ATE340413T1 - Organischer dünnfilmtransistor mit siloxanpolymergrenzfläche - Google Patents
Organischer dünnfilmtransistor mit siloxanpolymergrenzflächeInfo
- Publication number
- ATE340413T1 ATE340413T1 AT02797052T AT02797052T ATE340413T1 AT E340413 T1 ATE340413 T1 AT E340413T1 AT 02797052 T AT02797052 T AT 02797052T AT 02797052 T AT02797052 T AT 02797052T AT E340413 T1 ATE340413 T1 AT E340413T1
- Authority
- AT
- Austria
- Prior art keywords
- thin film
- film transistor
- organic thin
- siloxane polymer
- polymer interface
- Prior art date
Links
Classifications
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K10/00—Organic devices specially adapted for rectifying, amplifying, oscillating or switching; Organic capacitors or resistors having potential barriers
- H10K10/40—Organic transistors
- H10K10/46—Field-effect transistors, e.g. organic thin-film transistors [OTFT]
- H10K10/462—Insulated gate field-effect transistors [IGFETs]
- H10K10/468—Insulated gate field-effect transistors [IGFETs] characterised by the gate dielectrics
- H10K10/471—Insulated gate field-effect transistors [IGFETs] characterised by the gate dielectrics the gate dielectric comprising only organic materials
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
- H10P14/00—Formation of materials, e.g. in the shape of layers or pillars
- H10P14/60—Formation of materials, e.g. in the shape of layers or pillars of insulating materials
- H10P14/69—Inorganic materials
- H10P14/692—Inorganic materials composed of oxides, glassy oxides or oxide-based glasses
- H10P14/6921—Inorganic materials composed of oxides, glassy oxides or oxide-based glasses containing silicon
- H10P14/6922—Inorganic materials composed of oxides, glassy oxides or oxide-based glasses containing silicon the material containing Si, O and at least one of H, N, C, F or other non-metal elements, e.g. SiOC, SiOC:H or SiONC
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K10/00—Organic devices specially adapted for rectifying, amplifying, oscillating or switching; Organic capacitors or resistors having potential barriers
- H10K10/40—Organic transistors
- H10K10/46—Field-effect transistors, e.g. organic thin-film transistors [OTFT]
- H10K10/462—Insulated gate field-effect transistors [IGFETs]
- H10K10/464—Lateral top-gate IGFETs comprising only a single gate
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K10/00—Organic devices specially adapted for rectifying, amplifying, oscillating or switching; Organic capacitors or resistors having potential barriers
- H10K10/40—Organic transistors
- H10K10/46—Field-effect transistors, e.g. organic thin-film transistors [OTFT]
- H10K10/462—Insulated gate field-effect transistors [IGFETs]
- H10K10/466—Lateral bottom-gate IGFETs comprising only a single gate
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K10/00—Organic devices specially adapted for rectifying, amplifying, oscillating or switching; Organic capacitors or resistors having potential barriers
- H10K10/40—Organic transistors
- H10K10/46—Field-effect transistors, e.g. organic thin-film transistors [OTFT]
- H10K10/462—Insulated gate field-effect transistors [IGFETs]
- H10K10/468—Insulated gate field-effect transistors [IGFETs] characterised by the gate dielectrics
- H10K10/474—Insulated gate field-effect transistors [IGFETs] characterised by the gate dielectrics the gate dielectric comprising a multilayered structure
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K10/00—Organic devices specially adapted for rectifying, amplifying, oscillating or switching; Organic capacitors or resistors having potential barriers
- H10K10/40—Organic transistors
- H10K10/46—Field-effect transistors, e.g. organic thin-film transistors [OTFT]
- H10K10/462—Insulated gate field-effect transistors [IGFETs]
- H10K10/468—Insulated gate field-effect transistors [IGFETs] characterised by the gate dielectrics
- H10K10/474—Insulated gate field-effect transistors [IGFETs] characterised by the gate dielectrics the gate dielectric comprising a multilayered structure
- H10K10/476—Insulated gate field-effect transistors [IGFETs] characterised by the gate dielectrics the gate dielectric comprising a multilayered structure comprising at least one organic layer and at least one inorganic layer
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K71/00—Manufacture or treatment specially adapted for the organic devices covered by this subclass
- H10K71/10—Deposition of organic active material
- H10K71/16—Deposition of organic active material using physical vapour deposition [PVD], e.g. vacuum deposition or sputtering
- H10K71/164—Deposition of organic active material using physical vapour deposition [PVD], e.g. vacuum deposition or sputtering using vacuum deposition
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K85/00—Organic materials used in the body or electrodes of devices covered by this subclass
- H10K85/60—Organic compounds having low molecular weight
- H10K85/615—Polycyclic condensed aromatic hydrocarbons, e.g. anthracene
Landscapes
- Chemical & Material Sciences (AREA)
- Inorganic Chemistry (AREA)
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Materials Engineering (AREA)
- Manufacturing & Machinery (AREA)
- Thin Film Transistor (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US10/012,655 US6617609B2 (en) | 2001-11-05 | 2001-11-05 | Organic thin film transistor with siloxane polymer interface |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| ATE340413T1 true ATE340413T1 (de) | 2006-10-15 |
Family
ID=21756040
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| AT02797052T ATE340413T1 (de) | 2001-11-05 | 2002-10-23 | Organischer dünnfilmtransistor mit siloxanpolymergrenzfläche |
Country Status (9)
| Country | Link |
|---|---|
| US (1) | US6617609B2 (de) |
| EP (1) | EP1442487B1 (de) |
| JP (1) | JP2005509299A (de) |
| KR (1) | KR20050039730A (de) |
| CN (1) | CN100459206C (de) |
| AT (1) | ATE340413T1 (de) |
| AU (1) | AU2002361575A1 (de) |
| DE (1) | DE60214875T2 (de) |
| WO (1) | WO2003041186A2 (de) |
Families Citing this family (83)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6946676B2 (en) * | 2001-11-05 | 2005-09-20 | 3M Innovative Properties Company | Organic thin film transistor with polymeric interface |
| EP1361619A3 (de) * | 2002-05-09 | 2007-08-15 | Konica Corporation | Organischer Dünnfilmtransistor, organischer Dünnfilmtransistorträger und dessen Herstellungsmethode |
| US6891190B2 (en) * | 2002-05-23 | 2005-05-10 | Motorola, Inc. | Organic semiconductor device and method |
| US6870181B2 (en) * | 2002-07-02 | 2005-03-22 | Motorola, Inc. | Organic contact-enhancing layer for organic field effect transistors |
| US8044517B2 (en) * | 2002-07-29 | 2011-10-25 | Polyic Gmbh & Co. Kg | Electronic component comprising predominantly organic functional materials and a method for the production thereof |
| US6784017B2 (en) * | 2002-08-12 | 2004-08-31 | Precision Dynamics Corporation | Method of creating a high performance organic semiconductor device |
| US6791125B2 (en) * | 2002-09-30 | 2004-09-14 | Freescale Semiconductor, Inc. | Semiconductor device structures which utilize metal sulfides |
| US7078261B2 (en) * | 2002-12-16 | 2006-07-18 | The Regents Of The University Of California | Increased mobility from organic semiconducting polymers field-effect transistors |
| US7088145B2 (en) * | 2002-12-23 | 2006-08-08 | 3M Innovative Properties Company | AC powered logic circuitry |
| EP1434281A3 (de) * | 2002-12-26 | 2007-10-24 | Konica Minolta Holdings, Inc. | Herstellungsmethode eines Dünnfilmtransistors, Substrat und elektrische Schaltung |
| JP2004235298A (ja) * | 2003-01-29 | 2004-08-19 | Pioneer Electronic Corp | 有機半導体素子及びその製造方法 |
| US7098525B2 (en) * | 2003-05-08 | 2006-08-29 | 3M Innovative Properties Company | Organic polymers, electronic devices, and methods |
| US7279777B2 (en) * | 2003-05-08 | 2007-10-09 | 3M Innovative Properties Company | Organic polymers, laminates, and capacitors |
| EP1629544B1 (de) * | 2003-05-12 | 2008-11-19 | Cambridge Enterprise Limited | Polymerer transistor |
| JP2005019955A (ja) * | 2003-05-30 | 2005-01-20 | Seiko Epson Corp | 薄膜パターンの形成方法及びデバイスの製造方法、電気光学装置及び電子機器 |
| KR100995451B1 (ko) * | 2003-07-03 | 2010-11-18 | 삼성전자주식회사 | 다층 구조의 게이트 절연막을 포함하는 유기 박막 트랜지스터 |
| EP1660608B1 (de) | 2003-08-19 | 2015-07-08 | Merck Patent GmbH | Oligomer und polymer enthaltend triphenylphosphin einheiten |
| US20050263903A1 (en) * | 2003-08-30 | 2005-12-01 | Visible Tech-Knowledgy, Inc. | Method for pattern metalization of substrates |
| KR100678771B1 (ko) | 2003-09-30 | 2007-02-02 | 학교법인연세대학교 | 유기 박막 트랜지스터 및 그의 제조방법 |
| US20050130422A1 (en) * | 2003-12-12 | 2005-06-16 | 3M Innovative Properties Company | Method for patterning films |
| GB0400997D0 (en) * | 2004-01-16 | 2004-02-18 | Univ Cambridge Tech | N-channel transistor |
| JP4933051B2 (ja) * | 2004-03-10 | 2012-05-16 | キヤノン株式会社 | 電界効果型トランジスタおよびその製造方法、積層体の製造方法 |
| US7491967B2 (en) * | 2004-03-10 | 2009-02-17 | Canon Kabushiki Kaisha | Field effect transistor, method of producing the same, and method of producing laminated member |
| JP4661065B2 (ja) | 2004-03-22 | 2011-03-30 | セイコーエプソン株式会社 | 相補型有機半導体装置 |
| JP2005340802A (ja) * | 2004-04-28 | 2005-12-08 | Semiconductor Energy Lab Co Ltd | 半導体装置及び表示装置の作製方法 |
| US7655809B2 (en) * | 2004-05-18 | 2010-02-02 | University Of Ottawa | Compounds comprising a linear series of five fused carbon rings, and preparation thereof |
| US7935836B2 (en) * | 2004-05-18 | 2011-05-03 | Alexander Graham Fallis | Compounds comprising a linear series of five fused carbon rings, and preparation thereof |
| US8901268B2 (en) | 2004-08-03 | 2014-12-02 | Ahila Krishnamoorthy | Compositions, layers and films for optoelectronic devices, methods of production and uses thereof |
| JP5008288B2 (ja) * | 2004-09-29 | 2012-08-22 | 株式会社半導体エネルギー研究所 | 半導体装置の作製方法 |
| US7399668B2 (en) * | 2004-09-30 | 2008-07-15 | 3M Innovative Properties Company | Method for making electronic devices having a dielectric layer surface treatment |
| US20060105199A1 (en) * | 2004-11-18 | 2006-05-18 | 3M Innovative Properties Company | Electroluminescent devices containing trans-1,2-bis(acenyl)ethylene compounds |
| US7315042B2 (en) * | 2004-11-18 | 2008-01-01 | 3M Innovative Properties Company | Semiconductors containing trans-1,2-bis(acenyl)ethylene compounds |
| US20060128165A1 (en) * | 2004-12-13 | 2006-06-15 | 3M Innovative Properties Company | Method for patterning surface modification |
| JP2006245559A (ja) * | 2005-02-07 | 2006-09-14 | Mitsubishi Chemicals Corp | 電界効果トランジスタ及びその製造方法 |
| US7151276B2 (en) * | 2005-03-09 | 2006-12-19 | 3M Innovative Properties Company | Semiconductors containing perfluoroether acyl oligothiophene compounds |
| US7211679B2 (en) * | 2005-03-09 | 2007-05-01 | 3M Innovative Properties Company | Perfluoroether acyl oligothiophene compounds |
| US7282735B2 (en) * | 2005-03-31 | 2007-10-16 | Xerox Corporation | TFT having a fluorocarbon-containing layer |
| US20060231829A1 (en) * | 2005-04-13 | 2006-10-19 | Xerox Corporation | TFT gate dielectric with crosslinked polymer |
| US20060231908A1 (en) * | 2005-04-13 | 2006-10-19 | Xerox Corporation | Multilayer gate dielectric |
| CA2547799A1 (en) * | 2005-05-27 | 2006-11-27 | University Of Ottawa | Compounds comprising a linear series of five fused carbon rings, and preparation thereof |
| KR100786946B1 (ko) | 2005-06-30 | 2007-12-17 | 주식회사 엘지화학 | 유기 박막 트랜지스터 |
| KR100786947B1 (ko) * | 2005-06-30 | 2007-12-17 | 주식회사 엘지화학 | 파이렌 유도체 및 파이렌 유도체를 이용한 유기전자소자 |
| US7319153B2 (en) * | 2005-07-29 | 2008-01-15 | 3M Innovative Properties Company | 6,13-Bis(thienyl)pentacene compounds |
| TWI261361B (en) * | 2005-08-31 | 2006-09-01 | Ind Tech Res Inst | Organic thin-film transistor structure and method for fabricating the same is provided |
| JP5188048B2 (ja) * | 2005-09-06 | 2013-04-24 | キヤノン株式会社 | 半導体素子の製造方法 |
| JP5188046B2 (ja) * | 2005-09-06 | 2013-04-24 | キヤノン株式会社 | 半導体素子 |
| US7695999B2 (en) * | 2005-09-06 | 2010-04-13 | Canon Kabushiki Kaisha | Production method of semiconductor device |
| US7435989B2 (en) * | 2005-09-06 | 2008-10-14 | Canon Kabushiki Kaisha | Semiconductor device with layer containing polysiloxane compound |
| JP4860980B2 (ja) * | 2005-10-20 | 2012-01-25 | ローム株式会社 | モータ駆動回路およびそれを用いたディスク装置 |
| US8414962B2 (en) | 2005-10-28 | 2013-04-09 | The Penn State Research Foundation | Microcontact printed thin film capacitors |
| US7566899B2 (en) * | 2005-12-21 | 2009-07-28 | Palo Alto Research Center Incorporated | Organic thin-film transistor backplane with multi-layer contact structures and data lines |
| GB0601008D0 (en) * | 2006-01-18 | 2006-03-01 | Qinetiq Ltd | Method of fabricating a semicondutor device |
| WO2007099690A1 (ja) * | 2006-02-28 | 2007-09-07 | Pioneer Corporation | 有機トランジスタ及びその製造方法 |
| WO2008054477A2 (en) * | 2006-03-17 | 2008-05-08 | Northwestern University | High-performance field effect transistors with self-assembled nanodielectrics |
| US7667230B2 (en) * | 2006-03-31 | 2010-02-23 | 3M Innovative Properties Company | Electronic devices containing acene-thiophene copolymers |
| US7608679B2 (en) * | 2006-03-31 | 2009-10-27 | 3M Innovative Properties Company | Acene-thiophene copolymers |
| US7666968B2 (en) * | 2006-04-21 | 2010-02-23 | 3M Innovative Properties Company | Acene-thiophene copolymers with silethynly groups |
| US7495251B2 (en) * | 2006-04-21 | 2009-02-24 | 3M Innovative Properties Company | Electronic devices containing acene-thiophene copolymers with silylethynyl groups |
| US20080135891A1 (en) * | 2006-12-08 | 2008-06-12 | Palo Alto Research Center, Incorporated | Transistor Device Formed on a Flexible Substrate Including Anodized Gate Dielectric |
| WO2008091571A2 (en) * | 2007-01-22 | 2008-07-31 | Nano Terra Inc. | High-throughput apparatus for patterning flexible substrates and method of using the same |
| KR100850495B1 (ko) * | 2007-03-02 | 2008-08-05 | 성균관대학교산학협력단 | 유기 박막 트랜지스터 및 그 제조방법 |
| WO2008117450A1 (ja) * | 2007-03-27 | 2008-10-02 | Pioneer Corporation | 有機トランジスタの製造方法及び有機トランジスタ |
| WO2009005902A1 (en) * | 2007-06-28 | 2009-01-08 | 3M Innovative Properties Company | Method for forming gate structures |
| US8178873B2 (en) * | 2007-12-17 | 2012-05-15 | 3M Innovative Properties Company | Solution processable organic semiconductors |
| TW200950099A (en) * | 2008-01-31 | 2009-12-01 | Corning Inc | Thin film transistor having long lightly doped drain on SOI substrate and process for making same |
| US7968871B2 (en) * | 2008-04-11 | 2011-06-28 | Xerox Corporation | Organic thin film transistor |
| WO2009154877A1 (en) * | 2008-06-19 | 2009-12-23 | 3M Innovative Properties Company | Solution processable organic semiconductors |
| US8106387B2 (en) * | 2008-10-14 | 2012-01-31 | Xerox Corporation | Organic thin film transistors |
| US8557877B2 (en) | 2009-06-10 | 2013-10-15 | Honeywell International Inc. | Anti-reflective coatings for optically transparent substrates |
| CN102000661B (zh) * | 2009-09-01 | 2013-03-13 | 宝山钢铁股份有限公司 | 钢铁表面富勒烯薄膜的粘附制备方法 |
| JP2012089610A (ja) * | 2010-10-18 | 2012-05-10 | Kaneka Corp | 薄膜トランジスタ |
| JP2012183753A (ja) * | 2011-03-07 | 2012-09-27 | Fujifilm Corp | ナノインプリント方法 |
| US8864898B2 (en) | 2011-05-31 | 2014-10-21 | Honeywell International Inc. | Coating formulations for optical elements |
| US8779415B2 (en) | 2012-11-08 | 2014-07-15 | Eastman Kodak Company | Devices containing organic polymeric multi-metallic composites |
| US9721697B2 (en) | 2012-11-08 | 2017-08-01 | Eastman Kodak Company | Organic polymeric bi-metallic composites |
| WO2014102625A1 (en) | 2012-12-24 | 2014-07-03 | Indian Institute Of Technology Kanpur | Thin film transistor with a current-induced channel |
| EP3194502A4 (de) | 2015-04-13 | 2018-05-16 | Honeywell International Inc. | Polysiloxanformulierungen und beschichtungen für optoelektronische anwendungen |
| WO2017038944A1 (ja) * | 2015-09-02 | 2017-03-09 | 富士フイルム株式会社 | 有機薄膜トランジスタ、有機薄膜トランジスタの製造方法、有機半導体組成物、有機半導体膜および有機半導体膜の製造方法 |
| US10727426B2 (en) * | 2015-12-21 | 2020-07-28 | Samsung Electronics Co., Ltd. | Thin film transistor, method of manufacturing the same, and electronic device including the same |
| US10164192B2 (en) * | 2016-01-08 | 2018-12-25 | Hong Kong Baptist University | Solution process for fabricating high-performance organic thin-film transistors |
| KR102051182B1 (ko) * | 2016-06-08 | 2019-12-03 | 주식회사 엘지화학 | 유기트랜지스터 및 가스센서 |
| KR102120482B1 (ko) | 2018-10-05 | 2020-06-08 | 씨제이제일제당 (주) | 생분해성 고분자 나노입자를 포함하는 메모리 소자 및 이의 제조방법 |
| CN114530556B (zh) * | 2022-02-22 | 2022-08-19 | 天津大学 | 一种带状传输薄膜晶体管及其制备方法 |
Family Cites Families (14)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH0791509B2 (ja) * | 1985-12-17 | 1995-10-04 | 住友化学工業株式会社 | 半導体用絶縁膜形成塗布液 |
| US5079179A (en) | 1987-10-09 | 1992-01-07 | Hughes Aircraft Company | Process of making GaAs electrical circuit devices with Langmuir-Blodgett insulator layer |
| JPH0766990B2 (ja) * | 1988-07-15 | 1995-07-19 | 松下電器産業株式会社 | 有機デバイスおよびその製造方法 |
| US5892244A (en) * | 1989-01-10 | 1999-04-06 | Mitsubishi Denki Kabushiki Kaisha | Field effect transistor including πconjugate polymer and liquid crystal display including the field effect transistor |
| US5266222A (en) * | 1990-05-23 | 1993-11-30 | California Institute Of Technology | Durable low surface-energy surfaces |
| FR2664430B1 (fr) | 1990-07-04 | 1992-09-18 | Centre Nat Rech Scient | Transistor a effet de champ en couche mince de structure mis, dont l'isolant et le semiconducteur sont realises en materiaux organiques. |
| JP2637869B2 (ja) * | 1990-12-10 | 1997-08-06 | 松下電器産業株式会社 | 吸着単分子膜及びその製造方法 |
| JP3994441B2 (ja) * | 1995-01-09 | 2007-10-17 | 松下電器産業株式会社 | 電界効果トランジスタ |
| JPH0940779A (ja) * | 1995-08-01 | 1997-02-10 | Toshiba Corp | ポリシロキサン、ポリシロキサン組成物、絶縁膜の製造方法、着色部材の製造方法及び導電膜の製造方法 |
| US5625199A (en) | 1996-01-16 | 1997-04-29 | Lucent Technologies Inc. | Article comprising complementary circuit with inorganic n-channel and organic p-channel thin film transistors |
| US6326640B1 (en) * | 1996-01-29 | 2001-12-04 | Motorola, Inc. | Organic thin film transistor with enhanced carrier mobility |
| US5965679A (en) | 1996-09-10 | 1999-10-12 | The Dow Chemical Company | Polyphenylene oligomers and polymers |
| US6265243B1 (en) * | 1999-03-29 | 2001-07-24 | Lucent Technologies Inc. | Process for fabricating organic circuits |
| US6252245B1 (en) | 1999-03-29 | 2001-06-26 | Howard Edan Katz | Device comprising n-channel semiconductor material |
-
2001
- 2001-11-05 US US10/012,655 patent/US6617609B2/en not_active Expired - Fee Related
-
2002
- 2002-10-23 AT AT02797052T patent/ATE340413T1/de not_active IP Right Cessation
- 2002-10-23 DE DE60214875T patent/DE60214875T2/de not_active Expired - Lifetime
- 2002-10-23 AU AU2002361575A patent/AU2002361575A1/en not_active Abandoned
- 2002-10-23 EP EP02797052A patent/EP1442487B1/de not_active Expired - Lifetime
- 2002-10-23 JP JP2003543118A patent/JP2005509299A/ja active Pending
- 2002-10-23 WO PCT/US2002/033999 patent/WO2003041186A2/en not_active Ceased
- 2002-10-23 CN CNB028221907A patent/CN100459206C/zh not_active Expired - Fee Related
- 2002-10-23 KR KR1020047006753A patent/KR20050039730A/ko not_active Ceased
Also Published As
| Publication number | Publication date |
|---|---|
| WO2003041186A3 (en) | 2003-11-20 |
| CN100459206C (zh) | 2009-02-04 |
| JP2005509299A (ja) | 2005-04-07 |
| US6617609B2 (en) | 2003-09-09 |
| CN1582505A (zh) | 2005-02-16 |
| EP1442487A2 (de) | 2004-08-04 |
| DE60214875D1 (de) | 2006-11-02 |
| WO2003041186A2 (en) | 2003-05-15 |
| KR20050039730A (ko) | 2005-04-29 |
| AU2002361575A1 (en) | 2003-05-19 |
| EP1442487B1 (de) | 2006-09-20 |
| US20030102472A1 (en) | 2003-06-05 |
| DE60214875T2 (de) | 2007-09-20 |
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