ATE330043T1 - Verfahren zur herstellung einer metalloxidbeschichtung auf einem leitfähigen substrat, aktivierte kathode davon und ihre verwendung zur elektrolyse von wässriger alkalichlorid-lösungen - Google Patents

Verfahren zur herstellung einer metalloxidbeschichtung auf einem leitfähigen substrat, aktivierte kathode davon und ihre verwendung zur elektrolyse von wässriger alkalichlorid-lösungen

Info

Publication number: ATE330043T1
Authority: AT; Austria
Prior art keywords: conductive substrate; electrolysis; metal; lichloride; solutions
Prior art date: 2003-03-28

Application number

AT04742353T

Other languages

English (en)

Inventor

Francoise Andolfatto

Philippe Joubert

Gerard Duboeuf

Original Assignee

Arkema

Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)

2003-03-28

Filing date

2004-03-25

Publication date

2006-07-15

2004-03-25 Application filed by Arkema filed Critical Arkema

2006-07-15 Application granted granted Critical

2006-07-15 Publication of ATE330043T1 publication Critical patent/ATE330043T1/de

Links

239000000758 substrate Substances 0.000 title abstract 4
229910044991 metal oxide Inorganic materials 0.000 title abstract 3
150000004706 metal oxides Chemical class 0.000 title abstract 3
239000011248 coating agent Substances 0.000 title abstract 2
238000000576 coating method Methods 0.000 title abstract 2
238000005868 electrolysis reaction Methods 0.000 title abstract 2
238000004519 manufacturing process Methods 0.000 title 1
POILWHVDKZOXJZ-ARJAWSKDSA-M (z)-4-oxopent-2-en-2-olate Chemical compound C\C([O-])=C\C(C)=O POILWHVDKZOXJZ-ARJAWSKDSA-M 0.000 abstract 2
XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 abstract 2
229910052751 metal Inorganic materials 0.000 abstract 2
239000002184 metal Substances 0.000 abstract 2
229910000831 Steel Inorganic materials 0.000 abstract 1
RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 abstract 1
QCWXUUIWCKQGHC-UHFFFAOYSA-N Zirconium Chemical compound [Zr] QCWXUUIWCKQGHC-UHFFFAOYSA-N 0.000 abstract 1
229910001514 alkali metal chloride Inorganic materials 0.000 abstract 1
239000007864 aqueous solution Substances 0.000 abstract 1
230000015572 biosynthetic process Effects 0.000 abstract 1
238000001354 calcination Methods 0.000 abstract 1
238000001035 drying Methods 0.000 abstract 1
229910052742 iron Inorganic materials 0.000 abstract 1
238000000034 method Methods 0.000 abstract 1
230000000737 periodic effect Effects 0.000 abstract 1
239000010970 precious metal Substances 0.000 abstract 1
239000000243 solution Substances 0.000 abstract 1
239000002904 solvent Substances 0.000 abstract 1
239000010959 steel Substances 0.000 abstract 1
239000010936 titanium Substances 0.000 abstract 1
229910052719 titanium Inorganic materials 0.000 abstract 1
229910052726 zirconium Inorganic materials 0.000 abstract 1

Classifications

- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25B—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES FOR THE PRODUCTION OF COMPOUNDS OR NON-METALS; APPARATUS THEREFOR
- C25B11/00—Electrodes; Manufacture thereof not otherwise provided for
- C25B11/04—Electrodes; Manufacture thereof not otherwise provided for characterised by the material
- C25B11/051—Electrodes formed of electrocatalysts on a substrate or carrier
- C25B11/073—Electrodes formed of electrocatalysts on a substrate or carrier characterised by the electrocatalyst material
- C25B11/091—Electrodes formed of electrocatalysts on a substrate or carrier characterised by the electrocatalyst material consisting of at least one catalytic element and at least one catalytic compound; consisting of two or more catalytic elements or catalytic compounds
- C25B11/093—Electrodes formed of electrocatalysts on a substrate or carrier characterised by the electrocatalyst material consisting of at least one catalytic element and at least one catalytic compound; consisting of two or more catalytic elements or catalytic compounds at least one noble metal or noble metal oxide and at least one non-noble metal oxide
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
- C23C18/02—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition
- C23C18/04—Pretreatment of the material to be coated
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
- C23C18/02—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition
- C23C18/08—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition characterised by the deposition of metallic material
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
- C23C18/02—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition
- C23C18/12—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition characterised by the deposition of inorganic material other than metallic material
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
- C23C18/02—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition
- C23C18/12—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition characterised by the deposition of inorganic material other than metallic material
- C23C18/1204—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition characterised by the deposition of inorganic material other than metallic material inorganic material, e.g. non-oxide and non-metallic such as sulfides, nitrides based compounds
- C23C18/1208—Oxides, e.g. ceramics
- C23C18/1216—Metal oxides
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
- C23C18/02—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition
- C23C18/12—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition characterised by the deposition of inorganic material other than metallic material
- C23C18/1225—Deposition of multilayers of inorganic material
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
- C23C18/02—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition
- C23C18/12—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition characterised by the deposition of inorganic material other than metallic material
- C23C18/1229—Composition of the substrate
- C23C18/1241—Metallic substrates
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
- C23C18/02—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition
- C23C18/12—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition characterised by the deposition of inorganic material other than metallic material
- C23C18/125—Process of deposition of the inorganic material
- C23C18/1275—Process of deposition of the inorganic material performed under inert atmosphere
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
- C23C18/02—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition
- C23C18/12—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition characterised by the deposition of inorganic material other than metallic material
- C23C18/125—Process of deposition of the inorganic material
- C23C18/1279—Process of deposition of the inorganic material performed under reactive atmosphere, e.g. oxidising or reducing atmospheres
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25B—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES FOR THE PRODUCTION OF COMPOUNDS OR NON-METALS; APPARATUS THEREFOR
- C25B1/00—Electrolytic production of inorganic compounds or non-metals
- C25B1/01—Products
- C25B1/14—Alkali metal compounds

Landscapes

Chemical & Material Sciences (AREA)
Engineering & Computer Science (AREA)
Organic Chemistry (AREA)
Metallurgy (AREA)
Materials Engineering (AREA)
Chemical Kinetics & Catalysis (AREA)
Mechanical Engineering (AREA)
General Chemical & Material Sciences (AREA)
Thermal Sciences (AREA)
Physics & Mathematics (AREA)
Inorganic Chemistry (AREA)
Electrochemistry (AREA)
Ceramic Engineering (AREA)
Electrodes For Compound Or Non-Metal Manufacture (AREA)
Electrolytic Production Of Non-Metals, Compounds, Apparatuses Therefor (AREA)
Chemically Coating (AREA)
Oxygen, Ozone, And Oxides In General (AREA)

AT04742353T 2003-03-28 2004-03-25 Verfahren zur herstellung einer metalloxidbeschichtung auf einem leitfähigen substrat, aktivierte kathode davon und ihre verwendung zur elektrolyse von wässriger alkalichlorid-lösungen ATE330043T1 (de)

Applications Claiming Priority (1)

Application Number	Priority Date	Filing Date	Title
FR0303867A FR2852973B1 (fr)	2003-03-28	2003-03-28	Procede de formation d'un revetement d'oxydes metalliques sur un substrat electroconducteur; cathode activee en resultant et son utilisation pour l'electrolyse de solutions acqueuses de chorures de meteaux alcalins.

Publications (1)

Publication Number	Publication Date
ATE330043T1 true ATE330043T1 (de)	2006-07-15

Family

ID=32947259

Family Applications (1)

Application Number	Title	Priority Date	Filing Date
AT04742353T ATE330043T1 (de)	2003-03-28	2004-03-25	Verfahren zur herstellung einer metalloxidbeschichtung auf einem leitfähigen substrat, aktivierte kathode davon und ihre verwendung zur elektrolyse von wässriger alkalichlorid-lösungen

Country Status (16)

Country	Link
US (1)	US7790233B2 (de)
EP (1)	EP1608795B1 (de)
JP (1)	JP4532471B2 (de)
KR (1)	KR101111369B1 (de)
CN (1)	CN1795291B (de)
AT (1)	ATE330043T1 (de)
BR (1)	BRPI0408905A (de)
CA (1)	CA2520584C (de)
DE (1)	DE602004001230T2 (de)
ES (1)	ES2270380T3 (de)
FR (1)	FR2852973B1 (de)
MX (1)	MXPA05010353A (de)
PL (1)	PL1608795T3 (de)
UA (1)	UA80610C2 (de)
WO (1)	WO2004087992A2 (de)
ZA (1)	ZA200507825B (de)

Families Citing this family (8)

* Cited by examiner, † Cited by third party
Publication number	Priority date	Publication date	Assignee	Title
JP2006283143A (ja) *	2005-03-31	2006-10-19	Dainippon Printing Co Ltd	金属酸化物膜の製造方法
GB0714021D0 (en) *	2007-07-18	2007-08-29	Green Metals Ltd	Improvements in anode materials
US8022004B2 (en) *	2008-05-24	2011-09-20	Freeport-Mcmoran Corporation	Multi-coated electrode and method of making
US20120144511A1 (en) *	2009-05-26	2012-06-07	Agency For Science, Technology And Research	Muteins of the pyrroline-5-carboxylate reductase 1
CN102505127A (zh) *	2011-12-29	2012-06-20	文广	贵金属改性钛阳极材料的制备方法
WO2015137193A1 (ja) *	2014-03-12	2015-09-17	Jsr株式会社	半導体デバイス製造用組成物および該半導体デバイス製造用組成物を用いたパターン形成方法
CN106521433A (zh) *	2015-09-09	2017-03-22	宁波江丰电子材料股份有限公司	环件结构及其加工方法
IT201900020026A1 (it) *	2019-10-30	2021-04-30	Industrie De Nora Spa	Elettrodo per evoluzione elettrolitica di idrogeno

Family Cites Families (12)

* Cited by examiner, † Cited by third party
Publication number	Priority date	Publication date	Assignee	Title
US3850668A (en)	1972-06-05	1974-11-26	Johnson Matthey Co Ltd	Impregnation of graphite with ruthenium compounds
US4300992A (en)	1975-05-12	1981-11-17	Hodogaya Chemical Co., Ltd.	Activated cathode
US4100049A (en) *	1977-07-11	1978-07-11	Diamond Shamrock Corporation	Coated cathode for electrolysis cells
FR2583781A1 (fr) *	1985-06-24	1986-12-26	Atochem	Cathode pour electrolyse et un procede de fabrication de ladite cathode
FR2596776B1 (fr) *	1986-04-03	1988-06-03	Atochem	Cathode pour electrolyse et un procede de fabrication de ladite cathode
JPH0766816B2 (ja) *	1989-01-13	1995-07-19	東洋インキ製造株式会社	ガス拡散型複合電極の製造方法
PT848658E (pt) *	1995-08-04	2007-01-31	Ngimat Co	Deposição química de vapor e formação de pó utilizando vaporização térmica com soluções fluidas quase supercríticas e supercríticas
US5864051A (en) *	1997-11-10	1999-01-26	Uop	Selective oxidation catalyst process for preparing the catalyst and process using the catalyst
JP3383838B2 (ja)	1999-02-25	2003-03-10	独立行政法人産業技術総合研究所	金属酸化物の製造方法及び微細パターンの形成方法
FR2797646B1 (fr) *	1999-08-20	2002-07-05	Atofina	Cathode utilisable pour l'electrolyse de solutions aqueuses
US7258899B1 (en) *	2001-12-13	2007-08-21	Amt Holdings, Inc.	Process for preparing metal coatings from liquid solutions utilizing cold plasma
US20040077494A1 (en) *	2002-10-22	2004-04-22	Labarge William J.	Method for depositing particles onto a catalytic support

2003
- 2003-03-28 FR FR0303867A patent/FR2852973B1/fr not_active Expired - Fee Related
2004
- 2004-03-25 UA UAA200510604A patent/UA80610C2/uk unknown
- 2004-03-25 WO PCT/FR2004/000746 patent/WO2004087992A2/fr not_active Ceased
- 2004-03-25 EP EP04742353A patent/EP1608795B1/de not_active Expired - Lifetime
- 2004-03-25 US US10/550,646 patent/US7790233B2/en not_active Expired - Fee Related
- 2004-03-25 MX MXPA05010353A patent/MXPA05010353A/es active IP Right Grant
- 2004-03-25 AT AT04742353T patent/ATE330043T1/de not_active IP Right Cessation
- 2004-03-25 KR KR1020057018365A patent/KR101111369B1/ko not_active Expired - Fee Related
- 2004-03-25 CN CN2004800147636A patent/CN1795291B/zh not_active Expired - Fee Related
- 2004-03-25 DE DE602004001230T patent/DE602004001230T2/de not_active Expired - Lifetime
- 2004-03-25 ES ES04742353T patent/ES2270380T3/es not_active Expired - Lifetime
- 2004-03-25 JP JP2006505751A patent/JP4532471B2/ja not_active Expired - Fee Related
- 2004-03-25 CA CA2520584A patent/CA2520584C/fr not_active Expired - Fee Related
- 2004-03-25 BR BRPI0408905-7A patent/BRPI0408905A/pt not_active Application Discontinuation
- 2004-03-25 PL PL04742353T patent/PL1608795T3/pl unknown
2005
- 2005-09-27 ZA ZA200507825A patent/ZA200507825B/en unknown

Also Published As

Publication number	Publication date
US20060263614A1 (en)	2006-11-23
EP1608795A2 (de)	2005-12-28
FR2852973B1 (fr)	2006-05-26
PL1608795T3 (pl)	2006-11-30
CA2520584C (fr)	2011-08-23
KR101111369B1 (ko)	2012-04-09
WO2004087992A2 (fr)	2004-10-14
DE602004001230D1 (de)	2006-07-27
KR20050114265A (ko)	2005-12-05
WO2004087992A3 (fr)	2005-02-17
US7790233B2 (en)	2010-09-07
EP1608795B1 (de)	2006-06-14
CN1795291B (zh)	2011-08-31
CA2520584A1 (fr)	2004-10-14
FR2852973A1 (fr)	2004-10-01
JP2006521469A (ja)	2006-09-21
BRPI0408905A (pt)	2006-03-28
CN1795291A (zh)	2006-06-28
DE602004001230T2 (de)	2007-04-19
JP4532471B2 (ja)	2010-08-25
ZA200507825B (en)	2007-01-31
ES2270380T3 (es)	2007-04-01
MXPA05010353A (es)	2005-12-14
UA80610C2 (en)	2007-10-10

Legal Events

Date	Code	Title	Description
2006-12-15	RER	Ceased as to paragraph 5 lit. 3 law introducing patent treaties

Publication	Publication Date	Title
TWI525220B (zh)	2016-03-11	在電解池內釋出氣態生成物用之電極及其製法
ATE330043T1 (de)	2006-07-15	Verfahren zur herstellung einer metalloxidbeschichtung auf einem leitfähigen substrat, aktivierte kathode davon und ihre verwendung zur elektrolyse von wässriger alkalichlorid-lösungen
EP1449891A8 (de)	2004-12-22	Beschichtungsmasse zur ausbildung eines titanoxidfilms, verfahren zur ausbildung eines titanoxidfilms sowie mit titanoxidfilm beschichtetes metallsubstrat
EP3212580B1 (de)	2018-08-29	Elektrode für elektrochlorierungsverfahren und verfahren zur herstellung davon
ATE228177T1 (de)	2002-12-15	Chemisch passivierter gegenstand aus magnesium oder seinen legierungen
AR247251A1 (es)	1994-11-30	Electrodo adecuado para usar como catodo en una celda electrolitica, procedimiento para su preparacion, celda electrolitica que lo comprende y proceso de electrolisis de agua o de solucion acuosa
ATE292696T1 (de)	2005-04-15	Kathode für die elektrolyse von wässrigen lösungen
US8083921B2 (en)	2011-12-27	Anode for oxygen evolution
KR880003033A (ko)	1988-05-13	전해용 산화납 피복 전극 및 그 제조방법
ATE326437T1 (de)	2006-06-15	Beschichtungszusammensetzung, insbesondere für glasoberflächen, und verfahren zu deren herstellung und verwendung
ATE350513T1 (de)	2007-01-15	Aktivierung einer kathode
ATE373118T1 (de)	2007-09-15	Verfahren zur herstellung von peroxodisulfaten in wässriger lösung
JPS63235493A (ja)	1988-09-30	酸素発生用電極及びその製造方法
CN1982507A (zh)	2007-06-20	沉积无裂缝、耐腐蚀和硬的铬层及铬合金层的方法
ATE535536T1 (de)	2011-12-15	Mit nukleinsäuren beschichteter metallischer gegenstand, verfahren zu dessen herstellung und dessen verwendung
EP2037005A3 (de)	2011-09-21	Verfahren zur Herstellung von Graphitelektoden für elektrolytische Processe
DE602004017823D1 (de)	2009-01-02	Verfahren zur elektrolytischen Behandlung von chemischen Beschichtungslaugen
JPH06306670A (ja)	1994-11-01	酸素発生用電極の製法
KR102667240B1 (ko)	2024-05-17	전극의 제조 방법 및 전극
Kraft et al.	2000	Use of diamond electrodes for electrolytic water treatment and sterilisation by anodic oxidation
KR20030095013A (ko)	2003-12-18	전해조 전극 및 그를 제조하기 위한 제조방법
KR20030095012A (ko)	2003-12-18	전해조 전극 및 그를 제조하기 위한 제조방법
TH100657A (th)	2010-03-26	สูตรน้ำยาซิริซินเคลือบผืนเส้นใย
JP2007246987A (ja)	2007-09-27	電極製造用塗布液、及び該塗布液を使用して製造された電解用電極
US20020114964A1 (en)	2002-08-22	Electrode treatment