TWI398480B - 樹脂組成物及使用其形成之光學膜 - Google Patents
樹脂組成物及使用其形成之光學膜 Download PDFInfo
- Publication number
- TWI398480B TWI398480B TW098114364A TW98114364A TWI398480B TW I398480 B TWI398480 B TW I398480B TW 098114364 A TW098114364 A TW 098114364A TW 98114364 A TW98114364 A TW 98114364A TW I398480 B TWI398480 B TW I398480B
- Authority
- TW
- Taiwan
- Prior art keywords
- unit
- resin composition
- copolymer
- group
- cyclic
- Prior art date
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F220/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride ester, amide, imide or nitrile thereof
- C08F220/02—Monocarboxylic acids having less than ten carbon atoms; Derivatives thereof
- C08F220/04—Acids; Metal salts or ammonium salts thereof
- C08F220/06—Acrylic acid; Methacrylic acid; Metal salts or ammonium salts thereof
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
- C08L33/00—Compositions of homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical, or of salts, anhydrides, esters, amides, imides or nitriles thereof; Compositions of derivatives of such polymers
- C08L33/04—Homopolymers or copolymers of esters
- C08L33/06—Homopolymers or copolymers of esters of esters containing only carbon, hydrogen and oxygen, which oxygen atoms are present only as part of the carboxyl radical
- C08L33/10—Homopolymers or copolymers of methacrylic acid esters
- C08L33/12—Homopolymers or copolymers of methyl methacrylate
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F212/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by an aromatic carbocyclic ring
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F212/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by an aromatic carbocyclic ring
- C08F212/02—Monomers containing only one unsaturated aliphatic radical
- C08F212/04—Monomers containing only one unsaturated aliphatic radical containing one ring
- C08F212/06—Hydrocarbons
- C08F212/08—Styrene
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08J—WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
- C08J5/00—Manufacture of articles or shaped materials containing macromolecular substances
- C08J5/18—Manufacture of films or sheets
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F222/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by a carboxyl radical and containing at least one other carboxyl radical in the molecule; Salts, anhydrides, esters, amides, imides, or nitriles thereof
- C08F222/36—Amides or imides
- C08F222/40—Imides, e.g. cyclic imides
- C08F222/402—Alkyl substituted imides
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08J—WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
- C08J2333/00—Characterised by the use of homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical, or of salts, anhydrides, esters, amides, imides, or nitriles thereof; Derivatives of such polymers
- C08J2333/04—Characterised by the use of homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical, or of salts, anhydrides, esters, amides, imides, or nitriles thereof; Derivatives of such polymers esters
- C08J2333/06—Characterised by the use of homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical, or of salts, anhydrides, esters, amides, imides, or nitriles thereof; Derivatives of such polymers esters of esters containing only carbon, hydrogen, and oxygen, the oxygen atom being present only as part of the carboxyl radical
- C08J2333/10—Homopolymers or copolymers of methacrylic acid esters
- C08J2333/12—Homopolymers or copolymers of methyl methacrylate
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08J—WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
- C08J2425/00—Characterised by the use of homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by an aromatic carbocyclic ring; Derivatives of such polymers
- C08J2425/02—Homopolymers or copolymers of hydrocarbons
- C08J2425/04—Homopolymers or copolymers of styrene
- C08J2425/08—Copolymers of styrene
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08J—WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
- C08J2471/00—Characterised by the use of polyethers obtained by reactions forming an ether link in the main chain; Derivatives of such polymers
- C08J2471/08—Polyethers derived from hydroxy compounds or from their metallic derivatives
- C08J2471/10—Polyethers derived from hydroxy compounds or from their metallic derivatives from phenols
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
- C08L25/00—Compositions of, homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by an aromatic carbocyclic ring; Compositions of derivatives of such polymers
- C08L25/02—Homopolymers or copolymers of hydrocarbons
- C08L25/04—Homopolymers or copolymers of styrene
- C08L25/06—Polystyrene
Landscapes
- Chemical & Material Sciences (AREA)
- Health & Medical Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Medicinal Chemistry (AREA)
- Polymers & Plastics (AREA)
- Organic Chemistry (AREA)
- Engineering & Computer Science (AREA)
- Manufacturing & Machinery (AREA)
- Materials Engineering (AREA)
- Polarising Elements (AREA)
- Manufacture Of Macromolecular Shaped Articles (AREA)
- Compositions Of Macromolecular Compounds (AREA)
- Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| KR20080040843 | 2008-04-30 | ||
| KR1020090002069A KR101105424B1 (ko) | 2008-04-30 | 2009-01-09 | 수지 조성물 및 이를 이용하여 형성된 광학 필름 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| TW200948887A TW200948887A (en) | 2009-12-01 |
| TWI398480B true TWI398480B (zh) | 2013-06-11 |
Family
ID=41255571
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| TW098114364A TWI398480B (zh) | 2008-04-30 | 2009-04-30 | 樹脂組成物及使用其形成之光學膜 |
Country Status (7)
| Country | Link |
|---|---|
| US (1) | US8344083B2 (de) |
| EP (1) | EP2272879B1 (de) |
| JP (1) | JP5335070B2 (de) |
| KR (1) | KR101105424B1 (de) |
| CN (1) | CN102015793B (de) |
| TW (1) | TWI398480B (de) |
| WO (1) | WO2009134097A2 (de) |
Families Citing this family (37)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR20090076753A (ko) | 2008-01-08 | 2009-07-13 | 주식회사 엘지화학 | 투명한 수지 조성물 |
| KR20090076754A (ko) * | 2008-01-08 | 2009-07-13 | 주식회사 엘지화학 | 광학 필름, 위상차 필름, 보호 필름 및 이들을 포함하는액정 표시 장치 |
| KR101091534B1 (ko) * | 2008-04-30 | 2011-12-13 | 주식회사 엘지화학 | 광학 필름 및 이를 포함하는 정보전자 장치 |
| US8613986B2 (en) * | 2008-04-30 | 2013-12-24 | Lg Chem, Ltd. | Optical film and information technology apparatus comprising the same |
| KR101105424B1 (ko) | 2008-04-30 | 2012-01-17 | 주식회사 엘지화학 | 수지 조성물 및 이를 이용하여 형성된 광학 필름 |
| KR101270220B1 (ko) | 2011-04-13 | 2013-05-30 | 주식회사 엘지화학 | 광학 필름용 아크릴계 공중합체 수지의 제조방법 및 이를 이용한 광학필름의 제조방법 |
| WO2012141453A2 (en) * | 2011-04-13 | 2012-10-18 | Lg Chem, Ltd. | Method of preparing resin composition for optical film by using continuous bulk polymerization and methods of preparing optical film and polarizing plate using the resin composition |
| KR101409208B1 (ko) * | 2011-04-13 | 2014-06-20 | 주식회사 엘지화학 | 연속괴상중합법에 의한 광학 필름용 수지 조성물의 제조 방법, 이를 이용한 광학 필름의 제조 방법 및 편광판 제조 방법 |
| KR101269673B1 (ko) * | 2011-04-13 | 2013-05-30 | 주식회사 엘지화학 | 광학 필름용 수지 조성물 및 이를 이용한 광학 필름 |
| WO2012141422A1 (en) * | 2011-04-13 | 2012-10-18 | Lg Chem, Ltd. | Method for preparing acrylic copolymer resin for optical film and method for fabricating optical film using the same |
| WO2012141413A1 (en) * | 2011-04-13 | 2012-10-18 | Lg Chem, Ltd. | Resin composition for optical film and optical film using the same |
| KR101347021B1 (ko) | 2011-06-01 | 2014-01-07 | 주식회사 엘지화학 | 수지 조성물 및 이를 이용하여 형성된 광학 필름 |
| WO2012165755A1 (en) * | 2011-06-01 | 2012-12-06 | Lg Chem, Ltd. | Resin composition and optical film formed by using the same |
| TWI516537B (zh) * | 2011-10-04 | 2016-01-11 | Lg化學股份有限公司 | 樹脂組成物及使用其形成之光學補償膜 |
| WO2013051802A1 (ko) * | 2011-10-05 | 2013-04-11 | 주식회사 엘지화학 | 광학 필름용 수지 조성물 및 이를 이용한 보상필름 |
| KR101418755B1 (ko) | 2011-10-05 | 2014-07-11 | 주식회사 엘지화학 | 광학 필름용 수지 조성물 및 이를 이용한 보상필름 |
| TWI533036B (zh) | 2011-10-14 | 2016-05-11 | Lg化學股份有限公司 | 兩側具有保護膜之偏光件及包含其之光學裝置 |
| TWI607073B (zh) | 2011-10-14 | 2017-12-01 | Lg化學股份有限公司 | 用於偏光板之黏著劑及包含其之偏光板 |
| US9523792B2 (en) | 2011-10-14 | 2016-12-20 | Lg Chem, Ltd. | Polarizer having protection films in two sides and optical device comprising the same |
| KR101579646B1 (ko) | 2012-05-31 | 2015-12-24 | 주식회사 엘지화학 | 기능성 코팅층을 포함하는 광학 필름, 이를 포함하는 편광판 및 화상표시장치 |
| US20150203610A1 (en) * | 2012-07-30 | 2015-07-23 | Denki Kagaku Kogyo Kabushiki Kaisha | Copolymer for improving methacrylic resin heat resistance |
| KR101627904B1 (ko) | 2013-02-21 | 2016-06-13 | 주식회사 엘지화학 | 양면형 편광판의 제조방법 및 이로부터 제조된 양면형 편광판 |
| US9088009B2 (en) * | 2013-03-28 | 2015-07-21 | Lg Chem, Ltd. | Resin composition, optical film and organic light emitting display device |
| KR20140118879A (ko) | 2013-03-28 | 2014-10-08 | 주식회사 엘지화학 | 양면형 편광판의 제조방법 및 이로부터 제조된 양면형 편광판 |
| EP2840124B1 (de) | 2013-06-18 | 2019-01-30 | LG Chem, Ltd. | Radikalisch härtbare haftstoffzusammensetzung und polarisierungsplatte damit |
| KR101503216B1 (ko) | 2013-06-18 | 2015-03-17 | 주식회사 엘지화학 | 라디칼 경화형 접착제 조성물 및 이를 포함하는 편광판 |
| WO2015046971A1 (ko) | 2013-09-30 | 2015-04-02 | 주식회사 엘지화학 | 기능성 코팅층을 포함하는 광학 필름, 이를 포함하는 편광판 및 화상표시장치 |
| KR101584895B1 (ko) | 2013-09-30 | 2016-01-13 | 주식회사 엘지화학 | 편광판 |
| KR101496617B1 (ko) | 2013-09-30 | 2015-02-25 | 주식회사 엘지화학 | 편광판 |
| KR101620164B1 (ko) | 2013-09-30 | 2016-05-12 | 주식회사 엘지화학 | 라디칼 경화형 접착제 조성물 및 이를 포함하는 편광판 |
| KR101650235B1 (ko) | 2013-09-30 | 2016-08-22 | 주식회사 엘지화학 | 편광판 |
| JP6075424B2 (ja) * | 2014-09-30 | 2017-02-08 | 住友化学株式会社 | 偏光板、液晶表示装置及び有機エレクトロルミネッセンス表示装置 |
| WO2016076357A1 (ja) * | 2014-11-14 | 2016-05-19 | 株式会社クラレ | メタクリル樹脂組成物および成形体 |
| KR102417139B1 (ko) | 2016-01-07 | 2022-07-04 | 삼성전자주식회사 | 보상 필름, 광학 필름 및 표시 장치 |
| KR101903906B1 (ko) | 2017-09-22 | 2018-10-02 | 주식회사 엘지화학 | 편광판 보호층용 무용제형 광경화성 수지 조성물, 이의 경화물을 포함하는 편광판 및 화상표시장치 |
| EP3832361A4 (de) | 2018-07-27 | 2021-09-29 | Lg Chem, Ltd. | Verfahren zur herstellung einer betrachtungswinkelkompensationsfolie, verfahren zur herstellung einer polarisationsplatte, betrachtungswinkelkompensationsfolie, polarisationsplatte und anzeigevorrichtung damit |
| EP4640759A4 (de) * | 2022-12-20 | 2026-03-25 | Mitsubishi Gas Chemical Co | Harzzusammensetzung, plattenförmiger formkörper, mehrschichtiger gegenstand und formkörper |
Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5905554A (en) * | 1994-05-27 | 1999-05-18 | The University Of Akron | Non-birefringent optical adhesives and films |
| TW200303451A (en) * | 2002-01-09 | 2003-09-01 | Clariant Int Ltd | Negative-working photoimageable bottom antireflective coating |
Family Cites Families (66)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4419399A (en) * | 1981-07-06 | 1983-12-06 | Toyo Boseki Kabushiki Kaisha | Transparent conductive film |
| US4607079A (en) | 1985-06-24 | 1986-08-19 | General Electric Company | Blend of polycarbonate, acrylate elastomeric copolymer and a phenoxy resin |
| US4727117A (en) | 1985-08-27 | 1988-02-23 | Rohm And Haas Company | Imide polymers |
| US5004777A (en) | 1985-08-27 | 1991-04-02 | Rohm And Haas Company | Imide polymers |
| JPS63122746A (ja) | 1986-11-12 | 1988-05-26 | Sumitomo Naugatuck Co Ltd | 耐熱性共重合体組成物 |
| US5049313A (en) | 1989-09-05 | 1991-09-17 | Advanced Products Inc. | Thermoset polymer thick film compositions and their use as electrical circuitry |
| JP3118246B2 (ja) | 1990-10-11 | 2000-12-18 | 綜研化学株式会社 | 熱硬化型接着剤 |
| NL9002345A (nl) * | 1990-10-29 | 1992-05-18 | Stamicarbon | Polymeersamenstelling. |
| US5200492A (en) | 1990-10-29 | 1993-04-06 | Kuraray Co., Ltd. | Polymer blends |
| US5244862A (en) | 1992-07-31 | 1993-09-14 | Bailey David B | Thermal dye transfer receiving element with modified bisphenol-A epichlorohydrin polymer dye-image receiving layer |
| US5344868A (en) | 1993-03-23 | 1994-09-06 | Rohm And Haas Company | Polyglutarimide/glass fiber combinations |
| JPH07157632A (ja) | 1993-12-03 | 1995-06-20 | Sumitomo Bakelite Co Ltd | フェノール樹脂組成物 |
| DE4444378A1 (de) | 1994-12-14 | 1996-06-20 | Basf Ag | Thermoplastische Formmassen auf der Basis von teilaromatischen Polyamiden und Polymethacrylimiden |
| JPH08248202A (ja) | 1995-03-08 | 1996-09-27 | Seizo Miyata | 光学補償用フイルム、その製造方法およびそれを用いた液晶ディスプレー |
| JPH09152501A (ja) | 1995-09-27 | 1997-06-10 | Fuji Xerox Co Ltd | 光学素子およびその製造方法、並びに光学素子用高分子液晶組成物 |
| JPH1030048A (ja) | 1996-07-15 | 1998-02-03 | Toshiba Chem Corp | フェノール樹脂成形材料およびその成形品 |
| US6080833A (en) | 1996-07-31 | 2000-06-27 | Mitsui Chemicals, Inc. | Low-birefringent organic optical component and a spirobiindan polymer |
| JP3695024B2 (ja) | 1996-11-14 | 2005-09-14 | Jsr株式会社 | 半導体デバイス製造用感放射線性樹脂組成物 |
| US6197898B1 (en) | 1997-11-18 | 2001-03-06 | General Electric Company | Melt-mixing thermoplastic and epoxy resin above Tg or Tm of thermoplastic with curing agent |
| JP2000256635A (ja) | 1999-03-09 | 2000-09-19 | Hitachi Chem Co Ltd | アクリル樹脂を用いた接着剤層付き基材及び接着フィルム |
| JP2001220515A (ja) | 2000-02-08 | 2001-08-14 | Kawamura Inst Of Chem Res | 共連続構造を有する樹脂複合体及びその製造方法 |
| CA2375620C (en) | 2000-03-29 | 2005-11-15 | Teijin Limited | Protecting film for optical recording medium and optical recording medium |
| JP3560532B2 (ja) | 2000-05-02 | 2004-09-02 | 株式会社巴川製紙所 | ディスプレイ用帯電防止フィルム |
| JP3679976B2 (ja) | 2000-05-31 | 2005-08-03 | 株式会社巴川製紙所 | ディスプレイ用貼着フィルム |
| JP3890972B2 (ja) | 2000-12-26 | 2007-03-07 | コニカミノルタホールディングス株式会社 | セルロースエステルフィルム、それを用いる偏光板用保護フィルム及び偏光板 |
| JP2002243943A (ja) | 2001-02-21 | 2002-08-28 | Kanegafuchi Chem Ind Co Ltd | 偏光子保護フィルム |
| US6887729B2 (en) | 2002-01-14 | 2005-05-03 | Reveo, Inc. | Twisted nematic micropolarizer and its method of manufacturing |
| EP1477828A1 (de) | 2002-02-19 | 2004-11-17 | Nitto Denko Corporation | Graduierter optischer kompensationsfilm, prozess zu seiner herstellung und flüssigkristallanzeige damit |
| JP3917089B2 (ja) | 2002-02-19 | 2007-05-23 | 日東電工株式会社 | 傾斜光学補償フィルムの製造方法 |
| KR100446664B1 (ko) | 2002-02-20 | 2004-09-04 | 주식회사 엘지화학 | 아크릴계 점착제 조성물 |
| US20050129895A1 (en) | 2002-05-27 | 2005-06-16 | Ajinomoto Co., Inc. | Adhesive film and prepreg |
| TW200404842A (en) | 2002-07-30 | 2004-04-01 | Nitto Denko Corp | Optical film and manufacturing method thereof |
| JP2004269842A (ja) | 2002-09-30 | 2004-09-30 | Tosoh Corp | 透明耐熱樹脂光学材料及びフィルム |
| JP2004204208A (ja) | 2002-11-01 | 2004-07-22 | Hitachi Chem Co Ltd | 非複屈折性光学用樹脂組成物及び本樹脂組成物を用いた光学用素子 |
| KR100519516B1 (ko) * | 2002-11-25 | 2005-10-07 | 주식회사 하이닉스반도체 | 유기 반사방지막 중합체, 이의 제조 방법과 상기 중합체를포함하는 유기 반사 방지막 조성물 |
| US7833588B2 (en) | 2002-12-20 | 2010-11-16 | Teijin Limited | Transparent conductive laminate, touch panel and touch panel-equipped liquid crystal display |
| JP4117231B2 (ja) | 2003-08-05 | 2008-07-16 | Hoya株式会社 | プラスチックレンズ及びその製造方法 |
| JP4679808B2 (ja) * | 2003-08-26 | 2011-05-11 | Jsr株式会社 | 位相差膜形成用組成物 |
| KR100551736B1 (ko) | 2003-08-29 | 2006-02-13 | 비오이 하이디스 테크놀로지 주식회사 | 절연성글라스기판의 습식각 장치 및 이를 이용한 습식식각방법 |
| JP4369194B2 (ja) | 2003-09-30 | 2009-11-18 | Hoya株式会社 | プラスチックレンズ及びその製造方法 |
| KR100570211B1 (ko) * | 2003-12-24 | 2006-04-12 | 주식회사 하이닉스반도체 | 유기 반사방지막용 가교제 중합체, 이를 포함하는 유기반사 방지막 조성물 및 이를 이용한 포토레지스트의 패턴형성 방법 |
| US20070172181A1 (en) | 2004-02-25 | 2007-07-26 | Kansai Paint Co., Ltd. | Curable resin composition for optical waveguide, curable dry film for optical waveguide, optical waveguide and method for forming core part for optical waveguide |
| JP2005266464A (ja) | 2004-03-19 | 2005-09-29 | Teijin Ltd | 偏光子保護フィルム、偏光板および液晶表示素子 |
| JP2007263987A (ja) | 2004-03-26 | 2007-10-11 | Teijin Ltd | 偏光板用保護フィルム |
| US20060252234A1 (en) | 2004-07-07 | 2006-11-09 | Lintec Corporation | Hardenable pressure sensitive adhesive sheet for dicing/die-bonding and method for manufacturing semiconductor device |
| JP5335175B2 (ja) | 2004-09-15 | 2013-11-06 | 三星ディスプレイ株式會社 | インク組成物及び前記インク組成物を含むカラーフィルター |
| JP3985969B2 (ja) | 2004-09-29 | 2007-10-03 | 日東電工株式会社 | 液晶パネル及び液晶表示装置 |
| US7486442B2 (en) | 2004-09-30 | 2009-02-03 | Industrial Technology Research Institute | Polarizer protective film, polarizing plate, and visual display |
| US7329465B2 (en) | 2004-10-29 | 2008-02-12 | 3M Innovative Properties Company | Optical films incorporating cyclic olefin copolymers |
| US20070282077A1 (en) * | 2004-12-27 | 2007-12-06 | Jsr Corporation | Thermoplastic Resin Composition, Optical Film And Oriented Film |
| JP4618675B2 (ja) | 2005-02-08 | 2011-01-26 | 日東電工株式会社 | 位相差フィルム、偏光素子、液晶パネルおよび液晶表示装置 |
| JPWO2006112207A1 (ja) | 2005-03-31 | 2008-12-04 | 株式会社日本触媒 | 偏光子保護フィルム、偏光板、および画像表示装置 |
| KR100708994B1 (ko) | 2005-07-01 | 2007-04-18 | 주식회사 엘지화학 | 버티컬 얼라인먼트 액정표시장치용 이축 보상필름 |
| JP2007046044A (ja) | 2005-07-15 | 2007-02-22 | Toray Ind Inc | 熱可塑性樹脂組成物、成形品およびフィルム |
| JP2007031537A (ja) | 2005-07-26 | 2007-02-08 | Teijin Dupont Films Japan Ltd | 延伸フィルムおよび延伸フィルムを用いた偏光板 |
| CN101273292A (zh) | 2005-09-14 | 2008-09-24 | 日东电工株式会社 | 附有光学补偿层的偏光板、使用附有光学补偿层的偏光板的液晶面板、和图像显示装置 |
| JP5288150B2 (ja) * | 2005-10-24 | 2013-09-11 | 株式会社スリーボンド | 有機el素子封止用熱硬化型組成物 |
| JP2007169583A (ja) | 2005-10-24 | 2007-07-05 | Hitachi Chem Co Ltd | フィルター用樹脂組成物、及びこれを用いた特定波長吸収フィルター |
| WO2007061041A1 (ja) | 2005-11-28 | 2007-05-31 | Asahi Kasei Chemicals Corporation | 光学フィルム |
| JP2007169586A (ja) | 2005-11-28 | 2007-07-05 | Asahi Kasei Chemicals Corp | 光学材料用樹脂組成物 |
| KR20070113749A (ko) * | 2006-05-26 | 2007-11-29 | 주식회사 엘지화학 | 투명성 및 내열성이 우수한 광학 이방성 필름 및 이를포함하는 액정 디스플레이 장치 |
| JP2007321108A (ja) | 2006-06-02 | 2007-12-13 | Fujifilm Corp | 高分子組成物、位相差板、偏光板、液晶表示装置 |
| JPWO2008001855A1 (ja) | 2006-06-30 | 2009-11-26 | 三菱樹脂株式会社 | 活性エネルギー線硬化性組成物、該組成物からなる透明フィルム、及び該フィルムが使用された光ディスク |
| KR20090076754A (ko) * | 2008-01-08 | 2009-07-13 | 주식회사 엘지화학 | 광학 필름, 위상차 필름, 보호 필름 및 이들을 포함하는액정 표시 장치 |
| KR101091534B1 (ko) * | 2008-04-30 | 2011-12-13 | 주식회사 엘지화학 | 광학 필름 및 이를 포함하는 정보전자 장치 |
| KR101105424B1 (ko) | 2008-04-30 | 2012-01-17 | 주식회사 엘지화학 | 수지 조성물 및 이를 이용하여 형성된 광학 필름 |
-
2009
- 2009-01-09 KR KR1020090002069A patent/KR101105424B1/ko not_active Expired - Fee Related
- 2009-04-30 JP JP2011507354A patent/JP5335070B2/ja active Active
- 2009-04-30 CN CN2009801154945A patent/CN102015793B/zh not_active Expired - Fee Related
- 2009-04-30 WO PCT/KR2009/002302 patent/WO2009134097A2/ko not_active Ceased
- 2009-04-30 EP EP09739003.3A patent/EP2272879B1/de not_active Not-in-force
- 2009-04-30 TW TW098114364A patent/TWI398480B/zh not_active IP Right Cessation
- 2009-05-04 US US12/387,549 patent/US8344083B2/en active Active
Patent Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5905554A (en) * | 1994-05-27 | 1999-05-18 | The University Of Akron | Non-birefringent optical adhesives and films |
| TW200303451A (en) * | 2002-01-09 | 2003-09-01 | Clariant Int Ltd | Negative-working photoimageable bottom antireflective coating |
Also Published As
| Publication number | Publication date |
|---|---|
| WO2009134097A3 (ko) | 2009-12-30 |
| CN102015793B (zh) | 2013-05-08 |
| JP5335070B2 (ja) | 2013-11-06 |
| US20090275718A1 (en) | 2009-11-05 |
| CN102015793A (zh) | 2011-04-13 |
| TW200948887A (en) | 2009-12-01 |
| KR20090115040A (ko) | 2009-11-04 |
| EP2272879A4 (de) | 2012-11-21 |
| EP2272879A2 (de) | 2011-01-12 |
| JP2011519389A (ja) | 2011-07-07 |
| WO2009134097A2 (ko) | 2009-11-05 |
| US8344083B2 (en) | 2013-01-01 |
| EP2272879B1 (de) | 2014-09-03 |
| KR101105424B1 (ko) | 2012-01-17 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| TWI398480B (zh) | 樹脂組成物及使用其形成之光學膜 | |
| TWI412550B (zh) | 光學膜及包含其之資訊技術裝置 | |
| TWI397552B (zh) | 光學膜及包含其之資訊科技裝置 | |
| JP5830949B2 (ja) | 位相差フィルム用フマル酸ジエステル系樹脂及びそれよりなる位相差フィルム | |
| JP5312479B2 (ja) | 透明な樹脂組成物 | |
| WO2014013982A1 (ja) | フマル酸ジイソプロピル-ケイ皮酸誘導体系共重合体及びそれを用いた位相差フィルム | |
| JP5630852B2 (ja) | アクリル系共重合体を含む光学フィルム | |
| US8536275B2 (en) | Acryl-based copolymers and optical film including the same | |
| JP5672518B2 (ja) | 液晶ディスプレイ用基板及びその製造方法 | |
| JP2011102868A (ja) | 光学補償フィルム | |
| JP5831174B2 (ja) | 位相差フィルム用フマル酸ジエステル系樹脂及びそれよりなる位相差フィルム | |
| JP5664736B2 (ja) | 光学補償フィルム | |
| JP5440108B2 (ja) | 光学補償フィルム | |
| JP5428264B2 (ja) | 光学補償膜及びその製造方法 | |
| JP2011102867A (ja) | 光学補償フィルム | |
| WO2024204295A1 (ja) | 偏光子保護フィルム、偏光板および液晶パネル | |
| JP2014019833A (ja) | フマル酸ジイソプロピル−ケイ皮酸エステル共重合体及びそれを用いた位相差フィルム | |
| JP2014084364A (ja) | フマル酸ジイソプロピル−ケイ皮酸共重合体およびそれを用いた位相差フィルム |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| MM4A | Annulment or lapse of patent due to non-payment of fees |