WO2026046964A1 - Bain de placage de chrome trivalent - Google Patents

Bain de placage de chrome trivalent

Info

Publication number
WO2026046964A1
WO2026046964A1 PCT/EP2025/074223 EP2025074223W WO2026046964A1 WO 2026046964 A1 WO2026046964 A1 WO 2026046964A1 EP 2025074223 W EP2025074223 W EP 2025074223W WO 2026046964 A1 WO2026046964 A1 WO 2026046964A1
Authority
WO
WIPO (PCT)
Prior art keywords
bath
chromium
layer
hard chrome
plating
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
PCT/EP2025/074223
Other languages
English (en)
Inventor
Payam Samadi
Oliver Daub
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Dr Ing Max Schloetter GmbH and Co KG
Original Assignee
Dr Ing Max Schloetter GmbH and Co KG
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Dr Ing Max Schloetter GmbH and Co KG filed Critical Dr Ing Max Schloetter GmbH and Co KG
Publication of WO2026046964A1 publication Critical patent/WO2026046964A1/fr
Pending legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D3/00—Electroplating: Baths therefor
    • C25D3/02—Electroplating: Baths therefor from solutions
    • C25D3/04—Electroplating: Baths therefor from solutions of chromium
    • C25D3/06—Electroplating: Baths therefor from solutions of chromium from solutions of trivalent chromium
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D3/00—Electroplating: Baths therefor
    • C25D3/02—Electroplating: Baths therefor from solutions
    • C25D3/04—Electroplating: Baths therefor from solutions of chromium
    • C25D3/10—Electroplating: Baths therefor from solutions of chromium characterised by the organic bath constituents used
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Electrochemistry (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Electroplating And Plating Baths Therefor (AREA)

Abstract

La présente invention concerne l'utilisation d'une composition de bain de placage de chrome trivalent pour l'électrodéposition d'une couche de chrome dure d'une épaisseur de 1 µm ou plus, la composition comprenant (A) des ions chrome trivalents en une quantité de 5 à 40 g/l, (B) au moins un anion choisi parmi sulfate, chlorure, bromure et méthane sulfonate, (C) au moins un ion carboxylate choisi parmi formiate et acétate, (D) au moins une substance tampon choisie parmi l'ammoniac, l'acide borique, les acides carboxyliques ayant 2 à 8 atomes de carbone autres que le composant (C) et leurs sels, et les sels d'aluminium, et (E) 0,01 à 100 g/l d'au moins un composé spécifique qui comprend un groupe sulfonate et un groupe sulfure ou disulfure. D'autres aspects de l'invention concernent un procédé de placage de chrome dur, une couche de placage de chrome dur et un article plaqué de chrome dur.
PCT/EP2025/074223 2024-08-26 2025-08-26 Bain de placage de chrome trivalent Pending WO2026046964A1 (fr)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
EP24196401.4 2024-08-26
EP24196401.4A EP4703500A1 (fr) 2024-08-26 2024-08-26 Bain de placage au chrome trivalent

Publications (1)

Publication Number Publication Date
WO2026046964A1 true WO2026046964A1 (fr) 2026-03-05

Family

ID=92542692

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/EP2025/074223 Pending WO2026046964A1 (fr) 2024-08-26 2025-08-26 Bain de placage de chrome trivalent

Country Status (2)

Country Link
EP (1) EP4703500A1 (fr)
WO (1) WO2026046964A1 (fr)

Citations (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20110132765A1 (en) * 2006-03-31 2011-06-09 Bishop Craig V Crystalline chromium deposit
EP2899299A1 (fr) 2014-01-24 2015-07-29 COVENTYA S.p.A. Électrolyte au chrome trivalent et méthode de déposition du chrome métallique
US20150354077A1 (en) * 2012-02-27 2015-12-10 Faraday Technology, Inc. Electrodeposition of chromium from trivalent chromium using modulated electric fields
CN107419310A (zh) * 2017-09-28 2017-12-01 永星化工(上海)有限公司 一种三价铬镀层及其制备方法
US10006135B2 (en) 2011-05-03 2018-06-26 Atotech Deutschland LLP Electroplating bath and method for producing dark chromium layers
CN108456898A (zh) * 2018-06-25 2018-08-28 厦门大学 一种低浓度硫酸盐三价铬快速镀铬电镀液及其制备方法
US11214881B2 (en) 2016-09-27 2022-01-04 Atotech Deutschland Gmbh Method for treatment of a chromium finish surface
US11268206B2 (en) 2017-03-31 2022-03-08 Coventya S.P.A. Method for increasing the corrosion resistance of a chrome-plated substrate
US20230160083A1 (en) * 2018-12-21 2023-05-25 Maschinenfabrik Kaspar Walter Gmbh & Co. Kg Electrolyte and method for producing chromium layers

Patent Citations (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20110132765A1 (en) * 2006-03-31 2011-06-09 Bishop Craig V Crystalline chromium deposit
US10006135B2 (en) 2011-05-03 2018-06-26 Atotech Deutschland LLP Electroplating bath and method for producing dark chromium layers
US20150354077A1 (en) * 2012-02-27 2015-12-10 Faraday Technology, Inc. Electrodeposition of chromium from trivalent chromium using modulated electric fields
EP2899299A1 (fr) 2014-01-24 2015-07-29 COVENTYA S.p.A. Électrolyte au chrome trivalent et méthode de déposition du chrome métallique
US11214881B2 (en) 2016-09-27 2022-01-04 Atotech Deutschland Gmbh Method for treatment of a chromium finish surface
US11268206B2 (en) 2017-03-31 2022-03-08 Coventya S.P.A. Method for increasing the corrosion resistance of a chrome-plated substrate
CN107419310A (zh) * 2017-09-28 2017-12-01 永星化工(上海)有限公司 一种三价铬镀层及其制备方法
CN108456898A (zh) * 2018-06-25 2018-08-28 厦门大学 一种低浓度硫酸盐三价铬快速镀铬电镀液及其制备方法
US20230160083A1 (en) * 2018-12-21 2023-05-25 Maschinenfabrik Kaspar Walter Gmbh & Co. Kg Electrolyte and method for producing chromium layers

Non-Patent Citations (3)

* Cited by examiner, † Cited by third party
Title
ASM, vol. 5, pages 195 - 196
CHIEN C W ET AL: "Microstructure and properties of carbonsulfur-containing chromium deposits electroplated in trivalent chromium baths with thiosalicylic acid", ELECTROCHIMICA ACTA, ELSEVIER, AMSTERDAM, NL, vol. 72, 31 March 2012 (2012-03-31), pages 74 - 80, XP028505894, ISSN: 0013-4686, [retrieved on 20120412], DOI: 10.1016/J.ELECTACTA.2012.03.168 *
HANNAH BETZ ET AL.: "Hartverchromung aus dreiwertigen Elektrolyten", WOTECH, 7 February 2021 (2021-02-07)

Also Published As

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EP4703500A1 (fr) 2026-03-04

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