WO2012072914A3 - Machine d'exposition de panneaux - Google Patents

Machine d'exposition de panneaux Download PDF

Info

Publication number
WO2012072914A3
WO2012072914A3 PCT/FR2011/052708 FR2011052708W WO2012072914A3 WO 2012072914 A3 WO2012072914 A3 WO 2012072914A3 FR 2011052708 W FR2011052708 W FR 2011052708W WO 2012072914 A3 WO2012072914 A3 WO 2012072914A3
Authority
WO
WIPO (PCT)
Prior art keywords
machine
panel
insulated
mounting
slide
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Ceased
Application number
PCT/FR2011/052708
Other languages
English (en)
Other versions
WO2012072914A2 (fr
Inventor
David Lebret
Franck Roland
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
ALTIX
Original Assignee
ALTIX
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by ALTIX filed Critical ALTIX
Priority to CN201180057329.6A priority Critical patent/CN103261970B/zh
Publication of WO2012072914A2 publication Critical patent/WO2012072914A2/fr
Publication of WO2012072914A3 publication Critical patent/WO2012072914A3/fr
Anticipated expiration legal-status Critical
Ceased legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G03F7/2002—Exposure; Apparatus therefor with visible light or UV light, through an original having an opaque pattern on a transparent support, e.g. film printing, projection printing; by reflection of visible or UV light from an original such as a printed image
    • G03F7/2014—Contact or film exposure of light sensitive plates such as lithographic plates or circuit boards, e.g. in a vacuum frame
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G03F7/2022—Multi-step exposure, e.g. hybrid; backside exposure; blanket exposure, e.g. for image reversal; edge exposure, e.g. for edge bead removal; corrective exposure
    • G03F7/2032—Simultaneous exposure of the front side and the backside
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00—Apparatus or processes for manufacturing printed circuits
    • H05K3/0073—Masks not provided for in groups H05K3/02 - H05K3/46, e.g. for photomechanical production of patterned surfaces
    • H05K3/0082—Masks not provided for in groups H05K3/02 - H05K3/46, e.g. for photomechanical production of patterned surfaces characterised by the exposure method of radiation-sensitive masks

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Printers Or Recording Devices Using Electromagnetic And Radiation Means (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Arrangements Of Lighting Devices For Vehicle Interiors, Mounting And Supporting Thereof, Circuits Therefore (AREA)
  • Led Device Packages (AREA)

Abstract

Machine d'exposition de panneaux destinés à être insolés, utilisable dans tous les procédés de transfert d'image entre un cliché et un panneau : elle s'utilise principalement dans les domaines des circuits imprimés et des micro-processeurs mais également dans le domaine des écrans LCD ou encore celui de la découpe chimique de pièces de micromécanique. Elle comprend principalement un support de panneau à insoler (2), que l'on équipe d'un panneau (3) et d'un cliché à transférer (5, 5'), et un support de diodes électroluminescentes (10, 10') capable de se mouvoir dans une zone en regard du support de panneau à insoler (2), le support de diodes (10, 10') étant plus grand que le panneau à insoler (3) entraînant ainsi une course d'insolation réduite.
PCT/FR2011/052708 2010-11-30 2011-11-21 Machine d'exposition de panneaux Ceased WO2012072914A2 (fr)

Priority Applications (1)

Application Number Priority Date Filing Date Title
CN201180057329.6A CN103261970B (zh) 2010-11-30 2011-11-21 晒版机

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
FR1059907 2010-11-30
FR1059907A FR2968097B1 (fr) 2010-11-30 2010-11-30 Machine d'exposition de panneaux.

Publications (2)

Publication Number Publication Date
WO2012072914A2 WO2012072914A2 (fr) 2012-06-07
WO2012072914A3 true WO2012072914A3 (fr) 2012-08-30

Family

ID=44064825

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/FR2011/052708 Ceased WO2012072914A2 (fr) 2010-11-30 2011-11-21 Machine d'exposition de panneaux

Country Status (3)

Country Link
CN (1) CN103261970B (fr)
FR (1) FR2968097B1 (fr)
WO (1) WO2012072914A2 (fr)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN103513518B (zh) * 2013-09-11 2015-12-16 浙江欧视达科技有限公司 紫外led曝光机光学曝光照明系统及紫外led曝光机
CN106814553B (zh) * 2017-03-02 2018-05-29 河南华福包装科技有限公司 一种双面式晒版机
CN108508710A (zh) * 2018-05-30 2018-09-07 芜湖纯元光电设备技术有限公司 一种手动led曝光装置

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP2009676A2 (fr) * 2002-05-08 2008-12-31 Phoseon Technology, Inc. Systèmes d'inspection de matériaux à semi-conducteur
US20090002669A1 (en) * 2007-06-29 2009-01-01 Optical Associates, Inc. Ultraviolet light-emitting diode exposure apparatus for microfabrication
US20090168035A1 (en) * 2007-12-31 2009-07-02 Lg.Display Co., Ltd. Exposure method and exposure apparatus for photosensitive film

Family Cites Families (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
SG71804A1 (en) * 1995-08-30 2000-04-18 Matsushita Electric Industrial Co Ltd Screen printing method and screen printing apparatus
JP3035297B1 (ja) * 1999-05-27 2000-04-24 株式会社ケムテックジャパン プリント基板の製造装置および製造方法
JP2003156733A (ja) * 2001-11-22 2003-05-30 Fuji Photo Film Co Ltd 画像転写装置
FR2842617B1 (fr) * 2002-07-17 2005-01-21 Automa Tech Sa Machine d'exposition de panneaux de circuit imprime
JP2004294508A (ja) * 2003-03-25 2004-10-21 Fuji Photo Film Co Ltd 基板露光装置
FR2861251B1 (fr) * 2003-10-17 2006-02-03 Automa Tech Sa Ensemble d'exposition a la lumiere d'un panneau de circuit imprime double face et installation comportant au moins un tel ensemble d'exposition
CN100455161C (zh) * 2004-12-07 2009-01-21 鸿富锦精密工业（深圳）有限公司 一种印刷电路板设计方法及印刷电路板
EP1825332A1 (fr) * 2004-12-14 2007-08-29 Radove GmbH Processus et appareil de production de rayons uv de collimation pour transfert photolithographique
US20060164614A1 (en) * 2005-01-21 2006-07-27 Hua-Kuo Chen Exposing machine for a printed circuit board
DE102005033117B4 (de) * 2005-07-11 2008-06-19 Siemens Ag Leiterplattenanordnung und Verfahren zu deren Herstellung

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP2009676A2 (fr) * 2002-05-08 2008-12-31 Phoseon Technology, Inc. Systèmes d'inspection de matériaux à semi-conducteur
US20090002669A1 (en) * 2007-06-29 2009-01-01 Optical Associates, Inc. Ultraviolet light-emitting diode exposure apparatus for microfabrication
US20090168035A1 (en) * 2007-12-31 2009-07-02 Lg.Display Co., Ltd. Exposure method and exposure apparatus for photosensitive film

Also Published As

Publication number Publication date
CN103261970B (zh) 2016-03-30
FR2968097A1 (fr) 2012-06-01
FR2968097B1 (fr) 2013-08-16
CN103261970A (zh) 2013-08-21
WO2012072914A2 (fr) 2012-06-07

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