ATE251766T1 - Dämpfende eingebettete blankophasenverschiebungsmasken - Google Patents

Dämpfende eingebettete blankophasenverschiebungsmasken

Info

Publication number
ATE251766T1
ATE251766T1 AT97924667T AT97924667T ATE251766T1 AT E251766 T1 ATE251766 T1 AT E251766T1 AT 97924667 T AT97924667 T AT 97924667T AT 97924667 T AT97924667 T AT 97924667T AT E251766 T1 ATE251766 T1 AT E251766T1
Authority
AT
Austria
Prior art keywords
phase shift
shift masks
blank phase
damping
optically
Prior art date
Application number
AT97924667T
Other languages
English (en)
Inventor
Peter Francis Carcia
Roger Harquail French
Original Assignee
Dupont Photomasks Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Dupont Photomasks Inc filed Critical Dupont Photomasks Inc
Application granted granted Critical
Publication of ATE251766T1 publication Critical patent/ATE251766T1/de

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/26—Phase shift masks [PSM]; PSM blanks; Preparation thereof
    • G03F1/32—Attenuating PSM [att-PSM], e.g. halftone PSM or PSM having semi-transparent phase shift portion; Preparation thereof

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Chemical Or Physical Treatment Of Fibers (AREA)
  • Bakery Products And Manufacturing Methods Therefor (AREA)
AT97924667T 1996-05-20 1997-05-09 Dämpfende eingebettete blankophasenverschiebungsmasken ATE251766T1 (de)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US1798996P 1996-05-20 1996-05-20
US08/797,443 US5897977A (en) 1996-05-20 1997-02-10 Attenuating embedded phase shift photomask blanks
PCT/US1997/007956 WO1997044710A1 (en) 1996-05-20 1997-05-09 Attenuating embedded phase shift photomask blanks

Publications (1)

Publication Number Publication Date
ATE251766T1 true ATE251766T1 (de) 2003-10-15

Family

ID=26690596

Family Applications (1)

Application Number Title Priority Date Filing Date
AT97924667T ATE251766T1 (de) 1996-05-20 1997-05-09 Dämpfende eingebettete blankophasenverschiebungsmasken

Country Status (8)

Country Link
US (1) US5897977A (de)
EP (1) EP0900411B1 (de)
JP (1) JP3938940B2 (de)
CN (1) CN1311292C (de)
AT (1) ATE251766T1 (de)
DE (1) DE69725438T2 (de)
TW (1) TW334525B (de)
WO (1) WO1997044710A1 (de)

Families Citing this family (34)

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JP2878143B2 (ja) * 1994-02-22 1999-04-05 インターナショナル・ビジネス・マシーンズ・コーポレイション 減衰位相シフト・マスク作成用の薄膜材料及びその作成方法
JP3262529B2 (ja) * 1997-12-19 2002-03-04 ホーヤ株式会社 位相シフトマスク及び位相シフトマスクブランク
JPH11184067A (ja) * 1997-12-19 1999-07-09 Hoya Corp 位相シフトマスク及び位相シフトマスクブランク
JPH11258772A (ja) * 1998-03-16 1999-09-24 Toppan Printing Co Ltd ハーフトーン型位相シフトマスク用ブランクス及びハーフトーン型位相シフトマスク
US6355381B1 (en) * 1998-09-25 2002-03-12 Intel Corporation Method to fabricate extreme ultraviolet lithography masks
AU6417499A (en) 1998-10-08 2000-04-26 Rochester Institute Of Technology Photomask for projection lithography at or below about 160 nm and a method
US6835505B2 (en) * 1998-10-08 2004-12-28 Rochester Institute Of Technology Mask for projection photolithography at or below about 160 nm and a method thereof
US6274280B1 (en) * 1999-01-14 2001-08-14 E.I. Du Pont De Nemours And Company Multilayer attenuating phase-shift masks
US6401236B1 (en) * 1999-04-05 2002-06-04 Micron Technology Inc. Method to eliminate side lobe printing of attenuated phase shift
JP4163331B2 (ja) * 1999-07-14 2008-10-08 アルバック成膜株式会社 位相シフタ膜の製造方法、位相シフトマスク用ブランクスの製造方法、および、位相シフトマスクの製造方法
US6936066B2 (en) * 1999-11-19 2005-08-30 Advanced Bio Prosthetic Surfaces, Ltd. Complaint implantable medical devices and methods of making same
US6472123B1 (en) * 2000-05-15 2002-10-29 Micron Technology, Inc. Multiple pass write method and reticle
JP2002090978A (ja) * 2000-09-12 2002-03-27 Hoya Corp 位相シフトマスクブランクの製造方法、及び位相シフトマスクブランクの製造装置
US6653027B2 (en) * 2001-02-26 2003-11-25 International Business Machines Corporation Attenuated embedded phase shift photomask blanks
US7060394B2 (en) * 2001-03-30 2006-06-13 Hoya Corporation Halftone phase-shift mask blank and halftone phase-shift mask
US20020197509A1 (en) * 2001-04-19 2002-12-26 Carcia Peter Francis Ion-beam deposition process for manufacturing multi-layered attenuated phase shift photomask blanks
US6756160B2 (en) * 2001-04-19 2004-06-29 E.I. Du Pont De Nemours. And Company Ion-beam deposition process for manufacturing attenuated phase shift photomask blanks
US20040115343A1 (en) * 2002-04-19 2004-06-17 Carcia Peter Francis Ion-beam deposition process for manufacturing multi-layered attenuated phase shift photomask blanks
US20040115537A1 (en) * 2002-04-19 2004-06-17 Carcia Peter Francis Ion-beam deposition process for manufacturing attenuated phase shift photomask blanks
JP3802446B2 (ja) 2002-05-15 2006-07-26 東邦化成株式会社 基板乾燥方法およびその装置
JP2005529362A (ja) * 2002-06-10 2005-09-29 トッパン、フォウタマスクス、インク フォトマスクおよび欠陥の修復方法
US6844119B2 (en) 2002-07-30 2005-01-18 Hoya Corporation Method for producing a halftone phase shift mask blank, a halftone phase shift mask blank and halftone phase shift mask
US6855463B2 (en) * 2002-08-27 2005-02-15 Photronics, Inc. Photomask having an intermediate inspection film layer
CN100365510C (zh) * 2003-01-15 2008-01-30 友达光电股份有限公司 制作一金属图案的方法
TW200513812A (en) * 2003-09-05 2005-04-16 Schott Ag Attenuating phase shift mask blank and photomask
US7029803B2 (en) * 2003-09-05 2006-04-18 Schott Ag Attenuating phase shift mask blank and photomask
US7556892B2 (en) * 2004-03-31 2009-07-07 Shin-Etsu Chemical Co., Ltd. Halftone phase shift mask blank, halftone phase shift mask, and pattern transfer method
US20050260504A1 (en) * 2004-04-08 2005-11-24 Hans Becker Mask blank having a protection layer
US7455937B2 (en) * 2004-12-03 2008-11-25 Micron Technology, Inc. Reticles and methods of forming reticles
JP6005530B2 (ja) * 2013-01-15 2016-10-12 Hoya株式会社 マスクブランク、位相シフトマスクおよびこれらの製造方法
JP6430666B2 (ja) * 2016-09-26 2018-11-28 Hoya株式会社 マスクブランク、位相シフトマスク、位相シフトマスクの製造方法及び半導体デバイスの製造方法
JP7662307B2 (ja) * 2020-06-30 2025-04-15 テクセンドフォトマスク株式会社 反射型フォトマスクブランク及び反射型フォトマスク
EP4145222A4 (de) * 2020-04-30 2024-11-06 Toppan Photomask Co., Ltd. Reflektierender fotomaskenrohling und reflektierende fotomaske
KR102430218B1 (ko) * 2020-10-20 2022-08-11 한국전자기술연구원 AlN(질화알루미늄) 박막 증착 방법

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Publication number Priority date Publication date Assignee Title
US5106703A (en) * 1989-11-27 1992-04-21 Carcia Peter F Platinum/cobalt multilayer film for magneto-optical recording
JP3235115B2 (ja) * 1991-05-30 2001-12-04 ソニー株式会社 位相シフトマスクの製造方法
US5288569A (en) * 1992-04-23 1994-02-22 International Business Machines Corporation Feature biassing and absorptive phase-shifting techniques to improve optical projection imaging
TW505829B (en) * 1992-11-16 2002-10-11 Dupont Photomasks Inc A transmissive embedded phase shifter-photomask blank
AU5681194A (en) * 1993-01-21 1994-08-15 Sematech, Inc. Phase shifting mask structure with multilayer optical coating for improved transmission
JP3324005B2 (ja) * 1993-03-29 2002-09-17 大日本印刷株式会社 位相シフトフォトマスク用基板及びその製造法
KR100295385B1 (ko) * 1993-04-09 2001-09-17 기타지마 요시토시 하프톤위상쉬프트포토마스크,하프톤위상쉬프트포토마스크용블랭크스및이들의제조방법
JP3262302B2 (ja) * 1993-04-09 2002-03-04 大日本印刷株式会社 位相シフトフォトマスク、位相シフトフォトマスク用ブランクス及びそれらの製造方法
KR100311704B1 (ko) * 1993-08-17 2001-12-15 기타오카 다카시 하프톤위상쉬프트포토마스크,하프톤위상쉬프트포토마스크용블랭크스및그블랭크스의제조방법
GB2284070B (en) * 1993-11-16 1997-08-27 Compugraphics International Li Phase shift masks
JP2611734B2 (ja) * 1993-12-21 1997-05-21 日本電気株式会社 位相シフトマスク
JP2719493B2 (ja) * 1993-12-22 1998-02-25 ホーヤ株式会社 位相シフトマスクブランク及び位相シフトマスク
JPH07199447A (ja) * 1993-12-28 1995-08-04 Sony Corp 単層ハーフトーン方式位相シフトマスク及びその作製方法
JP3351892B2 (ja) * 1994-01-19 2002-12-03 大日本印刷株式会社 ハーフトーン位相シフトフォトマスク及びハーフトーン位相シフトフォトマスク用ブランクス
US5415953A (en) * 1994-02-14 1995-05-16 E. I. Du Pont De Nemours And Company Photomask blanks comprising transmissive embedded phase shifter
JPH07253655A (ja) * 1994-03-15 1995-10-03 Fujitsu Ltd 露光マスク
TW270219B (de) * 1994-05-31 1996-02-11 Advanced Micro Devices Inc
JP2837807B2 (ja) * 1994-06-27 1998-12-16 ホーヤ株式会社 位相シフトマスク及び位相シフトマスクブランク
JP2785757B2 (ja) * 1995-08-30 1998-08-13 日本電気株式会社 フォトマスク

Also Published As

Publication number Publication date
US5897977A (en) 1999-04-27
JP2000511301A (ja) 2000-08-29
EP0900411B1 (de) 2003-10-08
TW334525B (en) 1998-06-21
CN1311292C (zh) 2007-04-18
WO1997044710A1 (en) 1997-11-27
JP3938940B2 (ja) 2007-06-27
EP0900411A1 (de) 1999-03-10
CN1220742A (zh) 1999-06-23
DE69725438T2 (de) 2004-07-22
DE69725438D1 (de) 2003-11-13

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