ATE126366T1 - Gasphasen-aufgebrachte photolacke aus anionisch polymerisierbaren monomeren. - Google Patents

Gasphasen-aufgebrachte photolacke aus anionisch polymerisierbaren monomeren.

Info

Publication number
ATE126366T1
ATE126366T1 AT90201328T AT90201328T ATE126366T1 AT E126366 T1 ATE126366 T1 AT E126366T1 AT 90201328 T AT90201328 T AT 90201328T AT 90201328 T AT90201328 T AT 90201328T AT E126366 T1 ATE126366 T1 AT E126366T1
Authority
AT
Austria
Prior art keywords
substrate
photoresistants
gas phase
polymerizable monomers
anionic polymerizable
Prior art date
Application number
AT90201328T
Other languages
English (en)
Inventor
John G Woods
John M Rooney
Original Assignee
Loctite Ireland Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from US06/828,107 external-priority patent/US4675273A/en
Priority claimed from US06/828,109 external-priority patent/US4675270A/en
Application filed by Loctite Ireland Ltd filed Critical Loctite Ireland Ltd
Application granted granted Critical
Publication of ATE126366T1 publication Critical patent/ATE126366T1/de

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/16—Coating processes; Apparatus therefor
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/16—Coating processes; Apparatus therefor
    • G03F7/167—Coating processes; Apparatus therefor from the gas phase, by plasma deposition
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/40—Treatment after imagewise removal, e.g. baking

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
  • Polymerisation Methods In General (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Materials For Photolithography (AREA)
  • Physical Vapour Deposition (AREA)
AT90201328T 1986-02-10 1987-02-10 Gasphasen-aufgebrachte photolacke aus anionisch polymerisierbaren monomeren. ATE126366T1 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US06/828,107 US4675273A (en) 1986-02-10 1986-02-10 Resists formed by vapor deposition of anionically polymerizable monomer
US06/828,109 US4675270A (en) 1986-02-10 1986-02-10 Imaging method for vapor deposited photoresists of anionically polymerizable monomer

Publications (1)

Publication Number Publication Date
ATE126366T1 true ATE126366T1 (de) 1995-08-15

Family

ID=27125161

Family Applications (1)

Application Number Title Priority Date Filing Date
AT90201328T ATE126366T1 (de) 1986-02-10 1987-02-10 Gasphasen-aufgebrachte photolacke aus anionisch polymerisierbaren monomeren.

Country Status (5)

Country Link
EP (2) EP0393799B1 (de)
JP (1) JPH07120047B2 (de)
AT (1) ATE126366T1 (de)
DE (2) DE3782833T2 (de)
HK (1) HK1005323A1 (de)

Families Citing this family (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2550655B2 (ja) * 1988-04-26 1996-11-06 凸版印刷株式会社 ポジ型電子線レジスト
JPH022564A (ja) * 1988-06-15 1990-01-08 Toagosei Chem Ind Co Ltd ポジ型電子線レジスト
JPH02113253A (ja) * 1988-10-24 1990-04-25 Toagosei Chem Ind Co Ltd ポジ型レジスト
JP2574458B2 (ja) * 1989-04-12 1997-01-22 川崎製鉄株式会社 指紋検出方法
US7435353B2 (en) * 2004-12-09 2008-10-14 President And Fellows Of Harvard College Patterning by energetically-stimulated local removal of solid-condensed-gas layers and solid state chemical reactions produced with such layers
US7524431B2 (en) 2004-12-09 2009-04-28 President And Fellows Of Harvard College Lift-off patterning processing employing energetically-stimulated local removal of solid-condensed-gas layers
US8841152B2 (en) 2011-05-19 2014-09-23 Massachusetts Institute Of Technology Method of lift-off patterning thin films in situ employing phase change resists
WO2021059189A1 (en) * 2019-09-27 2021-04-01 3M Innovative Properties Company Molding process and compositions therefor

Family Cites Families (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US455041A (en) 1891-06-30 Ner-alteneck
US3922449A (en) * 1973-11-26 1975-11-25 Loctite Ireland Ltd Interfitting threaded part and process of preparing same
US4081276A (en) * 1976-10-18 1978-03-28 General Electric Company Photographic method
JPS55105244A (en) * 1979-02-06 1980-08-12 Victor Co Of Japan Ltd Electron beam resist
US4382985A (en) * 1980-10-11 1983-05-10 Daikin Kogyo Co., Ltd. Process for forming film of fluoroalkyl acrylate polymer on substrate and process for preparing patterned resist from the film
US4348473A (en) * 1981-03-04 1982-09-07 Xerox Corporation Dry process for the production of microelectronic devices
US4460436A (en) * 1983-09-06 1984-07-17 International Business Machines Corporation Deposition of polymer films by means of ion beams
JPS60501777A (ja) * 1983-11-02 1985-10-17 ヒユ−ズ・エアクラフト・カンパニ− 二酸化ケイ素系グラフト重合リソグラフマスク
GB8402937D0 (en) * 1984-02-03 1984-03-07 Ciba Geigy Ag Production of images
JPH067545B2 (ja) * 1984-04-20 1994-01-26 株式会社日立製作所 パタ−ン形成方法
US4550041A (en) * 1984-12-14 1985-10-29 Loctite Corporation Article containing a thixotropic additive and cyanoacrylate monomer employed for developing latent fingerprints
US4551418A (en) * 1985-02-19 1985-11-05 International Business Machines Corporation Process for preparing negative relief images with cationic photopolymerization

Also Published As

Publication number Publication date
EP0393799A3 (de) 1992-05-27
EP0233747B1 (de) 1992-12-02
DE3751453T2 (de) 1996-04-04
JPS62247356A (ja) 1987-10-28
DE3782833D1 (de) 1993-01-14
HK1005323A1 (en) 1998-12-31
JPH07120047B2 (ja) 1995-12-20
DE3782833T2 (de) 1993-05-19
DE3751453D1 (de) 1995-09-14
EP0233747A3 (en) 1989-02-08
EP0233747A2 (de) 1987-08-26
EP0393799A2 (de) 1990-10-24
EP0393799B1 (de) 1995-08-09

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Legal Events

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