WO2018166802A3 - Beschichtetes produkt und verfahren zur herstellung - Google Patents

Beschichtetes produkt und verfahren zur herstellung Download PDF

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Publication number
WO2018166802A3
WO2018166802A3 PCT/EP2018/055020 EP2018055020W WO2018166802A3 WO 2018166802 A3 WO2018166802 A3 WO 2018166802A3 EP 2018055020 W EP2018055020 W EP 2018055020W WO 2018166802 A3 WO2018166802 A3 WO 2018166802A3
Authority
WO
WIPO (PCT)
Prior art keywords
product
surface layer
manufacturing
coated product
coated
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Ceased
Application number
PCT/EP2018/055020
Other languages
English (en)
French (fr)
Other versions
WO2018166802A2 (de
Inventor
Johannes Galle
Dennis MUSCUTT
Volker Rauhut
Karl Brennfleck
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Schunk Kohlenstofftechnik GmbH
Original Assignee
Schunk Kohlenstofftechnik GmbH
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Schunk Kohlenstofftechnik GmbH filed Critical Schunk Kohlenstofftechnik GmbH
Priority to KR1020197027319A priority Critical patent/KR20190125349A/ko
Priority to CN201880016991.9A priority patent/CN110418858A/zh
Priority to JP2019550666A priority patent/JP2020514552A/ja
Priority to EP18711237.0A priority patent/EP3596247A2/de
Priority to US16/489,632 priority patent/US11932937B2/en
Publication of WO2018166802A2 publication Critical patent/WO2018166802A2/de
Publication of WO2018166802A3 publication Critical patent/WO2018166802A3/de
Anticipated expiration legal-status Critical
Ceased legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
    • C23C16/30—Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
    • C23C16/34—Nitrides
    • C23C16/345—Silicon nitride
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/02—Pretreatment of the material to be coated
    • C23C16/0272—Deposition of sub-layers, e.g. to promote the adhesion of the main coating
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/04—Coating on selected surface areas, e.g. using masks
    • C23C16/045—Coating cavities or hollow spaces, e.g. interior of tubes; Infiltration of porous substrates
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
    • C23C16/24—Deposition of silicon only
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/46—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for heating the substrate
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/56—After-treatment

Landscapes

  • Chemical & Material Sciences (AREA)
  • General Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Inorganic Chemistry (AREA)
  • Chemical Vapour Deposition (AREA)
  • Crystals, And After-Treatments Of Crystals (AREA)
  • Application Of Or Painting With Fluid Materials (AREA)

Abstract

Die Erfindung betrifft ein Verfahren zur Herstellung eines Produkts, einen Tiegel sowie eine Verwendung einer Schicht aus kristallinen Siliziumnitrid, wobei das Produkt aus einem überwiegend aus Kohlen- stoff oder einem keramischen Werkstoff bestehenden Material ausgebildet wird, wobei das Produkt mittels chemischer Gasphasenabscheidung (CVD) mit einer Oberflächenschicht beschichtet wird, wobei das Produkt mit einer Oberflächenschicht aus zumindest teilkristallinen, bevorzugt kristallinen Siliziumnitrid (Si3N4) beschichtet wird, wobei die Oberflächenschicht bei einer Prozesstemperatur von über 1.100 °C bis 1.700 °C auf dem Produkt ausgebildet wird.
PCT/EP2018/055020 2017-03-14 2018-03-01 Beschichtetes produkt und verfahren zur herstellung Ceased WO2018166802A2 (de)

Priority Applications (5)

Application Number Priority Date Filing Date Title
KR1020197027319A KR20190125349A (ko) 2017-03-14 2018-03-01 코팅된 제품 및 제조방법
CN201880016991.9A CN110418858A (zh) 2017-03-14 2018-03-01 涂覆产品和生产方法
JP2019550666A JP2020514552A (ja) 2017-03-14 2018-03-01 コーティングされた製品及びその製造方法
EP18711237.0A EP3596247A2 (de) 2017-03-14 2018-03-01 Beschichtetes produkt und verfahren zur herstellung
US16/489,632 US11932937B2 (en) 2017-03-14 2018-03-01 Coated product and production method

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
DE102017204257.5 2017-03-14
DE102017204257.5A DE102017204257A1 (de) 2017-03-14 2017-03-14 Beschichtetes Produkt und Verfahren zur Herstellung

Publications (2)

Publication Number Publication Date
WO2018166802A2 WO2018166802A2 (de) 2018-09-20
WO2018166802A3 true WO2018166802A3 (de) 2019-01-17

Family

ID=61655723

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/EP2018/055020 Ceased WO2018166802A2 (de) 2017-03-14 2018-03-01 Beschichtetes produkt und verfahren zur herstellung

Country Status (8)

Country Link
US (1) US11932937B2 (de)
EP (1) EP3596247A2 (de)
JP (1) JP2020514552A (de)
KR (1) KR20190125349A (de)
CN (1) CN110418858A (de)
DE (1) DE102017204257A1 (de)
TW (1) TWI776860B (de)
WO (1) WO2018166802A2 (de)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR102761515B1 (ko) * 2019-02-27 2025-02-04 삼성디스플레이 주식회사 증착원 증발 장치 및 그 제조방법
CN116589284A (zh) * 2023-05-20 2023-08-15 西北工业大学 一种高强高纯氮化硅坩埚及其制备方法和应用
CN118084517A (zh) * 2024-02-18 2024-05-28 阳泉银宇新材料有限责任公司 一种特种锂电池正极材料用匣钵及其制备方法

Citations (4)

* Cited by examiner, † Cited by third party
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US4239819A (en) * 1978-12-11 1980-12-16 Chemetal Corporation Deposition method and products
JPH05263255A (ja) * 1992-03-19 1993-10-12 Hitachi Electron Eng Co Ltd プラズマｃｖｄ装置
US5300322A (en) * 1992-03-10 1994-04-05 Martin Marietta Energy Systems, Inc. Molybdenum enhanced low-temperature deposition of crystalline silicon nitride
DE69630484T2 (de) * 1995-06-09 2004-08-19 Ebara Corp. Reaktivgasinjektor für Vorrichtung zur chemischen Gasphasenabscheidung

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JPS6047202B2 (ja) * 1976-01-13 1985-10-21 東北大学金属材料研究所長 超硬高純度の配向多結晶質窒化珪素
US4580524A (en) * 1984-09-07 1986-04-08 The United States Of America As Represented By The United States Department Of Energy Process for the preparation of fiber-reinforced ceramic composites by chemical vapor deposition
US5286565A (en) * 1984-09-24 1994-02-15 Air Products And Chemicals, Inc. Oxidation resistant carbon and method for making same
US4741925A (en) 1987-09-14 1988-05-03 Gte Products Corporation Method of forming silicon nitride coating
AU664824B1 (en) 1989-09-11 1995-12-07 Air Products And Chemicals Inc. Oxidation resistant carbon and method for making same
DE3933039A1 (de) 1989-10-04 1991-04-18 Sintec Keramik Gmbh Verfahren zur herstellung von oxidationsgeschuetzten cfc-formkoerpern
US5283089A (en) 1989-11-13 1994-02-01 Norton Company Non-porous diffusion furnace components
JPH05296999A (ja) 1992-04-24 1993-11-12 Amano Pharmaceut Co Ltd グルココルチコイドの効果判定マーカーとしてのヒトリポコルチンｉ及びその定量法
EP0623571A4 (de) 1992-11-26 1997-07-02 Tonen Corp Verfahren zur herstellung keramischer produkte.
US6284357B1 (en) 1995-09-08 2001-09-04 Georgia Tech Research Corp. Laminated matrix composites
WO2007139142A1 (ja) 2006-05-31 2007-12-06 Tokyo Electron Limited プラズマｃｖｄ方法、窒化珪素膜の形成方法、半導体装置の製造方法およびプラズマｃｖｄ装置
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EP2714960B1 (de) * 2011-06-03 2018-02-28 Versum Materials US, LLC Zusammensetzungen und verfahren zur ablagerung von kohlenstoffdotierten siliciumhaltigen filmen
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Publication number Priority date Publication date Assignee Title
US4239819A (en) * 1978-12-11 1980-12-16 Chemetal Corporation Deposition method and products
US5300322A (en) * 1992-03-10 1994-04-05 Martin Marietta Energy Systems, Inc. Molybdenum enhanced low-temperature deposition of crystalline silicon nitride
JPH05263255A (ja) * 1992-03-19 1993-10-12 Hitachi Electron Eng Co Ltd プラズマｃｖｄ装置
DE69630484T2 (de) * 1995-06-09 2004-08-19 Ebara Corp. Reaktivgasinjektor für Vorrichtung zur chemischen Gasphasenabscheidung

Also Published As

Publication number Publication date
US11932937B2 (en) 2024-03-19
DE102017204257A1 (de) 2018-09-20
TW201839163A (zh) 2018-11-01
WO2018166802A2 (de) 2018-09-20
US20200024732A1 (en) 2020-01-23
CN110418858A (zh) 2019-11-05
EP3596247A2 (de) 2020-01-22
JP2020514552A (ja) 2020-05-21
KR20190125349A (ko) 2019-11-06
TWI776860B (zh) 2022-09-11

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