WO2003009403A1 - Magnetic sensor and method for manufacturing the same - Google Patents

Magnetic sensor and method for manufacturing the same Download PDF

Info

Publication number
WO2003009403A1
WO2003009403A1 PCT/JP2002/007188 JP0207188W WO03009403A1 WO 2003009403 A1 WO2003009403 A1 WO 2003009403A1 JP 0207188 W JP0207188 W JP 0207188W WO 03009403 A1 WO03009403 A1 WO 03009403A1
Authority
WO
WIPO (PCT)
Prior art keywords
conductive nonmagnetic
electrode terminals
thin film
carrier signal
magnetic field
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Ceased
Application number
PCT/JP2002/007188
Other languages
English (en)
French (fr)
Inventor
Akio Kuroe
Sayuri Muramatsu
Akio Murata
Ken Takahashi
Yoshihiro Tosaki
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Panasonic Holdings Corp
Original Assignee
Matsushita Electric Industrial Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Matsushita Electric Industrial Co Ltd filed Critical Matsushita Electric Industrial Co Ltd
Priority to JP2003514640A priority Critical patent/JPWO2003009403A1/ja
Priority to US10/478,136 priority patent/US7145331B2/en
Priority to EP02746072A priority patent/EP1408562A4/en
Priority to KR10-2003-7016555A priority patent/KR20040019018A/ko
Publication of WO2003009403A1 publication Critical patent/WO2003009403A1/ja
Anticipated expiration legal-status Critical
Ceased legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10N—ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10N50/00—Galvanomagnetic devices
    • H10N50/10—Magnetoresistive devices
    • G—PHYSICS
    • G11—INFORMATION STORAGE
    • G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
    • G11B5/00—Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
    • G11B5/127—Structure or manufacture of heads, e.g. inductive
    • G11B5/33—Structure or manufacture of flux-sensitive heads, i.e. for reproduction only; Combination of such heads with means for recording or erasing only
    • G11B5/332—Structure or manufacture of flux-sensitive heads, i.e. for reproduction only; Combination of such heads with means for recording or erasing only using thin films
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01R—MEASURING ELECTRIC VARIABLES; MEASURING MAGNETIC VARIABLES
    • G01R33/00—Arrangements or instruments for measuring magnetic variables
    • G01R33/02—Measuring direction or magnitude of magnetic fields or magnetic flux
    • G—PHYSICS
    • G11—INFORMATION STORAGE
    • G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
    • G11B5/00—Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
    • G11B5/127—Structure or manufacture of heads, e.g. inductive
    • G11B5/33—Structure or manufacture of flux-sensitive heads, i.e. for reproduction only; Combination of such heads with means for recording or erasing only
    • G11B5/335—Structure or manufacture of flux-sensitive heads, i.e. for reproduction only; Combination of such heads with means for recording or erasing only with saturated jig, e.g. for detecting second harmonic; balanced flux head
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T29/00—Metal working
    • Y10T29/49—Method of mechanical manufacture
    • Y10T29/49002—Electrical device making
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00—Stock material or miscellaneous articles
    • Y10T428/11—Magnetic recording head
    • Y10T428/1171—Magnetic recording head with defined laminate structural detail

Landscapes

  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Measuring Magnetic Variables (AREA)
  • Hall/Mr Elements (AREA)
PCT/JP2002/007188 2001-07-19 2002-07-15 Magnetic sensor and method for manufacturing the same Ceased WO2003009403A1 (en)

Priority Applications (4)

Application Number Priority Date Filing Date Title
JP2003514640A JPWO2003009403A1 (ja) 2001-07-19 2002-07-15 磁気センサ及びその製造方法
US10/478,136 US7145331B2 (en) 2001-07-19 2002-07-15 Magnetic sensor having a closed magnetic path formed by soft magnetic films
EP02746072A EP1408562A4 (en) 2001-07-19 2002-07-15 MAGNETIC SENSOR AND METHOD FOR MANUFACTURING SAME
KR10-2003-7016555A KR20040019018A (ko) 2001-07-19 2002-07-15 자기센서 및 그 제조방법

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2001-220391 2001-07-19
JP2001220391 2001-07-19

Publications (1)

Publication Number Publication Date
WO2003009403A1 true WO2003009403A1 (en) 2003-01-30

Family

ID=19054213

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/JP2002/007188 Ceased WO2003009403A1 (en) 2001-07-19 2002-07-15 Magnetic sensor and method for manufacturing the same

Country Status (6)

Country Link
US (1) US7145331B2 (ja)
EP (1) EP1408562A4 (ja)
JP (1) JPWO2003009403A1 (ja)
KR (1) KR20040019018A (ja)
CN (1) CN100356605C (ja)
WO (1) WO2003009403A1 (ja)

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2007023836A1 (ja) * 2005-08-25 2007-03-01 Ntn Corporation 空気サイクル冷凍冷却用タービンユニット
CN103090888A (zh) * 2011-11-04 2013-05-08 新科实业有限公司 带有旁路层的磁传感器及其制造方法
WO2020170746A1 (ja) * 2019-02-19 2020-08-27 昭和電工株式会社 磁気センサおよび磁気センサシステム
JPWO2020240941A1 (ja) * 2019-05-27 2020-12-03
CN115825520A (zh) * 2021-09-16 2023-03-21 株式会社东芝 电流检测装置

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* Cited by examiner, † Cited by third party
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EP1731916A1 (en) * 2005-06-07 2006-12-13 IEE INTERNATIONAL ELECTRONICS & ENGINEERING S.A. Magnetic field sensor
JP5201885B2 (ja) 2007-06-19 2013-06-05 キヤノン株式会社 磁性物質の検出装置及び検出方法
US7893151B2 (en) * 2007-11-08 2011-02-22 Rohm And Haas Company Liquid-applied sound damping
KR100968143B1 (ko) * 2008-01-11 2010-07-06 한국과학기술연구원 자기임피던스 센서와 이의 제조방법
US8283920B2 (en) * 2008-07-10 2012-10-09 Honeywell International Inc. Thin film magnetic field sensor
JP5055515B2 (ja) * 2008-09-29 2012-10-24 オムロン株式会社 磁界検出素子および信号伝達素子
US8461834B2 (en) * 2009-02-27 2013-06-11 Aichi Steel Corporation Magneto-impedance sensor element and method for manufacturing the same
CN102683582A (zh) 2011-03-11 2012-09-19 曲炳郡 一种高灵敏度磁传感芯片的制造方法
US8558344B2 (en) 2011-09-06 2013-10-15 Analog Devices, Inc. Small size and fully integrated power converter with magnetics on chip
JP5979413B2 (ja) * 2012-03-27 2016-08-24 公立大学法人大阪市立大学 電力計測装置
JP6222351B2 (ja) * 2014-05-09 2017-11-01 愛知製鋼株式会社 磁気検出装置およびその製造方法
JP6506604B2 (ja) * 2015-04-22 2019-04-24 アルプスアルパイン株式会社 磁気センサ
TWI545332B (zh) * 2015-09-10 2016-08-11 旺玖科技股份有限公司 電磁阻抗感測元件及其製作方法
TWI578547B (zh) 2015-09-10 2017-04-11 旺玖科技股份有限公司 電磁阻抗感測元件及其製作方法
JP6899117B2 (ja) * 2016-08-26 2021-07-07 学校法人東北学院 磁界センサとバイアス方法
JP2018128390A (ja) * 2017-02-09 2018-08-16 Tdk株式会社 磁気センサとその製造方法
CN110603618B (zh) * 2017-03-10 2022-05-13 西蒙·弗雷泽大学 磁性装置、振荡器装置、磁性结构和制造磁性结构的方法
JP7262885B2 (ja) * 2017-06-16 2023-04-24 朝日インテック株式会社 超高感度マイクロ磁気センサ
CN107526046B (zh) * 2017-07-18 2020-07-14 上海交通大学 一种平面电感型磁传感器
JP6699638B2 (ja) * 2017-09-13 2020-05-27 Tdk株式会社 磁気センサ
US10768246B2 (en) * 2017-09-21 2020-09-08 Tdk Corporation Magnetic sensor with elongated soft magnetic body
US11131727B2 (en) * 2019-03-11 2021-09-28 Tdk Corporation Magnetic sensor device
EP4187261B1 (en) * 2021-11-25 2025-08-13 Melexis Technologies SA Conformal deposition for high voltage isolation
CN115513366A (zh) * 2022-10-18 2022-12-23 南京工业大学 表面图形磁性薄膜平面叠层巨磁阻抗传感器及制备方法

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Publication number Priority date Publication date Assignee Title
JPH09320020A (ja) * 1996-06-04 1997-12-12 Matsushita Electric Ind Co Ltd 磁気ヘッド及び磁気ヘッドの製造方法及び再生方法及び磁気再生装置
EP0831335A2 (en) * 1996-09-17 1998-03-25 Tokin Corporation Magneto-Impedance sensor
US5889403A (en) * 1995-03-31 1999-03-30 Canon Denshi Kabushiki Kaisha Magnetic detecting element utilizing magnetic impedance effect
JP2000019034A (ja) * 1998-07-01 2000-01-21 Toyota Central Res & Dev Lab Inc 磁界検出センサ
JP2000193728A (ja) * 1998-12-25 2000-07-14 Toyota Central Res & Dev Lab Inc 磁界検出素子
JP2001155310A (ja) * 1999-11-26 2001-06-08 Matsushita Electric Ind Co Ltd 磁気ヘッド並びに磁気再生装置
JP2001332779A (ja) * 2000-05-23 2001-11-30 Alps Electric Co Ltd 磁気インピーダンス効果素子及びその製造方法
JP2002057379A (ja) * 2000-08-07 2002-02-22 Alps Electric Co Ltd 磁気インピーダンス効果素子

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US4751598A (en) * 1985-02-01 1988-06-14 Censtor Corporation Thin-film, cross-field, closed-flux, anisotropic electromagnetic field device
DE69431614T2 (de) * 1993-08-25 2003-06-12 Nippon Telegraph And Telephone Corp., Tokio/Tokyo Magnetfeldmessverfahren und -vorrichtung
JP3356585B2 (ja) 1995-05-29 2002-12-16 キヤノン電子株式会社 磁気検出素子及び磁気ヘッド
JPH08285930A (ja) 1995-04-18 1996-11-01 Canon Electron Inc 磁気検出素子及び磁気ヘッド
US5831426A (en) * 1996-08-16 1998-11-03 Nonvolatile Electronics, Incorporated Magnetic current sensor
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US6462541B1 (en) * 1999-11-12 2002-10-08 Nve Corporation Uniform sense condition magnetic field sensor using differential magnetoresistance

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US5889403A (en) * 1995-03-31 1999-03-30 Canon Denshi Kabushiki Kaisha Magnetic detecting element utilizing magnetic impedance effect
JPH09320020A (ja) * 1996-06-04 1997-12-12 Matsushita Electric Ind Co Ltd 磁気ヘッド及び磁気ヘッドの製造方法及び再生方法及び磁気再生装置
EP0831335A2 (en) * 1996-09-17 1998-03-25 Tokin Corporation Magneto-Impedance sensor
JP2000019034A (ja) * 1998-07-01 2000-01-21 Toyota Central Res & Dev Lab Inc 磁界検出センサ
JP2000193728A (ja) * 1998-12-25 2000-07-14 Toyota Central Res & Dev Lab Inc 磁界検出素子
JP2001155310A (ja) * 1999-11-26 2001-06-08 Matsushita Electric Ind Co Ltd 磁気ヘッド並びに磁気再生装置
JP2001332779A (ja) * 2000-05-23 2001-11-30 Alps Electric Co Ltd 磁気インピーダンス効果素子及びその製造方法
JP2002057379A (ja) * 2000-08-07 2002-02-22 Alps Electric Co Ltd 磁気インピーダンス効果素子

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TAKESHI MORIKAWA ET AL.: "Enhancement of giant magneto-impedance in layered film by insulator separation", IEEE TRANSACTIONS ON MAGNETICS, vol. 32, no. 5, September 1996 (1996-09-01), pages 4965 - 4967, XP000634189 *

Cited By (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2007023836A1 (ja) * 2005-08-25 2007-03-01 Ntn Corporation 空気サイクル冷凍冷却用タービンユニット
US8215898B2 (en) 2005-08-25 2012-07-10 Ntn Corporation Turbine unit for refrigerating/cooling air cycle
CN103090888A (zh) * 2011-11-04 2013-05-08 新科实业有限公司 带有旁路层的磁传感器及其制造方法
WO2020170746A1 (ja) * 2019-02-19 2020-08-27 昭和電工株式会社 磁気センサおよび磁気センサシステム
JP2020134301A (ja) * 2019-02-19 2020-08-31 昭和電工株式会社 磁気センサおよび磁気センサシステム
JP7203630B2 (ja) 2019-02-19 2023-01-13 昭和電工株式会社 磁気センサおよび磁気センサシステム
JPWO2020240941A1 (ja) * 2019-05-27 2020-12-03
WO2020240941A1 (ja) * 2019-05-27 2020-12-03 昭和電工株式会社 磁気センサ
CN115825520A (zh) * 2021-09-16 2023-03-21 株式会社东芝 电流检测装置

Also Published As

Publication number Publication date
US7145331B2 (en) 2006-12-05
EP1408562A4 (en) 2009-12-23
CN1533613A (zh) 2004-09-29
EP1408562A1 (en) 2004-04-14
KR20040019018A (ko) 2004-03-04
JPWO2003009403A1 (ja) 2004-11-11
CN100356605C (zh) 2007-12-19
US20040150397A1 (en) 2004-08-05

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