WO2010093210A3 - 광활성 화합물 및 이를 포함하는 감광성 수지 조성물 - Google Patents

광활성 화합물 및 이를 포함하는 감광성 수지 조성물 Download PDF

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Publication number
WO2010093210A3
WO2010093210A3 PCT/KR2010/000923 KR2010000923W WO2010093210A3 WO 2010093210 A3 WO2010093210 A3 WO 2010093210A3 KR 2010000923 W KR2010000923 W KR 2010000923W WO 2010093210 A3 WO2010093210 A3 WO 2010093210A3
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WO
WIPO (PCT)
Prior art keywords
resin composition
photosensitive resin
photoactive compound
composition containing
same
Prior art date
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Ceased
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PCT/KR2010/000923
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English (en)
French (fr)
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WO2010093210A2 (ko
Inventor
조창호
김성현
카르바쉬라이사
이건우
오동궁
정원진
곽상규
이창순
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LG Chem Ltd
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LG Chem Ltd
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Publication date
Application filed by LG Chem Ltd filed Critical LG Chem Ltd
Priority to US13/147,342 priority Critical patent/US8168369B2/en
Priority to CN2010800079456A priority patent/CN102317863B/zh
Priority to JP2011545307A priority patent/JP5435596B2/ja
Priority to EP10741427.8A priority patent/EP2397903B1/en
Publication of WO2010093210A2 publication Critical patent/WO2010093210A2/ko
Publication of WO2010093210A3 publication Critical patent/WO2010093210A3/ko
Anticipated expiration legal-status Critical
Ceased legal-status Critical Current

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    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
    • C07F9/00—Compounds containing elements of Groups 5 or 15 of the Periodic Table
    • C07F9/02—Phosphorus compounds
    • C07F9/547—Heterocyclic compounds, e.g. containing phosphorus as a ring hetero atom
    • C07F9/553—Heterocyclic compounds, e.g. containing phosphorus as a ring hetero atom having one nitrogen atom as the only ring hetero atom
    • C07F9/572—Five-membered rings
    • C07F9/5728—Five-membered rings condensed with carbocyclic rings or carbocyclic ring systems
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07D—HETEROCYCLIC COMPOUNDS
    • C07D209/00—Heterocyclic compounds containing five-membered rings, condensed with other rings, with one nitrogen atom as the only ring hetero atom
    • C07D209/56—Ring systems containing three or more rings
    • C07D209/80—[b, c]- or [b, d]-condensed
    • C07D209/82—Carbazoles; Hydrogenated carbazoles
    • C07D209/88—Carbazoles; Hydrogenated carbazoles with hetero atoms or with carbon atoms having three bonds to hetero atoms with at the most one bond to halogen, e.g. ester or nitrile radicals, directly attached to carbon atoms of the ring system
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F2/00—Processes of polymerisation
    • C08F2/46—Polymerisation initiated by wave energy or particle radiation
    • C08F2/48—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light
    • C08F2/50—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light with sensitising agents
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G03F7/031—Organic compounds not covered by group G03F7/029
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
    • Y10S430/1055—Radiation sensitive composition or product or process of making
    • Y10S430/106—Binder containing
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
    • Y10S430/1055—Radiation sensitive composition or product or process of making
    • Y10S430/127—Spectral sensitizer containing

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  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Biochemistry (AREA)
  • General Health & Medical Sciences (AREA)
  • Molecular Biology (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Materials For Photolithography (AREA)
  • Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)

Abstract

본 발명은 신규한 구조의 광활성 화합물, 및 이를 포함하는 감광성 수지 조성물에 대한 것으로서, 본 발명에 따른 광활성 화합물은 니트로기와 포스포네이트 구조를 포함함으로써 UV 광원에 대한 효율적 흡수로 감도가 우수할 뿐만 아니라, 포스포네이트 구조와 바인더 수지와의 우수한 상용성으로 감광성 수지 조성물의 용해도를 개선시킴으로써 잔막률, 기계적 강도, 내열성, 내화학성 및 내현상성도 우수하다. 따라서, 본 발명에 의한 감광성 수지 조성물은 액정표시소자의 컬럼 스페이서, 오버코트 및 패시베이션 재료 등의 경화에 유리할 뿐 아니라, 고온 공정 특성에도 유리하다.
PCT/KR2010/000923 2009-02-13 2010-02-12 광활성 화합물 및 이를 포함하는 감광성 수지 조성물 Ceased WO2010093210A2 (ko)

Priority Applications (4)

Application Number Priority Date Filing Date Title
US13/147,342 US8168369B2 (en) 2009-02-13 2010-02-12 Photoactive compound and photosensitive resin composition containing the same
CN2010800079456A CN102317863B (zh) 2009-02-13 2010-02-12 光活性化合物和含有该化合物的光敏树脂组合物
JP2011545307A JP5435596B2 (ja) 2009-02-13 2010-02-12 光活性化合物及びそれを含む感光性樹脂組成物
EP10741427.8A EP2397903B1 (en) 2009-02-13 2010-02-12 Photoactive compound and photosensitive resin composition containing the same

Applications Claiming Priority (4)

Application Number Priority Date Filing Date Title
KR10-2009-0011700 2009-02-13
KR20090011700 2009-02-13
KR1020100013227A KR101077214B1 (ko) 2009-02-13 2010-02-12 광활성 화합물 및 이를 포함하는 감광성 수지 조성물
KR10-2010-0013227 2010-02-12

Publications (2)

Publication Number Publication Date
WO2010093210A2 WO2010093210A2 (ko) 2010-08-19
WO2010093210A3 true WO2010093210A3 (ko) 2010-12-02

Family

ID=42757580

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/KR2010/000923 Ceased WO2010093210A2 (ko) 2009-02-13 2010-02-12 광활성 화합물 및 이를 포함하는 감광성 수지 조성물

Country Status (6)

Country Link
US (1) US8168369B2 (ko)
EP (1) EP2397903B1 (ko)
JP (1) JP5435596B2 (ko)
KR (1) KR101077214B1 (ko)
CN (1) CN102317863B (ko)
WO (1) WO2010093210A2 (ko)

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KR101418735B1 (ko) * 2007-12-25 2014-07-11 가부시키가이샤 아데카 옥심에스테르 화합물 및 상기 화합물을 함유하는 광중합 개시제
JP5640722B2 (ja) * 2010-02-05 2014-12-17 Jsr株式会社 新規化合物及びそれを含有する感放射線性組成物
JP5598351B2 (ja) * 2010-02-16 2014-10-01 信越化学工業株式会社 電子線用又はｅｕｖ用化学増幅ポジ型レジスト組成物及びパターン形成方法
JP5713477B2 (ja) * 2011-08-04 2015-05-07 エルジー・ケム・リミテッド 光活性化合物およびこれを含む感光性樹脂組成物
WO2013084283A1 (ja) 2011-12-05 2013-06-13 日立化成株式会社 タッチパネル用電極の保護膜の形成方法、感光性樹脂組成物及び感光性エレメント
WO2013084282A1 (ja) 2011-12-05 2013-06-13 日立化成株式会社 樹脂硬化膜パターンの形成方法、感光性樹脂組成物及び感光性エレメント
JP5890297B2 (ja) * 2011-12-22 2016-03-22 東京応化工業株式会社 感光性樹脂組成物、それを用いたカラーフィルタ及び表示装置、オキシムエステル化合物、並びに光重合開始剤
KR102005532B1 (ko) * 2012-02-01 2019-07-30 닛산 가가쿠 가부시키가이샤 복소환을 포함하는 공중합 수지를 포함하는 레지스트 하층막 형성 조성물
FR2990944A1 (fr) 2012-05-23 2013-11-29 Oreal Procede de coloration des fibres keratiniques comprenant un colorant /pigment, un compose photoactif, et une source lumineuse
KR101489067B1 (ko) * 2012-05-30 2015-02-04 주식회사 엘지화학 광활성 화합물 및 이를 포함하는 감광성 수지 조성물
KR101403775B1 (ko) * 2012-05-30 2014-06-03 주식회사 엘지화학 광활성 화합물 및 이를 포함하는 감광성 수지 조성물
KR101384478B1 (ko) * 2012-05-31 2014-04-10 주식회사 엘지화학 광활성 화합물 및 이를 포함하는 감광성 수지 조성물
JP5890337B2 (ja) * 2013-02-13 2016-03-22 東京応化工業株式会社 感放射線性樹脂組成物、絶縁膜、及び表示装置
JP6177587B2 (ja) * 2013-05-27 2017-08-09 株式会社Adeka 紫外線吸収剤及び新規なカルバゾール化合物
JP5890355B2 (ja) * 2013-07-31 2016-03-22 東京応化工業株式会社 感光性樹脂組成物
JP2015041104A (ja) * 2013-08-22 2015-03-02 東友ファインケム株式会社 着色感光性樹脂組成物、これを含むカラーフィルタおよび表示装置
KR101768658B1 (ko) * 2016-01-27 2017-08-17 (주)켐이 카바졸 유도체, 이를 포함하는 광중합 개시제 및 포토레지스트 조성물
WO2017169819A1 (ja) * 2016-03-29 2017-10-05 株式会社Adeka 黒色感光性樹脂組成物
CN107325206B (zh) * 2016-04-12 2018-12-18 常州强力先端电子材料有限公司 一种含硝基咔唑肟酯类光引发剂及其制备方法和应用
KR101968747B1 (ko) * 2017-07-25 2019-04-12 (주)켐이 카바졸 유도체, 이를 포함하는 광중합 개시제 및 포토레지스트 조성물
CN107474068A (zh) * 2017-09-01 2017-12-15 南京法恩化学有限公司 一种光引发剂咔唑肟酯的制备方法
CN121586866A (zh) * 2023-07-31 2026-02-27 株式会社东进世美肯 感光性树脂组合物、绝缘膜以及包含所述绝缘膜的显示装置

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US7381842B2 (en) * 1999-12-15 2008-06-03 Ciba Specialty Chemicals Corporation Oxime ester photoinitiators
JP2006516246A (ja) * 2002-12-03 2006-06-29 チバ　スペシャルティ　ケミカルズ　ホールディング　インコーポレーテッド ヘテロ芳香族基を有するオキシムエステル光開始剤
US20080096115A1 (en) * 2004-08-18 2008-04-24 Junichi Tanabe Oxime Ester Photoinitiators
WO2008078686A1 (ja) * 2006-12-27 2008-07-03 Adeka Corporation オキシムエステル化合物及び該化合物を含有する光重合開始剤

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Also Published As

Publication number Publication date
EP2397903A4 (en) 2012-08-22
CN102317863A (zh) 2012-01-11
US8168369B2 (en) 2012-05-01
WO2010093210A2 (ko) 2010-08-19
EP2397903B1 (en) 2014-07-30
KR101077214B1 (ko) 2011-10-27
JP2012514636A (ja) 2012-06-28
CN102317863B (zh) 2013-11-20
US20110318692A1 (en) 2011-12-29
EP2397903A2 (en) 2011-12-21
JP5435596B2 (ja) 2014-03-05
KR20100092904A (ko) 2010-08-23

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