US2877353A - X-ray microscope - Google Patents

X-ray microscope Download PDF

Info

Publication number
US2877353A
US2877353A US443384A US44338454A US2877353A US 2877353 A US2877353 A US 2877353A US 443384 A US443384 A US 443384A US 44338454 A US44338454 A US 44338454A US 2877353 A US2877353 A US 2877353A
Authority
US
United States
Prior art keywords
electron beam
lens assembly
ray
target
plates
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
US443384A
Other languages
English (en)
Inventor
Sterling P Newberry
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
General Electric Co
Original Assignee
General Electric Co
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by General Electric Co filed Critical General Electric Co
Priority to US443384A priority Critical patent/US2877353A/en
Priority to FR1134065D priority patent/FR1134065A/fr
Priority to GB20447/55A priority patent/GB780682A/en
Application granted granted Critical
Publication of US2877353A publication Critical patent/US2877353A/en
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Images

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J35/00—X-ray tubes
    • H01J35/02—Details
    • H01J35/14—Arrangements for concentrating, focusing, or directing the cathode ray
    • G—PHYSICS
    • G21—NUCLEAR PHYSICS; NUCLEAR ENGINEERING
    • G21K—HANDLING OF PARTICLES OR IONISING RADIATION NOT OTHERWISE PROVIDED FOR; IRRADIATION DEVICES; GAMMA RAY OR X-RAY MICROSCOPES
    • G21K7/00—Gamma- or X-ray microscopes
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J35/00—X-ray tubes
    • H01J35/02—Details
    • H01J35/16—Vessels; Containers; Shields associated therewith
    • H01J35/18—Windows
    • H01J35/186—Windows used as targets or X-ray converters

Definitions

  • the present invention relates to an X-ray microscope.
  • the invention relates to X-ray microscopes of the shadow-graph type wherein the object to be examined is disposed in the path of a beam of X-rays, and the shadow cast thereby is directed onto a photographic plate.
  • Another object of the invention is to provide X-ray shadow microscopes which can readily be adapted for use with problems requiring widely dilerent resolving powers, and X-ray voltages, and which is easy to operate.
  • Still another object of the invention is to provide a new and improved X-ray shadow microscope which is relatively simple in construction and inexpensive to manufacture.
  • an X-ray shadow microscope which includes an electron beam source and at least one set of electrostatic eld producing plates which are disposed along the electron beam path and form an electron beam objective lens assembly.
  • An X-ray producing target-window structure is positioned to intercept the electron beam after the same passes through the objective lens assembly, and an electron beam defining aperture is positioned along the electron beam path on the side of the electrostatic field producing plates closest to the electron beam source.
  • the electron beam defining aperture is formed in a movable member having a plurality of different size apertures therein for selective movement into beam forming relationship with respect to the electron beam path.
  • Fig. l is a cross-sectional view of a new and improved X-ray shadow microscope constructed in accordance with the invention.
  • Fig. 2 is an enlarged fragmentary plan view of a manipulator comprising a part of the X-ray shadow microscope illustrated in Fig. 1, which plan view is taken on a line corresponding with 2 2 in Fig. l looking in the direction of the arrows;
  • Fig. 3 is a cross-sectional view of an alternative objective lens and target window structure suitable for use in an X-ray shadow microscope of the type shown in Fig. l;
  • Fig. 4 is still another alternative form of objective lens and target window construction, and comprises a part of the invention.
  • Fig. 5 is a sectional view taken on a line corresponding with 5-5 in Fig. 1 looking in the direction of the arrows.
  • a new and improved X-ray shadow microscope shown in Fig. l includes a suitable housing 11 which is preferably cylindrically shaped, and has a connection 12 to a suitable vacuum-pumping system for maintaining the interior of the housing under vacuum.
  • an electron beam source 13 consisting of an electron larnent 14, a focusing electrode 15, and an accelerating electrode 16 all aligned over the lament 14 in a manner so as to form the electrons emitted therefrom into a beam of electron rays and accelerate the rays out through the opening in the accelerating electrode.
  • the focusing electrode 15 is secured to a bottom plate 17 that closes one end of the cylindrical housing 11, and is held in place by means of set screws 1S.
  • the set screws can be used to adjust the position of the opening in the focusing electrode 15 with respect to the accelerating electrode 16 so as to properly position the electron beam emitting therefrom relative to the remainder of the elements in the housing.
  • the accelerating electrode 16 is insulatingly supported separately from the focusing electrode 1S by means of adjustable set screws 19 which provide a means for adjusting the horizontal position of the aperture in the accelerating electrode relative to the electron filament 14 and the remainder of the elements in housing 11.
  • the electron filament itself may be adjusted relative to the optic axis of the housing by means of individual set screws 19a disposed on opposite sides of the base thereof.
  • a rst set of electrostatic lield producing plates 21, 22 and 23 which form condenser lens 20.
  • Each of these plates has a central aperture formed therein aligned along the electron beam path so as to form an electron beam condenser lens structure.
  • This structure is supported in place by means of a sleeve 24 that forms a magnetic shield.
  • the sleeve is based on a lip portion of the accelerating electrode 16 in the electron gun, and may be adjusted relative to the electron beam path by means of a screw rod 25 having a knurled knob on the free end thereof and the inner end engaging electrode plate.
  • Screw rod 25 acts against a spring loaded pusher element 26 which serves to provide a return adjusting motion to the structure and thereby assists in aligning the same.
  • a spring loaded pusher element 26 which serves to provide a return adjusting motion to the structure and thereby assists in aligning the same.
  • Each ofthe plates 23 and 21 are secured together by bolts so that movement of one by adjustment of knob 25 results in the movement of the other, and the middle plate 22 is supported between each of the plates 21 and 23 so that it follows adjustment of the assembly.
  • Operating potential is supplied to the central plate 22 through a high voltage connection 26a having a resilient contact fashion,
  • the condenser lens assembly serves to bend the electron rays into curved paths during transit therethrough, and through this bending action, serves to bring the group of divergent electron rays emitted from the filament 14 into a beam of substantially parallel or slightly convergent rays. Because of this characteristic, the structure is termed a condenser lens assembly.
  • a second set of electrostatic field producing plates 28, 29 and 31 Disposed in the housing 11 opposite electron beam source 13 and aligned along the electron beam path is a second set of electrostatic field producing plates 28, 29 and 31 which form objective lens 27.
  • These field producing plates form an objective lens assembly, and for this reason are disposed on the side of the condenser lens assembly 20 opposite from the electron beam source 13.
  • This objective lens assembly is supported on a lip formed ⁇ on the interior surface of housing 11 in a straight forward and serves to bend the parallel electron rays transmitted thereto from the condenser lens assembly 27 in such a manner so as to bring all of the rays together at a particular focal point determined by the design of the electrostatic plates.
  • a target-window structure preferably comprises a flat plate, and, in the instances of heavy metal structures which are necessarily in the order of .001 millimeter, and hence quite thin, a sandwich structure of a .025 millimeter of beryllium coated with the heavy metal can be used.
  • This target-window structure is joined to the end of the housing 11 by a suitable bonding agent.
  • the target-window structure is preferably secured to the inner surface of the last electrostatic plate element 31 in the objective lens assembly at a point furthest from the electron beam source 13 so that electron rays hit the target window after passing through the condenser lens assembly and the object lens assembly. Because the target-window 32 is a flat plate, and is substantially flush with the surfaces of the electrostatic plate element 31, the target window does not adversely affect the electrostatic iield so as to produce defocusing of the objective lens assembly.
  • the condenser lens assembly 20 serves to bend the divergent rays of electrons produced by the electron source 13 into a beam of substantially parallel rays of electrons, and the beam thus formed is directed to the objective lens assembly 27 comprised by plates 28, 29, and 31.
  • the objective lens assembly thereafter bends the rays again to focus most of them on the focal point of the objective lens where the target-window structure 32 is located. Impingement of the focused electron rays on a point on the surface of the target-window produces X- rays which pass out through the opposite side of the targetwindow structure from that on which the electron beam impinges.
  • the intensity of these X-rays is inversely proportional to the square of the focal length of the objective lens assembly 27.
  • This target window the target-window structure 32 ltrons emitting from the 4 l pass from the structure through and marginally of an object being examined 35 which is supported in a small cupshaped specimen holder 36 seated in a manipulator shown generally at 37.
  • the X-rays After passing through or marginally of object 35 being examined, the X-rays then impinge on an X-ray sensitive photographic plate, indicated at 38, which is supported in a suitable holder 39, and if desired, may comprise an X-ray sensitive film that may be developed by conventional wet processing or by so called dry processing while still associated with the microscope.
  • the X-rays will tend to diverge outwardly from the point source on the target-window structure 32, corresponding to the spot on which the electron beam impinges, the X- rays passing marginally of or through the object 35 will cast an enlarged image of the object, thereby serving to magnify its proportions.
  • the focal length of the objective lens assembly necessarily had to be lengthened to exclude large angle electrons.
  • the intensity of X-rays produced by an X-ray shadow microscope is inversely proportional to the square of the focal length of the objective lens assembly.
  • the intensity of the X-rays produced by the microscope was necessarily lessened.
  • Cosslett and Nixon developed an X-ray shadow microscope using electromagnetic lens assemblies wherein it was possible to locate beam defining apertures right within the objective lens assembly itself, since the aperture would have no eiect on the electromagnetic focusing field.
  • an electron beam defining aperture 51 located in a movable member 52 that is semi-circularly shaped and secured to the end of a rotatable control rod journalled in housing 11.
  • the plate 52 illustrated fragmentarily may be of semi-cylindrical or other arcuate configuration and provided with a plurality of different size apertures, such as 51, formed therein, so that by merely rotating the control rod 53, an aperture of any desired diameter, see Fig. 5, can be brought into alignment with the electron beam path.
  • the aperture 51 is located along the electron beam path adjacent the second set of electrostatic field producing plates 27 that form the objective lens assembly on the side thereof closest to the electron beam source 13 so that, in eect, divergent electrons are eliminated prior to passage through the objective lens assembly.
  • applicant is able to limit the marginal rays of electrons not brought into parallel relationship by the condenser lens assembly, thereby doing away with any adverse eect they might have should they impinge upon the target-window structure 32. Applicant has been able to accomplish this result Without in any way requiring an extension or elongation of the focal length of the objective lens assembly with its consequent decrease in X-ray intensity.
  • the target-window structure 32 may be mounted on the inner surface of the last electrostatic field producing plate element of the objective lens assembly, thereby reducing the focal length of the objective lens assembly to an absolute minimum, and assuring that maximum intensity X-rays can be produced with the instrument. Consequently, extremely sharp shadow graphs can be produced by applicants novel microscope construction. Also, because of the simple manner in which the size of the beam forming or limiting apertures 51 can be changed, the resolving power of the instrument can be quickly adjusted without requiring complete or partial disassembly of the instrument. Additionally, the sirnplied construction, facilitates manufacture of the instrument as well as decreases its cost.
  • FIG. 3 of the drawings A second form of the invention is shown in Fig. 3 of the drawings wherein elements similar to those described with relation to the instrument shown in Fig. 1 of the drawing, are given the same reference numeral.
  • the structure shown in Fig. 3 constitutes the objective lens assembly, the beam forming aperture construction, and
  • the beam-defining aperture 55 is secured to that electrostatic plate of the second set forming the objective lens assembly which is closest to the electron beam source.
  • the beam defining aperture serves to limit marginal rays of electrons which were not focused into paraxial positions by the preceding condenser lens assembly, thereby preventing such marginal rays from reaching 'the target-window structure with its consequent blurring of the shadow graph.
  • the structure shown in Fig. 3 incorporates Iall the operating advantages as shown in Fig. 1 of the drawings; however, the structure shown in Fig. 3 'has a further advantage of being much more simple in construction, and not requiring a separate structure for the beam delning aperture. Otherwise, the operation and advantages of the two constructions are entirely similar.
  • Fig. 4 of the drawings wherein the structure disclosed differs fromthe instrument shown in Fig. 1 only in the portion illustrated.
  • the embodiment of the invention shown in Fig. 4 comprises la second set of electrostatic field producing plates 28, 29 and 31 which form an objective lens assembly.
  • An X-ray target-window structure 32 is secured to the inner surface of the plate 31 so as to intercept the electron-beam passing through the objective lens assembly thereto.
  • a beam forming aperture structure is provided and positioned immediately preceding the objective lens assembly formed by plates 28, 29 and 31.
  • This structure includes a pair of arms 56 and 57 supported in the housing 11 in a manner such that the arms may be translated in or out, or may be rotated.
  • each of the arms 56 and 57 Secured to the inner ends of each of the arms 56 and 57 are bifurcated end pieces 58 and 59 which coact to form a beam defining aperture.
  • the size of this aperture may be readily vcontrolled by adjustment of the relative distances that each of the arms 56 and 57 protrude inward, or by rotation of one of the bifurcated end pieces 58, 59 with respect to the other. lIn this manner the size of the beam forming aperture provided by the structure can be adjusted to a very line degree thereby providing an excellent means for controlling the resolving power of the instrument.
  • the structure incorporates all of the advantages of the arrangements described in relation to Figs. 1 and 3 in that the target-window structure 32 may be located at a.
  • the invention provides a new and improved shadow X-ray microscope construction as capable of developing high intensity X-rays thereby making it possible to produce sharply defined shadow graphs of objects being examined. Additionally, the improved microscope is designed so that the resolving power can readily be adjusted for use with problems requiring different degrees of resolving power, and hence, easy to operate and requires no special skill. In addition to these above advantages, the construction of the structure of the microscope is relatively simple, and can be manufactured at low cost. v
  • An X-ray shadow microscope including in combination an electron beam source, at least one set of electrostatic field producing plates disposed along the electron beam path for forming an electron beam objective lens assembly, an X-ray producing target-window structure psitioned to intercept the electron beam, and an element provided with an electron beam defining aperture positioned along the electron beam path on the side of said set of electrostatic field producing plates nearest the electron beam source.
  • An X-ray shadow microscope including in combination an electron beam source, a first set of electrostatic field producing plates disposed along the electron beam path and forming an electron beam condenser lens assembly, a second set of electrostatic field producing plates disposed along the electron beam path on the side of said first set of plates opposite from the electron beam source for forming an electron beam objective lens assembly, an X-ray producing target-window structure positioned to intercept the electron beam, and an element provided with an electron beam defining aperture positioned along the electron beam path on the side of said second set of plates closest to the electron beam source.
  • An X-ray shadow microscope including in combination an electron beam source, a first set of electrostatic field producing plates disposed along the electron beam path and forming an electron beam condenser lens assembly, a second, set of electrostatic field producing plates disposed along the electron beam path on the side ot said first set of plates opposite from the electron beam source for forming an electron beam'objective lens assembly, an X-ray producing target-window structure positioned to intercept the electron beam, and an element provided with an electron beam defining aperture secured yto the plate of the second set of electrostatic plates which is closest the electron beam source.
  • An X-ray shadow microscope including in combination an electron beam source, a first set of electrostatic field producing plates disposed along the electron beam path and forming an electron beam condenser lens assembly, a second set of electrostatic field producing plates disposed along the electron beam path on the side of said first set of plates opposite from the electron beam source for forming an electron beam objective lens assembly, an X-ray producing target-window structure positioned to intercept the electron beam, an element provided with an electron beam defining aperture positioned along the electron beam path on the side of said second set of plates closest to the electron beam source, and a'housing having said electron beam source supported at one end thereof and enclosing said field producing plates the remain- 8 ing end thereof being closed by said target-window structure, said electron beam source and said target-window structure being translatable with respect to said housing and with respect to each other.
  • An X-ray shadow microscope including in combination an electron beam source, at least one set of spacedapart electrostatic field producing plates aligned along the electron beam path for forming an electron beam objective lens assembly, a fiat plate comprising an X-Iay producing target-window structure positioned to intercept the electron beam and secured to the electrostatic .field producing plate furthest from said electron beam source, said X-ray producing target window structure being Substantially fiush with the innermo-st surface of said fiat plate so as not to adversely affect the electrostatic field produced thereby, and an element provided with an electron beam defining aperture positioned along the electron beam path for shaping and defigning the electron beam, said aperture being positioned on the side of said set of e1ec trostatic plates nearest the electron beam source.
  • An X-ray shadow microscope including in combination an electron beam source, a first set of spaced-apart electrostatic field producing plates aligned along the electron beam path and forming an electron beam condenser lens assembly, a second set of spaced-apart electrostatic field producing plates aligned along the electron beam path on the side of saidvfirst set of plates opposite from said electron beam source, a fiat plate comprising an X-ray producing target-window structure positioned to intercept the electron beam and secured to the electrostatic field producing plate furthest from said electron beam source, and an element provided with an electron beam defining aperture positioned along the electron beam path for shaping and defining the electron beam, said aperture being located on the side of said second set of electrostatic plates closest to the electron beam source.
  • An X-ray shadow microscope including in combination an electron beam source, a first set of spaced-apart electrostatic field producing plates aligned along the elec tron beam path and forming an electron beam condenser lens assembly, a second set of space-d-apart electrostatic field producing plates aligned along the electron beam path on the side of said first set of plates opposite from said electron beam source, a fiat plate comprising an X-ray producing target-window structure positioned to intercept the electron beam and secured to the electrostatic field producing plate urthest from said electron beam source, and an element provided with an electron beam defining aperture secured to the plate of the second set of electrostatic plates which is closest the electron beam source for shaping and defining the electron beam.
  • An X-ray shadow microscope including in combination an electron beam source, a rst set of spaced-apart electrostatic field producing plates aligned along the electron beam path and forming an electron beam condenser lens assembly, a second set of spaced-apart electrostatic field producing plates aligned along the electron beam path on the side of said rst set of plates opposite from said electron beam source, a fiat plate comprising an X-ray producing target-window structure positioned to intercept the electron beam and secured to the electrostatic field producing plate furthest from said electron beam source, said X-ray producing target-window structure being substantially flush with the innermost surface of the fiat plate so as to not adversely affect the electrostatic field produced thereby, an element provided with an electron beam defining aperture positioned along the electron beam path for shaping and defining the electron beam, said aperture being located on the side of said second set of electrostatic plates closest to the electron beam source, and a housing having said electron beam source supported at one end thereof and enclosing said field producing plates with the remaining end
  • An X-ray shadow microscope including in combination an electron beam source, at least one set of spacedapart electrostatic field producing plates aligned along the electron beam path for forming an electron beam objective lens assembly, a fiat plate comprising an X-ray producing target-window structure positioned to intercept the electron beam and secured to the electrostatic field producing plate furthest from said electron beam source, said X-ray producing target-window structure being substantially flush with the innermost surface of said fiat plate so as to not adversely affect the electrostatic field produced thereby, and an arcuate element provided with a plurality of electron beam defining apertures of varying sizes positioned along the electron beam path for shaping and defining the electron beam, said aperture being located on the side of said set of electrostatic plates closest to the electron beam source.
  • An X-ray shadow microscope including in combination an electron beam source, at least one set of spacedapart electrostatic field producing plates aligned along the electron beam path for forming an electron beam objective lens assembly, a fiat plate comprising an X-ray producing target-window structure positioned to intercept the electron beam and secured to the electrostatic field producing plate furthest from said electron beam source, and a movable member having a plurality of electron beam defining apertures formed therein positioned along the electron beam path on the side of said second set of electrostatic plates closest to the electron beam source, said movable member being adjustable to locate an aperture of any desired dimension in beam defining relationship with respect to said electron beam path.
  • An X-ray shadow microscope including in combination an electron beam source, a first set of spacedapart electrostatic field producing plates aligned along the electron beam path and forming an electron beam condenser lens assembly, a second set of spaced-apart electrostatic field producing plates aligned along the electron beam path on the side of said first set of plates opposite from said electron beam source, a flat plate comprising an X-ray producing target-window structure positioned to intercept the electron beam and secured to the electrostatic field producing plate furthest from said electron beam source, said X-ray producing target-window structure being substantially flush with the innermost surface of said fiat plate so as to not adversely affect the electrostatic field produced thereby, and a movable member having a plurality of electron beam defining apertures formed therein positioned along the electron beam path on the side of said second set of electrostatic plates closest to the electron beam source, said movable member being adjustable to locate an aperture of any desired dimension in beam defining relationship with respect to said electron beam path.
  • An X-ray shadow microscope including in combination an electron beam source, a first set of spacedapart electrostatic field producing plates aligned along the electron beam path and forming an electron beam condenser lens assembly, a second set of spaced-apart electrostatic field producing plates aligned along the electron beam path on the side of said first set of plates opposite from said electron beam source, a flat plate comprising an X-ray producing target-window structure positioned to intercept the electron beam and secured to the electrostatic field producing plate furthest from said electron beam source, and a pair of opposed translatable and rotatable members having bifurcated end pieces positioned along the electron beam path for forming an electron beam shaping and defining aperture, said members being located on the side of said second set of electrostatic plates closest to the electron beam source.
  • An X-ray shadow microscope including in combination an electron beam source, at least one set of electrostatic field producing plates disposed along the electron beam path and forming an electron beam objective lens assembly, an X-ray producing target-window structure positioned to intercept the electron beam, and a movable member having a plurality of electron beam defining apertures formed thereon positioned along the electron beam path on the side of said sets of electrostatic field producing plates nearest the electron beam source, said movable member being adjustable to locate an aperture of any desired dimension in beam defining relationship with respect to said electron beam path.

Landscapes

  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • General Engineering & Computer Science (AREA)
  • High Energy & Nuclear Physics (AREA)
  • Electron Sources, Ion Sources (AREA)
  • Analysing Materials By The Use Of Radiation (AREA)
US443384A 1954-07-14 1954-07-14 X-ray microscope Expired - Lifetime US2877353A (en)

Priority Applications (3)

Application Number Priority Date Filing Date Title
US443384A US2877353A (en) 1954-07-14 1954-07-14 X-ray microscope
FR1134065D FR1134065A (fr) 1954-07-14 1955-07-07 Microscope à rayons x
GB20447/55A GB780682A (en) 1954-07-14 1955-07-14 Improvements in and relating to x-ray microscopes

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US443384A US2877353A (en) 1954-07-14 1954-07-14 X-ray microscope

Publications (1)

Publication Number Publication Date
US2877353A true US2877353A (en) 1959-03-10

Family

ID=23760580

Family Applications (1)

Application Number Title Priority Date Filing Date
US443384A Expired - Lifetime US2877353A (en) 1954-07-14 1954-07-14 X-ray microscope

Country Status (3)

Country Link
US (1) US2877353A (fr)
FR (1) FR1134065A (fr)
GB (1) GB780682A (fr)

Cited By (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3030506A (en) * 1958-09-13 1962-04-17 Philips Corp X-ray shadow microscope
US3149258A (en) * 1954-09-09 1964-09-15 Sheldon Edward Emanuel Electron microscope with an X-ray target
US3150257A (en) * 1962-07-05 1964-09-22 Philips Electronic Pharma Electron beam aperture plate
US3182175A (en) * 1962-09-24 1965-05-04 Nat Res Corp Electron beam heating device
US3333098A (en) * 1963-07-31 1967-07-25 Hitachi Ltd Aperture device for electron microscopes and the like
US3374349A (en) * 1966-11-14 1968-03-19 Victor G. Macres Electron probe having a specific shortfocal length magnetic lens and light microscope
US3395279A (en) * 1964-11-30 1968-07-30 Phillips Petroleum Co Positioning device for a radiation shield having means for cooling said shield
US3743845A (en) * 1972-02-07 1973-07-03 N Rabodzei Closed-circuit tv inspection x-ray microscope
US4159436A (en) * 1977-01-19 1979-06-26 Thor Cryogenics Limited Electron beam focussing for X-ray apparatus
US4521902A (en) * 1983-07-05 1985-06-04 Ridge, Inc. Microfocus X-ray system
US4979203A (en) * 1989-06-19 1990-12-18 Princeton X-Ray Laser X-ray laser microscope apparatus
US5119411A (en) * 1990-01-10 1992-06-02 Nikon Corporation X-ray optical apparatus
US9129715B2 (en) 2012-09-05 2015-09-08 SVXR, Inc. High speed x-ray inspection microscope
US9291578B2 (en) 2012-08-03 2016-03-22 David L. Adler X-ray photoemission microscope for integrated devices

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP4726764A1 (fr) * 2024-10-14 2026-04-15 Excillum AB Atténuation de rayonnement secondaire dans des sources de rayons x à impact d'électrons

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2257774A (en) * 1937-02-18 1941-10-07 Ardenne Manfred Von Electronic-optical device
US2418029A (en) * 1943-10-08 1947-03-25 Rca Corp Electron probe analysis employing X-ray spectrography
US2440640A (en) * 1946-11-27 1948-04-27 Research Corp Electron microanalyzer
US2569872A (en) * 1949-12-24 1951-10-02 Machlett Lab Inc Electron discharge tube

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2257774A (en) * 1937-02-18 1941-10-07 Ardenne Manfred Von Electronic-optical device
US2418029A (en) * 1943-10-08 1947-03-25 Rca Corp Electron probe analysis employing X-ray spectrography
US2440640A (en) * 1946-11-27 1948-04-27 Research Corp Electron microanalyzer
US2569872A (en) * 1949-12-24 1951-10-02 Machlett Lab Inc Electron discharge tube

Cited By (16)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3149258A (en) * 1954-09-09 1964-09-15 Sheldon Edward Emanuel Electron microscope with an X-ray target
US3030506A (en) * 1958-09-13 1962-04-17 Philips Corp X-ray shadow microscope
US3150257A (en) * 1962-07-05 1964-09-22 Philips Electronic Pharma Electron beam aperture plate
US3182175A (en) * 1962-09-24 1965-05-04 Nat Res Corp Electron beam heating device
US3333098A (en) * 1963-07-31 1967-07-25 Hitachi Ltd Aperture device for electron microscopes and the like
US3395279A (en) * 1964-11-30 1968-07-30 Phillips Petroleum Co Positioning device for a radiation shield having means for cooling said shield
US3374349A (en) * 1966-11-14 1968-03-19 Victor G. Macres Electron probe having a specific shortfocal length magnetic lens and light microscope
US3743845A (en) * 1972-02-07 1973-07-03 N Rabodzei Closed-circuit tv inspection x-ray microscope
US4159436A (en) * 1977-01-19 1979-06-26 Thor Cryogenics Limited Electron beam focussing for X-ray apparatus
US4521902A (en) * 1983-07-05 1985-06-04 Ridge, Inc. Microfocus X-ray system
US4979203A (en) * 1989-06-19 1990-12-18 Princeton X-Ray Laser X-ray laser microscope apparatus
US5119411A (en) * 1990-01-10 1992-06-02 Nikon Corporation X-ray optical apparatus
US9291578B2 (en) 2012-08-03 2016-03-22 David L. Adler X-ray photoemission microscope for integrated devices
US9129715B2 (en) 2012-09-05 2015-09-08 SVXR, Inc. High speed x-ray inspection microscope
US9607724B2 (en) 2012-09-05 2017-03-28 SVXR, Inc. Devices processed using x-rays
US9646732B2 (en) 2012-09-05 2017-05-09 SVXR, Inc. High speed X-ray microscope

Also Published As

Publication number Publication date
GB780682A (en) 1957-08-07
FR1134065A (fr) 1957-04-05

Similar Documents

Publication Publication Date Title
US2877353A (en) X-ray microscope
US2667585A (en) Device for producing screening images of body sections
US2058914A (en) Apparatus for producing images of objects
US2452919A (en) Electron optical system
US4963823A (en) Electron beam measuring instrument
US3023336A (en) Cathode ray tube having post acceleration
US2814729A (en) X-ray microscope
US3980919A (en) Rectangular beam laminar flow electron gun
US3732426A (en) X-ray source for generating an x-ray beam having selectable sectional shapes
US2922904A (en) Target window for x-ray microscopes
Zworykin On electron optics
US2272353A (en) Electronic microscope
US2060825A (en) Control of electron streams
US3201631A (en) Short focus lens at focal point of long focus lens
US12469664B2 (en) Charged particle gun and charged particle beam system
US3311772A (en) Focussing system for an ion source having apertured electrodes
US3660657A (en) Electron microscope with multi-focusing electron lens
US2842694A (en) X-ray apparatus
US3728570A (en) Electron probe forming system
US2485754A (en) Electron microscope
US3287558A (en) Charged particle deflecting device consisting of sequentially positioned uniform and non-uniform magnetic field sectors
GB865050A (en) Improvements in or relating to x-ray shadow microscopes with adjustable optical focussing
US2405306A (en) Electronic microanalyzer monitoring
US3835327A (en) Triode electron gun for electron beam machines
US6943360B1 (en) Twisted-compensated low-energy electron microscope