-08-14 Kawamura Inst Of Chem Res 共連続構造を有する樹脂複合体及びその製造方法
CA2375620C (en) 2000-03-29 2005-11-15 Teijin Limited Protecting film for optical recording medium and optical recording medium
JP3560532B2 (ja) 2000-05-02 2004-09-02 株式会社巴川製紙所 ディスプレイ用帯電防止フィルム
JP3679976B2 (ja) 2000-05-31 2005-08-03 株式会社巴川製紙所 ディスプレイ用貼着フィルム
JP3890972B2 (ja) 2000-12-26 2007-03-07 コニカミノルタホールディングス株式会社 セルロースエステルフィルム、それを用いる偏光板用保護フィルム及び偏光板
JP2002243943A (ja) 2001-02-21 2002-08-28 Kanegafuchi Chem Ind Co Ltd 偏光子保護フィルム
US6887729B2 (en) 2002-01-14 2005-05-03 Reveo, Inc. Twisted nematic micropolarizer and its method of manufacturing
EP1477828A1 (de) 2002-02-19 2004-11-17 Nitto Denko Corporation Graduierter optischer kompensationsfilm, prozess zu seiner herstellung und flüssigkristallanzeige damit
JP3917089B2 (ja) 2002-02-19 2007-05-23 日東電工株式会社 傾斜光学補償フィルムの製造方法
KR100446664B1 (ko) 2002-02-20 2004-09-04 주식회사 엘지화학 아크릴계 점착제 조성물
US20050129895A1 (en) 2002-05-27 2005-06-16 Ajinomoto Co., Inc. Adhesive film and prepreg
TW200404842A (en) 2002-07-30 2004-04-01 Nitto Denko Corp Optical film and manufacturing method thereof
JP2004269842A (ja) 2002-09-30 2004-09-30 Tosoh Corp 透明耐熱樹脂光学材料及びフィルム
JP2004204208A (ja) 2002-11-01 2004-07-22 Hitachi Chem Co Ltd 非複屈折性光学用樹脂組成物及び本樹脂組成物を用いた光学用素子
KR100519516B1 (ko) * 2002-11-25 2005-10-07 주식회사 하이닉스반도체 유기 반사방지막 중합체, 이의 제조 방법과 상기 중합체를포함하는 유기 반사 방지막 조성물
US7833588B2 (en) 2002-12-20 2010-11-16 Teijin Limited Transparent conductive laminate, touch panel and touch panel-equipped liquid crystal display
JP4117231B2 (ja) 2003-08-05 2008-07-16 Hoya株式会社 プラスチックレンズ及びその製造方法
JP4679808B2 (ja) * 2003-08-26 2011-05-11 Jsr株式会社 位相差膜形成用組成物
KR100551736B1 (ko) 2003-08-29 2006-02-13 비오이 하이디스 테크놀로지 주식회사 절연성글라스기판의 습식각 장치 및 이를 이용한 습식식각방법
JP4369194B2 (ja) 2003-09-30 2009-11-18 Hoya株式会社 プラスチックレンズ及びその製造方法
KR100570211B1 (ko) * 2003-12-24 2006-04-12 주식회사 하이닉스반도체 유기 반사방지막용 가교제 중합체, 이를 포함하는 유기반사 방지막 조성물 및 이를 이용한 포토레지스트의 패턴형성 방법
US20070172181A1 (en) 2004-02-25 2007-07-26 Kansai Paint Co., Ltd. Curable resin composition for optical waveguide, curable dry film for optical waveguide, optical waveguide and method for forming core part for optical waveguide
JP2005266464A (ja) 2004-03-19 2005-09-29 Teijin Ltd 偏光子保護フィルム、偏光板および液晶表示素子
JP2007263987A (ja) 2004-03-26 2007-10-11 Teijin Ltd 偏光板用保護フィルム
US20060252234A1 (en) 2004-07-07 2006-11-09 Lintec Corporation Hardenable pressure sensitive adhesive sheet for dicing/die-bonding and method for manufacturing semiconductor device
JP5335175B2 (ja) 2004-09-15 2013-11-06 三星ディスプレイ株式會社 インク組成物及び前記インク組成物を含むカラーフィルター
JP3985969B2 (ja) 2004-09-29 2007-10-03 日東電工株式会社 液晶パネル及び液晶表示装置
US7486442B2 (en) 2004-09-30 2009-02-03 Industrial Technology Research Institute Polarizer protective film, polarizing plate, and visual display
US7329465B2 (en) 2004-10-29 2008-02-12 3M Innovative Properties Company Optical films incorporating cyclic olefin copolymers
US20070282077A1 (en) * 2004-12-27 2007-12-06 Jsr Corporation Thermoplastic Resin Composition, Optical Film And Oriented Film
JP4618675B2 (ja) 2005-02-08 2011-01-26 日東電工株式会社 位相差フィルム、偏光素子、液晶パネルおよび液晶表示装置
JPWO2006112207A1 (ja) 2005-03-31 2008-12-04 株式会社日本触媒 偏光子保護フィルム、偏光板、および画像表示装置
KR100708994B1 (ko) 2005-07-01 2007-04-18 주식회사 엘지화학 버티컬 얼라인먼트 액정표시장치용 이축 보상필름
JP2007046044A (ja) 2005-07-15 2007-02-22 Toray Ind Inc 熱可塑性樹脂組成物、成形品およびフィルム
JP2007031537A (ja) 2005-07-26 2007-02-08 Teijin Dupont Films Japan Ltd 延伸フィルムおよび延伸フィルムを用いた偏光板
CN101273292A (zh) 2005-09-14 2008-09-24 日东电工株式会社 附有光学补偿层的偏光板、使用附有光学补偿层的偏光板的液晶面板、和图像显示装置
JP5288150B2 (ja) * 2005-10-24 2013-09-11 株式会社スリーボンド 有機el素子封止用熱硬化型組成物
JP2007169583A (ja) 2005-10-24 2007-07-05 Hitachi Chem Co Ltd フィルター用樹脂組成物、及びこれを用いた特定波長吸収フィルター
WO2007061041A1 (ja) 2005-11-28 2007-05-31 Asahi Kasei Chemicals Corporation 光学フィルム
JP2007169586A (ja) 2005-11-28 2007-07-05 Asahi Kasei Chemicals Corp 光学材料用樹脂組成物
KR20070113749A (ko) * 2006-05-26 2007-11-29 주식회사 엘지화학 투명성 및 내열성이 우수한 광학 이방성 필름 및 이를포함하는 액정 디스플레이 장치
JP2007321108A (ja) 2006-06-02 2007-12-13 Fujifilm Corp 高分子組成物、位相差板、偏光板、液晶表示装置
JPWO2008001855A1 (ja) 2006-06-30 2009-11-26 三菱樹脂株式会社 活性エネルギー線硬化性組成物、該組成物からなる透明フィルム、及び該フィルムが使用された光ディスク
KR20090076754A (ko) * 2008-01-08 2009-07-13 주식회사 엘지화학 광학 필름, 위상차 필름, 보호 필름 및 이들을 포함하는액정 표시 장치
KR101091534B1 (ko) * 2008-04-30 2011-12-13 주식회사 엘지화학 광학 필름 및 이를 포함하는 정보전자 장치
KR101105424B1 (ko) 2008-04-30 2012-01-17 주식회사 엘지화학 수지 조성물 및 이를 이용하여 형성된 광학 필름

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5905554A (en) * 1994-05-27 1999-05-18 The University Of Akron Non-birefringent optical adhesives and films
TW200303451A (en) * 2002-01-09 2003-09-01 Clariant Int Ltd Negative-working photoimageable bottom antireflective coating

Also Published As

Publication number Publication date
WO2009134097A3 (ko) 2009-12-30
CN102015793B (zh) 2013-05-08
JP5335070B2 (ja) 2013-11-06
US20090275718A1 (en) 2009-11-05
CN102015793A (zh) 2011-04-13
TW200948887A (en) 2009-12-01
KR20090115040A (ko) 2009-11-04
EP2272879A4 (de) 2012-11-21
EP2272879A2 (de) 2011-01-12
JP2011519389A (ja) 2011-07-07
WO2009134097A2 (ko) 2009-11-05
US8344083B2 (en) 2013-01-01
EP2272879B1 (de) 2014-09-03
KR101105424B1 (ko) 2012-01-17

Similar Documents

Publication Publication Date Title
TWI398480B (zh) 樹脂組成物及使用其形成之光學膜
TWI412550B (zh) 光學膜及包含其之資訊技術裝置
TWI397552B (zh) 光學膜及包含其之資訊科技裝置
JP5830949B2 (ja) 位相差フィルム用フマル酸ジエステル系樹脂及びそれよりなる位相差フィルム
JP5312479B2 (ja) 透明な樹脂組成物
WO2014013982A1 (ja) フマル酸ジイソプロピル-ケイ皮酸誘導体系共重合体及びそれを用いた位相差フィルム
JP5630852B2 (ja) アクリル系共重合体を含む光学フィルム
US8536275B2 (en) Acryl-based copolymers and optical film including the same
JP5672518B2 (ja) 液晶ディスプレイ用基板及びその製造方法
JP2011102868A (ja) 光学補償フィルム
JP5831174B2 (ja) 位相差フィルム用フマル酸ジエステル系樹脂及びそれよりなる位相差フィルム
JP5664736B2 (ja) 光学補償フィルム
JP5440108B2 (ja) 光学補償フィルム
JP5428264B2 (ja) 光学補償膜及びその製造方法
JP2011102867A (ja) 光学補償フィルム
WO2024204295A1 (ja) 偏光子保護フィルム、偏光板および液晶パネル
JP2014019833A (ja) フマル酸ジイソプロピル−ケイ皮酸エステル共重合体及びそれを用いた位相差フィルム
JP2014084364A (ja) フマル酸ジイソプロピル−ケイ皮酸共重合体およびそれを用いた位相差フィルム

Legal Events

Date Code Title Description
MM4A Annulment or lapse of patent due to non-payment of fees