CN103261970B - 晒版机 - Google Patents

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Publication number
CN103261970B
CN103261970B CN201180057329.6A CN201180057329A CN103261970B CN 103261970 B CN103261970 B CN 103261970B CN 201180057329 A CN201180057329 A CN 201180057329A CN 103261970 B CN103261970 B CN 103261970B
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CN
China
Prior art keywords
light
axis
emitting diode
light emitting
emitting diodes
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
CN201180057329.6A
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English (en)
Chinese (zh)
Other versions
CN103261970A (zh
Inventor
D·勒布雷
F·罗兰
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
ALTIX
Original Assignee
ALTIX
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Publication date
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Publication of CN103261970A publication Critical patent/CN103261970A/zh
Application granted granted Critical
Publication of CN103261970B publication Critical patent/CN103261970B/zh
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Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G03F7/2002—Exposure; Apparatus therefor with visible light or UV light, through an original having an opaque pattern on a transparent support, e.g. film printing, projection printing; by reflection of visible or UV light from an original such as a printed image
    • G03F7/2014—Contact or film exposure of light sensitive plates such as lithographic plates or circuit boards, e.g. in a vacuum frame
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G03F7/2022—Multi-step exposure, e.g. hybrid; backside exposure; blanket exposure, e.g. for image reversal; edge exposure, e.g. for edge bead removal; corrective exposure
    • G03F7/2032—Simultaneous exposure of the front side and the backside
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00—Apparatus or processes for manufacturing printed circuits
    • H05K3/0073—Masks not provided for in groups H05K3/02 - H05K3/46, e.g. for photomechanical production of patterned surfaces
    • H05K3/0082—Masks not provided for in groups H05K3/02 - H05K3/46, e.g. for photomechanical production of patterned surfaces characterised by the exposure method of radiation-sensitive masks

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Printers Or Recording Devices Using Electromagnetic And Radiation Means (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Arrangements Of Lighting Devices For Vehicle Interiors, Mounting And Supporting Thereof, Circuits Therefore (AREA)
  • Led Device Packages (AREA)
CN201180057329.6A 2010-11-30 2011-11-21 晒版机 Active CN103261970B (zh)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
FR1059907 2010-11-30
FR1059907A FR2968097B1 (fr) 2010-11-30 2010-11-30 Machine d'exposition de panneaux.
PCT/FR2011/052708 WO2012072914A2 (fr) 2010-11-30 2011-11-21 Machine d'exposition de panneaux

Publications (2)

Publication Number Publication Date
CN103261970A CN103261970A (zh) 2013-08-21
CN103261970B true CN103261970B (zh) 2016-03-30

Family

ID=44064825

Family Applications (1)

Application Number Title Priority Date Filing Date
CN201180057329.6A Active CN103261970B (zh) 2010-11-30 2011-11-21 晒版机

Country Status (3)

Country Link
CN (1) CN103261970B (fr)
FR (1) FR2968097B1 (fr)
WO (1) WO2012072914A2 (fr)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN103513518B (zh) * 2013-09-11 2015-12-16 浙江欧视达科技有限公司 紫外led曝光机光学曝光照明系统及紫外led曝光机
CN106814553B (zh) * 2017-03-02 2018-05-29 河南华福包装科技有限公司 一种双面式晒版机
CN108508710A (zh) * 2018-05-30 2018-09-07 芜湖纯元光电设备技术有限公司 一种手动led曝光装置

Citations (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP1189111A1 (fr) * 1999-05-27 2002-03-20 Kem-Tec Japan Co., Ltd Dispositif et procede de fabrication pour circuits imprimes, circuit imprime lui-meme
JP2003156733A (ja) * 2001-11-22 2003-05-30 Fuji Photo Film Co Ltd 画像転写装置
CN1427664A (zh) * 1995-08-30 2003-07-02 松下电器产业株式会社 丝网印刷方法和丝网印刷设备
JP2004294508A (ja) * 2003-03-25 2004-10-21 Fuji Photo Film Co Ltd 基板露光装置
CN1610487A (zh) * 2003-10-17 2005-04-27 奥托马-科技公司 使双面印刷电路面板曝光的组件及包括该曝光组件的设备
JP2005533284A (ja) * 2002-07-17 2005-11-04 オートマ‐テック 印刷回路板の露光装置
CN1787724A (zh) * 2004-12-07 2006-06-14 鸿富锦精密工业（深圳）有限公司 一种印刷电路板设计方法及印刷电路板
US20060164614A1 (en) * 2005-01-21 2006-07-27 Hua-Kuo Chen Exposing machine for a printed circuit board
CN1897787A (zh) * 2005-07-11 2007-01-17 西门子公司 印刷线路板装置及其制造方法
US20090244510A1 (en) * 2004-12-14 2009-10-01 Radove Gmbh Process and apparatus for the production of collimated uv rays for photolithographic transfer

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP2009676B8 (fr) * 2002-05-08 2012-11-21 Phoseon Technology, Inc. Systèmes d'inspection de matériaux à semi-conducteur
US20090002669A1 (en) * 2007-06-29 2009-01-01 Optical Associates, Inc. Ultraviolet light-emitting diode exposure apparatus for microfabrication
KR100983582B1 (ko) * 2007-12-31 2010-10-11 엘지디스플레이 주식회사 노광 장치 및 노광 방법과 그 노광 장치를 이용한 박막패터닝 방법

Patent Citations (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN1427664A (zh) * 1995-08-30 2003-07-02 松下电器产业株式会社 丝网印刷方法和丝网印刷设备
EP1189111A1 (fr) * 1999-05-27 2002-03-20 Kem-Tec Japan Co., Ltd Dispositif et procede de fabrication pour circuits imprimes, circuit imprime lui-meme
JP2003156733A (ja) * 2001-11-22 2003-05-30 Fuji Photo Film Co Ltd 画像転写装置
JP2005533284A (ja) * 2002-07-17 2005-11-04 オートマ‐テック 印刷回路板の露光装置
JP2004294508A (ja) * 2003-03-25 2004-10-21 Fuji Photo Film Co Ltd 基板露光装置
CN1610487A (zh) * 2003-10-17 2005-04-27 奥托马-科技公司 使双面印刷电路面板曝光的组件及包括该曝光组件的设备
CN1787724A (zh) * 2004-12-07 2006-06-14 鸿富锦精密工业（深圳）有限公司 一种印刷电路板设计方法及印刷电路板
US20090244510A1 (en) * 2004-12-14 2009-10-01 Radove Gmbh Process and apparatus for the production of collimated uv rays for photolithographic transfer
US20060164614A1 (en) * 2005-01-21 2006-07-27 Hua-Kuo Chen Exposing machine for a printed circuit board
CN1897787A (zh) * 2005-07-11 2007-01-17 西门子公司 印刷线路板装置及其制造方法

Also Published As

Publication number Publication date
WO2012072914A3 (fr) 2012-08-30
FR2968097A1 (fr) 2012-06-01
FR2968097B1 (fr) 2013-08-16
CN103261970A (zh) 2013-08-21
WO2012072914A2 (fr) 2012-06-07

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