IL43966A - Method and apparatus for thin film deposition on a substrate by plasma vapor sputtering - Google Patents

Method and apparatus for thin film deposition on a substrate by plasma vapor sputtering

Info

Publication number
IL43966A
IL43966A IL43966A IL4396674A IL43966A IL 43966 A IL43966 A IL 43966A IL 43966 A IL43966 A IL 43966A IL 4396674 A IL4396674 A IL 4396674A IL 43966 A IL43966 A IL 43966A
Authority
IL
Israel
Prior art keywords
substrate
drum
path
vessel
cylinder
Prior art date
Application number
IL43966A
Other languages
English (en)
Other versions
IL43966A0 (en
Original Assignee
Coulter Information Systems
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Coulter Information Systems filed Critical Coulter Information Systems
Publication of IL43966A0 publication Critical patent/IL43966A0/xx
Publication of IL43966A publication Critical patent/IL43966A/en

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32431—Constructional details of the reactor
    • H01J37/32733—Means for moving the material to be treated
    • H01J37/32752—Means for moving the material to be treated for moving the material across the discharge
    • H01J37/32761—Continuous moving
    • H01J37/3277—Continuous moving of continuous material
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/34—Sputtering
    • C23C14/3464—Sputtering using more than one target
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/54—Controlling or regulating the coating process
    • C23C14/541—Heating or cooling of the substrates
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/56—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks
    • C23C14/562—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks for coating elongated substrates
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/34—Gas-filled discharge tubes operating with cathodic sputtering

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • Plasma & Fusion (AREA)
  • Analytical Chemistry (AREA)
  • Physical Vapour Deposition (AREA)
  • Chemical Vapour Deposition (AREA)
IL43966A 1973-01-12 1974-01-07 Method and apparatus for thin film deposition on a substrate by plasma vapor sputtering IL43966A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US323133A US3884787A (en) 1973-01-12 1973-01-12 Sputtering method for thin film deposition on a substrate

Publications (2)

Publication Number Publication Date
IL43966A0 IL43966A0 (en) 1974-06-30
IL43966A true IL43966A (en) 1976-12-31

Family

ID=23257860

Family Applications (1)

Application Number Title Priority Date Filing Date
IL43966A IL43966A (en) 1973-01-12 1974-01-07 Method and apparatus for thin film deposition on a substrate by plasma vapor sputtering

Country Status (15)

Country Link
US (1) US3884787A (fr)
JP (1) JPS5747267B2 (fr)
AT (1) AT341335B (fr)
BE (1) BE809464A (fr)
CA (1) CA1018475A (fr)
CH (1) CH597622A5 (fr)
DD (1) DD109035A5 (fr)
DE (1) DE2400587A1 (fr)
FR (1) FR2322667A1 (fr)
GB (1) GB1461921A (fr)
IL (1) IL43966A (fr)
IT (1) IT1002650B (fr)
LU (1) LU69122A1 (fr)
NL (1) NL7317670A (fr)
SE (1) SE392919B (fr)

Families Citing this family (35)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3939052A (en) * 1975-01-15 1976-02-17 Riley Leon H Depositing optical fibers
GB2010676B (en) * 1977-12-27 1982-05-19 Alza Corp Diffusional drug delivery device with block copolymer as drug carrier
US4331526A (en) * 1979-09-24 1982-05-25 Coulter Systems Corporation Continuous sputtering apparatus and method
US4290877A (en) * 1980-09-08 1981-09-22 The United States Of America As Represented By The Secretary Of The Interior Sputtering apparatus for coating elongated tubes and strips
US4384532A (en) * 1980-10-31 1983-05-24 Staff Arthur B Table extension for the handicapped
DE3112104A1 (de) 1981-03-27 1982-10-07 Leybold-Heraeus GmbH, 5000 Köln Verfahren und vorrichtung zum herstellen von elektrisch leitfaehigen transparenten oxidschichten
US4343881A (en) * 1981-07-06 1982-08-10 Savin Corporation Multilayer photoconductive assembly with intermediate heterojunction
US4434037A (en) 1981-07-16 1984-02-28 Ampex Corporation High rate sputtering system and method
US4389295A (en) * 1982-05-06 1983-06-21 Gte Products Corporation Thin film phosphor sputtering process
JPS5976571A (ja) * 1982-10-25 1984-05-01 Natl House Ind Co Ltd 塗布装置
GB8332394D0 (en) * 1983-12-05 1984-01-11 Pilkington Brothers Plc Coating apparatus
NL8602759A (nl) * 1986-10-31 1988-05-16 Bekaert Sa Nv Werkwijze en inrichting voor het behandelen van een langwerpig substraat, dat van een deklaag voorzien is; alsmede volgens die werkwijze behandelde substraten en met deze substraten versterkte voorwerpen uit polymeermateriaal.
US5219668A (en) * 1986-10-31 1993-06-15 N.V. Bekaert S.A. Process and apparatus for the treatment of coated, elongated substrate, as well as substrates thus treated and articles of polymeric material reinforced with these substrates
US4849087A (en) * 1988-02-11 1989-07-18 Southwall Technologies Apparatus for obtaining transverse uniformity during thin film deposition on extended substrate
DE3886754D1 (de) * 1988-10-19 1994-02-10 Ibm Deutschland Vorrichtung zum Plasma- oder reaktiven Ionenätzen und Verfahren zum Ätzen schlecht wärmeleitender Substrate.
DE29600991U1 (de) * 1996-01-20 1997-05-22 Strämke, Siegfried, Dr.-Ing., 52538 Selfkant Plasmareaktor
US5725706A (en) * 1996-03-12 1998-03-10 The Whitaker Corporation Laser transfer deposition
US6066826A (en) * 1998-03-16 2000-05-23 Yializis; Angelo Apparatus for plasma treatment of moving webs
ATE326556T1 (de) * 2002-03-15 2006-06-15 Vhf Technologies Sa Vorrichtung und verfahren zur herstellung von flexiblen halbleiter-einrichtungen
CH696013A5 (de) * 2002-10-03 2006-11-15 Tetra Laval Holdings & Finance Vorrichtung zur Behandlung eines bandförmigen Materials in einem Plasma-unterstützten Prozess.
US6906008B2 (en) * 2003-06-26 2005-06-14 Superpower, Inc. Apparatus for consecutive deposition of high-temperature superconducting (HTS) buffer layers
US7169232B2 (en) * 2004-06-01 2007-01-30 Eastman Kodak Company Producing repetitive coatings on a flexible substrate
ATE468797T1 (de) * 2004-12-29 2010-06-15 Sca Hygiene Prod Ab Freihand-papiertuchspender und spendersystem
DE102005058869A1 (de) * 2005-12-09 2007-06-14 Cis Solartechnik Gmbh & Co. Kg Verfahren und Vorrichtung zur Beschichtung von Bändern
KR100750654B1 (ko) * 2006-09-15 2007-08-20 한국전기연구원 장선 테이프 증착장치
KR100928222B1 (ko) * 2007-10-31 2009-11-24 한국전기연구원 가이드 롤러가 구비된 장선 증착 장치
US20090194505A1 (en) * 2008-01-24 2009-08-06 Microcontinuum, Inc. Vacuum coating techniques
EP2113585A1 (fr) * 2008-04-29 2009-11-04 Applied Materials, Inc. Dispositif et procédé de revêtement de bandes sous vide par tordre et guider la bande à plusiers reprises le long d'un cylindre devant un région de traitement
TW201110831A (en) * 2009-09-03 2011-03-16 Chunghwa Picture Tubes Ltd Plasma apparatus and method of fabricating nano-crystalline silicon thin film
PL2508315T3 (pl) 2011-04-07 2014-02-28 Gedore Werkzeugfabrik Gmbh & Co Kg Klin rozszczepiający
US9869782B2 (en) * 2012-10-22 2018-01-16 Proportional Technologies, Inc. Method and apparatus for coating thin foil with a boron coating
KR20140061808A (ko) * 2012-11-14 2014-05-22 삼성디스플레이 주식회사 유기물 증착 장치
US10112836B2 (en) * 2012-11-26 2018-10-30 The Regents Of The University Of Michigan Continuous nanosynthesis apparatus and process
EP4200461A4 (fr) * 2020-08-21 2024-09-18 Applied Materials, Inc. Système de traitement pour traiter un substrat souple et procédé de mesure d'au moins l'une d'une propriété d'un substrat souple et d'une propriété d'un ou plusieurs revêtements sur le substrat souple
CN113413895B (zh) * 2021-07-09 2022-03-29 苏州道一至诚纳米材料技术有限公司 薄膜催化剂的生产设备及生产方法

Family Cites Families (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2249710A (en) * 1935-02-18 1941-07-15 Ind Rayon Corp Apparatus for continuously processing thread or the like
NL143409C (fr) * 1947-11-20
US3068510A (en) * 1959-12-14 1962-12-18 Radiation Res Corp Polymerizing method and apparatus
BE599444A (fr) * 1960-02-03
US3343207A (en) * 1963-10-14 1967-09-26 Monsanto Co Novelty yarn apparatus
US3272175A (en) * 1965-05-12 1966-09-13 Heraeus Gmbh W C Vapor deposition means for strip-coating continuously moving, helically wound ribbon
US3477902A (en) * 1965-10-14 1969-11-11 Radiation Res Corp Process for making tires by exposure to an ionized gas and treatment with resorcinol-formaldehyde/latex composition and the product
DE1802932B2 (de) * 1968-10-14 1974-11-14 W.C. Heraeus Gmbh, 6450 Hanau Verfahren zur Herstellung eines elektrischen Schaltkontaktes
US3598639A (en) * 1968-12-09 1971-08-10 Bror Olov Nikolaus Hansson Method of continuously producing metal wire and profiles
US3700489A (en) * 1970-07-30 1972-10-24 Ethicon Inc Process for applying a thin coating of polytetrafluoroethylene

Also Published As

Publication number Publication date
GB1461921A (en) 1977-01-19
BE809464A (fr) 1974-07-08
CH597622A5 (fr) 1978-04-14
US3884787A (en) 1975-05-20
JPS5747267B2 (fr) 1982-10-08
DE2400587A1 (de) 1974-07-18
LU69122A1 (fr) 1975-12-09
JPS49104972A (fr) 1974-10-04
DD109035A5 (fr) 1974-10-12
FR2322667A1 (fr) 1977-04-01
CA1018475A (en) 1977-10-04
SE392919B (sv) 1977-04-25
FR2322667B1 (fr) 1978-10-27
IL43966A0 (en) 1974-06-30
ATA9674A (de) 1977-05-15
NL7317670A (fr) 1974-07-16
AT341335B (de) 1978-02-10
IT1002650B (it) 1976-05-20

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