WO1987006773A1 - Dispositif laser a gaz - Google Patents
Dispositif laser a gaz Download PDFInfo
- Publication number
- WO1987006773A1 WO1987006773A1 PCT/JP1987/000260 JP8700260W WO8706773A1 WO 1987006773 A1 WO1987006773 A1 WO 1987006773A1 JP 8700260 W JP8700260 W JP 8700260W WO 8706773 A1 WO8706773 A1 WO 8706773A1
- Authority
- WO
- WIPO (PCT)
- Prior art keywords
- gas
- laser
- discharge
- main discharge
- discharge electrode
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Ceased
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/02—Constructional details
- H01S3/03—Constructional details of gas laser discharge tubes
- H01S3/038—Electrodes, e.g. special shape, configuration or composition
- H01S3/0385—Shape
Definitions
- the present invention relates to a gas laser device g, and more particularly to a supply of a laser gas between discharge electrodes.
- the excimer laser which emits laser light by exciting the excimer state, has high efficiency and high output power. Since it is possible, it has been widely developed in recent years. In particular, because of its non-coherent nature, it can be used for, for example, tris d'arafi. ⁇ '
- a through-flow fan is provided in a cylindrical channel 100. Gas is flowed in the circumferential direction by the through-flow fan, and the gas passing through the heat exchanger 102 is discharged to the discharge section 103. Is configured to be
- one discharge pulse (hereinafter, one pulse) is applied in order to apply the energy of electrons to the gas by the discharge. It is necessary to blow off the gas every time, but in the above method, the pre-ionization gap where the gas is blown out is located on both sides of the main discharge electrode 104 of the discharge part 103. It is between 105 and 106.
- the present invention has been made in view of the above circumstances, and has as its object to reduce the gas circulation flow rate and reduce the load on the gas circulation device. Disclosure of light
- a small hole or a slit is formed in the discharge portion—surface of one of the main discharge electrodes, and the laser gas can be injected into the discharge region from this hole. To do so.
- the gas is ejected from one main discharge electrode directly to the other main discharge electrode into the discharge region, so that the discharge is performed extremely efficiently, and Gas circulating flow rate can be reduced because gas is not required to be circulated in the preliminary ionization gap that does not affect the performance of the user. Is reduced. Furthermore, it is possible to oscillate up to the number of repetitions, which was impossible with the conventional device.
- FIG. 1 is an explanatory view of an essential part of an excimer laser device according to an embodiment of the present invention
- FIG. 2 is a diagram showing a conventional laser device.
- FIG. 1 is a diagram showing a structure of a main part of a discharge section of an excimer laser device according to an embodiment of the present invention.
- This device is provided so as to face a first main discharge electrode (force source) 1 on a flat plate having a large number of holes h formed on the surface thereof and the first main discharge electrode.
- the main discharge of 2 includes gas discharge sections 4 a and 4 b disposed on both sides of the electrode 2, and includes a gas circulation device disposed in the vicinity of the gas supply section 3.
- Krypton fluoride (KrF) gas is ejected from the gas supply unit 3 through the hole h of the first main discharge electrode 1 by a once-through fan (not shown).
- 6 is a pre-discharge electrode
- g is a pre-ionization gap for equalizing discharge and increasing efficiency
- 7 is a capacitor for discharging the pre-discharge electrode
- 8 is a capacitor.
- 9 is a ground plate
- 10 is a capacitor circuit for generating a main discharge
- 11 is a first main circuit from the capacitor circuit 10.
- the gas laser device of the present invention may be used as an exposure device in a photolithography or as a processing device, and as an energy supply means for various devices. This is particularly effective for gas laser devices that require laser oscillation at a high repetition rate. '
- the shape of the gas supply hole formed in the main discharge electrode, the shape of the main discharge electrode, and the shape of the gas discharge portion, etc., are not limited to the examples. It can be changed as needed.
Landscapes
- Physics & Mathematics (AREA)
- Electromagnetism (AREA)
- Engineering & Computer Science (AREA)
- Plasma & Fusion (AREA)
- Optics & Photonics (AREA)
- Lasers (AREA)
Abstract
Dans un dispositif laser à gaz dans lequel un gaz est injecté entre des première et seconde électrodes (1 et 2) de décharge principales qui sont agencées de manière opposée de sorte qu'il se produit des oscillations laser, un perfectionnement est réalisé en ce que de petits trous ou fentes (h) sont percés dans toute la surface d'une partie de décharge de la première électrode de décharge principale de sorte que le gaz peut être injecté dans la région de décharge par les trous ou les fentes. En conséquence, la décharge se produit de manière plus efficace et on peut faire circuler le gaz en quantités réduites.
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP9567186 | 1986-04-24 | ||
| JP61/95671 | 1986-04-24 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| WO1987006773A1 true WO1987006773A1 (fr) | 1987-11-05 |
Family
ID=14143963
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| PCT/JP1987/000260 Ceased WO1987006773A1 (fr) | 1986-04-24 | 1987-04-23 | Dispositif laser a gaz |
Country Status (2)
| Country | Link |
|---|---|
| JP (1) | JPS6344779A (fr) |
| WO (1) | WO1987006773A1 (fr) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US7260134B2 (en) * | 2004-02-06 | 2007-08-21 | Coherent, Inc. | Dielectric coupled CO2 slab laser |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR20140090995A (ko) | 2011-10-06 | 2014-07-18 | 제이에스피 인터내셔널 에스에이알엘 | 플라스틱 입자상 물질 성형 |
Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5068789A (fr) * | 1973-10-23 | 1975-06-09 | ||
| JPS5783078A (en) * | 1980-09-18 | 1982-05-24 | Comp Generale Electricite | Gas laser |
-
1986
- 1986-06-30 JP JP15304486A patent/JPS6344779A/ja active Pending
-
1987
- 1987-04-23 WO PCT/JP1987/000260 patent/WO1987006773A1/fr not_active Ceased
Patent Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5068789A (fr) * | 1973-10-23 | 1975-06-09 | ||
| JPS5783078A (en) * | 1980-09-18 | 1982-05-24 | Comp Generale Electricite | Gas laser |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US7260134B2 (en) * | 2004-02-06 | 2007-08-21 | Coherent, Inc. | Dielectric coupled CO2 slab laser |
Also Published As
| Publication number | Publication date |
|---|---|
| JPS6344779A (ja) | 1988-02-25 |
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