ATE167310T1 - Triamin-entschichtungslösung für positive photolacke - Google Patents

Triamin-entschichtungslösung für positive photolacke

Info

Publication number
ATE167310T1
ATE167310T1 AT88306659T AT88306659T ATE167310T1 AT E167310 T1 ATE167310 T1 AT E167310T1 AT 88306659 T AT88306659 T AT 88306659T AT 88306659 T AT88306659 T AT 88306659T AT E167310 T1 ATE167310 T1 AT E167310T1
Authority
AT
Austria
Prior art keywords
positive
photocoatings
triamine
organic photoresist
positive organic
Prior art date
Application number
AT88306659T
Other languages
English (en)
Inventor
Wai Mun Lee
Original Assignee
Ekc Technology Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Ekc Technology Inc filed Critical Ekc Technology Inc
Application granted granted Critical
Publication of ATE167310T1 publication Critical patent/ATE167310T1/de

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/42—Stripping or agents therefor
    • G03F7/422—Stripping or agents therefor using liquids only
    • G03F7/425—Stripping or agents therefor using liquids only containing mineral alkaline compounds; containing organic basic compounds, e.g. quaternary ammonium compounds; containing heterocyclic basic compounds containing nitrogen
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S438/00—Semiconductor device manufacturing: process
    • Y10S438/942—Masking
    • Y10S438/948—Radiation resist

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Detergent Compositions (AREA)
  • Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
AT88306659T 1987-07-30 1988-07-20 Triamin-entschichtungslösung für positive photolacke ATE167310T1 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US07/079,714 US4824763A (en) 1987-07-30 1987-07-30 Triamine positive photoresist stripping composition and prebaking process

Publications (1)

Publication Number Publication Date
ATE167310T1 true ATE167310T1 (de) 1998-06-15

Family

ID=22152327

Family Applications (2)

Application Number Title Priority Date Filing Date
AT97121197T ATE231987T1 (de) 1987-07-30 1988-07-20 Wärmebehandlungsverfahren zum erleichtern der entfernung eines positiven photoresists mit entschichtungslösungen
AT88306659T ATE167310T1 (de) 1987-07-30 1988-07-20 Triamin-entschichtungslösung für positive photolacke

Family Applications Before (1)

Application Number Title Priority Date Filing Date
AT97121197T ATE231987T1 (de) 1987-07-30 1988-07-20 Wärmebehandlungsverfahren zum erleichtern der entfernung eines positiven photoresists mit entschichtungslösungen

Country Status (6)

Country Link
US (2) US4824763A (de)
EP (2) EP0846984B1 (de)
JP (2) JP2930956B2 (de)
KR (1) KR890003003A (de)
AT (2) ATE231987T1 (de)
DE (2) DE3856553T2 (de)

Families Citing this family (90)

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CN113039486B (zh) 2018-11-14 2024-11-12 朗姆研究公司 可用于下一代光刻法中的硬掩模制作方法
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TWI837391B (zh) 2019-06-26 2024-04-01 美商蘭姆研究公司 利用鹵化物化學品的光阻顯影
KR102748920B1 (ko) 2019-06-27 2024-12-30 램 리써치 코포레이션 교번하는 에칭 및 패시베이션 프로세스
KR20250160237A (ko) 2019-06-28 2025-11-11 램 리써치 코포레이션 복수의 패터닝 복사-흡수 엘리먼트들 및/또는 수직 조성 경사를 갖는 포토레지스트
SG11202108851RA (en) 2020-01-15 2021-09-29 Lam Res Corp Underlayer for photoresist adhesion and dose reduction
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Also Published As

Publication number Publication date
US4824763A (en) 1989-04-25
DE3856202T2 (de) 1998-10-22
JP2930956B2 (ja) 1999-08-09
JPH10319609A (ja) 1998-12-04
DE3856553T2 (de) 2004-02-19
US5399464A (en) 1995-03-21
EP0301756A3 (de) 1990-11-14
EP0846984A2 (de) 1998-06-10
KR890003003A (ko) 1989-04-12
DE3856553D1 (de) 2003-03-06
JP3044207B2 (ja) 2000-05-22
EP0846984A3 (de) 2000-03-22
DE3856202D1 (de) 1998-07-16
HK1012166A1 (en) 1999-07-23
EP0846984B1 (de) 2003-01-29
JPH01105949A (ja) 1989-04-24
EP0301756B1 (de) 1998-06-10
ATE231987T1 (de) 2003-02-15
EP0301756A2 (de) 1989-02-01
HK1011882A1 (en) 1999-07-23

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