ATE175523T1 - Eine integrierte vorrichtung mit einem bipolaren transistor und einem mosfet transistor in emittorschaltungsanordnung - Google Patents

Eine integrierte vorrichtung mit einem bipolaren transistor und einem mosfet transistor in emittorschaltungsanordnung

Info

Publication number
ATE175523T1
ATE175523T1 AT93830385T AT93830385T ATE175523T1 AT E175523 T1 ATE175523 T1 AT E175523T1 AT 93830385 T AT93830385 T AT 93830385T AT 93830385 T AT93830385 T AT 93830385T AT E175523 T1 ATE175523 T1 AT E175523T1
Authority
AT
Austria
Prior art keywords
transistor
bipolar transistor
mosfet
emitter
region
Prior art date
Application number
AT93830385T
Other languages
English (en)
Inventor
Sergio Palara
Original Assignee
Cons Ric Microelettronica
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Cons Ric Microelettronica filed Critical Cons Ric Microelettronica
Application granted granted Critical
Publication of ATE175523T1 publication Critical patent/ATE175523T1/de

Links

Classifications

    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D84/00—Integrated devices formed in or on semiconductor substrates that comprise only semiconducting layers, e.g. on Si wafers or on GaAs-on-Si wafers
    • H10D84/40—Integrated devices formed in or on semiconductor substrates that comprise only semiconducting layers, e.g. on Si wafers or on GaAs-on-Si wafers characterised by the integration of at least one component covered by groups H10D12/00 or H10D30/00 with at least one component covered by groups H10D10/00 or H10D18/00, e.g. integration of IGFETs with BJTs
    • H10D84/401—Combinations of FETs or IGBTs with BJTs
    • H10D84/403—Combinations of FETs or IGBTs with BJTs and with one or more of diodes, resistors or capacitors
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D84/00—Integrated devices formed in or on semiconductor substrates that comprise only semiconducting layers, e.g. on Si wafers or on GaAs-on-Si wafers
    • H10D84/40—Integrated devices formed in or on semiconductor substrates that comprise only semiconducting layers, e.g. on Si wafers or on GaAs-on-Si wafers characterised by the integration of at least one component covered by groups H10D12/00 or H10D30/00 with at least one component covered by groups H10D10/00 or H10D18/00, e.g. integration of IGFETs with BJTs
    • H10D84/401—Combinations of FETs or IGBTs with BJTs

Landscapes

  • Bipolar Transistors (AREA)
  • Metal-Oxide And Bipolar Metal-Oxide Semiconductor Integrated Circuits (AREA)
  • Bipolar Integrated Circuits (AREA)
AT93830385T 1993-09-17 1993-09-17 Eine integrierte vorrichtung mit einem bipolaren transistor und einem mosfet transistor in emittorschaltungsanordnung ATE175523T1 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
EP93830385A EP0646965B1 (de) 1993-09-17 1993-09-17 Eine integrierte Vorrichtung mit einem bipolaren Transistor und einem MOSFET Transistor in Emittorschaltungsanordnung

Publications (1)

Publication Number Publication Date
ATE175523T1 true ATE175523T1 (de) 1999-01-15

Family

ID=8215219

Family Applications (1)

Application Number Title Priority Date Filing Date
AT93830385T ATE175523T1 (de) 1993-09-17 1993-09-17 Eine integrierte vorrichtung mit einem bipolaren transistor und einem mosfet transistor in emittorschaltungsanordnung

Country Status (5)

Country Link
US (1) US5665994A (de)
EP (1) EP0646965B1 (de)
JP (1) JPH07193154A (de)
AT (1) ATE175523T1 (de)
DE (1) DE69322963T2 (de)

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Publication number Priority date Publication date Assignee Title
EP0765025A3 (de) * 1995-09-21 1998-12-30 Siemens Aktiengesellschaft Anlaufschaltung und Halbleiterkörper für eine solche Anlaufschaltung
KR100239402B1 (ko) * 1997-04-02 2000-02-01 김영환 반도체 소자의 웰과 그 형성방법
US6093613A (en) * 1998-02-09 2000-07-25 Chartered Semiconductor Manufacturing, Ltd Method for making high gain lateral PNP and NPN bipolar transistor compatible with CMOS for making BICMOS circuits
EP0981163A1 (de) * 1998-08-14 2000-02-23 STMicroelectronics S.r.l. Halbleiter-Leistungsbauelement mit isoliertem Schaltkreis und Herstellungsverfahren
US6441445B1 (en) * 1998-10-06 2002-08-27 Stmicroelectronics S.R.L. Integrated device with bipolar transistor and electronic switch in “emitter switching” configuration
IT1316871B1 (it) * 2000-03-31 2003-05-12 St Microelectronics Srl Dispositivo elettronico integrato monoliticamente e relativo processodi fabbricazione
IT1319755B1 (it) * 2000-12-28 2003-11-03 St Microelectronics Srl Dispositivo integrato in configurazione emitter-switching e relativoprocesso di fabbricazione
JP4610786B2 (ja) * 2001-02-20 2011-01-12 三菱電機株式会社 半導体装置
JP2002324846A (ja) * 2001-04-25 2002-11-08 Sanken Electric Co Ltd 半導体装置及びその製造方法
US6909150B2 (en) * 2001-07-23 2005-06-21 Agere Systems Inc. Mixed signal integrated circuit with improved isolation
US6573558B2 (en) * 2001-09-07 2003-06-03 Power Integrations, Inc. High-voltage vertical transistor with a multi-layered extended drain structure
US7221011B2 (en) * 2001-09-07 2007-05-22 Power Integrations, Inc. High-voltage vertical transistor with a multi-gradient drain doping profile
US6635544B2 (en) * 2001-09-07 2003-10-21 Power Intergrations, Inc. Method of fabricating a high-voltage transistor with a multi-layered extended drain structure
US6555873B2 (en) * 2001-09-07 2003-04-29 Power Integrations, Inc. High-voltage lateral transistor with a multi-layered extended drain structure
US7786533B2 (en) 2001-09-07 2010-08-31 Power Integrations, Inc. High-voltage vertical transistor with edge termination structure
US6847045B2 (en) * 2001-10-12 2005-01-25 Hewlett-Packard Development Company, L.P. High-current avalanche-tunneling and injection-tunneling semiconductor-dielectric-metal stable cold emitter, which emulates the negative electron affinity mechanism of emission
JP4593126B2 (ja) * 2004-02-18 2010-12-08 三菱電機株式会社 半導体装置
ITVA20050038A1 (it) * 2005-06-10 2006-12-11 St Microelectronics Srl Transistore bipolare di potenza e relativo dispositivo integrato con clamp della tensione di collettore
US7554839B2 (en) * 2006-09-30 2009-06-30 Alpha & Omega Semiconductor, Ltd. Symmetric blocking transient voltage suppressor (TVS) using bipolar transistor base snatch
US7859037B2 (en) * 2007-02-16 2010-12-28 Power Integrations, Inc. Checkerboarded high-voltage vertical transistor layout
US8653583B2 (en) 2007-02-16 2014-02-18 Power Integrations, Inc. Sensing FET integrated with a high-voltage transistor
US7468536B2 (en) 2007-02-16 2008-12-23 Power Integrations, Inc. Gate metal routing for transistor with checkerboarded layout
US7595523B2 (en) * 2007-02-16 2009-09-29 Power Integrations, Inc. Gate pullback at ends of high-voltage vertical transistor structure
US7557406B2 (en) 2007-02-16 2009-07-07 Power Integrations, Inc. Segmented pillar layout for a high-voltage vertical transistor
US10325988B2 (en) 2013-12-13 2019-06-18 Power Integrations, Inc. Vertical transistor device structure with cylindrically-shaped field plates
US9543396B2 (en) 2013-12-13 2017-01-10 Power Integrations, Inc. Vertical transistor device structure with cylindrically-shaped regions
US10553633B2 (en) * 2014-05-30 2020-02-04 Klaus Y.J. Hsu Phototransistor with body-strapped base

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB2190539A (en) * 1986-05-16 1987-11-18 Philips Electronic Associated Semiconductor devices
IT1217323B (it) * 1987-12-22 1990-03-22 Sgs Microelettronica Spa Struttura integrata di transistor bipolare di potenza di alta tensione e di transistor mos di potenza di bassa tensione nella configurazione"emitter switching"e relativo processo di fabbricazione
JPH01305557A (ja) * 1988-06-03 1989-12-08 Fuji Electric Co Ltd 半導体装置
JP2536137B2 (ja) * 1989-03-28 1996-09-18 富士電機株式会社 伝導度変調型ｍｏｓｆｅｔを備えた半導体装置
IT1244239B (it) * 1990-05-31 1994-07-08 Sgs Thomson Microelectronics Terminazione dello stadio di potenza di un dispositivo monolitico a semicondutture e relativo processo di fabbricazione

Also Published As

Publication number Publication date
DE69322963T2 (de) 1999-06-24
DE69322963D1 (de) 1999-02-18
EP0646965B1 (de) 1999-01-07
US5665994A (en) 1997-09-09
EP0646965A1 (de) 1995-04-05
JPH07193154A (ja) 1995-07-28

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