ATE296335T1 - Abscheidungsverfahren mit verschiedenen quellen - Google Patents

Abscheidungsverfahren mit verschiedenen quellen

Info

Publication number
ATE296335T1
ATE296335T1 AT01271929T AT01271929T ATE296335T1 AT E296335 T1 ATE296335 T1 AT E296335T1 AT 01271929 T AT01271929 T AT 01271929T AT 01271929 T AT01271929 T AT 01271929T AT E296335 T1 ATE296335 T1 AT E296335T1
Authority
AT
Austria
Prior art keywords
composition
substrate
pellet
deposition
sulphide
Prior art date
Application number
AT01271929T
Other languages
English (en)
Inventor
Dan Daeweon Cheong
Original Assignee
Ifire Technology Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Ifire Technology Corp filed Critical Ifire Technology Corp
Application granted granted Critical
Publication of ATE296335T1 publication Critical patent/ATE296335T1/de

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09K—MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FOR ELSEWHERE
    • C09K11/00—Luminescent materials, e.g. electroluminescent or chemiluminescent
    • C09K11/08—Luminescent materials, e.g. electroluminescent or chemiluminescent containing inorganic luminescent materials
    • C09K11/77—Luminescent materials, e.g. electroluminescent or chemiluminescent containing inorganic luminescent materials containing rare earth metals
    • C09K11/7728—Luminescent materials, e.g. electroluminescent or chemiluminescent containing inorganic luminescent materials containing rare earth metals containing europium
    • C09K11/7729—Chalcogenides
    • C09K11/7731—Chalcogenides with alkaline earth metals
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09K—MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FOR ELSEWHERE
    • C09K11/00—Luminescent materials, e.g. electroluminescent or chemiluminescent
    • C09K11/08—Luminescent materials, e.g. electroluminescent or chemiluminescent containing inorganic luminescent materials
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09K—MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FOR ELSEWHERE
    • C09K11/00—Luminescent materials, e.g. electroluminescent or chemiluminescent
    • C09K11/08—Luminescent materials, e.g. electroluminescent or chemiluminescent containing inorganic luminescent materials
    • C09K11/77—Luminescent materials, e.g. electroluminescent or chemiluminescent containing inorganic luminescent materials containing rare earth metals
    • C09K11/7728—Luminescent materials, e.g. electroluminescent or chemiluminescent containing inorganic luminescent materials containing rare earth metals containing europium
    • C09K11/7734—Aluminates
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/0623—Sulfides, selenides or tellurides
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24—Vacuum evaporation
    • C23C14/28—Vacuum evaporation by wave energy or particle radiation
    • C23C14/30—Vacuum evaporation by wave energy or particle radiation by electron bombardment
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/54—Controlling or regulating the coating process
    • C23C14/548—Controlling the composition
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01B—CABLES; CONDUCTORS; INSULATORS; SELECTION OF MATERIALS FOR THEIR CONDUCTIVE, INSULATING OR DIELECTRIC PROPERTIES
    • H01B3/00—Insulators or insulating bodies characterised by the insulating materials; Selection of materials for their insulating or dielectric properties
    • H01B3/02—Insulators or insulating bodies characterised by the insulating materials; Selection of materials for their insulating or dielectric properties mainly consisting of inorganic substances

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Organic Chemistry (AREA)
  • Inorganic Chemistry (AREA)
  • Metallurgy (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Mechanical Engineering (AREA)
  • Toxicology (AREA)
  • Health & Medical Sciences (AREA)
  • Luminescent Compositions (AREA)
  • Physical Vapour Deposition (AREA)
  • Steroid Compounds (AREA)
  • Compounds Of Unknown Constitution (AREA)
  • Electroluminescent Light Sources (AREA)
AT01271929T 2000-12-22 2001-12-17 Abscheidungsverfahren mit verschiedenen quellen ATE296335T1 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US09/747,315 US6610352B2 (en) 2000-12-22 2000-12-22 Multiple source deposition process
PCT/CA2001/001823 WO2002051960A1 (en) 2000-12-22 2001-12-17 Multiple source deposition process

Publications (1)

Publication Number Publication Date
ATE296335T1 true ATE296335T1 (de) 2005-06-15

Family

ID=25004562

Family Applications (1)

Application Number Title Priority Date Filing Date
AT01271929T ATE296335T1 (de) 2000-12-22 2001-12-17 Abscheidungsverfahren mit verschiedenen quellen

Country Status (8)

Country Link
US (2) US6610352B2 (de)
EP (1) EP1346007B1 (de)
JP (2) JP2004522826A (de)
KR (1) KR100874523B1 (de)
AT (1) ATE296335T1 (de)
CA (1) CA2431084C (de)
DE (1) DE60111077T2 (de)
WO (1) WO2002051960A1 (de)

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US6771019B1 (en) * 1999-05-14 2004-08-03 Ifire Technology, Inc. Electroluminescent laminate with patterned phosphor structure and thick film dielectric with improved dielectric properties
US7005198B2 (en) 2001-04-19 2006-02-28 The Westaim Corporation Phosphor thin film, preparation method, and EL panel
US6627251B2 (en) * 2001-04-19 2003-09-30 Tdk Corporation Phosphor thin film, preparation method, and EL panel
US6793782B2 (en) 2001-12-21 2004-09-21 Ifire Technology Inc. Sputter deposition process for electroluminescent phosphors
JP2003301171A (ja) * 2002-02-06 2003-10-21 Tdk Corp 蛍光体薄膜、その製造方法およびｅｌパネル
US6838114B2 (en) 2002-05-24 2005-01-04 Micron Technology, Inc. Methods for controlling gas pulsing in processes for depositing materials onto micro-device workpieces
US6955725B2 (en) 2002-08-15 2005-10-18 Micron Technology, Inc. Reactors with isolated gas connectors and methods for depositing materials onto micro-device workpieces
WO2004055231A2 (en) * 2002-12-16 2004-07-01 Ifire Technology Corp. Composite sputter target and phosphor deposition method
CA2509417A1 (en) 2002-12-20 2004-07-08 Ifire Technology Corp. Aluminum nitride passivated phosphors for electroluminescent displays
TW200420740A (en) 2003-01-30 2004-10-16 Ifire Technology Inc Controlled sulfur species deposition process
US7155250B2 (en) * 2003-03-10 2006-12-26 Lucent Technologies Inc. Fast method for adjusting downlink transmitted power
CN100529155C (zh) * 2003-07-03 2009-08-19 伊菲雷知识产权公司 用于无机发光材料沉积的硫化氢注射方法
CA2540592A1 (en) * 2003-10-07 2005-04-14 Ifire Technology Corp. Polysulfide thermal vapour source for thin sulfide film deposition
US7581511B2 (en) 2003-10-10 2009-09-01 Micron Technology, Inc. Apparatus and methods for manufacturing microfeatures on workpieces using plasma vapor processes
US20050092253A1 (en) * 2003-11-04 2005-05-05 Venkat Selvamanickam Tape-manufacturing system having extended operational capabilites
US8057856B2 (en) * 2004-03-15 2011-11-15 Ifire Ip Corporation Method for gettering oxygen and water during vacuum deposition of sulfide films
US8133554B2 (en) 2004-05-06 2012-03-13 Micron Technology, Inc. Methods for depositing material onto microfeature workpieces in reaction chambers and systems for depositing materials onto microfeature workpieces
US7699932B2 (en) 2004-06-02 2010-04-20 Micron Technology, Inc. Reactors, systems and methods for depositing thin films onto microfeature workpieces
US7427367B2 (en) 2004-08-06 2008-09-23 Ifire Technology Corp. Barium thioaluminate phosphor materials with novel crystal structures
US20060046594A1 (en) * 2004-08-30 2006-03-02 David Starrett Flame retardant sound dampening appliance insulation
WO2006045195A1 (en) * 2004-10-29 2006-05-04 Ifire Technology Corp. Novel thiosilicate phosphor compositions and deposition methods using barium-silicon vacuum deposition sources for deposition of thiosilicate phosphor films
JP4849829B2 (ja) * 2005-05-15 2012-01-11 株式会社ソニー・コンピュータエンタテインメント センタ装置
JP5016848B2 (ja) * 2006-05-19 2012-09-05 キヤノン株式会社 多原色ディスプレイ
KR20080045974A (ko) * 2006-11-21 2008-05-26 삼성전자주식회사 박막 증착장치 및 박막 증착방법
US10276740B1 (en) 2018-03-19 2019-04-30 The United States Of America As Represented By The Secretary Of The Air Force Co-deposition of black silicon

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US4393873A (en) * 1980-03-10 1983-07-19 Nawash Michael S Gastrostomy and other percutaneous transport tubes
CA1243762A (en) 1983-10-11 1988-10-25 Martin P. Schrank Thin film electroluminescent display device
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Also Published As

Publication number Publication date
EP1346007B1 (de) 2005-05-25
CA2431084C (en) 2010-03-23
KR20030091948A (ko) 2003-12-03
WO2002051960A1 (en) 2002-07-04
US20020081371A1 (en) 2002-06-27
KR100874523B1 (ko) 2008-12-16
US6610352B2 (en) 2003-08-26
EP1346007A1 (de) 2003-09-24
DE60111077T2 (de) 2006-01-26
CA2431084A1 (en) 2002-07-04
US20040028957A1 (en) 2004-02-12
DE60111077D1 (de) 2005-06-30
JP2004522826A (ja) 2004-07-29
JP2009062619A (ja) 2009-03-26

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