WO2012141459A2 - Unité de support pour supporter un substrat - Google Patents

Unité de support pour supporter un substrat Download PDF

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Publication number
WO2012141459A2
WO2012141459A2 PCT/KR2012/002668 KR2012002668W WO2012141459A2 WO 2012141459 A2 WO2012141459 A2 WO 2012141459A2 KR 2012002668 W KR2012002668 W KR 2012002668W WO 2012141459 A2 WO2012141459 A2 WO 2012141459A2
Authority
WO
WIPO (PCT)
Prior art keywords
support
substrate
bar
supported
cross
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Ceased
Application number
PCT/KR2012/002668
Other languages
English (en)
Korean (ko)
Other versions
WO2012141459A3 (fr
Inventor
강호영
조병호
박주영
김철호
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Tera Semicon Corp
Original Assignee
Tera Semicon Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from KR1020110034246A external-priority patent/KR101243309B1/ko
Priority claimed from KR1020110041661A external-priority patent/KR101306757B1/ko
Application filed by Tera Semicon Corp filed Critical Tera Semicon Corp
Priority to CN201280017748.1A priority Critical patent/CN103477426B/zh
Priority to JP2014505066A priority patent/JP5981986B2/ja
Publication of WO2012141459A2 publication Critical patent/WO2012141459A2/fr
Publication of WO2012141459A3 publication Critical patent/WO2012141459A3/fr
Anticipated expiration legal-status Critical
Ceased legal-status Critical Current

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Classifications

    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P72/00—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof
    • H10P72/10—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof using carriers specially adapted therefor, e.g. front opening unified pods [FOUP]
    • H10P72/17—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof using carriers specially adapted therefor, e.g. front opening unified pods [FOUP] specially adapted for supporting large square shaped substrates

Definitions

  • the present invention relates to a support unit for supporting a substrate, which prevents the substrate from being deformed by sag during processing of the substrate.
  • Substrate processing apparatuses are used in the manufacture of flat panel displays, and are roughly classified into vapor deposition apparatuses and annealing apparatuses.
  • the deposition apparatus is a device for forming a transparent conductive layer, an insulating layer, a metal layer, or a silicon layer, which constitute the core of a flat panel display, and is a chemical vapor deposition such as low pressure chemical vapor deposition (LPCVD) or plasma-enhanced chemical vapor deposition (PECVD). Devices and physical vapor deposition devices such as sputtering.
  • LPCVD low pressure chemical vapor deposition
  • PECVD plasma-enhanced chemical vapor deposition
  • the annealing device is a device for improving the properties of the deposited film after depositing a film on the substrate, and is an apparatus for heat treatment to crystallize or phase change the deposited film.
  • a substrate processing apparatus includes a single substrate type for processing one substrate and a batch type for processing a plurality of substrates.
  • Single sheet substrate processing apparatus has a simple configuration, but has a disadvantage of low productivity, a batch substrate processing apparatus is frequently used for mass production.
  • the batch substrate processing apparatus is provided with a chamber that provides a space in which the substrate is processed, and a support unit for supporting the substrate loaded into the chamber is installed in the chamber.
  • the conventional support unit does not support the entire surface of the substrate, when the substrate is loaded and processed in the chamber, the substrate may be bent and deformed by its own weight. For this reason, the display characteristics of a flat panel display deteriorate, and there existed a problem that reliability fell.
  • the object of the present invention is to support the entire surface of the substrate during processing of the substrate support for supporting the substrate can improve the reliability of the flat panel display In providing the unit.
  • Supporting substrate support unit for achieving the above object, a pair of cross support bars arranged in parallel to each other; One end side and the other end side of the cross support bar are respectively supported and coupled to a counterpart to position the cross support bar on the counterpart; And a pair of outer main bars which are arranged at intervals with each other and whose one end side is supported by one of the cross support bars, and the other end side is supported by the other one of the cross support bars, which is smaller than the diameter of the outer main bar.
  • a pair of outer support bars formed with a diameter and coupled to each other in a form of being laminated to the outer main bar, a pair of outer supporting bars supporting the edge portion of the substrate, a plurality of connecting bars interconnecting the pair of outer main bars, and formed on the connecting bar It includes a boat having a plurality of support pins for supporting the.
  • the support unit for supporting the substrate according to the present invention for achieving the above object, a plurality of support bars arranged in parallel with each other; One end side and the other end side of the support bar is respectively supported, coupled to the mating support bracket for positioning the support bar on the mating object; And a plurality of support pins formed on the support bar to support the substrate.
  • the substrate supporting support unit since the entire surface of the substrate is uniformly supported by the plurality of support pins during the processing of the substrate, there is no fear that the substrate is bent and deformed by its own weight. Therefore, the reliability of the flat panel display is improved.
  • FIG. 1 is a perspective view of a substrate processing apparatus using a support unit for supporting a substrate according to a first embodiment of the present invention.
  • Figure 2 is a perspective view of the support unit for supporting the substrate shown in FIG.
  • Figure 3 is a perspective view of any one of the substrate support unit shown in FIG.
  • FIG. 4 is a perspective view of the boat shown in FIG.
  • FIG. 5 is a perspective view of a support unit for supporting a substrate according to a second embodiment of the present invention.
  • Figure 6 is a perspective view of any one of the substrate support unit shown in FIG.
  • FIG. 7 is a perspective view of any one of the support bars shown in FIG.
  • the treatment of the substrate refers to a process of heating and cooling the substrate, all deposition processes for depositing a predetermined film on the substrate, and all annealing, crystallization, or phase change for a predetermined film deposited on the substrate. It should be understood as a concept including a heat treatment process and the like.
  • FIG. 1 is a perspective view of a substrate processing apparatus using a substrate support support unit according to a first embodiment of the present invention
  • Figure 2 is a perspective view of the substrate support support units shown in FIG.
  • the substrate processing apparatus includes a main body 10 formed in a substantially rectangular parallelepiped shape to form an appearance, and inside the main body 10, a chamber 11, which is an enclosed space in which the substrate 50 is processed, is formed. do.
  • the main body 10 may be formed in various shapes according to the shape of the substrate 50 as well as the rectangular parallelepiped shape.
  • the front surface of the main body 10 is opened so that the door 13 is installed, and the door 13 opens and closes the chamber 11. That is, in the state in which the door 11 is opened and the chamber 11 is opened, the substrate 50 is supported by a robot (not shown) or the like to load the substrate 50 into the chamber 11. Then, the substrate 50 is processed while the door 13 is closed and the chamber 11 is closed.
  • the upper surface of the main body 10 may also be opened, and for this purpose, a cover 15 is installed, and the chamber 11 is also opened and closed by the cover 15.
  • the cover 15 opens the interior of the chamber 11 in the repair or replacement of components necessary for the processing of the substrate 50, installed in the chamber 11.
  • the components installed inside the chamber 11 cool the substrate support support unit 100 for mounting and supporting the substrate 50, the heater 17 for heating the substrate 50, and the substrate 50. Cooling pipes (not shown) may be included.
  • the left end side and the right end side of the heater 17 are supported by the left side wall and the right side wall of the main body 10, respectively.
  • a plurality of heaters 17 are installed while having a predetermined interval from the front side to the rear side of the main body 10, and a plurality of heaters are provided while having a predetermined interval from the upper side of the main body 10 to the lower side.
  • FIG. 2 A support unit for supporting a substrate 100 according to a first embodiment of the present invention will be described with reference to FIGS. 1 to 3.
  • 3 is a perspective view of any one of the substrate support units shown in FIG. 2.
  • the substrate support support unit 100 may be configured to include a cross support bar 110, a support bracket 120 and the boat 130.
  • a plurality of substrate supporting apparatuses 100 according to the first embodiment of the present invention may be installed in a form of stacked up and down in the substrate processing apparatus.
  • the cross support bars 110 are provided in pairs and are positioned at the same height with respect to the bottom surface of the main body 10 and disposed in parallel with each other. At this time, one cross support bar 110 is supported on both side walls of the front side of the main body 10 adjacent to the door 13, the other cross support bar 110 is both side walls of the rear side of the main body 10 Is supported.
  • the main body 10 is a counterpart on which the cross support bar 110 is supported.
  • the left end side and the right end side of the cross support bar 110 penetrate the left and right walls of the main body 10 and are located outside the main body 10, and the cross support bars on the left and right walls of the main body 10.
  • the support bracket 120 for supporting the 110 is coupled.
  • the support groove 121 and the locking groove 123 are formed in the form orthogonal to each other.
  • the support groove 121 parallel to the cross support bar 110 is inserted and supported at the lower end of the cross support bar 110 exposed to the outside of the main body 10, and is a locking groove perpendicular to the cross support bar 110.
  • 123 is inserted and supported by the engaging ring 111 formed on the outer peripheral surface of the end side of the cross support bar (110).
  • the cross support bar 110 Since the end side of the cross support bar 110 is inserted and supported in the support groove 121, and the locking ring 111 is inserted and supported in the locking groove 123, the cross support bar 110 is supported by the support bracket 120. It is firmly supported.
  • FIG. 3 A boat according to a first embodiment of the present invention will be described with reference to FIGS. 3 and 4. 4 is a perspective view of the boat shown in FIG.
  • the boat 130 is preferably made of quartz that can withstand high temperatures during processing of the substrate 50 and has almost no change in structure.
  • the boat 130 includes a pair of outer main bars 131 disposed to be spaced apart from each other.
  • Each of the front end side of the outer main bar 131 is supported by any one of the cross support bars 110 positioned on the front side of the main body 10 (see FIG. 1), and each of the rear end sides of the outer main bar 131 is the rear side of the main body 10. It is supported by the other cross support bar 110 located on the side.
  • the front end portion of the outer main bar 131 is inserted into and coupled to any one of the cross support bars 110.
  • the second end piece 131b supported by the other cross support bar 110 is formed at the rear end, respectively.
  • the second locking piece 131b is formed at the connection bar 135 to be described later, which is coupled to the left end side and the right end side of the pair of outer main bars 131 to interconnect the pair of outer main bars 131, respectively. It may be.
  • the first locking piece 131a is formed in a semicircular cross section and placed in the cross support bar 110, and the second locking piece 131b is formed in a bar shape and mounted on the cross support bar 110. Supported. Since the first locking piece 131a is inserted and coupled to the cross support bar 110, and the second locking piece 131b is mounted and supported on the cross support bar 110, the boat 130 is firmly supported by the cross support bar 110. Is supported). In addition, since the first locking piece 131a of the boat 130 is formed in a semi-circular shape and is settled in the cross support bar 110, the boat 130 is simply formed by lifting the boat 130 upward. 110). Thus, the boat 130 can be easily separated from the cross support bar 110.
  • the outer support bar 133 is coupled to the outer main bar 131, respectively. Since the outer support bar 133 is coupled to the outer main bar 131, respectively, the outer support bar 133 is also provided in pairs.
  • the outer support bar 133 is formed in a diameter smaller than the diameter of the outer main bar 131 is coupled to each other laminated on the outer main bar 131. The edge portion side of the substrate 50 is supported by the outer support bar 133.
  • the outer main bar 131 In order for the outer main bar 131 to have a predetermined rigidity, the outer main bar 131 should have a relatively large diameter. However, when the substrate 50 is brought into contact with and supported by the outer main bar 131, a portion of the substrate 50 in contact with the outer main bar 131 may not be uniformly processed. Therefore, the outer support bar 133 having a smaller diameter than the outer main bar 131 is coupled to the outer main bar 131, and the substrate 50 is brought into contact with the outer support bar 133 to be supported.
  • the outer main bar 131 is coupled to each other by a plurality of connection bars 135, and a plurality of support pins 136 supporting the substrate 50 are coupled to the connection bar 135. Since the entire portion of the substrate 50 is evenly supported by the support pins 136, the substrate 50 is prevented from sagging due to its own weight or the like.
  • connection bar 135 located at the rear end of the outer main bar 131.
  • the support pin 136 is preferably detachably coupled to the connecting bar 135. If the support pin 136 can be attached to or detached from the connecting bar 135, the support pin 136 may be concentrated at a portion where the substrate 50 sags due to the weight of the substrate 50, thereby providing the substrate 50. This deformation can be completely prevented.
  • the support pin 136 may be formed in various shapes, which will be described later.
  • the plurality of substrates 50 may be partitioned and supported by the outer support bar 133.
  • a plurality of stoppers 133a are formed in the outer support bar 133.
  • the stopper 133a is in contact with the side surface of the substrate 50 to prevent the substrate 50 from flowing in the longitudinal direction of the outer support bar 133, respectively.
  • the stopper 133a is also preferably detachably coupled to the outer support bar 133. Then, since the stopper 133a may be attached or detached according to the size of the substrate 50, the substrate 50 having various sizes may be supported by the outer support bar 133.
  • the first coupling groove 135a and the second coupling groove 133b to which the lower side of the support pin 136 and the stopper 133a are detachably coupled to the connection bar 135 and the outer support bar 133 are respectively. Is formed.
  • the support piece 133c may be formed at the front end side and the rear end side of the outer support bar 133 so as to be orthogonal to the outer support bar 133 to support the edge portion side of the substrate 50.
  • the substrate 50 is more firmly supported by the support piece 133c.
  • the support piece 133c may also be formed at the center side of the outer support bar 133 to correspond to the substrate 50.
  • the boat 130 is loaded by a jig (not shown) to load the boat 130 into the chamber 11 (see FIG. 1), and unloading from the chamber 11.
  • the hook hooks 131c are formed respectively.
  • the height of the hook hook 131c may be appropriately adjusted so that the jig does not interfere with the support pin 136 and the stopper 133a.
  • Reference numeral 20 in FIG. 1 is a support frame for supporting the main body 10.
  • the entire surface of the substrate 50 is supported by the plurality of support pins 136, so that the substrate 50 is bent and deformed by its own weight. There is no fear of becoming. Therefore, the reliability of the flat panel display is improved.
  • FIGS. 5 to 7 are perspective views of a substrate supporting support unit according to a second embodiment of the present invention
  • FIG. 6 is a perspective view of any one substrate supporting support unit shown in FIG. 5, and
  • the substrate support support unit 200 may include a plurality of support bars 210, support brackets 220 and a plurality of support pins 230. have.
  • a plurality of substrate supporting apparatuses 200 according to the second embodiment of the present invention may be provided in a form of stacked up and down in the substrate processing apparatus.
  • the plurality of support bars 210 are positioned at the same height with respect to the lower surface of the main body 10 (see FIG. 1) and disposed in parallel to each other. That is, the plurality of support bars 210 are positioned on the same horizontal plane and are disposed in parallel to each other.
  • the left end side and the right end side of the support bar 210 are coupled to and supported on the left side wall and the right side wall of the counterpart body 10, respectively.
  • the left end side and the right end side of the support bar 210 are located outside the main body 10 through the left and right walls of the main body 10, and the support bar 210 on the left and right walls of the main body 10.
  • Support bracket 220 is coupled to support.
  • the support groove 221 and the locking groove 223 are formed to be orthogonal to each other.
  • the support groove 221 parallel to the support bar 210 the outer surface of the lower end portion of the support bar 210 exposed to the outside of the main body 10 is inserted and supported.
  • the engaging groove 223 perpendicular to the support bar 210 is inserted and supported by the engaging ring 211 formed on the outer peripheral surface of the end side of the support bar 210.
  • the support bar 210 Since the end side of the support bar 210 is inserted and supported in the support groove 221 and the locking ring 211 is inserted and supported in the locking groove 223, the support bar 210 is firmly supported by the support bracket 220. Supported.
  • a plurality of support pins 230 are formed on each support bar 210 and support the substrate 50. That is, the lower side of the support pin 230 is coupled to the support bar 210, the substrate 50 is supported on the upper end of the support pin 230. Since the plurality of support pins 230 are respectively coupled to the plurality of support bars 210, the substrate 50 is uniformly supported by the support pins 230. Thus, the substrate 50 is prevented from sagging due to its own weight or the like and being deformed.
  • a coupling groove 213 is formed in the support bar 210, and the support pin 230 may be detachably inserted into the coupling groove 213. Since the support pin 230 is attached to or detached from the support bar 210, when the substrate 50 is processed, the support pin 230 may be concentrated on a portion where the substrate 50 sags due to the weight of the substrate 50. have. Therefore, the deformation of the substrate 50 can be completely prevented.
  • the lower side cross-sectional shape of the support pin 230 may be variously formed, such as circular, elliptical, or square. At this time, it is obvious that the shape of the coupling groove 213 into which the support pin 230 is inserted should correspond to the cross-sectional shape of the lower side of the support pin 230.
  • the support pin 231 When the cross-sectional shape of the support pin 231 and the shape of the coupling groove 213a are circular, the support pin 231 may be rotated based on the support bar 210. In addition, when the cross-sectional shape of the support pin 233 and the shape of the coupling groove 213b are oval or the cross-sectional shape of the support pin 235 and the shape of the coupling groove 213c are square, the support pins 233 and 235 are Rotation with respect to the support bar 210 is prevented.
  • the support pin 231 is bent (231a) the middle portion, the upper portion of the support pin 231, the substrate 50 is in contact support and the lower portion of the support pin 231 is inserted and coupled to the support bar 210 Virtual straight lines L1 and L2 passing through the longitudinal center may be formed in parallel to each other.
  • the support pin 231 is rotated without having to insert the support pin 231 into the coupling groove 213a. In this way, the portion where the substrate 50 sags can be easily supported.
  • the bending part 231a of the support pin 231 may be bent a plurality of times as necessary.
  • the entire surface of the substrate 50 is supported by the plurality of support pins 230 during the processing of the substrate 50. ) Is not deformed due to its own weight. Therefore, the reliability of the flat panel display is improved.
  • the support pin 136 (see FIG. 4) according to the first embodiment of the present invention may also be configured like the support pin 230 according to the second embodiment.
  • the support pin 136 according to the first embodiment of the present invention also has a circular, elliptical, or rectangular cross-sectional shape of the lower side like the support pins 231, 233, and 235 according to the second embodiment. And the like. At this time, it is obvious that the shape of the first coupling groove 135a formed in the connection bar 135 should correspond to the cross-sectional shape of the support pin 136.
  • the support pin 136 according to the first embodiment of the present invention is also bent the middle portion, such as the support pin 231 according to the second embodiment of the support pin 136 is inserted into the connection bar 135 Virtual straight lines passing through the longitudinal centers of the lower portion and the upper portion of the upper portion of the support pin 136 on which the substrate 50 is supported may be formed in parallel to each other.
  • the lower portion of the support pin 136 is rotatably inserted and coupled to the connecting bar 135, the middle portion may be bent a plurality of times.

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  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)

Abstract

L'invention porte sur une unité de support pour supporter un substrat, qui empêche le substrat de s'affaisser ou d'être déformé pendant le traitement du substrat. L'unité de support pour supporter un substrat selon la présente invention empêche le substrat d'être voilé ou déformé du fait du poids du substrat, car la totalité de la surface du substrat est supportée de façon uniforme par une pluralité d'ailettes de support pendant le traitement du substrat. Par conséquent, la fiabilité d'un écran plat peut être améliorée.
PCT/KR2012/002668 2011-04-13 2012-04-09 Unité de support pour supporter un substrat Ceased WO2012141459A2 (fr)

Priority Applications (2)

Application Number Priority Date Filing Date Title
CN201280017748.1A CN103477426B (zh) 2011-04-13 2012-04-09 基板支撑用支撑单元
JP2014505066A JP5981986B2 (ja) 2011-04-13 2012-04-09 基板支持用支持ユニット

Applications Claiming Priority (4)

Application Number Priority Date Filing Date Title
KR1020110034246A KR101243309B1 (ko) 2011-04-13 2011-04-13 기판 지지용 보트, 보트를 포함하는 지지 유닛 및 지지 유닛을 사용한 기판 처리 장치
KR10-2011-0034246 2011-04-13
KR1020110041661A KR101306757B1 (ko) 2011-05-02 2011-05-02 기판 지지용 지지 유닛 및 이를 사용한 기판 처리 장치
KR10-2011-0041661 2011-05-02

Publications (2)

Publication Number Publication Date
WO2012141459A2 true WO2012141459A2 (fr) 2012-10-18
WO2012141459A3 WO2012141459A3 (fr) 2013-01-03

Family

ID=47009810

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/KR2012/002668 Ceased WO2012141459A2 (fr) 2011-04-13 2012-04-09 Unité de support pour supporter un substrat

Country Status (4)

Country Link
JP (1) JP5981986B2 (fr)
CN (1) CN103477426B (fr)
TW (1) TWI584402B (fr)
WO (1) WO2012141459A2 (fr)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP6362278B2 (ja) * 2014-06-30 2018-07-25 ウォンイク テラセミコン カンパニー リミテッド ボート

Family Cites Families (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3977481B2 (ja) * 1997-04-11 2007-09-19 淀川ヒューテック株式会社 基板用トレイカセット
JP2002154648A (ja) * 2000-11-15 2002-05-28 Fuji Photo Film Co Ltd 基板カセット
JP4079651B2 (ja) * 2002-02-12 2008-04-23 オリンパス株式会社 基板支持装置
JP2004042984A (ja) * 2002-07-15 2004-02-12 Sharp Corp 超大型基板用カセット
JP2004107006A (ja) * 2002-09-18 2004-04-08 Masato Toshima 基板の搬送装置
KR100600515B1 (ko) * 2005-01-20 2006-07-13 (주)상아프론테크 크로스바 설치용 연결구가 구비된 기판 적재용 카세트
JP4317883B2 (ja) * 2007-04-18 2009-08-19 国立大学法人東北大学 支持ピンの製造方法、支持ピン、熱処理装置および基板焼成炉
JP5022855B2 (ja) * 2007-10-05 2012-09-12 古河機械金属株式会社 リフトピン機構、加熱処理装置、減圧乾燥装置
KR101016048B1 (ko) * 2008-07-16 2011-02-23 주식회사 테라세미콘 배치식 열처리 장치
KR101058187B1 (ko) * 2008-12-05 2011-08-22 주식회사 에스에프에이 기판 보관용 카세트 시스템

Also Published As

Publication number Publication date
JP2014512106A (ja) 2014-05-19
WO2012141459A3 (fr) 2013-01-03
CN103477426A (zh) 2013-12-25
TWI584402B (zh) 2017-05-21
TW201248771A (en) 2012-12-01
CN103477426B (zh) 2016-06-29
JP5981986B2 (ja) 2016-08-31

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