WO2020115111A3 - Verfahren zum bilden von nanostrukturen an einer oberfläche und optisches element - Google Patents

Verfahren zum bilden von nanostrukturen an einer oberfläche und optisches element Download PDF

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Publication number
WO2020115111A3
WO2020115111A3 PCT/EP2019/083628 EP2019083628W WO2020115111A3 WO 2020115111 A3 WO2020115111 A3 WO 2020115111A3 EP 2019083628 W EP2019083628 W EP 2019083628W WO 2020115111 A3 WO2020115111 A3 WO 2020115111A3
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WO
WIPO (PCT)
Prior art keywords
substrate
optical element
radiation
nanostructures
fuv
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Ceased
Application number
PCT/EP2019/083628
Other languages
English (en)
French (fr)
Other versions
WO2020115111A2 (de
Inventor
Vitaliy Shklover
Alexandra Pazidis
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Carl Zeiss SMT GmbH
Original Assignee
Carl Zeiss SMT GmbH
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Carl Zeiss SMT GmbH filed Critical Carl Zeiss SMT GmbH
Priority to KR1020217020407A priority Critical patent/KR102815328B1/ko
Publication of WO2020115111A2 publication Critical patent/WO2020115111A2/de
Publication of WO2020115111A3 publication Critical patent/WO2020115111A3/de
Priority to US17/341,239 priority patent/US11982788B2/en
Anticipated expiration legal-status Critical
Ceased legal-status Critical Current

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Classifications

    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
    • G02B1/10—Optical coatings produced by application to, or surface treatment of, optical elements
    • G02B1/11—Anti-reflection coatings
    • G02B1/113—Anti-reflection coatings using inorganic layer materials only
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24—Vacuum evaporation
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/02—Pretreatment of the material to be coated
    • C23C16/0227—Pretreatment of the material to be coated by cleaning or etching
    • C23C16/0245—Pretreatment of the material to be coated by cleaning or etching by etching with a plasma
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
    • G02B1/10—Optical coatings produced by application to, or surface treatment of, optical elements
    • G02B1/11—Anti-reflection coatings
    • G02B1/118—Anti-reflection coatings having sub-optical wavelength surface structures designed to provide an enhanced transmittance, e.g. moth-eye structures
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
    • G02B1/10—Optical coatings produced by application to, or surface treatment of, optical elements
    • G02B1/12—Optical coatings produced by application to, or surface treatment of, optical elements by surface treatment, e.g. by irradiation
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/02—Constructional details
    • H01S3/03—Constructional details of gas laser discharge tubes
    • H01S3/034—Optical devices within, or forming part of, the tube, e.g. windows, mirrors
    • H01S3/0346—Protection of windows or mirrors against deleterious effects
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y20/00—Nanooptics, e.g. quantum optics or photonic crystals
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y30/00—Nanotechnology for materials or surface science, e.g. nanocomposites
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y40/00—Manufacture or treatment of nanostructures
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B2207/00—Coding scheme for general features or characteristics of optical elements and systems of subclass G02B, but not including elements and systems which would be classified in G02B6/00 and subgroups
    • G02B2207/101—Nanooptics
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/14—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range characterised by the material used as the active medium
    • H01S3/22—Gases
    • H01S3/223—Gases the active gas being polyatomic, i.e. containing two or more atoms
    • H01S3/225—Gases the active gas being polyatomic, i.e. containing two or more atoms comprising an excimer or exciplex

Landscapes

  • Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Chemical & Material Sciences (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Electromagnetism (AREA)
  • Plasma & Fusion (AREA)
  • Inorganic Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • General Chemical & Material Sciences (AREA)
  • Surface Treatment Of Optical Elements (AREA)
  • Crystals, And After-Treatments Of Crystals (AREA)
  • Physical Vapour Deposition (AREA)

Abstract

Die Erfindung betrifft ein Verfahren zum Bilden von reflexionsmindernden Nanostrukturen (5) an einer polierten Oberfläche (3) eines kristallinen, ionischen Substrats (1) zur Transmission von Strahlung (11) im FUV/VUV-Wellenlängenbereich, umfassend: Bereitstellen einer Oberfläche (3, 7), die nicht entlang einer Gitterebene mit minimaler Oberflächenenergie orientiert ist, an dem Substrat (1) oder an einer Oberfläche (7) einer durch ein Beschichtungsverfahren, beispielweise Vakuum bedampfen, auf das Substrat (1) aufgebrachten Schicht (6), sowie Einbringen eines Energieeintrags (E) in die Oberfläche (7) zur Umlagerung der Oberfläche (7) unter Bildung der Nanostrukturen (5), wobei der Energieeintrag (E) durch Bestrahlen der Oberfläche (3, 7) mit elektromagnetischer Strahlung (4) erzeugt wird. Die Erfindung betrifft auch ein optisches Element zur Transmission von Strahlung im FUV/VUV-Wellenlängenbereich.
PCT/EP2019/083628 2018-12-07 2019-12-04 Verfahren zum bilden von nanostrukturen an einer oberfläche und optisches element Ceased WO2020115111A2 (de)

Priority Applications (2)

Application Number Priority Date Filing Date Title
KR1020217020407A KR102815328B1 (ko) 2018-12-07 2019-12-04 표면 상에 나노구조를 형성하기 위한 방법 및 광학 요소
US17/341,239 US11982788B2 (en) 2018-12-07 2021-06-07 Method for forming nanostructures on a surface and optical element

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
DE102018221189.2 2018-12-07
DE102018221189.2A DE102018221189A1 (de) 2018-12-07 2018-12-07 Verfahren zum Bilden von Nanostrukturen an einer Oberfläche und optisches Element

Related Child Applications (1)

Application Number Title Priority Date Filing Date
US17/341,239 Continuation US11982788B2 (en) 2018-12-07 2021-06-07 Method for forming nanostructures on a surface and optical element

Publications (2)

Publication Number Publication Date
WO2020115111A2 WO2020115111A2 (de) 2020-06-11
WO2020115111A3 true WO2020115111A3 (de) 2020-08-13

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ID=68835194

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PCT/EP2019/083628 Ceased WO2020115111A2 (de) 2018-12-07 2019-12-04 Verfahren zum bilden von nanostrukturen an einer oberfläche und optisches element

Country Status (4)

Country Link
US (1) US11982788B2 (de)
KR (1) KR102815328B1 (de)
DE (1) DE102018221189A1 (de)
WO (1) WO2020115111A2 (de)

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20230045243A (ko) 2021-09-28 2023-04-04 경희대학교 산학협력단 나노 구조를 가지는 고분자 물질 및 이의 형성방법
KR20240093699A (ko) * 2021-10-19 2024-06-24 코닝 인코포레이티드 칼슘 불화물 광학 부품용 원자층 침착 유래된 보호 코팅
DE102022210512A1 (de) * 2022-10-05 2024-04-11 Carl Zeiss Smt Gmbh Verfahren und Vorrichtung zur Nachbehandlung einer Fluoridschicht für ein optisches Element für den VUV-Wellenlängenbereich
DE102022210513A1 (de) * 2022-10-05 2024-04-11 Carl Zeiss Smt Gmbh Verfahren zum Bilden einer Fluorid- oder Oxyfluoridschicht
WO2024260671A1 (en) * 2023-06-20 2024-12-26 Asml Netherlands B.V. Anti-reflective nanostructures for semiconductor lithography, metrology, and inspection systems
US20250271771A1 (en) * 2024-02-22 2025-08-28 Kla Corporation Vacuum ultraviolet light mirror

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Also Published As

Publication number Publication date
US20210293996A1 (en) 2021-09-23
KR102815328B1 (ko) 2025-06-02
DE102018221189A1 (de) 2020-06-10
US11982788B2 (en) 2024-05-14
KR20210097175A (ko) 2021-08-06
WO2020115111A2 (de) 2020-06-11

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