ATE283119T1 - Verfahren zum entfernen von oberflächenverunreinigungen - Google Patents

Verfahren zum entfernen von oberflächenverunreinigungen

Info

Publication number
ATE283119T1
ATE283119T1 AT00121431T AT00121431T ATE283119T1 AT E283119 T1 ATE283119 T1 AT E283119T1 AT 00121431 T AT00121431 T AT 00121431T AT 00121431 T AT00121431 T AT 00121431T AT E283119 T1 ATE283119 T1 AT E283119T1
Authority
AT
Austria
Prior art keywords
ozone
contaminants
deposited
substrates
treating solution
Prior art date
Application number
AT00121431T
Other languages
English (en)
Inventor
Hisashi Muraoka
Original Assignee
Nomura Micro Science Kk
Ums Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Family has litigation
First worldwide family litigation filed litigation Critical https://patents.darts-ip.com/?family=26553579&utm_source=google_patent&utm_medium=platform_link&utm_campaign=public_patent_search&patent=ATE283119(T1) "Global patent litigation dataset” by Darts-ip is licensed under a Creative Commons Attribution 4.0 International License.
Application filed by Nomura Micro Science Kk, Ums Co Ltd filed Critical Nomura Micro Science Kk
Application granted granted Critical
Publication of ATE283119T1 publication Critical patent/ATE283119T1/de

Links

Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B08—CLEANING
    • B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
    • B08B3/00—Cleaning by methods involving the use or presence of liquid or steam
    • B08B3/04—Cleaning involving contact with liquid
    • B08B3/08—Cleaning involving contact with liquid the liquid having chemical or dissolving effect
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P52/00—Grinding, lapping or polishing of wafers, substrates or parts of devices
    • C—CHEMISTRY; METALLURGY
    • C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
    • C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
    • C11D3/00—Other compounding ingredients of detergent compositions covered in group C11D1/00
    • C11D3/39—Organic or inorganic per-compounds
    • C11D3/3947—Liquid compositions
    • C—CHEMISTRY; METALLURGY
    • C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
    • C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
    • C11D7/00—Compositions of detergents based essentially on non-surface-active compounds
    • C11D7/22—Organic compounds
    • C11D7/26—Organic compounds containing oxygen
    • C11D7/265—Carboxylic acids or salts thereof
    • C—CHEMISTRY; METALLURGY
    • C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
    • C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
    • C11D7/00—Compositions of detergents based essentially on non-surface-active compounds
    • C11D7/22—Organic compounds
    • C11D7/28—Organic compounds containing halogen
    • C11D7/30—Halogenated hydrocarbons
    • C—CHEMISTRY; METALLURGY
    • C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
    • C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
    • C11D2111/00—Cleaning compositions characterised by the objects to be cleaned; Cleaning compositions characterised by non-standard cleaning or washing processes
    • C11D2111/10—Objects to be cleaned
    • C11D2111/14—Hard surfaces
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S134/00—Cleaning and liquid contact with solids
    • Y10S134/902—Semiconductor wafer

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Organic Chemistry (AREA)
  • Engineering & Computer Science (AREA)
  • Oil, Petroleum & Natural Gas (AREA)
  • Wood Science & Technology (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Inorganic Chemistry (AREA)
  • Health & Medical Sciences (AREA)
  • Emergency Medicine (AREA)
  • General Chemical & Material Sciences (AREA)
  • Cleaning Or Drying Semiconductors (AREA)
  • Mechanical Treatment Of Semiconductor (AREA)
AT00121431T 1999-09-30 2000-09-29 Verfahren zum entfernen von oberflächenverunreinigungen ATE283119T1 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP28001799 1999-09-30
JP2000086924 2000-03-27

Publications (1)

Publication Number Publication Date
ATE283119T1 true ATE283119T1 (de) 2004-12-15

Family

ID=26553579

Family Applications (1)

Application Number Title Priority Date Filing Date
AT00121431T ATE283119T1 (de) 1999-09-30 2000-09-29 Verfahren zum entfernen von oberflächenverunreinigungen

Country Status (6)

Country Link
US (1) US6699330B1 (de)
EP (1) EP1088603B1 (de)
KR (1) KR100707126B1 (de)
AT (1) ATE283119T1 (de)
DE (1) DE60016133T2 (de)
TW (1) TW466558B (de)

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JP6875561B2 (ja) * 2018-01-31 2021-05-26 富士フイルム株式会社 分析方法、薬液、及び、薬液の製造方法
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CN109201605B (zh) * 2018-09-13 2023-05-09 无锡市恒利弘实业有限公司 一种金属表面保护uv油墨的脱膜装置
CN109201606B (zh) * 2018-09-13 2023-05-09 无锡市恒利弘实业有限公司 一种金属基材表面uv油墨的剥离联用工艺
CN109201607B (zh) * 2018-09-13 2023-05-09 无锡市恒利弘实业有限公司 一种金属基材表面uv油墨的剥离联用装置
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Also Published As

Publication number Publication date
DE60016133T2 (de) 2005-05-25
US6699330B1 (en) 2004-03-02
KR100707126B1 (ko) 2007-04-16
EP1088603B1 (de) 2004-11-24
EP1088603A1 (de) 2001-04-04
KR20010039947A (ko) 2001-05-15
DE60016133D1 (de) 2004-12-30
TW466558B (en) 2001-12-01

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