ATE263034T1 - Verfahren und vorrichtung zur bildung von mustern in filmen unter verwendung von temperaturgradienten - Google Patents

Verfahren und vorrichtung zur bildung von mustern in filmen unter verwendung von temperaturgradienten

Info

Publication number
ATE263034T1
ATE263034T1 AT01993546T AT01993546T ATE263034T1 AT E263034 T1 ATE263034 T1 AT E263034T1 AT 01993546 T AT01993546 T AT 01993546T AT 01993546 T AT01993546 T AT 01993546T AT E263034 T1 ATE263034 T1 AT E263034T1
Authority
AT
Austria
Prior art keywords
film
temperature gradients
forming patterns
patterns
producing
Prior art date
Application number
AT01993546T
Other languages
English (en)
Inventor
Erik Schaeffer
Ullrich Steiner
Original Assignee
Applied Nanosystems Bv
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Applied Nanosystems Bv filed Critical Applied Nanosystems Bv
Application granted granted Critical
Publication of ATE263034T1 publication Critical patent/ATE263034T1/de

Links

Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41C—PROCESSES FOR THE MANUFACTURE OR REPRODUCTION OF PRINTING SURFACES
    • B41C1/00—Forme preparation
    • B41C1/10—Forme preparation for lithographic printing; Master sheets for transferring a lithographic image to the forme
    • B41C1/1041—Forme preparation for lithographic printing; Master sheets for transferring a lithographic image to the forme by modification of the lithographic properties without removal or addition of material, e.g. by the mere generation of a lithographic pattern
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y30/00—Nanotechnology for materials or surface science, e.g. nanocomposites
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41M—PRINTING, DUPLICATING, MARKING, OR COPYING PROCESSES; COLOUR PRINTING
    • B41M5/00—Duplicating or marking methods; Sheet materials for use therein
    • B41M5/26—Thermography ; Marking by high energetic means, e.g. laser otherwise than by burning, and characterised by the material used
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41M—PRINTING, DUPLICATING, MARKING, OR COPYING PROCESSES; COLOUR PRINTING
    • B41M5/00—Duplicating or marking methods; Sheet materials for use therein
    • B41M5/26—Thermography ; Marking by high energetic means, e.g. laser otherwise than by burning, and characterised by the material used
    • B41M5/36—Thermography ; Marking by high energetic means, e.g. laser otherwise than by burning, and characterised by the material used using a polymeric layer, which may be particulate and which is deformed or structurally changed with modification of its' properties, e.g. of its' optical hydrophobic-hydrophilic, solubility or permeability properties
    • G—PHYSICS
    • G05—CONTROLLING; REGULATING
    • G05D—SYSTEMS FOR CONTROLLING OR REGULATING NON-ELECTRIC VARIABLES
    • G05D23/00—Control of temperature
    • G05D23/19—Control of temperature characterised by the use of electric means
    • G05D23/1927—Control of temperature characterised by the use of electric means using a plurality of sensors
    • G05D23/193—Control of temperature characterised by the use of electric means using a plurality of sensors sensing the temperaure in different places in thermal relationship with one or more spaces
    • G05D23/1935—Control of temperature characterised by the use of electric means using a plurality of sensors sensing the temperaure in different places in thermal relationship with one or more spaces using sequential control

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • General Physics & Mathematics (AREA)
  • Nanotechnology (AREA)
  • Optics & Photonics (AREA)
  • Materials Engineering (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Composite Materials (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Manufacturing & Machinery (AREA)
  • Remote Sensing (AREA)
  • Automation & Control Theory (AREA)
  • Application Of Or Painting With Fluid Materials (AREA)
  • Chemical Vapour Deposition (AREA)
  • Physical Vapour Deposition (AREA)
  • Internal Circuitry In Semiconductor Integrated Circuit Devices (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Shaping Of Tube Ends By Bending Or Straightening (AREA)
AT01993546T 2000-11-08 2001-11-08 Verfahren und vorrichtung zur bildung von mustern in filmen unter verwendung von temperaturgradienten ATE263034T1 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
EP00124205A EP1207048A1 (de) 2000-11-08 2000-11-08 Verfahren und Vorrichtung zur Bildaufzeichnung von Mustern auf Filmen durch die Verwendung von Temperaturgradienten
PCT/EP2001/012944 WO2002038386A1 (en) 2000-11-08 2001-11-08 A process and an apparatus for the formation of patterns in films using temperature gradients

Publications (1)

Publication Number Publication Date
ATE263034T1 true ATE263034T1 (de) 2004-04-15

Family

ID=8170309

Family Applications (1)

Application Number Title Priority Date Filing Date
AT01993546T ATE263034T1 (de) 2000-11-08 2001-11-08 Verfahren und vorrichtung zur bildung von mustern in filmen unter verwendung von temperaturgradienten

Country Status (9)

Country Link
US (1) US20040063250A1 (de)
EP (2) EP1207048A1 (de)
JP (1) JP2004512974A (de)
AT (1) ATE263034T1 (de)
AU (1) AU2002226328A1 (de)
CA (1) CA2428118A1 (de)
DE (1) DE60102600T2 (de)
NZ (1) NZ525162A (de)
WO (1) WO2002038386A1 (de)

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4202962B2 (ja) * 2004-04-27 2008-12-24 株式会社東芝 基板処理方法及び半導体装置の製造方法
US8793006B2 (en) 2008-11-25 2014-07-29 California Institute Of Technology Method and apparatus for the controlled fabrication of micro and nanoscale structures by thermocapillary lithography
FR2950562B1 (fr) * 2009-09-30 2012-01-06 Commissariat Energie Atomique Procede de realisation de motifs localises
KR101792585B1 (ko) 2012-08-20 2017-11-02 코니카 미놀타 가부시키가이샤 도전성 재료를 포함하는 평행선 패턴, 평행선 패턴 형성 방법, 투명 도전막을 구비한 기재, 디바이스 및 전자 기기
DE18801943T1 (de) * 2017-05-17 2020-06-04 Everix, Inc. Ultradünne, flexible dünnschichtfilter mit räumlich oder zeitlich variierenden optischen eigenschaften und herstellungsverfahren dafür
CN115075184B (zh) * 2022-07-08 2024-05-17 江苏百绿园林集团有限公司 一种城市内河弯曲河道防侵蚀护岸结构布局与构建方法

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS50136038A (de) * 1974-04-15 1975-10-28
DE3726809C1 (en) * 1987-08-12 1988-12-15 Dornier System Gmbh Gradient plate
JPH02128890A (ja) * 1988-11-09 1990-05-17 Dainippon Printing Co Ltd パターン形成方法
EP0487794A1 (de) * 1990-11-27 1992-06-03 Sony Corporation Verfahren zur Herstellung von Photolackmustern
US6713238B1 (en) * 1998-10-09 2004-03-30 Stephen Y. Chou Microscale patterning and articles formed thereby

Also Published As

Publication number Publication date
EP1207048A1 (de) 2002-05-22
DE60102600D1 (de) 2004-05-06
US20040063250A1 (en) 2004-04-01
DE60102600T2 (de) 2005-02-17
NZ525162A (en) 2004-08-27
CA2428118A1 (en) 2002-05-16
AU2002226328A1 (en) 2002-05-21
WO2002038386B1 (en) 2002-09-06
JP2004512974A (ja) 2004-04-30
EP1339550B1 (de) 2004-03-31
WO2002038386A1 (en) 2002-05-16
EP1339550A1 (de) 2003-09-03

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Legal Events

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