ATE135497T1 - Photovoltaisches pin-bauelement mit einer i- halbleiterschicht aus znse oder znsete die wasserstoff in einer menge von 1 bis 4 atom- - Google Patents

Photovoltaisches pin-bauelement mit einer i- halbleiterschicht aus znse oder znsete die wasserstoff in einer menge von 1 bis 4 atom-

Info

Publication number
ATE135497T1
ATE135497T1 AT88308068T AT88308068T ATE135497T1 AT E135497 T1 ATE135497 T1 AT E135497T1 AT 88308068 T AT88308068 T AT 88308068T AT 88308068 T AT88308068 T AT 88308068T AT E135497 T1 ATE135497 T1 AT E135497T1
Authority
AT
Austria
Prior art keywords
semiconductor layer
atoms
type semiconductor
amount
znse
Prior art date
Application number
AT88308068T
Other languages
English (en)
Inventor
Katsumi Nakagawa
Masahiro Kanai
Shunichi Ishihara
Kozo Arao
Yasushi Fujioka
Akira Sakai
Tsutomu Murakami
Original Assignee
Canon Kk
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Canon Kk filed Critical Canon Kk
Application granted granted Critical
Publication of ATE135497T1 publication Critical patent/ATE135497T1/de

Links

Classifications

    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10FINORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
    • H10F10/00Individual photovoltaic cells, e.g. solar cells
    • H10F10/10Individual photovoltaic cells, e.g. solar cells having potential barriers
    • H10F10/17Photovoltaic cells having only PIN junction potential barriers
    • H10F10/174Photovoltaic cells having only PIN junction potential barriers comprising monocrystalline or polycrystalline materials
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10FINORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
    • H10F71/00Manufacture or treatment of devices covered by this subclass
    • H10F71/125The active layers comprising only Group II-VI materials, e.g. CdS, ZnS or CdTe
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10FINORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
    • H10F77/00Constructional details of devices covered by this subclass
    • H10F77/10Semiconductor bodies
    • H10F77/12Active materials
    • H10F77/123Active materials comprising only Group II-VI materials, e.g. CdS, ZnS or HgCdTe
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10FINORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
    • H10F77/00Constructional details of devices covered by this subclass
    • H10F77/10Semiconductor bodies
    • H10F77/12Active materials
    • H10F77/123Active materials comprising only Group II-VI materials, e.g. CdS, ZnS or HgCdTe
    • H10F77/1233Active materials comprising only Group II-VI materials, e.g. CdS, ZnS or HgCdTe characterised by the dopants
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10FINORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
    • H10F77/00Constructional details of devices covered by this subclass
    • H10F77/10Semiconductor bodies
    • H10F77/12Active materials
    • H10F77/123Active materials comprising only Group II-VI materials, e.g. CdS, ZnS or HgCdTe
    • H10F77/1237Active materials comprising only Group II-VI materials, e.g. CdS, ZnS or HgCdTe having at least three elements, e.g. HgCdTe
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02EREDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
    • Y02E10/00Energy generation through renewable energy sources
    • Y02E10/50Photovoltaic [PV] energy
    • Y02E10/543Solar cells from Group II-VI materials
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02EREDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
    • Y02E10/00Energy generation through renewable energy sources
    • Y02E10/50Photovoltaic [PV] energy
    • Y02E10/547Monocrystalline silicon PV cells
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02EREDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
    • Y02E10/00Energy generation through renewable energy sources
    • Y02E10/50Photovoltaic [PV] energy
    • Y02E10/548Amorphous silicon PV cells

Landscapes

  • Photovoltaic Devices (AREA)
AT88308068T 1987-08-31 1988-08-31 Photovoltaisches pin-bauelement mit einer i- halbleiterschicht aus znse oder znsete die wasserstoff in einer menge von 1 bis 4 atom- ATE135497T1 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP21749287 1987-08-31
JP24985687 1987-10-05

Publications (1)

Publication Number Publication Date
ATE135497T1 true ATE135497T1 (de) 1996-03-15

Family

ID=26522048

Family Applications (1)

Application Number Title Priority Date Filing Date
AT88308068T ATE135497T1 (de) 1987-08-31 1988-08-31 Photovoltaisches pin-bauelement mit einer i- halbleiterschicht aus znse oder znsete die wasserstoff in einer menge von 1 bis 4 atom-

Country Status (7)

Country Link
US (1) US4888062A (de)
EP (1) EP0306297B1 (de)
AT (1) ATE135497T1 (de)
AU (1) AU610231B2 (de)
CA (1) CA1311547C (de)
DE (1) DE3855090T2 (de)
ES (1) ES2084583T3 (de)

Families Citing this family (27)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6424468A (en) * 1987-07-21 1989-01-26 Canon Kk Functional deposited film
EP0301903A3 (de) * 1987-07-31 1990-07-11 Canon Kabushiki Kaisha Funktionelle niedergeschlagene ZnSe1-xTeX: H-Schicht
ES2073407T3 (es) * 1987-11-20 1995-08-16 Canon Kk Elemento fotovoltaico con union pin, celulas tandem y triples.
CA1298639C (en) * 1987-11-20 1992-04-07 Katsumi Nakagawa Pinjunction photovoltaic element with p or n-type semiconductor layercomprising non-single crystal material containing zn, se, te, h in anamount of 1 to 4 atomic % and a dopant and i-type semiconductor layer comprising non-single crystal si(h,f) material
JP2717583B2 (ja) * 1988-11-04 1998-02-18 キヤノン株式会社 積層型光起電力素子
AU1745695A (en) * 1994-06-03 1996-01-04 Materials Research Corporation A method of nitridization of titanium thin films
US5665640A (en) * 1994-06-03 1997-09-09 Sony Corporation Method for producing titanium-containing thin films by low temperature plasma-enhanced chemical vapor deposition using a rotating susceptor reactor
US5628829A (en) * 1994-06-03 1997-05-13 Materials Research Corporation Method and apparatus for low temperature deposition of CVD and PECVD films
US5975912A (en) * 1994-06-03 1999-11-02 Materials Research Corporation Low temperature plasma-enhanced formation of integrated circuits
JPH11289103A (ja) * 1998-02-05 1999-10-19 Canon Inc 半導体装置および太陽電池モジュ―ル及びその解体方法
US6248122B1 (en) * 1999-02-26 2001-06-19 Vascular Architects, Inc. Catheter with controlled release endoluminal prosthesis
KR100343949B1 (ko) * 2000-01-26 2002-07-24 한국과학기술연구원 상온에서 작동하는 자외선 수광, 발광소자용 ZnO박막의 제조 방법 및 그를 위한 장치
KR100366349B1 (ko) * 2001-01-03 2002-12-31 삼성에스디아이 주식회사 태양 전지 및 그의 제조 방법
US6914467B2 (en) * 2003-12-04 2005-07-05 International Business Machines Corporation Dual edge programmable delay unit
EP1840916A1 (de) * 2006-03-27 2007-10-03 IVF Industriforskning och Utveckling AB Versiegeltes monolithisches photo-elektrochemisches System und Verfahren zur Herstellung versiegelter monolithischer photo-elektrochemischer Systeme
US20110041898A1 (en) * 2009-08-19 2011-02-24 Emcore Solar Power, Inc. Back Metal Layers in Inverted Metamorphic Multijunction Solar Cells
KR20100021045A (ko) * 2008-08-14 2010-02-24 주성엔지니어링(주) 박막형 태양전지 및 그 제조방법
US8742531B2 (en) * 2008-12-08 2014-06-03 Arizona Board Of Regents, Acting For And On Behalf Of Arizona State University Electrical devices including dendritic metal electrodes
KR101727204B1 (ko) * 2010-10-07 2017-04-14 구엘라 테크놀로지 가부시키가이샤 태양 전지
WO2012046325A1 (ja) * 2010-10-07 2012-04-12 グエラテクノロジー株式会社 二次電池
WO2012173778A2 (en) * 2011-06-16 2012-12-20 3M Innovative Properties Company Booster films for solar photovoltaic systems
JP5963765B2 (ja) * 2011-10-30 2016-08-03 株式会社日本マイクロニクス 繰り返し充放電できる量子電池
JP2015149389A (ja) * 2014-02-06 2015-08-20 ルネサスエレクトロニクス株式会社 半導体発光素子およびその製造方法
WO2018089705A1 (en) 2016-11-10 2018-05-17 Medtronic Vascular Inc. Drug-filled stents to prevent vessel micro-injuries and methods of manufacture thereof
IL318736A (en) 2021-06-16 2025-03-01 Conti Innovation Center Llc Mechanically stacked solar transmissive cells or modules
CN113506842B (zh) * 2021-07-09 2023-07-25 安徽华晟新能源科技有限公司 异质结太阳能电池的制备方法
US12414402B1 (en) 2025-01-03 2025-09-09 Conti Innovation Center, Llc Optimizing cadmium (CD) alloy solar cells with sputtered copper-dopped zinc telluride (ZNTE:CU) back contacts in the presence of hydrogen

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5752176A (en) * 1980-09-16 1982-03-27 Semiconductor Energy Lab Co Ltd Semiconductor device
US4596645A (en) * 1984-10-23 1986-06-24 California Institute Of Technology Reactively-sputtered zinc semiconductor films of high conductivity for heterojunction devices
CA1303194C (en) * 1987-07-21 1992-06-09 Katsumi Nakagawa Photovoltaic element with a semiconductor layer comprising non-single crystal material containing at least zn, se and h in an amount of 1 to40 atomic %
JPS6424468A (en) * 1987-07-21 1989-01-26 Canon Kk Functional deposited film
JPS6436086A (en) * 1987-07-31 1989-02-07 Canon Kk Functional deposition film

Also Published As

Publication number Publication date
EP0306297B1 (de) 1996-03-13
US4888062A (en) 1989-12-19
CA1311547C (en) 1992-12-15
EP0306297A3 (en) 1990-06-13
ES2084583T3 (es) 1996-05-16
DE3855090T2 (de) 1996-10-17
DE3855090D1 (de) 1996-04-18
AU610231B2 (en) 1991-05-16
AU2167488A (en) 1989-03-02
EP0306297A2 (de) 1989-03-08

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