ATE325368T1 - Farbfilter und verfahren zu seiner herstellung - Google Patents
Farbfilter und verfahren zu seiner herstellungInfo
- Publication number
- ATE325368T1 ATE325368T1 AT01116623T AT01116623T ATE325368T1 AT E325368 T1 ATE325368 T1 AT E325368T1 AT 01116623 T AT01116623 T AT 01116623T AT 01116623 T AT01116623 T AT 01116623T AT E325368 T1 ATE325368 T1 AT E325368T1
- Authority
- AT
- Austria
- Prior art keywords
- color filter
- transparent substrate
- producing
- pixel
- resistance
- Prior art date
Links
- 238000004519 manufacturing process Methods 0.000 title 1
- 239000000758 substrate Substances 0.000 abstract 2
- 229920003180 amino resin Polymers 0.000 abstract 1
- 125000003178 carboxy group Chemical group [H]OC(*)=O 0.000 abstract 1
- 239000011248 coating agent Substances 0.000 abstract 1
- 239000011247 coating layer Substances 0.000 abstract 1
- 238000000576 coating method Methods 0.000 abstract 1
- 238000004040 coloring Methods 0.000 abstract 1
- 150000001875 compounds Chemical class 0.000 abstract 1
- 125000000524 functional group Chemical group 0.000 abstract 1
- 238000013007 heat curing Methods 0.000 abstract 1
- 125000002887 hydroxy group Chemical group [H]O* 0.000 abstract 1
- 239000000463 material Substances 0.000 abstract 1
- ISWSIDIOOBJBQZ-UHFFFAOYSA-N phenol group Chemical group C1(=CC=CC=C1)O ISWSIDIOOBJBQZ-UHFFFAOYSA-N 0.000 abstract 1
- 239000002904 solvent Substances 0.000 abstract 1
- 239000000126 substance Substances 0.000 abstract 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/20—Filters
- G02B5/201—Filters in the form of arrays
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/0005—Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
- G03F7/0007—Filters, e.g. additive colour filters; Components for display devices
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
- G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
- Y02P20/00—Technologies relating to chemical industry
- Y02P20/50—Improvements relating to the production of bulk chemicals
- Y02P20/582—Recycling of unreacted starting or intermediate materials
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Optical Filters (AREA)
- Materials For Photolithography (AREA)
- Color Television Image Signal Generators (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2000212674 | 2000-07-13 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| ATE325368T1 true ATE325368T1 (de) | 2006-06-15 |
Family
ID=18708559
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| AT01116623T ATE325368T1 (de) | 2000-07-13 | 2001-07-12 | Farbfilter und verfahren zu seiner herstellung |
Country Status (7)
| Country | Link |
|---|---|
| US (1) | US6524757B2 (de) |
| EP (1) | EP1174765B1 (de) |
| KR (1) | KR100716632B1 (de) |
| CN (1) | CN1211672C (de) |
| AT (1) | ATE325368T1 (de) |
| DE (1) | DE60119233T2 (de) |
| TW (1) | TW496970B (de) |
Families Citing this family (10)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP1193513B1 (de) * | 2000-09-27 | 2008-12-03 | DIC Corporation | Verfahren zur Herstellung eines Farbfilters |
| US20040242725A1 (en) * | 2001-10-18 | 2004-12-02 | Gordon Kotora | Ionically cross-linked paste inks |
| JP2004198717A (ja) * | 2002-12-18 | 2004-07-15 | Showa Denko Kk | カラーフィルターブラックマトリックスレジスト組成物及びその組成物に用いるカーボンブラック分散液組成物 |
| PT1633472E (pt) * | 2003-06-13 | 2008-11-24 | Dsm Ip Assets Bv | Materiais encapsulados |
| US8334012B2 (en) * | 2004-12-20 | 2012-12-18 | Palo Alto Research Center Incorporated | Method for preprinting and/or reliquifying subpixels to achieve color uniformity in color filters |
| US20060264873A1 (en) * | 2005-05-23 | 2006-11-23 | Carstens Jerry E | System comprising thong-shaped holder and absorbent article |
| TWI475038B (zh) * | 2005-11-30 | 2015-03-01 | Dainippon Ink & Chemicals | 苯酚樹脂組成物、其硬化物、覆銅積層板用樹脂組成物、覆銅積層板及新穎苯酚樹脂 |
| JP5371449B2 (ja) | 2008-01-31 | 2013-12-18 | 富士フイルム株式会社 | 樹脂、顔料分散液、着色硬化性組成物、これを用いたカラーフィルタ及びその製造方法 |
| CN102015910B (zh) * | 2008-11-27 | 2013-09-11 | Dic株式会社 | 滤色器用颜料组合物、其制造方法以及滤色器 |
| JP5479163B2 (ja) * | 2009-03-31 | 2014-04-23 | 富士フイルム株式会社 | カラーフィルタ用着色硬化性組成物、カラーフィルタ及びその製造方法、並びに固体撮像素子 |
Family Cites Families (13)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE69418826T2 (de) | 1993-11-22 | 1999-10-21 | Ciba Specialty Chemicals Holding Inc., Basel | Zusammensetzungen zur Herstellung strukturierter Farbbilder und deren Anwendung |
| JP3557680B2 (ja) | 1994-12-26 | 2004-08-25 | 大日本インキ化学工業株式会社 | 新規なアルキルエーテル化アミノ樹脂およびその製造方法 |
| JP3449664B2 (ja) | 1995-04-19 | 2003-09-22 | 東京応化工業株式会社 | ネガ型レジスト組成物 |
| JP3101974B2 (ja) | 1995-11-27 | 2000-10-23 | 大日本インキ化学工業株式会社 | ４，６−ジアミノ−１，３，５−トリアジン−２−イル−安息香酸類の製法 |
| JPH09203806A (ja) | 1996-01-29 | 1997-08-05 | Mitsubishi Chem Corp | カラーフィルター用ネガ型感光性組成物 |
| JP3760215B2 (ja) | 1996-01-30 | 2006-03-29 | 大日本インキ化学工業株式会社 | 水性塗料用組成物 |
| JPH1060214A (ja) * | 1996-08-22 | 1998-03-03 | Nippon Oil Co Ltd | カラーフィルター用アクリル樹脂組成物 |
| WO1999007800A1 (en) | 1997-08-11 | 1999-02-18 | Dainippon Ink And Chemicals, Inc. | Water-based coating composition or water-based coating material |
| JP3982021B2 (ja) | 1996-09-10 | 2007-09-26 | 大日本インキ化学工業株式会社 | 水性樹脂組成物 |
| US6048924A (en) | 1996-09-10 | 2000-04-11 | Dainippon Ink And Chemicals, Inc. | Aqueous resin composition and aqueous paint |
| WO1998011165A1 (en) | 1996-09-10 | 1998-03-19 | Dainippon Ink And Chemicals, Inc. | Aqueous resin composition and aqueous paint |
| KR100256392B1 (ko) | 1996-09-30 | 2000-05-15 | 겐지 아이다 | 칼라필터용 감광성 수지 착색 조성물 및 이로부터 형성된 칼라필터 및 그 제조방법 |
| JPH10273525A (ja) * | 1997-03-31 | 1998-10-13 | Jsr Corp | アルカリ可溶性重合体 |
-
2001
- 2001-07-11 US US09/901,596 patent/US6524757B2/en not_active Expired - Fee Related
- 2001-07-12 DE DE60119233T patent/DE60119233T2/de not_active Expired - Fee Related
- 2001-07-12 EP EP01116623A patent/EP1174765B1/de not_active Expired - Lifetime
- 2001-07-12 TW TW090117068A patent/TW496970B/zh not_active IP Right Cessation
- 2001-07-12 AT AT01116623T patent/ATE325368T1/de not_active IP Right Cessation
- 2001-07-13 KR KR1020010042425A patent/KR100716632B1/ko not_active Expired - Fee Related
- 2001-07-13 CN CNB011407565A patent/CN1211672C/zh not_active Expired - Fee Related
Also Published As
| Publication number | Publication date |
|---|---|
| CN1338643A (zh) | 2002-03-06 |
| EP1174765A1 (de) | 2002-01-23 |
| US20020025481A1 (en) | 2002-02-28 |
| KR20020007216A (ko) | 2002-01-26 |
| DE60119233T2 (de) | 2007-02-22 |
| EP1174765B1 (de) | 2006-05-03 |
| CN1211672C (zh) | 2005-07-20 |
| KR100716632B1 (ko) | 2007-05-09 |
| DE60119233D1 (de) | 2006-06-08 |
| US6524757B2 (en) | 2003-02-25 |
| TW496970B (en) | 2002-08-01 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| RER | Ceased as to paragraph 5 lit. 3 law introducing patent treaties |