TWI644492B - 脈衝控制裝置及脈衝控制方法 - Google Patents

脈衝控制裝置及脈衝控制方法 Download PDF

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Publication number
TWI644492B
TWI644492B TW105130292A TW105130292A TWI644492B TW I644492 B TWI644492 B TW I644492B TW 105130292 A TW105130292 A TW 105130292A TW 105130292 A TW105130292 A TW 105130292A TW I644492 B TWI644492 B TW I644492B
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TW
Taiwan
Prior art keywords
time
pulse
laser pulses
laser
modulator
Prior art date
Application number
TW105130292A
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English (en)
Chinese (zh)
Other versions
TW201740643A (zh
Inventor
申東晙
Original Assignee
Eo科技股份有限公司
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Eo科技股份有限公司 filed Critical Eo科技股份有限公司
Publication of TW201740643A publication Critical patent/TW201740643A/zh
Application granted granted Critical
Publication of TWI644492B publication Critical patent/TWI644492B/zh

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Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/10—Controlling the intensity, frequency, phase, polarisation or direction of the emitted radiation, e.g. switching, gating, modulating or demodulating
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/10—Controlling the intensity, frequency, phase, polarisation or direction of the emitted radiation, e.g. switching, gating, modulating or demodulating
    • H01S3/106—Controlling the intensity, frequency, phase, polarisation or direction of the emitted radiation, e.g. switching, gating, modulating or demodulating by controlling devices placed within the cavity
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/10—Controlling the intensity, frequency, phase, polarisation or direction of the emitted radiation, e.g. switching, gating, modulating or demodulating
    • H01S3/106—Controlling the intensity, frequency, phase, polarisation or direction of the emitted radiation, e.g. switching, gating, modulating or demodulating by controlling devices placed within the cavity
    • H01S3/107—Controlling the intensity, frequency, phase, polarisation or direction of the emitted radiation, e.g. switching, gating, modulating or demodulating by controlling devices placed within the cavity using electro-optic devices, e.g. exhibiting Pockels or Kerr effect

Landscapes

  • Physics & Mathematics (AREA)
  • Electromagnetism (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Optics & Photonics (AREA)
  • Lasers (AREA)
  • Optical Modulation, Optical Deflection, Nonlinear Optics, Optical Demodulation, Optical Logic Elements (AREA)
TW105130292A 2016-02-16 2016-09-20 脈衝控制裝置及脈衝控制方法 TWI644492B (zh)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
??10-2016-0017860 2016-02-16
KR1020160017860A KR101787483B1 (ko) 2016-02-16 2016-02-16 레이저 펄스 제어 장치 및 레이저 펄스 제어 방법

Publications (2)

Publication Number Publication Date
TW201740643A TW201740643A (zh) 2017-11-16
TWI644492B true TWI644492B (zh) 2018-12-11

Family

ID=59625230

Family Applications (1)

Application Number Title Priority Date Filing Date
TW105130292A TWI644492B (zh) 2016-02-16 2016-09-20 脈衝控制裝置及脈衝控制方法

Country Status (4)

Country Link
KR (1) KR101787483B1 (ko)
CN (1) CN108780978A (ko)
TW (1) TWI644492B (ko)
WO (1) WO2017142155A1 (ko)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR102231118B1 (ko) * 2019-04-18 2021-03-24 김영태 다이오드 기반 레이저 장치
KR20250048283A (ko) * 2022-09-15 2025-04-08 미쓰비시덴키 가부시키가이샤 레이저 장치, 레이저 가공 장치, 학습 장치, 추론 장치, 레이저 가공 시스템 및 레이저 가공 방법

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20080203071A1 (en) * 2003-08-19 2008-08-28 Electro Scientific Industries, Inc. Link processing using laser pulses with specially tailored power profiles
US20100177794A1 (en) * 2009-01-15 2010-07-15 Electro Scientific Industries, Inc. Pulse temporal programmable ultrafast burst mode laser for micromachining
TW201250832A (en) * 2011-06-15 2012-12-16 Applied Materials Inc Wafer dicing using pulse train laser with multiple-pulse bursts and plasma etch

Family Cites Families (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN87100630A (zh) 1986-01-06 1987-12-02 兰克·泰勒·霍布森有限公司 用偏振调制的计量设备和方法
US5892357A (en) 1995-12-08 1999-04-06 Lockheed Martin Idaho Technologies Company Electro-optic voltage sensor for sensing voltage in an E-field
US7158553B2 (en) * 2003-02-14 2007-01-02 Lambda Physik Ag Master oscillator/power amplifier excimer laser system with pulse energy and pointing control
US8374206B2 (en) * 2008-03-31 2013-02-12 Electro Scientific Industries, Inc. Combining multiple laser beams to form high repetition rate, high average power polarized laser beam
KR101176447B1 (ko) * 2011-04-28 2012-08-30 광주과학기술원 펄스 레이저 장치 및 이를 이용한 버스트 모드, 가변 버스트 모드 제어 방법
US8958705B2 (en) * 2012-01-13 2015-02-17 Esi-Pyrophotonics Lasers Inc. Methods and systems for a pulsed laser source emitting a predetermined output pulse profile
WO2013185792A1 (de) * 2012-06-12 2013-12-19 Photon Energy Gmbh Kurzpuls - laser mit verstärker und einstellbarer pulsfolge
AU2013380267B2 (en) * 2013-02-27 2017-03-30 Alcon Inc. Laser apparatus and method for laser processing a target material
CN103500913B (zh) * 2013-09-30 2015-11-25 中国科学院高能物理研究所 脉冲光纤激光器及激光脉冲生成方法

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20080203071A1 (en) * 2003-08-19 2008-08-28 Electro Scientific Industries, Inc. Link processing using laser pulses with specially tailored power profiles
US20100177794A1 (en) * 2009-01-15 2010-07-15 Electro Scientific Industries, Inc. Pulse temporal programmable ultrafast burst mode laser for micromachining
TW201250832A (en) * 2011-06-15 2012-12-16 Applied Materials Inc Wafer dicing using pulse train laser with multiple-pulse bursts and plasma etch

Also Published As

Publication number Publication date
CN108780978A (zh) 2018-11-09
WO2017142155A1 (ko) 2017-08-24
TW201740643A (zh) 2017-11-16
KR101787483B1 (ko) 2017-10-18
KR20170096457A (ko) 2017-08-24

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