AT341335B - Verfahren zum beschichten eines langgestreckten tragers mit einem dunnen film durch dampfplasmabeschichtung und vorrichtung zur durchfuhrung dieses verfahrens - Google Patents
Verfahren zum beschichten eines langgestreckten tragers mit einem dunnen film durch dampfplasmabeschichtung und vorrichtung zur durchfuhrung dieses verfahrensInfo
- Publication number
- AT341335B AT341335B AT9674A AT9674A AT341335B AT 341335 B AT341335 B AT 341335B AT 9674 A AT9674 A AT 9674A AT 9674 A AT9674 A AT 9674A AT 341335 B AT341335 B AT 341335B
- Authority
- AT
- Austria
- Prior art keywords
- coating
- carrying
- thin film
- long stretched
- steam plasma
- Prior art date
Links
- 239000011248 coating agent Substances 0.000 title 2
- 238000000576 coating method Methods 0.000 title 2
- 238000000034 method Methods 0.000 title 2
- 238000004326 stimulated echo acquisition mode for imaging Methods 0.000 title 1
- 239000010409 thin film Substances 0.000 title 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/32431—Constructional details of the reactor
- H01J37/32733—Means for moving the material to be treated
- H01J37/32752—Means for moving the material to be treated for moving the material across the discharge
- H01J37/32761—Continuous moving
- H01J37/3277—Continuous moving of continuous material
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/34—Sputtering
- C23C14/3464—Sputtering using more than one target
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/54—Controlling or regulating the coating process
- C23C14/541—Heating or cooling of the substrates
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/56—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks
- C23C14/562—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks for coating elongated substrates
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/34—Gas-filled discharge tubes operating with cathodic sputtering
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Physics & Mathematics (AREA)
- Plasma & Fusion (AREA)
- Analytical Chemistry (AREA)
- Physical Vapour Deposition (AREA)
- Chemical Vapour Deposition (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US323133A US3884787A (en) | 1973-01-12 | 1973-01-12 | Sputtering method for thin film deposition on a substrate |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| ATA9674A ATA9674A (de) | 1977-05-15 |
| AT341335B true AT341335B (de) | 1978-02-10 |
Family
ID=23257860
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| AT9674A AT341335B (de) | 1973-01-12 | 1974-01-07 | Verfahren zum beschichten eines langgestreckten tragers mit einem dunnen film durch dampfplasmabeschichtung und vorrichtung zur durchfuhrung dieses verfahrens |
Country Status (15)
| Country | Link |
|---|---|
| US (1) | US3884787A (fr) |
| JP (1) | JPS5747267B2 (fr) |
| AT (1) | AT341335B (fr) |
| BE (1) | BE809464A (fr) |
| CA (1) | CA1018475A (fr) |
| CH (1) | CH597622A5 (fr) |
| DD (1) | DD109035A5 (fr) |
| DE (1) | DE2400587A1 (fr) |
| FR (1) | FR2322667A1 (fr) |
| GB (1) | GB1461921A (fr) |
| IL (1) | IL43966A (fr) |
| IT (1) | IT1002650B (fr) |
| LU (1) | LU69122A1 (fr) |
| NL (1) | NL7317670A (fr) |
| SE (1) | SE392919B (fr) |
Families Citing this family (35)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3939052A (en) * | 1975-01-15 | 1976-02-17 | Riley Leon H | Depositing optical fibers |
| GB2010676B (en) * | 1977-12-27 | 1982-05-19 | Alza Corp | Diffusional drug delivery device with block copolymer as drug carrier |
| US4331526A (en) * | 1979-09-24 | 1982-05-25 | Coulter Systems Corporation | Continuous sputtering apparatus and method |
| US4290877A (en) * | 1980-09-08 | 1981-09-22 | The United States Of America As Represented By The Secretary Of The Interior | Sputtering apparatus for coating elongated tubes and strips |
| US4384532A (en) * | 1980-10-31 | 1983-05-24 | Staff Arthur B | Table extension for the handicapped |
| DE3112104A1 (de) | 1981-03-27 | 1982-10-07 | Leybold-Heraeus GmbH, 5000 Köln | Verfahren und vorrichtung zum herstellen von elektrisch leitfaehigen transparenten oxidschichten |
| US4343881A (en) * | 1981-07-06 | 1982-08-10 | Savin Corporation | Multilayer photoconductive assembly with intermediate heterojunction |
| US4434037A (en) | 1981-07-16 | 1984-02-28 | Ampex Corporation | High rate sputtering system and method |
| US4389295A (en) * | 1982-05-06 | 1983-06-21 | Gte Products Corporation | Thin film phosphor sputtering process |
| JPS5976571A (ja) * | 1982-10-25 | 1984-05-01 | Natl House Ind Co Ltd | 塗布装置 |
| GB8332394D0 (en) * | 1983-12-05 | 1984-01-11 | Pilkington Brothers Plc | Coating apparatus |
| NL8602759A (nl) * | 1986-10-31 | 1988-05-16 | Bekaert Sa Nv | Werkwijze en inrichting voor het behandelen van een langwerpig substraat, dat van een deklaag voorzien is; alsmede volgens die werkwijze behandelde substraten en met deze substraten versterkte voorwerpen uit polymeermateriaal. |
| US5219668A (en) * | 1986-10-31 | 1993-06-15 | N.V. Bekaert S.A. | Process and apparatus for the treatment of coated, elongated substrate, as well as substrates thus treated and articles of polymeric material reinforced with these substrates |
| US4849087A (en) * | 1988-02-11 | 1989-07-18 | Southwall Technologies | Apparatus for obtaining transverse uniformity during thin film deposition on extended substrate |
| DE3886754D1 (de) * | 1988-10-19 | 1994-02-10 | Ibm Deutschland | Vorrichtung zum Plasma- oder reaktiven Ionenätzen und Verfahren zum Ätzen schlecht wärmeleitender Substrate. |
| DE29600991U1 (de) * | 1996-01-20 | 1997-05-22 | Strämke, Siegfried, Dr.-Ing., 52538 Selfkant | Plasmareaktor |
| US5725706A (en) * | 1996-03-12 | 1998-03-10 | The Whitaker Corporation | Laser transfer deposition |
| US6066826A (en) * | 1998-03-16 | 2000-05-23 | Yializis; Angelo | Apparatus for plasma treatment of moving webs |
| ATE326556T1 (de) * | 2002-03-15 | 2006-06-15 | Vhf Technologies Sa | Vorrichtung und verfahren zur herstellung von flexiblen halbleiter-einrichtungen |
| CH696013A5 (de) * | 2002-10-03 | 2006-11-15 | Tetra Laval Holdings & Finance | Vorrichtung zur Behandlung eines bandförmigen Materials in einem Plasma-unterstützten Prozess. |
| US6906008B2 (en) * | 2003-06-26 | 2005-06-14 | Superpower, Inc. | Apparatus for consecutive deposition of high-temperature superconducting (HTS) buffer layers |
| US7169232B2 (en) * | 2004-06-01 | 2007-01-30 | Eastman Kodak Company | Producing repetitive coatings on a flexible substrate |
| ATE468797T1 (de) * | 2004-12-29 | 2010-06-15 | Sca Hygiene Prod Ab | Freihand-papiertuchspender und spendersystem |
| DE102005058869A1 (de) * | 2005-12-09 | 2007-06-14 | Cis Solartechnik Gmbh & Co. Kg | Verfahren und Vorrichtung zur Beschichtung von Bändern |
| KR100750654B1 (ko) * | 2006-09-15 | 2007-08-20 | 한국전기연구원 | 장선 테이프 증착장치 |
| KR100928222B1 (ko) * | 2007-10-31 | 2009-11-24 | 한국전기연구원 | 가이드 롤러가 구비된 장선 증착 장치 |
| US20090194505A1 (en) * | 2008-01-24 | 2009-08-06 | Microcontinuum, Inc. | Vacuum coating techniques |
| EP2113585A1 (fr) * | 2008-04-29 | 2009-11-04 | Applied Materials, Inc. | Dispositif et procédé de revêtement de bandes sous vide par tordre et guider la bande à plusiers reprises le long d'un cylindre devant un région de traitement |
| TW201110831A (en) * | 2009-09-03 | 2011-03-16 | Chunghwa Picture Tubes Ltd | Plasma apparatus and method of fabricating nano-crystalline silicon thin film |
| PL2508315T3 (pl) | 2011-04-07 | 2014-02-28 | Gedore Werkzeugfabrik Gmbh & Co Kg | Klin rozszczepiający |
| US9869782B2 (en) * | 2012-10-22 | 2018-01-16 | Proportional Technologies, Inc. | Method and apparatus for coating thin foil with a boron coating |
| KR20140061808A (ko) * | 2012-11-14 | 2014-05-22 | 삼성디스플레이 주식회사 | 유기물 증착 장치 |
| US10112836B2 (en) * | 2012-11-26 | 2018-10-30 | The Regents Of The University Of Michigan | Continuous nanosynthesis apparatus and process |
| EP4200461A4 (fr) * | 2020-08-21 | 2024-09-18 | Applied Materials, Inc. | Système de traitement pour traiter un substrat souple et procédé de mesure d'au moins l'une d'une propriété d'un substrat souple et d'une propriété d'un ou plusieurs revêtements sur le substrat souple |
| CN113413895B (zh) * | 2021-07-09 | 2022-03-29 | 苏州道一至诚纳米材料技术有限公司 | 薄膜催化剂的生产设备及生产方法 |
Family Cites Families (10)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US2249710A (en) * | 1935-02-18 | 1941-07-15 | Ind Rayon Corp | Apparatus for continuously processing thread or the like |
| NL143409C (fr) * | 1947-11-20 | |||
| US3068510A (en) * | 1959-12-14 | 1962-12-18 | Radiation Res Corp | Polymerizing method and apparatus |
| BE599444A (fr) * | 1960-02-03 | |||
| US3343207A (en) * | 1963-10-14 | 1967-09-26 | Monsanto Co | Novelty yarn apparatus |
| US3272175A (en) * | 1965-05-12 | 1966-09-13 | Heraeus Gmbh W C | Vapor deposition means for strip-coating continuously moving, helically wound ribbon |
| US3477902A (en) * | 1965-10-14 | 1969-11-11 | Radiation Res Corp | Process for making tires by exposure to an ionized gas and treatment with resorcinol-formaldehyde/latex composition and the product |
| DE1802932B2 (de) * | 1968-10-14 | 1974-11-14 | W.C. Heraeus Gmbh, 6450 Hanau | Verfahren zur Herstellung eines elektrischen Schaltkontaktes |
| US3598639A (en) * | 1968-12-09 | 1971-08-10 | Bror Olov Nikolaus Hansson | Method of continuously producing metal wire and profiles |
| US3700489A (en) * | 1970-07-30 | 1972-10-24 | Ethicon Inc | Process for applying a thin coating of polytetrafluoroethylene |
-
1973
- 1973-01-12 US US323133A patent/US3884787A/en not_active Expired - Lifetime
- 1973-12-27 NL NL7317670A patent/NL7317670A/xx not_active Application Discontinuation
-
1974
- 1974-01-07 FR FR7400468A patent/FR2322667A1/fr active Granted
- 1974-01-07 LU LU69122A patent/LU69122A1/xx unknown
- 1974-01-07 CH CH22474A patent/CH597622A5/xx not_active IP Right Cessation
- 1974-01-07 BE BE139580A patent/BE809464A/fr not_active IP Right Cessation
- 1974-01-07 JP JP49005003A patent/JPS5747267B2/ja not_active Expired
- 1974-01-07 DE DE2400587A patent/DE2400587A1/de not_active Withdrawn
- 1974-01-07 IL IL43966A patent/IL43966A/en unknown
- 1974-01-07 AT AT9674A patent/AT341335B/de not_active IP Right Cessation
- 1974-01-07 CA CA189,611A patent/CA1018475A/en not_active Expired
- 1974-01-07 GB GB64474A patent/GB1461921A/en not_active Expired
- 1974-01-10 DD DD175932A patent/DD109035A5/xx unknown
- 1974-01-11 SE SE7400351A patent/SE392919B/xx unknown
- 1974-01-14 IT IT47682/74A patent/IT1002650B/it active
Also Published As
| Publication number | Publication date |
|---|---|
| GB1461921A (en) | 1977-01-19 |
| BE809464A (fr) | 1974-07-08 |
| CH597622A5 (fr) | 1978-04-14 |
| US3884787A (en) | 1975-05-20 |
| JPS5747267B2 (fr) | 1982-10-08 |
| DE2400587A1 (de) | 1974-07-18 |
| LU69122A1 (fr) | 1975-12-09 |
| JPS49104972A (fr) | 1974-10-04 |
| DD109035A5 (fr) | 1974-10-12 |
| FR2322667A1 (fr) | 1977-04-01 |
| CA1018475A (en) | 1977-10-04 |
| SE392919B (sv) | 1977-04-25 |
| FR2322667B1 (fr) | 1978-10-27 |
| IL43966A (en) | 1976-12-31 |
| IL43966A0 (en) | 1974-06-30 |
| ATA9674A (de) | 1977-05-15 |
| NL7317670A (fr) | 1974-07-16 |
| IT1002650B (it) | 1976-05-20 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| EFA | Change in the company name | ||
| ELJ | Ceased due to non-payment of the annual fee | ||
| UEP | Publication of translation of european patent specification | ||
| REN | Ceased due to non-payment of the annual fee |