ZA924765B - Plasma assisted diamond synthesis - Google Patents

Plasma assisted diamond synthesis

Info

Publication number: ZA924765B
Authority: ZA; South Africa
Prior art keywords: plasma; substrate; gas; reaction chamber; bell jar
Prior art date: 1991-06-28

Application number

ZA924765A

Other languages

English (en)

Inventor

Christopher John Howard Wort

John Howard Wort Christopher

Harry Richard Holliday

Richard Holliday Harry

Ricardo Simon Sussmann

Simon Sussmann Ricardo

Dennis Charles Hawkins

Charles Hawkins Dennis

Original Assignee

De Beers Ind Diamond

Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)

1991-06-28

Filing date

1992-06-26

Publication date

1993-03-31

1992-06-26 Application filed by De Beers Ind Diamond filed Critical De Beers Ind Diamond

1993-03-31 Publication of ZA924765B publication Critical patent/ZA924765B/xx

Links

229910003460 diamond Inorganic materials 0.000 title abstract 2
239000010432 diamond Substances 0.000 title abstract 2
230000015572 biosynthetic process Effects 0.000 title 1
238000003786 synthesis reaction Methods 0.000 title 1
239000007789 gas Substances 0.000 abstract 3
238000000034 method Methods 0.000 abstract 3
239000000758 substrate Substances 0.000 abstract 3
OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 abstract 2
150000001722 carbon compounds Chemical class 0.000 abstract 1
229910010293 ceramic material Inorganic materials 0.000 abstract 1
238000005229 chemical vapour deposition Methods 0.000 abstract 1
230000001419 dependent effect Effects 0.000 abstract 1
229910052739 hydrogen Inorganic materials 0.000 abstract 1
239000001257 hydrogen Substances 0.000 abstract 1
125000004435 hydrogen atom Chemical class [H]* 0.000 abstract 1
238000004519 manufacturing process Methods 0.000 abstract 1
230000005855 radiation Effects 0.000 abstract 1

Classifications

- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
- C23C16/26—Deposition of carbon only
- C23C16/27—Diamond only
- C23C16/274—Diamond only using microwave discharges
- B—PERFORMING OPERATIONS; TRANSPORTING
- B22—CASTING; POWDER METALLURGY
- B22F—WORKING METALLIC POWDER; MANUFACTURE OF ARTICLES FROM METALLIC POWDER; MAKING METALLIC POWDER; APPARATUS OR DEVICES SPECIALLY ADAPTED FOR METALLIC POWDER
- B22F7/00—Manufacture of composite layers, workpieces, or articles, comprising metallic powder, by sintering the powder, with or without compacting wherein at least one part is obtained by sintering or compression
- B22F7/02—Manufacture of composite layers, workpieces, or articles, comprising metallic powder, by sintering the powder, with or without compacting wherein at least one part is obtained by sintering or compression of composite layers
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/50—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges
- C23C16/511—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges using microwave discharges

Landscapes

Chemical & Material Sciences (AREA)
Engineering & Computer Science (AREA)
Mechanical Engineering (AREA)
Materials Engineering (AREA)
Organic Chemistry (AREA)
Chemical Kinetics & Catalysis (AREA)
General Chemical & Material Sciences (AREA)
Metallurgy (AREA)
Inorganic Chemistry (AREA)
Composite Materials (AREA)
Manufacturing & Machinery (AREA)
Physics & Mathematics (AREA)
Plasma & Fusion (AREA)
Crystals, And After-Treatments Of Crystals (AREA)
Carbon And Carbon Compounds (AREA)
Chemical Vapour Deposition (AREA)
Plasma Technology (AREA)

ZA924765A 1991-06-28 1992-06-26 Plasma assisted diamond synthesis ZA924765B (en)

Applications Claiming Priority (1)

Application Number	Priority Date	Filing Date	Title
GB919114014A GB9114014D0 (en)	1991-06-28	1991-06-28	Plasma assisted diamond synthesis

Publications (1)

Publication Number	Publication Date
ZA924765B true ZA924765B (en)	1993-03-31

Family

ID=10697507

Family Applications (1)

Application Number	Title	Priority Date	Filing Date
ZA924765A ZA924765B (en)	1991-06-28	1992-06-26	Plasma assisted diamond synthesis

Country Status (10)

Country	Link
EP (1)	EP0520832B1 (de)
JP (1)	JPH05239656A (de)
KR (1)	KR930000181A (de)
AT (1)	ATE135752T1 (de)
AU (1)	AU1862392A (de)
CA (1)	CA2072455A1 (de)
DE (1)	DE69209163T2 (de)
GB (1)	GB9114014D0 (de)
TW (1)	TW262626B (de)
ZA (1)	ZA924765B (de)

Families Citing this family (17)

* Cited by examiner, † Cited by third party
Publication number	Priority date	Publication date	Assignee	Title
US5328550A (en) *	1992-10-02	1994-07-12	At&T Bell Laboratories	Thinning a diamond body by means of molten rare-earth-containing alloys
DE10156615B4 (de) *	2001-11-17	2004-10-07	Forschungszentrum Karlsruhe Gmbh	Einrichtung zur Erzeugung eines örtlich variierbaren Elektron-Zyklotron-Resonanz-Mikrowellen-Niederdruckplasmas
US6845734B2 (en)	2002-04-11	2005-01-25	Micron Technology, Inc.	Deposition apparatuses configured for utilizing phased microwave radiation
RU2215061C1 (ru)	2002-09-30	2003-10-27	Институт прикладной физики РАН	Высокоскоростной способ осаждения алмазных пленок из газовой фазы в плазме свч-разряда и плазменный реактор для его реализации
US8555921B2 (en)	2002-12-18	2013-10-15	Vapor Technologies Inc.	Faucet component with coating
US8220489B2 (en)	2002-12-18	2012-07-17	Vapor Technologies Inc.	Faucet with wear-resistant valve component
US7866343B2 (en)	2002-12-18	2011-01-11	Masco Corporation Of Indiana	Faucet
US7866342B2 (en)	2002-12-18	2011-01-11	Vapor Technologies, Inc.	Valve component for faucet
US6904935B2 (en)	2002-12-18	2005-06-14	Masco Corporation Of Indiana	Valve component with multiple surface layers
US20070026205A1 (en)	2005-08-01	2007-02-01	Vapor Technologies Inc.	Article having patterned decorative coating
RU2357001C2 (ru) *	2007-07-25	2009-05-27	Ооо "Твинн"	Способ получения изделий из поликристаллического алмаза
DE102008035917B4 (de) *	2008-08-01	2010-06-17	Eads Deutschland Gmbh	Blitzschutz von Radomen und Sende-/Empfangsvorrichtungen
CN113373425B (zh) *	2020-03-10	2022-06-10	宏硕系统股份有限公司	人造钻石生产装置及其微波发射模块
US11155915B1 (en)	2020-04-13	2021-10-26	Wave Power Technology Inc.	Artificial diamond production device and microwave transmitting module thereof
JP7074795B2 (ja) *	2020-04-21	2022-05-24	宏碩系統股▲フン▼有限公司	合成ダイヤモンドの製造装置及びこれに用いられるマイクロ波発射モジュール
US12084759B2 (en)	2022-01-07	2024-09-10	Wave Power Technology Inc.	Artificial diamond plasma production device
JP7250969B1 (ja) *	2022-02-08	2023-04-03	宏碩系統股▲フン▼有限公司	人工ダイヤモンドプラズマ生成機器

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number	Priority date	Publication date	Assignee	Title
US4434188A (en) *	1981-12-17	1984-02-28	National Institute For Researches In Inorganic Materials	Method for synthesizing diamond
AU560521B2 (en) *	1982-10-18	1987-04-09	Energy Conversion Devices Inc.	Layered amorphous semiconductor alloys

1991
- 1991-06-28 GB GB919114014A patent/GB9114014D0/en active Pending
1992
- 1992-06-26 CA CA002072455A patent/CA2072455A1/en not_active Abandoned
- 1992-06-26 ZA ZA924765A patent/ZA924765B/xx unknown
- 1992-06-26 AU AU18623/92A patent/AU1862392A/en not_active Abandoned
- 1992-06-27 KR KR1019920011419A patent/KR930000181A/ko not_active Withdrawn
- 1992-06-29 DE DE69209163T patent/DE69209163T2/de not_active Expired - Fee Related
- 1992-06-29 EP EP92305950A patent/EP0520832B1/de not_active Expired - Lifetime
- 1992-06-29 AT AT92305950T patent/ATE135752T1/de not_active IP Right Cessation
- 1992-06-29 JP JP4210619A patent/JPH05239656A/ja active Pending
- 1992-07-10 TW TW081105485A patent/TW262626B/zh active

Also Published As

Publication number	Publication date
ATE135752T1 (de)	1996-04-15
AU1862392A (en)	1993-01-07
CA2072455A1 (en)	1992-12-29
KR930000181A (ko)	1993-01-15
TW262626B (de)	1995-11-11
JPH05239656A (ja)	1993-09-17
EP0520832B1 (de)	1996-03-20
EP0520832A1 (de)	1992-12-30
GB9114014D0 (en)	1991-08-14
DE69209163D1 (de)	1996-04-25
DE69209163T2 (de)	1996-08-01

Publication	Publication Date	Title
ZA924765B (en)	1993-03-31	Plasma assisted diamond synthesis
US5154945A (en)	1992-10-13	Methods using lasers to produce deposition of diamond thin films on substrates
US5366556A (en)	1994-11-22	Process and apparatus for production of diamond-like films
EP0439135B1 (de)	1996-05-22	Verfahren zum Herstellen eines Bornitridfilms
JP2589033B2 (ja)	1997-03-12	レーザ補助による化学蒸着法
US20040204785A1 (en)	2004-10-14	Method and system for direct writing, editing and transmitting a three dimensional part and imaging systems therefor
SE8403834D0 (sv)	1984-07-23	Kemisk angavsettning av titannitrid och liknande filmer
US5835519A (en)	1998-11-10	Laser thermal plasma method
EP0265886B1 (de)	1993-04-07	Verfahren zur Herstellung eines Films aus ultrafeinen Teilchen
US5605759A (en)	1997-02-25	Physical vapor deposition of diamond-like carbon films
EP0054189A1 (de)	1982-06-23	Verfahren zur photochemischen Dampfabscheidung
JPH07138761A (ja)	1995-05-30	薄膜の製造方法とその装置
JPH0257476B2 (de)	1990-12-05
US6536237B1 (en)	2003-03-25	Laser annealing system
RU2046843C1 (ru)	1995-10-27	Способ получения поликристаллического селенида цинка
JPH0248627B2 (ja)	1990-10-25	Hakumakukeiseibuhinnoseizohohooyobisochi
EP0319021A2 (de)	1989-06-07	Vorrichtung für laserunterstützten Dampfniederschlag
JPS6478695A (en)	1989-03-24	Method for cutting raw film of polishing film
JPH0814023B2 (ja)	1996-02-14	高圧相窒化ホウ素の気相合成法
JPS63228718A (ja)	1988-09-22	光化学気相成長装置
JPS60236215A (ja)	1985-11-25	レ−ザｃｖｄ方法
JPS60178622A (ja)	1985-09-12	半導体装置の製造方法
JPS61146791A (ja)	1986-07-04	ダイヤモンド膜又はダイヤモンド状炭素膜の形成方法
JP4604233B2 (ja)	2011-01-05	薄膜形成装置並びに薄膜形成方法
JPH0628235B2 (ja)	1994-04-13	薄膜デバイスのビツトパタ−ン形成方法