ATE124542T1 - Verfahren zur herstellung einer optischen struktur und damit hergestellte optische struktur. - Google Patents

Verfahren zur herstellung einer optischen struktur und damit hergestellte optische struktur.

Info

Publication number
ATE124542T1
ATE124542T1 AT92401596T AT92401596T ATE124542T1 AT E124542 T1 ATE124542 T1 AT E124542T1 AT 92401596 T AT92401596 T AT 92401596T AT 92401596 T AT92401596 T AT 92401596T AT E124542 T1 ATE124542 T1 AT E124542T1
Authority
AT
Austria
Prior art keywords
optical structure
deposition
producing
produced therefrom
micron thick
Prior art date
Application number
AT92401596T
Other languages
English (en)
Inventor
Jean-Christophe Rostaing
Francois Coeuret
Original Assignee
Air Liquide
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Air Liquide filed Critical Air Liquide
Application granted granted Critical
Publication of ATE124542T1 publication Critical patent/ATE124542T1/de

Links

Classifications

    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
    • G02B1/10—Optical coatings produced by application to, or surface treatment of, optical elements
    • G02B1/14—Protective coatings, e.g. hard coatings
    • G02B1/105—
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
    • C23C16/30—Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
    • C23C16/40—Oxides
    • C23C16/401—Oxides containing silicon
    • C23C16/402—Silicon dioxide
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/50—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges
    • C23C16/505—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges using radio frequency discharges

Landscapes

  • Chemical & Material Sciences (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Engineering & Computer Science (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • General Chemical & Material Sciences (AREA)
  • Inorganic Chemistry (AREA)
  • Plasma & Fusion (AREA)
  • Laminated Bodies (AREA)
  • Surface Treatment Of Optical Elements (AREA)
  • Glass Compositions (AREA)
  • Chemical Vapour Deposition (AREA)
  • Eyeglasses (AREA)
  • Optical Fibers, Optical Fiber Cores, And Optical Fiber Bundles (AREA)
  • Polarising Elements (AREA)
AT92401596T 1991-06-12 1992-06-10 Verfahren zur herstellung einer optischen struktur und damit hergestellte optische struktur. ATE124542T1 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
FR9107140A FR2677773B1 (fr) 1991-06-12 1991-06-12 Procede d'elaboration d'une structure optique et structure optique ainsi realisee.

Publications (1)

Publication Number Publication Date
ATE124542T1 true ATE124542T1 (de) 1995-07-15

Family

ID=9413735

Family Applications (1)

Application Number Title Priority Date Filing Date
AT92401596T ATE124542T1 (de) 1991-06-12 1992-06-10 Verfahren zur herstellung einer optischen struktur und damit hergestellte optische struktur.

Country Status (8)

Country Link
EP (1) EP0519784B1 (de)
JP (1) JPH05287537A (de)
KR (1) KR930000966A (de)
AT (1) ATE124542T1 (de)
CA (1) CA2070959A1 (de)
DE (1) DE69203165T2 (de)
ES (1) ES2074345T3 (de)
FR (1) FR2677773B1 (de)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5909314A (en) 1994-02-15 1999-06-01 Dai Nippon Printing Co., Ltd. Optical functional materials and process for producing the same
FR2741328B1 (fr) * 1995-11-20 1997-12-19 Commissariat Energie Atomique Boite de stockage d'un objet destine a etre protege d'une contamination physico-chimique
ES2176589T3 (es) 1997-11-17 2002-12-01 Alanod Al Veredlung Gmbh Material compuesto, en particular para reflectores.
JP2013227626A (ja) * 2012-04-26 2013-11-07 Kojima Press Industry Co Ltd Ｃｖｄ膜の形成方法並びに積層構造体

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE3624467A1 (de) * 1986-07-19 1988-01-28 Leybold Heraeus Gmbh & Co Kg Verfahren zum herstellen transparenter schutzschichten aus siliziumverbindungen
FR2614317B1 (fr) * 1987-04-22 1989-07-13 Air Liquide Procede de protection de substrat polymerique par depot par plasma de composes du type oxynitrure de silicium et dispositif pour sa mise en oeuvre.
IT1204006B (it) * 1987-05-05 1989-02-23 Eniricerche Spa Procedimento per la preparazione di film poliolefinici metallizzabili
US4927704A (en) * 1987-08-24 1990-05-22 General Electric Company Abrasion-resistant plastic articles and method for making them

Also Published As

Publication number Publication date
ES2074345T3 (es) 1995-09-01
EP0519784A1 (de) 1992-12-23
KR930000966A (ko) 1993-01-16
DE69203165D1 (de) 1995-08-03
DE69203165T2 (de) 1995-11-16
EP0519784B1 (de) 1995-06-28
FR2677773A1 (fr) 1992-12-18
FR2677773B1 (fr) 1994-04-29
CA2070959A1 (fr) 1992-12-13
JPH05287537A (ja) 1993-11-02

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Legal Events

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