UA80610C2 - Method for the coating of metal oxides formation on the electroconductive support, activated cathode, which is obtained by this method and its use for electrolysis of water solutions of alkali chlorides - Google Patents

Method for the coating of metal oxides formation on the electroconductive support, activated cathode, which is obtained by this method and its use for electrolysis of water solutions of alkali chlorides Download PDF

Info

Publication number: UA80610C2
Authority: UA; Ukraine
Prior art keywords: metal; coating; cathode; substrate; differs
Prior art date: 2003-03-28

Application number

UAA200510604A

Other languages

English (en)

Ukrainian (uk)

Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)

2003-03-28

Filing date

2004-03-25

Publication date

2007-10-10

2004-03-25 Application filed filed Critical

2007-10-10 Publication of UA80610C2 publication Critical patent/UA80610C2/uk

Links

239000011248 coating agent Substances 0.000 title claims abstract description 57
238000000576 coating method Methods 0.000 title claims abstract description 57
238000000034 method Methods 0.000 title claims abstract description 32
238000005868 electrolysis reaction Methods 0.000 title claims abstract description 15
229910044991 metal oxide Inorganic materials 0.000 title claims abstract description 15
150000004706 metal oxides Chemical class 0.000 title claims abstract description 15
230000015572 biosynthetic process Effects 0.000 title abstract description 5
XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 title description 4
239000003513 alkali Substances 0.000 title description 2
150000001805 chlorine compounds Chemical class 0.000 title description 2
XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 claims abstract description 68
239000000758 substrate Substances 0.000 claims abstract description 67
229910052742 iron Inorganic materials 0.000 claims abstract description 34
229910052751 metal Inorganic materials 0.000 claims abstract description 31
239000002184 metal Substances 0.000 claims abstract description 31
239000010936 titanium Substances 0.000 claims abstract description 25
229910000831 Steel Inorganic materials 0.000 claims abstract description 24
239000010959 steel Substances 0.000 claims abstract description 24
RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 claims abstract description 20
239000002904 solvent Substances 0.000 claims abstract description 20
229910052719 titanium Inorganic materials 0.000 claims abstract description 18
239000010970 precious metal Substances 0.000 claims abstract description 12
230000000737 periodic effect Effects 0.000 claims abstract description 9
238000001035 drying Methods 0.000 claims abstract description 8
QCWXUUIWCKQGHC-UHFFFAOYSA-N Zirconium Chemical compound [Zr] QCWXUUIWCKQGHC-UHFFFAOYSA-N 0.000 claims abstract description 7
229910052726 zirconium Inorganic materials 0.000 claims abstract description 7
239000000243 solution Substances 0.000 claims description 39
CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical group CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 claims description 24
239000000203 mixture Substances 0.000 claims description 22
MVDYEFQVZNBPPH-UHFFFAOYSA-N pentane-2,3,4-trione Chemical compound CC(=O)C(=O)C(C)=O MVDYEFQVZNBPPH-UHFFFAOYSA-N 0.000 claims description 20
LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 claims description 19
229910052707 ruthenium Inorganic materials 0.000 claims description 14
KJTLSVCANCCWHF-UHFFFAOYSA-N Ruthenium Chemical compound [Ru] KJTLSVCANCCWHF-UHFFFAOYSA-N 0.000 claims description 13
FAPWRFPIFSIZLT-UHFFFAOYSA-M Sodium chloride Chemical compound [Na+].[Cl-] FAPWRFPIFSIZLT-UHFFFAOYSA-M 0.000 claims description 13
KDLHZDBZIXYQEI-UHFFFAOYSA-N Palladium Chemical compound [Pd] KDLHZDBZIXYQEI-UHFFFAOYSA-N 0.000 claims description 10
238000010438 heat treatment Methods 0.000 claims description 10
BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Chemical compound [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 claims description 8
ZAMOUSCENKQFHK-UHFFFAOYSA-N Chlorine atom Chemical compound [Cl] ZAMOUSCENKQFHK-UHFFFAOYSA-N 0.000 claims description 6
HEDRZPFGACZZDS-UHFFFAOYSA-N Chloroform Chemical group ClC(Cl)Cl HEDRZPFGACZZDS-UHFFFAOYSA-N 0.000 claims description 6
KFZMGEQAYNKOFK-UHFFFAOYSA-N Isopropanol Chemical compound CC(C)O KFZMGEQAYNKOFK-UHFFFAOYSA-N 0.000 claims description 6
239000007864 aqueous solution Substances 0.000 claims description 6
239000000460 chlorine Substances 0.000 claims description 6
239000011780 sodium chloride Substances 0.000 claims description 6
229910052801 chlorine Inorganic materials 0.000 claims description 5
NEHMKBQYUWJMIP-UHFFFAOYSA-N chloromethane Chemical class ClC NEHMKBQYUWJMIP-UHFFFAOYSA-N 0.000 claims description 5
238000010304 firing Methods 0.000 claims description 5
229910052741 iridium Inorganic materials 0.000 claims description 5
GKOZUEZYRPOHIO-UHFFFAOYSA-N iridium atom Chemical compound [Ir] GKOZUEZYRPOHIO-UHFFFAOYSA-N 0.000 claims description 5
150000002576 ketones Chemical class 0.000 claims description 4
229910052762 osmium Inorganic materials 0.000 claims description 4
SYQBFIAQOQZEGI-UHFFFAOYSA-N osmium atom Chemical compound [Os] SYQBFIAQOQZEGI-UHFFFAOYSA-N 0.000 claims description 4
229910052763 palladium Inorganic materials 0.000 claims description 4
229910052697 platinum Inorganic materials 0.000 claims description 4
229910052703 rhodium Inorganic materials 0.000 claims description 4
239000010948 rhodium Substances 0.000 claims description 4
MHOVAHRLVXNVSD-UHFFFAOYSA-N rhodium atom Chemical compound [Rh] MHOVAHRLVXNVSD-UHFFFAOYSA-N 0.000 claims description 4
VEXZGXHMUGYJMC-UHFFFAOYSA-M Chloride anion Chemical compound [Cl-] VEXZGXHMUGYJMC-UHFFFAOYSA-M 0.000 claims description 3
150000001298 alcohols Chemical class 0.000 claims description 3
229910001514 alkali metal chloride Inorganic materials 0.000 claims description 3
229910052783 alkali metal Inorganic materials 0.000 claims description 2
150000008044 alkali metal hydroxides Chemical class 0.000 claims description 2
150000001340 alkali metals Chemical class 0.000 claims description 2
QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 claims description 2
239000011261 inert gas Substances 0.000 claims description 2
238000002156 mixing Methods 0.000 claims description 2
125000002524 organometallic group Chemical group 0.000 claims description 2
229910052760 oxygen Inorganic materials 0.000 claims description 2
239000001301 oxygen Substances 0.000 claims description 2
239000000126 substance Substances 0.000 claims 2
XTEGARKTQYYJKE-UHFFFAOYSA-M Chlorate Chemical class [O-]Cl(=O)=O XTEGARKTQYYJKE-UHFFFAOYSA-M 0.000 claims 1
239000011877 solvent mixture Substances 0.000 claims 1
POILWHVDKZOXJZ-ARJAWSKDSA-M (z)-4-oxopent-2-en-2-olate Chemical compound C\C([O-])=C\C(C)=O POILWHVDKZOXJZ-ARJAWSKDSA-M 0.000 abstract 1
125000005595 acetylacetonate group Chemical group 0.000 abstract 1
238000001354 calcination Methods 0.000 abstract 1
229910001510 metal chloride Inorganic materials 0.000 abstract 1
PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 25
239000010410 layer Substances 0.000 description 12
229910052759 nickel Inorganic materials 0.000 description 12
KRHYYFGTRYWZRS-UHFFFAOYSA-N Fluorane Chemical compound F KRHYYFGTRYWZRS-UHFFFAOYSA-N 0.000 description 10
238000009434 installation Methods 0.000 description 10
BZSXEZOLBIJVQK-UHFFFAOYSA-N 2-methylsulfonylbenzoic acid Chemical compound CS(=O)(=O)C1=CC=CC=C1C(O)=O BZSXEZOLBIJVQK-UHFFFAOYSA-N 0.000 description 6
HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 description 6
239000003792 electrolyte Substances 0.000 description 6
PEDCQBHIVMGVHV-UHFFFAOYSA-N Glycerine Chemical compound OCC(O)CO PEDCQBHIVMGVHV-UHFFFAOYSA-N 0.000 description 5
150000002739 metals Chemical class 0.000 description 5
230000010287 polarization Effects 0.000 description 5
-1 chloromethylene Chemical group 0.000 description 4
238000009736 wetting Methods 0.000 description 4
ZWEHNKRNPOVVGH-UHFFFAOYSA-N 2-Butanone Chemical compound CCC(C)=O ZWEHNKRNPOVVGH-UHFFFAOYSA-N 0.000 description 3
IAZDPXIOMUYVGZ-UHFFFAOYSA-N Dimethylsulphoxide Chemical compound CS(C)=O IAZDPXIOMUYVGZ-UHFFFAOYSA-N 0.000 description 3
MUBZPKHOEPUJKR-UHFFFAOYSA-N Oxalic acid Chemical compound OC(=O)C(O)=O MUBZPKHOEPUJKR-UHFFFAOYSA-N 0.000 description 3
239000002253 acid Substances 0.000 description 3
230000004913 activation Effects 0.000 description 3
238000004090 dissolution Methods 0.000 description 3
239000000463 material Substances 0.000 description 3
229910017604 nitric acid Inorganic materials 0.000 description 3
OGIDPMRJRNCKJF-UHFFFAOYSA-N titanium oxide Inorganic materials [Ti]=O OGIDPMRJRNCKJF-UHFFFAOYSA-N 0.000 description 3
MHAJPDPJQMAIIY-UHFFFAOYSA-N Hydrogen peroxide Chemical compound OO MHAJPDPJQMAIIY-UHFFFAOYSA-N 0.000 description 2
GRYLNZFGIOXLOG-UHFFFAOYSA-N Nitric acid Chemical compound O[N+]([O-])=O GRYLNZFGIOXLOG-UHFFFAOYSA-N 0.000 description 2
ROZSPJBPUVWBHW-UHFFFAOYSA-N [Ru]=O Chemical class [Ru]=O ROZSPJBPUVWBHW-UHFFFAOYSA-N 0.000 description 2
229910045601 alloy Inorganic materials 0.000 description 2
239000000956 alloy Substances 0.000 description 2
239000011247 coating layer Substances 0.000 description 2
230000000694 effects Effects 0.000 description 2
238000005516 engineering process Methods 0.000 description 2
235000011187 glycerol Nutrition 0.000 description 2
238000011084 recovery Methods 0.000 description 2
238000011160 research Methods 0.000 description 2
229910001925 ruthenium oxide Inorganic materials 0.000 description 2
150000003573 thiols Chemical class 0.000 description 2
238000005406 washing Methods 0.000 description 2
IYWJIYWFPADQAN-LNTINUHCSA-N (z)-4-hydroxypent-3-en-2-one;ruthenium Chemical compound [Ru].C\C(O)=C\C(C)=O.C\C(O)=C\C(C)=O.C\C(O)=C\C(C)=O IYWJIYWFPADQAN-LNTINUHCSA-N 0.000 description 1
XNWFRZJHXBZDAG-UHFFFAOYSA-N 2-METHOXYETHANOL Chemical compound COCCO XNWFRZJHXBZDAG-UHFFFAOYSA-N 0.000 description 1
MYLBTCQBKAKUTJ-UHFFFAOYSA-N 7-methyl-6,8-bis(methylsulfanyl)pyrrolo[1,2-a]pyrazine Chemical group C1=CN=CC2=C(SC)C(C)=C(SC)N21 MYLBTCQBKAKUTJ-UHFFFAOYSA-N 0.000 description 1
OYPRJOBELJOOCE-UHFFFAOYSA-N Calcium Chemical compound [Ca] OYPRJOBELJOOCE-UHFFFAOYSA-N 0.000 description 1
VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 description 1
DGAQECJNVWCQMB-PUAWFVPOSA-M Ilexoside XXIX Chemical compound C[C@@H]1CC[C@@]2(CC[C@@]3(C(=CC[C@H]4[C@]3(CC[C@@H]5[C@@]4(CC[C@@H](C5(C)C)OS(=O)(=O)[O-])C)C)[C@@H]2[C@]1(C)O)C)C(=O)O[C@H]6[C@@H]([C@H]([C@@H]([C@H](O6)CO)O)O)O.[Na+] DGAQECJNVWCQMB-PUAWFVPOSA-M 0.000 description 1
229910001209 Low-carbon steel Inorganic materials 0.000 description 1
FYYHWMGAXLPEAU-UHFFFAOYSA-N Magnesium Chemical compound [Mg] FYYHWMGAXLPEAU-UHFFFAOYSA-N 0.000 description 1
ZOKXTWBITQBERF-UHFFFAOYSA-N Molybdenum Chemical compound [Mo] ZOKXTWBITQBERF-UHFFFAOYSA-N 0.000 description 1
BUGBHKTXTAQXES-UHFFFAOYSA-N Selenium Chemical compound [Se] BUGBHKTXTAQXES-UHFFFAOYSA-N 0.000 description 1
239000004809 Teflon Substances 0.000 description 1
229920006362 Teflon® Polymers 0.000 description 1
HCHKCACWOHOZIP-UHFFFAOYSA-N Zinc Chemical compound [Zn] HCHKCACWOHOZIP-UHFFFAOYSA-N 0.000 description 1
PCBMYXLJUKBODW-UHFFFAOYSA-N [Ru].ClOCl Chemical compound [Ru].ClOCl PCBMYXLJUKBODW-UHFFFAOYSA-N 0.000 description 1
229910052788 barium Inorganic materials 0.000 description 1
DSAJWYNOEDNPEQ-UHFFFAOYSA-N barium atom Chemical compound [Ba] DSAJWYNOEDNPEQ-UHFFFAOYSA-N 0.000 description 1
229910052791 calcium Inorganic materials 0.000 description 1
239000011575 calcium Substances 0.000 description 1
229940075397 calomel Drugs 0.000 description 1
150000001768 cations Chemical class 0.000 description 1
238000006243 chemical reaction Methods 0.000 description 1
229910001902 chlorine oxide Inorganic materials 0.000 description 1
XFVGXQSSXWIWIO-UHFFFAOYSA-N chloro hypochlorite;titanium Chemical compound [Ti].ClOCl XFVGXQSSXWIWIO-UHFFFAOYSA-N 0.000 description 1
229910052804 chromium Inorganic materials 0.000 description 1
239000011651 chromium Substances 0.000 description 1
229910017052 cobalt Inorganic materials 0.000 description 1
239000010941 cobalt Substances 0.000 description 1
GUTLYIVDDKVIGB-UHFFFAOYSA-N cobalt atom Chemical compound [Co] GUTLYIVDDKVIGB-UHFFFAOYSA-N 0.000 description 1
230000000052 comparative effect Effects 0.000 description 1
150000001875 compounds Chemical class 0.000 description 1
230000007797 corrosion Effects 0.000 description 1
238000005260 corrosion Methods 0.000 description 1
RCJVRSBWZCNNQT-UHFFFAOYSA-N dichloridooxygen Chemical compound ClOCl RCJVRSBWZCNNQT-UHFFFAOYSA-N 0.000 description 1
ZOMNIUBKTOKEHS-UHFFFAOYSA-L dimercury dichloride Chemical compound Cl[Hg][Hg]Cl ZOMNIUBKTOKEHS-UHFFFAOYSA-L 0.000 description 1
238000005530 etching Methods 0.000 description 1
239000007789 gas Substances 0.000 description 1
UQSXHKLRYXJYBZ-UHFFFAOYSA-N iron oxide Inorganic materials [Fe]=O UQSXHKLRYXJYBZ-UHFFFAOYSA-N 0.000 description 1
235000013980 iron oxide Nutrition 0.000 description 1
VBMVTYDPPZVILR-UHFFFAOYSA-N iron(2+);oxygen(2-) Chemical class [O-2].[Fe+2] VBMVTYDPPZVILR-UHFFFAOYSA-N 0.000 description 1
238000009533 lab test Methods 0.000 description 1
239000006101 laboratory sample Substances 0.000 description 1
229910052749 magnesium Inorganic materials 0.000 description 1
239000011777 magnesium Substances 0.000 description 1
238000005259 measurement Methods 0.000 description 1
229910052750 molybdenum Inorganic materials 0.000 description 1
239000011733 molybdenum Substances 0.000 description 1
229910052758 niobium Inorganic materials 0.000 description 1
239000010955 niobium Substances 0.000 description 1
GUCVJGMIXFAOAE-UHFFFAOYSA-N niobium atom Chemical compound [Nb] GUCVJGMIXFAOAE-UHFFFAOYSA-N 0.000 description 1
150000002902 organometallic compounds Chemical class 0.000 description 1
235000006408 oxalic acid Nutrition 0.000 description 1
230000033116 oxidation-reduction process Effects 0.000 description 1
RVTZCBVAJQQJTK-UHFFFAOYSA-N oxygen(2-);zirconium(4+) Chemical compound [O-2].[O-2].[Zr+4] RVTZCBVAJQQJTK-UHFFFAOYSA-N 0.000 description 1
229910003445 palladium oxide Inorganic materials 0.000 description 1
238000012545 processing Methods 0.000 description 1
239000000523 sample Substances 0.000 description 1
239000012047 saturated solution Substances 0.000 description 1
229910052711 selenium Inorganic materials 0.000 description 1
239000011669 selenium Substances 0.000 description 1
238000002791 soaking Methods 0.000 description 1
229910052708 sodium Inorganic materials 0.000 description 1
239000011734 sodium Substances 0.000 description 1
238000005507 spraying Methods 0.000 description 1
230000006641 stabilisation Effects 0.000 description 1
238000011105 stabilization Methods 0.000 description 1
239000010935 stainless steel Substances 0.000 description 1
229910001220 stainless steel Inorganic materials 0.000 description 1
238000003756 stirring Methods 0.000 description 1
229910052712 strontium Inorganic materials 0.000 description 1
CIOAGBVUUVVLOB-UHFFFAOYSA-N strontium atom Chemical compound [Sr] CIOAGBVUUVVLOB-UHFFFAOYSA-N 0.000 description 1
238000003786 synthesis reaction Methods 0.000 description 1
229910052714 tellurium Inorganic materials 0.000 description 1
PORWMNRCUJJQNO-UHFFFAOYSA-N tellurium atom Chemical compound [Te] PORWMNRCUJJQNO-UHFFFAOYSA-N 0.000 description 1
238000012360 testing method Methods 0.000 description 1
238000005979 thermal decomposition reaction Methods 0.000 description 1
GWEVSGVZZGPLCZ-UHFFFAOYSA-N titanium dioxide Inorganic materials O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 description 1
229910000314 transition metal oxide Inorganic materials 0.000 description 1
WFKWXMTUELFFGS-UHFFFAOYSA-N tungsten Chemical compound [W] WFKWXMTUELFFGS-UHFFFAOYSA-N 0.000 description 1
229910052721 tungsten Inorganic materials 0.000 description 1
239000010937 tungsten Substances 0.000 description 1
229910052725 zinc Inorganic materials 0.000 description 1
239000011701 zinc Substances 0.000 description 1
229910001928 zirconium oxide Inorganic materials 0.000 description 1

Classifications

- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25B—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES FOR THE PRODUCTION OF COMPOUNDS OR NON-METALS; APPARATUS THEREFOR
- C25B11/00—Electrodes; Manufacture thereof not otherwise provided for
- C25B11/04—Electrodes; Manufacture thereof not otherwise provided for characterised by the material
- C25B11/051—Electrodes formed of electrocatalysts on a substrate or carrier
- C25B11/073—Electrodes formed of electrocatalysts on a substrate or carrier characterised by the electrocatalyst material
- C25B11/091—Electrodes formed of electrocatalysts on a substrate or carrier characterised by the electrocatalyst material consisting of at least one catalytic element and at least one catalytic compound; consisting of two or more catalytic elements or catalytic compounds
- C25B11/093—Electrodes formed of electrocatalysts on a substrate or carrier characterised by the electrocatalyst material consisting of at least one catalytic element and at least one catalytic compound; consisting of two or more catalytic elements or catalytic compounds at least one noble metal or noble metal oxide and at least one non-noble metal oxide
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
- C23C18/02—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition
- C23C18/04—Pretreatment of the material to be coated
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
- C23C18/02—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition
- C23C18/08—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition characterised by the deposition of metallic material
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
- C23C18/02—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition
- C23C18/12—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition characterised by the deposition of inorganic material other than metallic material
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
- C23C18/02—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition
- C23C18/12—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition characterised by the deposition of inorganic material other than metallic material
- C23C18/1204—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition characterised by the deposition of inorganic material other than metallic material inorganic material, e.g. non-oxide and non-metallic such as sulfides, nitrides based compounds
- C23C18/1208—Oxides, e.g. ceramics
- C23C18/1216—Metal oxides
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
- C23C18/02—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition
- C23C18/12—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition characterised by the deposition of inorganic material other than metallic material
- C23C18/1225—Deposition of multilayers of inorganic material
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
- C23C18/02—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition
- C23C18/12—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition characterised by the deposition of inorganic material other than metallic material
- C23C18/1229—Composition of the substrate
- C23C18/1241—Metallic substrates
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
- C23C18/02—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition
- C23C18/12—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition characterised by the deposition of inorganic material other than metallic material
- C23C18/125—Process of deposition of the inorganic material
- C23C18/1275—Process of deposition of the inorganic material performed under inert atmosphere
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
- C23C18/02—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition
- C23C18/12—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition characterised by the deposition of inorganic material other than metallic material
- C23C18/125—Process of deposition of the inorganic material
- C23C18/1279—Process of deposition of the inorganic material performed under reactive atmosphere, e.g. oxidising or reducing atmospheres
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25B—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES FOR THE PRODUCTION OF COMPOUNDS OR NON-METALS; APPARATUS THEREFOR
- C25B1/00—Electrolytic production of inorganic compounds or non-metals
- C25B1/01—Products
- C25B1/14—Alkali metal compounds

Landscapes

Chemical & Material Sciences (AREA)
Engineering & Computer Science (AREA)
Organic Chemistry (AREA)
Metallurgy (AREA)
Materials Engineering (AREA)
Chemical Kinetics & Catalysis (AREA)
Mechanical Engineering (AREA)
General Chemical & Material Sciences (AREA)
Thermal Sciences (AREA)
Physics & Mathematics (AREA)
Inorganic Chemistry (AREA)
Electrochemistry (AREA)
Ceramic Engineering (AREA)
Electrodes For Compound Or Non-Metal Manufacture (AREA)
Electrolytic Production Of Non-Metals, Compounds, Apparatuses Therefor (AREA)
Chemically Coating (AREA)
Oxygen, Ozone, And Oxides In General (AREA)

UAA200510604A 2003-03-28 2004-03-25 Method for the coating of metal oxides formation on the electroconductive support, activated cathode, which is obtained by this method and its use for electrolysis of water solutions of alkali chlorides UA80610C2 (en)

Applications Claiming Priority (2)

Application Number	Priority Date	Filing Date	Title
FR0303867A FR2852973B1 (fr)	2003-03-28	2003-03-28	Procede de formation d'un revetement d'oxydes metalliques sur un substrat electroconducteur; cathode activee en resultant et son utilisation pour l'electrolyse de solutions acqueuses de chorures de meteaux alcalins.
PCT/FR2004/000746 WO2004087992A2 (fr)	2003-03-28	2004-03-25	Procede de formation d'un revetement d'oxydes metalliques sur un substrat electroconducteur, cathode activee en resultant et son utilisation pour l'electrolyse de solutions aqueuses de chlorures de metaux alcalins.

Publications (1)

Publication Number	Publication Date
UA80610C2 true UA80610C2 (en)	2007-10-10

Family

ID=32947259

Family Applications (1)

Application Number	Title	Priority Date	Filing Date
UAA200510604A UA80610C2 (en)	2003-03-28	2004-03-25	Method for the coating of metal oxides formation on the electroconductive support, activated cathode, which is obtained by this method and its use for electrolysis of water solutions of alkali chlorides

Country Status (16)

Country	Link
US (1)	US7790233B2 (de)
EP (1)	EP1608795B1 (de)
JP (1)	JP4532471B2 (de)
KR (1)	KR101111369B1 (de)
CN (1)	CN1795291B (de)
AT (1)	ATE330043T1 (de)
BR (1)	BRPI0408905A (de)
CA (1)	CA2520584C (de)
DE (1)	DE602004001230T2 (de)
ES (1)	ES2270380T3 (de)
FR (1)	FR2852973B1 (de)
MX (1)	MXPA05010353A (de)
PL (1)	PL1608795T3 (de)
UA (1)	UA80610C2 (de)
WO (1)	WO2004087992A2 (de)
ZA (1)	ZA200507825B (de)

Families Citing this family (8)

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JP2006283143A (ja) *	2005-03-31	2006-10-19	Dainippon Printing Co Ltd	金属酸化物膜の製造方法
GB0714021D0 (en) *	2007-07-18	2007-08-29	Green Metals Ltd	Improvements in anode materials
US8124556B2 (en) *	2008-05-24	2012-02-28	Freeport-Mcmoran Corporation	Electrochemically active composition, methods of making, and uses thereof
KR20120058453A (ko)	2009-05-26	2012-06-07	에이전시 포 사이언스, 테크놀로지 앤드 리서치	피롤린-5-카르복실레이트 환원 효소 1의 변이체
CN102505127A (zh) *	2011-12-29	2012-06-20	文广	贵金属改性钛阳极材料的制备方法
WO2015137193A1 (ja) *	2014-03-12	2015-09-17	Jsr株式会社	半導体デバイス製造用組成物および該半導体デバイス製造用組成物を用いたパターン形成方法
CN106521433A (zh) *	2015-09-09	2017-03-22	宁波江丰电子材料股份有限公司	环件结构及其加工方法
IT201900020026A1 (it) *	2019-10-30	2021-04-30	Industrie De Nora Spa	Elettrodo per evoluzione elettrolitica di idrogeno

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US3850668A (en)	1972-06-05	1974-11-26	Johnson Matthey Co Ltd	Impregnation of graphite with ruthenium compounds
US4300992A (en)	1975-05-12	1981-11-17	Hodogaya Chemical Co., Ltd.	Activated cathode
US4100049A (en) *	1977-07-11	1978-07-11	Diamond Shamrock Corporation	Coated cathode for electrolysis cells
FR2583781A1 (fr) *	1985-06-24	1986-12-26	Atochem	Cathode pour electrolyse et un procede de fabrication de ladite cathode
FR2596776B1 (fr) *	1986-04-03	1988-06-03	Atochem	Cathode pour electrolyse et un procede de fabrication de ladite cathode
JPH0766816B2 (ja) *	1989-01-13	1995-07-19	東洋インキ製造株式会社	ガス拡散型複合電極の製造方法
US5997956A (en) *	1995-08-04	1999-12-07	Microcoating Technologies	Chemical vapor deposition and powder formation using thermal spray with near supercritical and supercritical fluid solutions
US5864051A (en) *	1997-11-10	1999-01-26	Uop	Selective oxidation catalyst process for preparing the catalyst and process using the catalyst
JP3383838B2 (ja) *	1999-02-25	2003-03-10	独立行政法人産業技術総合研究所	金属酸化物の製造方法及び微細パターンの形成方法
FR2797646B1 (fr) *	1999-08-20	2002-07-05	Atofina	Cathode utilisable pour l'electrolyse de solutions aqueuses
US7258899B1 (en) *	2001-12-13	2007-08-21	Amt Holdings, Inc.	Process for preparing metal coatings from liquid solutions utilizing cold plasma
US20040077494A1 (en) *	2002-10-22	2004-04-22	Labarge William J.	Method for depositing particles onto a catalytic support

2003
- 2003-03-28 FR FR0303867A patent/FR2852973B1/fr not_active Expired - Fee Related
2004
- 2004-03-25 EP EP04742353A patent/EP1608795B1/de not_active Expired - Lifetime
- 2004-03-25 WO PCT/FR2004/000746 patent/WO2004087992A2/fr not_active Ceased
- 2004-03-25 CN CN2004800147636A patent/CN1795291B/zh not_active Expired - Fee Related
- 2004-03-25 AT AT04742353T patent/ATE330043T1/de not_active IP Right Cessation
- 2004-03-25 KR KR1020057018365A patent/KR101111369B1/ko not_active Expired - Fee Related
- 2004-03-25 CA CA2520584A patent/CA2520584C/fr not_active Expired - Fee Related
- 2004-03-25 PL PL04742353T patent/PL1608795T3/pl unknown
- 2004-03-25 ES ES04742353T patent/ES2270380T3/es not_active Expired - Lifetime
- 2004-03-25 UA UAA200510604A patent/UA80610C2/uk unknown
- 2004-03-25 US US10/550,646 patent/US7790233B2/en not_active Expired - Fee Related
- 2004-03-25 BR BRPI0408905-7A patent/BRPI0408905A/pt not_active Application Discontinuation
- 2004-03-25 MX MXPA05010353A patent/MXPA05010353A/es active IP Right Grant
- 2004-03-25 DE DE602004001230T patent/DE602004001230T2/de not_active Expired - Lifetime
- 2004-03-25 JP JP2006505751A patent/JP4532471B2/ja not_active Expired - Fee Related
2005
- 2005-09-27 ZA ZA200507825A patent/ZA200507825B/en unknown

Also Published As

Publication number	Publication date
BRPI0408905A (pt)	2006-03-28
ZA200507825B (en)	2007-01-31
FR2852973B1 (fr)	2006-05-26
EP1608795B1 (de)	2006-06-14
JP4532471B2 (ja)	2010-08-25
PL1608795T3 (pl)	2006-11-30
CN1795291B (zh)	2011-08-31
ATE330043T1 (de)	2006-07-15
MXPA05010353A (es)	2005-12-14
KR101111369B1 (ko)	2012-04-09
WO2004087992A3 (fr)	2005-02-17
KR20050114265A (ko)	2005-12-05
CN1795291A (zh)	2006-06-28
EP1608795A2 (de)	2005-12-28
ES2270380T3 (es)	2007-04-01
JP2006521469A (ja)	2006-09-21
CA2520584A1 (fr)	2004-10-14
WO2004087992A2 (fr)	2004-10-14
US20060263614A1 (en)	2006-11-23
FR2852973A1 (fr)	2004-10-01
US7790233B2 (en)	2010-09-07
DE602004001230T2 (de)	2007-04-19
DE602004001230D1 (de)	2006-07-27
CA2520584C (fr)	2011-08-23

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TWI757535B (zh)	2022-03-11	電解用陽極及其製法
KR100735588B1 (ko)	2007-07-04	수용액의 전해용 캐쏘드
EA023645B1 (ru)	2016-06-30	Анод для электролитического выделения хлора
CN107002257B (zh)	2019-11-05	用于氯气的电解析出的阳极
US5503663A (en)	1996-04-02	Sable coating solutions for coating valve metal anodes
KR20250130691A (ko)	2025-09-02	염소의 전해 발생을 위한 애노드
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JP2836840B2 (ja)	1998-12-14	塩素発生用電極及びその製造方法
CN114616358A (zh)	2022-06-10	用于电化学析氢的电极
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JP7399189B2 (ja)	2023-12-15	スズ酸化物形成用組成物
JP6247535B2 (ja)	2017-12-13	電解槽のための電極
CN112342566B (zh)	2023-09-19	电解用电极的制造方法
KR102503040B1 (ko)	2023-02-23	복합 금속 인화물을 포함하는 산화 전극 및 이의 제조방법
KR830000815B1 (ko)	1983-04-19	전해용 전극
CN115715336A (zh)	2023-02-24	用于氢的电化学析出的电极
CS222661B2 (cs)	1983-07-29	Elektroda s jádrem z kovu odolného vůči chloru