ATE139866T1 - Verfahren zum herstellen von abgeschiedener metallschicht, die aluminium als hauptkomponente enthält, mit anwendung von alkylaluminiumhydrid - Google Patents

Verfahren zum herstellen von abgeschiedener metallschicht, die aluminium als hauptkomponente enthält, mit anwendung von alkylaluminiumhydrid

Info

Publication number
ATE139866T1
ATE139866T1 AT91301278T AT91301278T ATE139866T1 AT E139866 T1 ATE139866 T1 AT E139866T1 AT 91301278 T AT91301278 T AT 91301278T AT 91301278 T AT91301278 T AT 91301278T AT E139866 T1 ATE139866 T1 AT E139866T1
Authority
AT
Austria
Prior art keywords
main component
metal layer
layer containing
deposited metal
aluminum hydride
Prior art date
Application number
AT91301278T
Other languages
English (en)
Inventor
Shigeyuki Matsumoto
Osamu Ikeda
Original Assignee
Canon Kk
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Canon Kk filed Critical Canon Kk
Application granted granted Critical
Publication of ATE139866T1 publication Critical patent/ATE139866T1/de

Links

Classifications

    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P14/00—Formation of materials, e.g. in the shape of layers or pillars
    • H10P14/40—Formation of materials, e.g. in the shape of layers or pillars of conductive or resistive materials
    • H10P14/42—Formation of materials, e.g. in the shape of layers or pillars of conductive or resistive materials using a gas or vapour
    • H10P14/43—Chemical deposition, e.g. chemical vapour deposition [CVD]
    • H10P14/432—Chemical deposition, e.g. chemical vapour deposition [CVD] using selective deposition
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P14/00—Formation of materials, e.g. in the shape of layers or pillars
    • H10P14/40—Formation of materials, e.g. in the shape of layers or pillars of conductive or resistive materials
    • H10P14/412—Deposition of metallic or metal-silicide materials
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10W—GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W20/00—Interconnections in chips, wafers or substrates
    • H10W20/01—Manufacture or treatment
    • H10W20/031—Manufacture or treatment of conductive parts of the interconnections
    • H10W20/056—Manufacture or treatment of conductive parts of the interconnections by filling conductive material into holes, grooves or trenches
    • H10W20/057—Manufacture or treatment of conductive parts of the interconnections by filling conductive material into holes, grooves or trenches by selectively depositing, e.g. by using selective CVD or plating

Landscapes

  • Electrodes Of Semiconductors (AREA)
  • Internal Circuitry In Semiconductor Integrated Circuit Devices (AREA)
  • Chemical Vapour Deposition (AREA)
  • Physical Vapour Deposition (AREA)
AT91301278T 1990-02-19 1991-02-18 Verfahren zum herstellen von abgeschiedener metallschicht, die aluminium als hauptkomponente enthält, mit anwendung von alkylaluminiumhydrid ATE139866T1 (de)

Applications Claiming Priority (4)

Application Number Priority Date Filing Date Title
JP3619690 1990-02-19
JP3619490 1990-02-19
JP3619790 1990-02-19
JP3619590 1990-02-19

Publications (1)

Publication Number Publication Date
ATE139866T1 true ATE139866T1 (de) 1996-07-15

Family

ID=27460225

Family Applications (1)

Application Number Title Priority Date Filing Date
AT91301278T ATE139866T1 (de) 1990-02-19 1991-02-18 Verfahren zum herstellen von abgeschiedener metallschicht, die aluminium als hauptkomponente enthält, mit anwendung von alkylaluminiumhydrid

Country Status (7)

Country Link
US (3) US5151305A (de)
EP (1) EP0448223B1 (de)
KR (1) KR940006669B1 (de)
CN (1) CN1036860C (de)
AT (1) ATE139866T1 (de)
DE (1) DE69120446T2 (de)
MY (1) MY104628A (de)

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Also Published As

Publication number Publication date
JPH04214868A (ja) 1992-08-05
US6258174B1 (en) 2001-07-10
EP0448223B1 (de) 1996-06-26
CN1036860C (zh) 1997-12-31
KR940006669B1 (ko) 1994-07-25
US5330633A (en) 1994-07-19
CN1061445A (zh) 1992-05-27
DE69120446T2 (de) 1996-11-14
KR920000113A (ko) 1992-01-10
EP0448223A2 (de) 1991-09-25
DE69120446D1 (de) 1996-08-01
EP0448223A3 (en) 1992-02-19
MY104628A (en) 1994-04-30
US5151305A (en) 1992-09-29

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