ATE289079T1 - Pixelzelle mit dünnfilmtransistor für anzeigevorrichtung - Google Patents

Pixelzelle mit dünnfilmtransistor für anzeigevorrichtung

Info

Publication number
ATE289079T1
ATE289079T1 AT01310043T AT01310043T ATE289079T1 AT E289079 T1 ATE289079 T1 AT E289079T1 AT 01310043 T AT01310043 T AT 01310043T AT 01310043 T AT01310043 T AT 01310043T AT E289079 T1 ATE289079 T1 AT E289079T1
Authority
AT
Austria
Prior art keywords
thin film
film transistor
pixel cell
layer
transistor structure
Prior art date
Application number
AT01310043T
Other languages
English (en)
Inventor
Evan G Colgan
Kai R Schleupen
Takatoshi Tsujimura
Original Assignee
Ibm
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Ibm filed Critical Ibm
Application granted granted Critical
Publication of ATE289079T1 publication Critical patent/ATE289079T1/de

Links

Classifications

    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/136—Liquid crystal cells structurally associated with a semi-conducting layer or substrate, e.g. cells forming part of an integrated circuit
    • G02F1/1362—Active matrix addressed cells
    • G02F1/136227—Through-hole connection of the pixel electrode to the active element through an insulation layer
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D30/00—Field-effect transistors [FET]
    • H10D30/60—Insulated-gate field-effect transistors [IGFET]
    • H10D30/67—Thin-film transistors [TFT]
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/136—Liquid crystal cells structurally associated with a semi-conducting layer or substrate, e.g. cells forming part of an integrated circuit
    • G02F1/1362—Active matrix addressed cells
    • G02F1/1368—Active matrix addressed cells in which the switching element is a three-electrode device

Landscapes

  • Physics & Mathematics (AREA)
  • Nonlinear Science (AREA)
  • Engineering & Computer Science (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Mathematical Physics (AREA)
  • Chemical & Material Sciences (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Thin Film Transistor (AREA)
  • Liquid Crystal (AREA)
  • Devices For Indicating Variable Information By Combining Individual Elements (AREA)
AT01310043T 2000-12-05 2001-11-30 Pixelzelle mit dünnfilmtransistor für anzeigevorrichtung ATE289079T1 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US09/730,218 US6511869B2 (en) 2000-12-05 2000-12-05 Thin film transistors with self-aligned transparent pixel electrode

Publications (1)

Publication Number Publication Date
ATE289079T1 true ATE289079T1 (de) 2005-02-15

Family

ID=24934439

Family Applications (1)

Application Number Title Priority Date Filing Date
AT01310043T ATE289079T1 (de) 2000-12-05 2001-11-30 Pixelzelle mit dünnfilmtransistor für anzeigevorrichtung

Country Status (8)

Country Link
US (2) US6511869B2 (de)
EP (1) EP1213602B1 (de)
KR (1) KR100454186B1 (de)
CN (1) CN1164972C (de)
AT (1) ATE289079T1 (de)
CA (1) CA2358579C (de)
DE (1) DE60108834T2 (de)
TW (1) TW548848B (de)

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KR100611042B1 (ko) * 1999-12-27 2006-08-09 엘지.필립스 엘시디 주식회사 액정 표시장치 제조방법 및 그 제조방법에 따른액정표시장치
US6511869B2 (en) * 2000-12-05 2003-01-28 International Business Machines Corporation Thin film transistors with self-aligned transparent pixel electrode
US7205570B2 (en) * 2002-07-19 2007-04-17 Samsung Electronics Co., Ltd. Thin film transistor array panel
TWI302996B (en) * 2002-07-25 2008-11-11 Toppoly Optoelectronics Corp Method for forming a self-aligned pixel electrode of lcd
CN100364108C (zh) * 2002-08-28 2008-01-23 中国科学院长春应用化学研究所 含有有机半导体的夹心型场效应晶体管及制作方法
TW575961B (en) * 2002-12-03 2004-02-11 Quanta Display Inc Pixel structure
CN1324665C (zh) * 2004-03-29 2007-07-04 广辉电子股份有限公司 自对准式薄膜晶体管的制造方法
GB0409439D0 (en) * 2004-04-28 2004-06-02 Koninkl Philips Electronics Nv Thin film transistor
JP4802462B2 (ja) * 2004-07-27 2011-10-26 三菱電機株式会社 薄膜トランジスタアレイ基板の製造方法
CN100356261C (zh) * 2004-12-01 2007-12-19 鸿富锦精密工业（深圳）有限公司 液晶显示器
KR20060080728A (ko) * 2005-01-06 2006-07-11 삼성에스디아이 주식회사 탄소나노튜브 합성을 위한 촉매층의 패터닝 방법 및 이를이용한 전계방출소자의 제조방법
US7548302B2 (en) * 2005-03-29 2009-06-16 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US7317506B2 (en) * 2005-03-29 2008-01-08 Asml Netherlands B.V. Variable illumination source
TW200811569A (en) * 2006-08-21 2008-03-01 Prime View Int Co Ltd E-ink display panel
CN100521165C (zh) * 2007-10-16 2009-07-29 友达光电股份有限公司 一种薄膜晶体管及其形成方法
TWI401750B (zh) * 2010-05-17 2013-07-11 Au Optronics Corp 薄膜電晶體及其製造方法
TWI451563B (zh) * 2011-11-21 2014-09-01 Au Optronics Corp 薄膜電晶體陣列及其線路結構
US9223128B2 (en) 2012-12-18 2015-12-29 Pixtronix, Inc. Display apparatus with densely packed electromechanical systems display elements
KR102061306B1 (ko) 2013-06-14 2019-12-31 한국전자통신연구원 트랜지스터 및 그 제조방법
TWI511302B (zh) * 2013-08-23 2015-12-01 業鑫科技顧問股份有限公司 薄膜電晶體及使用該薄膜電晶體的顯示陣列基板的製造方法
WO2018181142A1 (ja) * 2017-03-31 2018-10-04 シャープ株式会社 アクティブマトリクス基板、液晶表示装置

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JPH06208132A (ja) * 1990-03-24 1994-07-26 Sony Corp 液晶表示装置
KR950001360B1 (ko) 1990-11-26 1995-02-17 가부시키가이샤 한도오따이 에네루기 겐큐쇼 전기 광학장치와 그 구동방법
US5126865A (en) * 1990-12-31 1992-06-30 Honeywell Inc. Liquid crystal display with sub-pixels
DE69332142T2 (de) 1992-12-25 2003-03-06 Sony Corp., Tokio/Tokyo Substrat mit aktiver Matrix
US5550066A (en) * 1994-12-14 1996-08-27 Eastman Kodak Company Method of fabricating a TFT-EL pixel
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JPH09105952A (ja) * 1995-10-11 1997-04-22 Toshiba Electron Eng Corp アクティブマトリクス型液晶表示装置
JP3205501B2 (ja) * 1996-03-12 2001-09-04 シャープ株式会社 アクティブマトリクス表示装置およびその修正方法
DE19712233C2 (de) * 1996-03-26 2003-12-11 Lg Philips Lcd Co Flüssigkristallanzeige und Herstellungsverfahren dafür
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CN1148600C (zh) * 1996-11-26 2004-05-05 三星电子株式会社 薄膜晶体管基片及其制造方法
US6236440B1 (en) * 1998-07-22 2001-05-22 U.S. Philips Corporation Display device in which one of the two electrodes of a pixel is coated with a dipole material to equalize the electrode work functions
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US6511869B2 (en) * 2000-12-05 2003-01-28 International Business Machines Corporation Thin film transistors with self-aligned transparent pixel electrode

Also Published As

Publication number Publication date
TW548848B (en) 2003-08-21
CA2358579A1 (en) 2002-06-05
CA2358579C (en) 2006-08-29
DE60108834T2 (de) 2006-01-19
CN1164972C (zh) 2004-09-01
US6713786B2 (en) 2004-03-30
DE60108834D1 (de) 2005-03-17
CN1357786A (zh) 2002-07-10
US6511869B2 (en) 2003-01-28
EP1213602A3 (de) 2003-07-02
US20030138995A1 (en) 2003-07-24
KR100454186B1 (ko) 2004-10-26
EP1213602A2 (de) 2002-06-12
KR20020044542A (ko) 2002-06-15
EP1213602B1 (de) 2005-02-09
US20020066900A1 (en) 2002-06-06

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