JPS5747267B2 - - Google Patents

Info

Publication number
JPS5747267B2
JPS5747267B2 JP49005003A JP500374A JPS5747267B2 JP S5747267 B2 JPS5747267 B2 JP S5747267B2 JP 49005003 A JP49005003 A JP 49005003A JP 500374 A JP500374 A JP 500374A JP S5747267 B2 JPS5747267 B2 JP S5747267B2
Authority
JP
Japan
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP49005003A
Other languages
Japanese (ja)
Other versions
JPS49104972A (fr
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Publication of JPS49104972A publication Critical patent/JPS49104972A/ja
Publication of JPS5747267B2 publication Critical patent/JPS5747267B2/ja
Expired legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32431—Constructional details of the reactor
    • H01J37/32733—Means for moving the material to be treated
    • H01J37/32752—Means for moving the material to be treated for moving the material across the discharge
    • H01J37/32761—Continuous moving
    • H01J37/3277—Continuous moving of continuous material
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/34—Sputtering
    • C23C14/3464—Sputtering using more than one target
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/54—Controlling or regulating the coating process
    • C23C14/541—Heating or cooling of the substrates
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/56—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks
    • C23C14/562—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks for coating elongated substrates
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/34—Gas-filled discharge tubes operating with cathodic sputtering

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • Plasma & Fusion (AREA)
  • Analytical Chemistry (AREA)
  • Physical Vapour Deposition (AREA)
  • Chemical Vapour Deposition (AREA)
JP49005003A 1973-01-12 1974-01-07 Expired JPS5747267B2 (fr)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US323133A US3884787A (en) 1973-01-12 1973-01-12 Sputtering method for thin film deposition on a substrate

Publications (2)

Publication Number Publication Date
JPS49104972A JPS49104972A (fr) 1974-10-04
JPS5747267B2 true JPS5747267B2 (fr) 1982-10-08

Family

ID=23257860

Family Applications (1)

Application Number Title Priority Date Filing Date
JP49005003A Expired JPS5747267B2 (fr) 1973-01-12 1974-01-07

Country Status (15)

Country Link
US (1) US3884787A (fr)
JP (1) JPS5747267B2 (fr)
AT (1) AT341335B (fr)
BE (1) BE809464A (fr)
CA (1) CA1018475A (fr)
CH (1) CH597622A5 (fr)
DD (1) DD109035A5 (fr)
DE (1) DE2400587A1 (fr)
FR (1) FR2322667A1 (fr)
GB (1) GB1461921A (fr)
IL (1) IL43966A (fr)
IT (1) IT1002650B (fr)
LU (1) LU69122A1 (fr)
NL (1) NL7317670A (fr)
SE (1) SE392919B (fr)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5976571A (ja) * 1982-10-25 1984-05-01 Natl House Ind Co Ltd 塗布装置

Families Citing this family (34)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3939052A (en) * 1975-01-15 1976-02-17 Riley Leon H Depositing optical fibers
GB2010676B (en) * 1977-12-27 1982-05-19 Alza Corp Diffusional drug delivery device with block copolymer as drug carrier
US4331526A (en) * 1979-09-24 1982-05-25 Coulter Systems Corporation Continuous sputtering apparatus and method
US4290877A (en) * 1980-09-08 1981-09-22 The United States Of America As Represented By The Secretary Of The Interior Sputtering apparatus for coating elongated tubes and strips
US4384532A (en) * 1980-10-31 1983-05-24 Staff Arthur B Table extension for the handicapped
DE3112104A1 (de) 1981-03-27 1982-10-07 Leybold-Heraeus GmbH, 5000 Köln Verfahren und vorrichtung zum herstellen von elektrisch leitfaehigen transparenten oxidschichten
US4343881A (en) * 1981-07-06 1982-08-10 Savin Corporation Multilayer photoconductive assembly with intermediate heterojunction
US4434037A (en) 1981-07-16 1984-02-28 Ampex Corporation High rate sputtering system and method
US4389295A (en) * 1982-05-06 1983-06-21 Gte Products Corporation Thin film phosphor sputtering process
GB8332394D0 (en) * 1983-12-05 1984-01-11 Pilkington Brothers Plc Coating apparatus
US5219668A (en) * 1986-10-31 1993-06-15 N.V. Bekaert S.A. Process and apparatus for the treatment of coated, elongated substrate, as well as substrates thus treated and articles of polymeric material reinforced with these substrates
NL8602759A (nl) * 1986-10-31 1988-05-16 Bekaert Sa Nv Werkwijze en inrichting voor het behandelen van een langwerpig substraat, dat van een deklaag voorzien is; alsmede volgens die werkwijze behandelde substraten en met deze substraten versterkte voorwerpen uit polymeermateriaal.
US4849087A (en) * 1988-02-11 1989-07-18 Southwall Technologies Apparatus for obtaining transverse uniformity during thin film deposition on extended substrate
EP0364619B1 (fr) * 1988-10-19 1993-12-29 Ibm Deutschland Gmbh Dispositif de gravure ionique réactive ou par plasma et procédé de gravure de substrats mauvais conducteurs thermiques
DE29600991U1 (de) * 1996-01-20 1997-05-22 Strämke, Siegfried, Dr.-Ing., 52538 Selfkant Plasmareaktor
US5725706A (en) * 1996-03-12 1998-03-10 The Whitaker Corporation Laser transfer deposition
US6066826A (en) * 1998-03-16 2000-05-23 Yializis; Angelo Apparatus for plasma treatment of moving webs
PT1347077E (pt) * 2002-03-15 2006-09-29 Vhf Technologies Sa Aparelho e metodo para a producao de dispositivos semicondutores flexiveis
CH696013A5 (de) * 2002-10-03 2006-11-15 Tetra Laval Holdings & Finance Vorrichtung zur Behandlung eines bandförmigen Materials in einem Plasma-unterstützten Prozess.
US6906008B2 (en) * 2003-06-26 2005-06-14 Superpower, Inc. Apparatus for consecutive deposition of high-temperature superconducting (HTS) buffer layers
US7169232B2 (en) * 2004-06-01 2007-01-30 Eastman Kodak Company Producing repetitive coatings on a flexible substrate
MX2007007907A (es) * 2004-12-29 2007-08-17 Sca Hygiene Prod Ab Un dispensador a manos libres de toallas de papel y sistema de distribucion.
DE102005058869A1 (de) * 2005-12-09 2007-06-14 Cis Solartechnik Gmbh & Co. Kg Verfahren und Vorrichtung zur Beschichtung von Bändern
KR100750654B1 (ko) * 2006-09-15 2007-08-20 한국전기연구원 장선 테이프 증착장치
KR100928222B1 (ko) * 2007-10-31 2009-11-24 한국전기연구원 가이드 롤러가 구비된 장선 증착 장치
WO2009094622A2 (fr) * 2008-01-24 2009-07-30 Microcontinuum, Inc. Techniques de revêtement sous vide
EP2113585A1 (fr) * 2008-04-29 2009-11-04 Applied Materials, Inc. Dispositif et procédé de revêtement de bandes sous vide par tordre et guider la bande à plusiers reprises le long d'un cylindre devant un région de traitement
TW201110831A (en) * 2009-09-03 2011-03-16 Chunghwa Picture Tubes Ltd Plasma apparatus and method of fabricating nano-crystalline silicon thin film
SI2508315T1 (sl) 2011-04-07 2014-01-31 Gedore-Werkzeugfabrik Gmbh & Co. Kg Cepilni klin
US9869782B2 (en) * 2012-10-22 2018-01-16 Proportional Technologies, Inc. Method and apparatus for coating thin foil with a boron coating
KR20140061808A (ko) * 2012-11-14 2014-05-22 삼성디스플레이 주식회사 유기물 증착 장치
US10112836B2 (en) * 2012-11-26 2018-10-30 The Regents Of The University Of Michigan Continuous nanosynthesis apparatus and process
WO2022040075A1 (fr) * 2020-08-21 2022-02-24 Applied Materials, Inc. Système de traitement pour traiter un substrat souple et procédé de mesure d'au moins l'une d'une propriété d'un substrat souple et d'une propriété d'un ou plusieurs revêtements sur le substrat souple
CN113413895B (zh) * 2021-07-09 2022-03-29 苏州道一至诚纳米材料技术有限公司 薄膜催化剂的生产设备及生产方法

Family Cites Families (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2249710A (en) * 1935-02-18 1941-07-15 Ind Rayon Corp Apparatus for continuously processing thread or the like
BE485884A (fr) * 1947-11-20
US3068510A (en) * 1959-12-14 1962-12-18 Radiation Res Corp Polymerizing method and apparatus
BE599444A (fr) * 1960-02-03
US3343207A (en) * 1963-10-14 1967-09-26 Monsanto Co Novelty yarn apparatus
US3272175A (en) * 1965-05-12 1966-09-13 Heraeus Gmbh W C Vapor deposition means for strip-coating continuously moving, helically wound ribbon
US3477902A (en) * 1965-10-14 1969-11-11 Radiation Res Corp Process for making tires by exposure to an ionized gas and treatment with resorcinol-formaldehyde/latex composition and the product
DE1802932B2 (de) * 1968-10-14 1974-11-14 W.C. Heraeus Gmbh, 6450 Hanau Verfahren zur Herstellung eines elektrischen Schaltkontaktes
US3598639A (en) * 1968-12-09 1971-08-10 Bror Olov Nikolaus Hansson Method of continuously producing metal wire and profiles
US3700489A (en) * 1970-07-30 1972-10-24 Ethicon Inc Process for applying a thin coating of polytetrafluoroethylene

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5976571A (ja) * 1982-10-25 1984-05-01 Natl House Ind Co Ltd 塗布装置

Also Published As

Publication number Publication date
FR2322667B1 (fr) 1978-10-27
LU69122A1 (fr) 1975-12-09
ATA9674A (de) 1977-05-15
IT1002650B (it) 1976-05-20
FR2322667A1 (fr) 1977-04-01
CH597622A5 (fr) 1978-04-14
DE2400587A1 (de) 1974-07-18
JPS49104972A (fr) 1974-10-04
SE392919B (sv) 1977-04-25
IL43966A (en) 1976-12-31
BE809464A (fr) 1974-07-08
IL43966A0 (en) 1974-06-30
GB1461921A (en) 1977-01-19
CA1018475A (en) 1977-10-04
US3884787A (en) 1975-05-20
NL7317670A (fr) 1974-07-16
AT341335B (de) 1978-02-10
DD109035A5 (fr) 1974-10-12

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