ATE232993T1 - Wässrige entwicklungslösungen für die verminderung der entwicklerrückstände - Google Patents

Wässrige entwicklungslösungen für die verminderung der entwicklerrückstände

Info

Publication number
ATE232993T1
ATE232993T1 AT99303087T AT99303087T ATE232993T1 AT E232993 T1 ATE232993 T1 AT E232993T1 AT 99303087 T AT99303087 T AT 99303087T AT 99303087 T AT99303087 T AT 99303087T AT E232993 T1 ATE232993 T1 AT E232993T1
Authority
AT
Austria
Prior art keywords
developing solutions
aqueous developing
developer residue
reducing developer
reducing
Prior art date
Application number
AT99303087T
Other languages
English (en)
Inventor
Robert Barr
Daniel E Lundy
Original Assignee
Nichigo Morton Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nichigo Morton Co Ltd filed Critical Nichigo Morton Co Ltd
Application granted granted Critical
Publication of ATE232993T1 publication Critical patent/ATE232993T1/de

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/30—Imagewise removal using liquid means
    • G03F7/32—Liquid compositions therefor, e.g. developers

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Separation Of Suspended Particles By Flocculating Agents (AREA)
  • Removal Of Specific Substances (AREA)
  • Manufacturing Of Printed Circuit Boards (AREA)
AT99303087T 1998-04-29 1999-04-21 Wässrige entwicklungslösungen für die verminderung der entwicklerrückstände ATE232993T1 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US09/069,517 US6063550A (en) 1998-04-29 1998-04-29 Aqueous developing solutions for reduced developer residue

Publications (1)

Publication Number Publication Date
ATE232993T1 true ATE232993T1 (de) 2003-03-15

Family

ID=22089521

Family Applications (1)

Application Number Title Priority Date Filing Date
AT99303087T ATE232993T1 (de) 1998-04-29 1999-04-21 Wässrige entwicklungslösungen für die verminderung der entwicklerrückstände

Country Status (11)

Country Link
US (1) US6063550A (de)
EP (1) EP0953879B1 (de)
KR (1) KR100376611B1 (de)
CN (1) CN1141621C (de)
AT (1) ATE232993T1 (de)
BR (1) BR9901323A (de)
CA (1) CA2266609A1 (de)
DE (1) DE69905416T2 (de)
IL (1) IL129581A0 (de)
SG (1) SG80023A1 (de)
TW (1) TW581942B (de)

Families Citing this family (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6248506B1 (en) * 1998-12-04 2001-06-19 Nichigo-Morton Aqueous developing solutions for reduced developer residue
US6503694B1 (en) * 2001-06-12 2003-01-07 Chi Mei Corporation Developer solution and edge bead remover composition
US20030196685A1 (en) * 2001-12-18 2003-10-23 Shipley Company, L.L.C. Cleaning composition and method
CN1441043A (zh) * 2002-02-06 2003-09-10 希普利公司 清洁用组合物
US6900003B2 (en) * 2002-04-12 2005-05-31 Shipley Company, L.L.C. Photoresist processing aid and method
JP2004252395A (ja) * 2002-05-07 2004-09-09 Shipley Co Llc 残渣削減安定濃縮物
US6887654B2 (en) * 2002-05-07 2005-05-03 Shipley Company, L.L.C. Residue and scum reducing composition and method
JP2004163904A (ja) * 2002-09-30 2004-06-10 Rohm & Haas Electronic Materials Llc 改善された光開始剤
US7094523B1 (en) 2005-11-30 2006-08-22 Kesheng Feng Developer solution and process for use
KR102158579B1 (ko) * 2019-01-25 2020-09-22 (주)화백엔지니어링 Pcb 현상공정에서 스컴 방지를 위한 반응성 계면활성제가 함유된 현상 조성물 및 이의 제어시스템
KR102158580B1 (ko) * 2019-02-01 2020-09-22 (주)화백엔지니어링 정밀 회로구현이 가능한 현상 조성물

Family Cites Families (26)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4824769A (en) * 1984-10-15 1989-04-25 Allied Corporation High contrast photoresist developer
US4613561A (en) * 1984-10-17 1986-09-23 James Marvin Lewis Method of high contrast positive O-quinone diazide photoresist developing using pretreatment solution
JPH063549B2 (ja) * 1984-12-25 1994-01-12 株式会社東芝 ポジ型フォトレジスト現像液組成物
JPH0638159B2 (ja) * 1986-07-18 1994-05-18 東京応化工業株式会社 ポジ型ホトレジスト用現像液
JP2527172B2 (ja) * 1987-01-09 1996-08-21 東京応化工業株式会社 ポジ型ホトレジスト用現像液
DE3884825D1 (de) * 1987-02-16 1993-11-18 Konishiroku Photo Ind Entwickler für lichtempfindliche lithographische Druckplatte, gemeinschaftlich verarbeitungsfähig für den Negativ-Typ und den Positiv-Typ und Entwicklerzusammensetzung für lichtempfindliches Material.
US5364736A (en) * 1987-12-07 1994-11-15 Morton International, Inc. Photoimageable compositions
JP2543742B2 (ja) * 1988-04-07 1996-10-16 富士写真フイルム株式会社 ポジ型フオトレジスト用現像液
US5175078A (en) * 1988-10-20 1992-12-29 Mitsubishi Gas Chemical Company, Inc. Positive type photoresist developer
US5122438A (en) * 1989-11-02 1992-06-16 Konica Corporation Method for developing a waterless light-sensitive lithographic plate
JPH03167554A (ja) * 1989-11-27 1991-07-19 Toray Ind Inc 水なし平版印刷版用現像液
JPH04163556A (ja) * 1990-10-29 1992-06-09 Konica Corp 感光性平版印刷版の処理方法及び処理装置
JP2866951B2 (ja) * 1990-11-28 1999-03-08 富士写真フイルム株式会社 ハロゲン化銀カラー写真感光材料の処理方法
JP2748057B2 (ja) * 1991-07-22 1998-05-06 富士写真フイルム株式会社 画像形成方法及びアルカリ性現像液
JPH0572686A (ja) * 1991-09-11 1993-03-26 Konica Corp ハロゲン化銀写真感光材料
US5532116A (en) * 1992-01-13 1996-07-02 Fuji Photo Film Co., Ltd. Aqueous alkaline developing solution
DE4300576A1 (en) * 1992-01-13 1993-07-15 Fuji Photo Film Co Ltd Imaging process using specified surfactant in alkaline developer soln. - used to reduce development time of light-sensitive resin and minimise pigment fog
JP3094716B2 (ja) * 1992-01-16 2000-10-03 富士写真フイルム株式会社 ハロゲン化銀カラー写真感光材料の処理方法
US5457011A (en) * 1993-12-27 1995-10-10 Eastman Kodak Company Photographic developing composition containing a sludge inhibiting agent and use thereof in the high contrast development of nucleated photographic elements
US5364737A (en) * 1994-01-25 1994-11-15 Morton International, Inc. Waterbone photoresists having associate thickeners
JP2937801B2 (ja) * 1994-03-31 1999-08-23 東京応化工業株式会社 レジスト用現像原液
US5753421A (en) * 1994-03-31 1998-05-19 Tokyo Ohka Kogya Co., Ltd. Stock developer solutions for photoresists and developer solutions prepared by dilution thereof
DE4419166A1 (de) * 1994-06-01 1995-12-07 Hoechst Ag Entwickler für Photoresistschichten
US5576145A (en) * 1995-02-10 1996-11-19 Morton International, Inc. Esterified styrene/maleic anhydride polymer and polymer-containing photoimageable composition having improved alkaline process resistance
US5609991A (en) * 1995-02-10 1997-03-11 Morton International, Inc. Photoimageable composition having improved alkaline process resistance and tack-free surface for contact imaging
US5998102A (en) * 1997-10-06 1999-12-07 Agfa Corporation Etch inhibitors in developer for lithographic printing plates

Also Published As

Publication number Publication date
EP0953879A2 (de) 1999-11-03
CN1141621C (zh) 2004-03-10
US6063550A (en) 2000-05-16
DE69905416D1 (de) 2003-03-27
TW581942B (en) 2004-04-01
IL129581A0 (en) 2000-02-29
SG80023A1 (en) 2001-04-17
BR9901323A (pt) 2000-03-14
EP0953879A3 (de) 1999-11-17
CA2266609A1 (en) 1999-10-29
CN1233782A (zh) 1999-11-03
KR100376611B1 (ko) 2003-03-19
EP0953879B1 (de) 2003-02-19
KR19990083500A (ko) 1999-11-25
DE69905416T2 (de) 2003-07-17

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Legal Events

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