ATE343608T1 - Verfahren zur herstellung von organischem silicatpolymer - Google Patents

Verfahren zur herstellung von organischem silicatpolymer

Info

Publication number
ATE343608T1
ATE343608T1 AT01974911T AT01974911T ATE343608T1 AT E343608 T1 ATE343608 T1 AT E343608T1 AT 01974911 T AT01974911 T AT 01974911T AT 01974911 T AT01974911 T AT 01974911T AT E343608 T1 ATE343608 T1 AT E343608T1
Authority
AT
Austria
Prior art keywords
low dielectric
insulating film
silicate polymer
organic silicate
dielectric insulating
Prior art date
Application number
AT01974911T
Other languages
English (en)
Inventor
Min-Jin Ko
Myung-Sun Moon
Dong-Seok Shin
Jung-Won Kang
Hye-Yeong Nam
Heungduk-Ku
Original Assignee
Lg Chemical Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Lg Chemical Ltd filed Critical Lg Chemical Ltd
Application granted granted Critical
Publication of ATE343608T1 publication Critical patent/ATE343608T1/de

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G77/00—Macromolecular compounds obtained by reactions forming a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon in the main chain of the macromolecule
    • C08G77/02—Polysilicates
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G77/00—Macromolecular compounds obtained by reactions forming a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon in the main chain of the macromolecule
    • C08G77/48—Macromolecular compounds obtained by reactions forming a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon in the main chain of the macromolecule in which at least two but not all the silicon atoms are connected by linkages other than oxygen atoms
    • C08G77/50—Macromolecular compounds obtained by reactions forming a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon in the main chain of the macromolecule in which at least two but not all the silicon atoms are connected by linkages other than oxygen atoms by carbon linkages
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G77/00—Macromolecular compounds obtained by reactions forming a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon in the main chain of the macromolecule
    • C08G77/04—Polysiloxanes
    • C08G77/06—Preparatory processes
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D183/00—Coating compositions based on macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing silicon, with or without sulfur, nitrogen, oxygen, or carbon only; Coating compositions based on derivatives of such polymers
    • C09D183/04—Polysiloxanes
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00—Stock material or miscellaneous articles
    • Y10T428/31504—Composite [nonstructural laminate]
    • Y10T428/31652—Of asbestos
    • Y10T428/31663—As siloxane, silicone or silane

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Organic Chemistry (AREA)
  • Health & Medical Sciences (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Wood Science & Technology (AREA)
  • Silicon Polymers (AREA)
  • Formation Of Insulating Films (AREA)
  • Polymers With Sulfur, Phosphorus Or Metals In The Main Chain (AREA)
  • Paints Or Removers (AREA)
  • Organic Insulating Materials (AREA)
AT01974911T 2000-09-18 2001-09-18 Verfahren zur herstellung von organischem silicatpolymer ATE343608T1 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
KR10-2000-0054591A KR100382702B1 (ko) 2000-09-18 2000-09-18 유기실리케이트 중합체의 제조방법

Publications (1)

Publication Number Publication Date
ATE343608T1 true ATE343608T1 (de) 2006-11-15

Family

ID=19689060

Family Applications (1)

Application Number Title Priority Date Filing Date
AT01974911T ATE343608T1 (de) 2000-09-18 2001-09-18 Verfahren zur herstellung von organischem silicatpolymer

Country Status (8)

Country Link
US (1) US7358316B2 (de)
EP (1) EP1328571B1 (de)
JP (1) JP2004509191A (de)
KR (1) KR100382702B1 (de)
CN (1) CN1246362C (de)
AT (1) ATE343608T1 (de)
DE (1) DE60124128T2 (de)
WO (1) WO2002022710A1 (de)

Families Citing this family (23)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100405312B1 (ko) * 2001-04-11 2003-11-12 주식회사 엘지 유기실리케이트 중합체 및 이를 함유하는 저유전 절연막
KR100419069B1 (ko) * 2001-06-21 2004-02-19 주식회사 엘지화학 유기실리케이트 중합체 및 이를 함유하는 저유전 절연막
US7834119B2 (en) * 2002-04-18 2010-11-16 Lg Chem, Ltd. Organic silicate polymer and insulation film comprising the same
KR100508903B1 (ko) * 2002-05-06 2005-08-17 주식회사 엘지화학 저유전 절연막 형성용 조성물 및 절연막 제조 방법
KR100508902B1 (ko) * 2002-05-06 2005-08-17 주식회사 엘지화학 유기실리케이트 중합체 및 이를 함유하는 절연막
KR20040018710A (ko) * 2002-08-26 2004-03-04 주식회사 엘지화학 유기실리케이트 중합체의 제조방법
TWI240959B (en) 2003-03-04 2005-10-01 Air Prod & Chem Mechanical enhancement of dense and porous organosilicate materials by UV exposure
US7098149B2 (en) * 2003-03-04 2006-08-29 Air Products And Chemicals, Inc. Mechanical enhancement of dense and porous organosilicate materials by UV exposure
JP2004307693A (ja) * 2003-04-09 2004-11-04 Shin Etsu Chem Co Ltd 多孔質膜形成用組成物、多孔質膜の製造方法、多孔質膜、層間絶縁膜、及び半導体装置
JP2004307692A (ja) 2003-04-09 2004-11-04 Shin Etsu Chem Co Ltd 多孔質膜形成用組成物、多孔質膜の製造方法、多孔質膜、層間絶縁膜及び半導体装置
KR20050024721A (ko) * 2003-09-01 2005-03-11 삼성전자주식회사 신규 실록산계 수지 및 이를 이용한 반도체 층간 절연막
US8053159B2 (en) 2003-11-18 2011-11-08 Honeywell International Inc. Antireflective coatings for via fill and photolithography applications and methods of preparation thereof
EP2236561B1 (de) * 2005-05-20 2013-07-03 Sumitomo Chemical Company, Limited Polymerzusammensetzung und dieselbe verwendende lichtemittierende Vorrichtung auf Polymerbasis
BRPI0614609A2 (pt) * 2005-08-03 2016-11-08 Univ Alabama silanos como uma fonte de hidrogênio
US7705062B2 (en) * 2005-09-08 2010-04-27 The United States Of America As Represented By The Secretary Of The Navy Nanoporous organosilicas as pre-concentration materials for sensors
GB0524189D0 (en) 2005-11-28 2006-01-04 Welding Inst Process for the production of organosilsesquioxanes
US8642246B2 (en) 2007-02-26 2014-02-04 Honeywell International Inc. Compositions, coatings and films for tri-layer patterning applications and methods of preparation thereof
US8557877B2 (en) 2009-06-10 2013-10-15 Honeywell International Inc. Anti-reflective coatings for optically transparent substrates
AU2012248254B2 (en) * 2011-04-27 2014-09-04 Nippon Steel Corporation Surface-treated metal material and aqueous metal surface treatment agent
US8864898B2 (en) 2011-05-31 2014-10-21 Honeywell International Inc. Coating formulations for optical elements
US9884268B2 (en) 2011-06-09 2018-02-06 Waters Technologies Corporation Porous material and devices for performing separations, filtrations, and catalysis and EK pumps, and methods of making and using the same
JP6803842B2 (ja) 2015-04-13 2020-12-23 ハネウェル・インターナショナル・インコーポレーテッドＨｏｎｅｙｗｅｌｌ Ｉｎｔｅｒｎａｔｉｏｎａｌ Ｉｎｃ． オプトエレクトロニクス用途のためのポリシロキサン製剤及びコーティング
US20240392072A1 (en) * 2021-09-29 2024-11-28 Wacker Chemie Ag Method for preparing low-silanol polyorganosiloxanes

Family Cites Families (16)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5294353A (en) * 1976-02-04 1977-08-08 Kansai Paint Co Ltd Production of silica-resin composite
US4159206A (en) * 1977-03-18 1979-06-26 Rohm And Haas Company Weatherable, abrasion resistant coating composition, method, and coated articles
US4539232A (en) * 1982-06-03 1985-09-03 Owens-Illinois, Inc. Solventless liquid organopolysiloxanes
JPH078913B2 (ja) * 1987-06-03 1995-02-01 信越化学工業株式会社 オルガノポリシロキサンの製造方法
US5181141A (en) * 1989-03-31 1993-01-19 Hoya Corporation Anti-reflection optical element
JPH0320331A (ja) * 1989-06-16 1991-01-29 Shin Etsu Chem Co Ltd 溶剤可溶性ポリオルガノシルセスキオキサンの製造方法
KR930002256B1 (ko) * 1990-06-01 1993-03-27 현대전자산업 주식회사 Pcm클럭 발생회로
RU2044014C1 (ru) 1992-07-06 1995-09-20 Государственный научно-исследовательский институт химических реактивов и особо чистых химических веществ Способ получения пленкообразующего раствора и способ получения диэлектрического покрытия с использованием этого раствора
KR100265777B1 (ko) * 1993-08-05 2000-09-15 김순택 화상표시장치의 반사방지막 제조방법, 및 이를 채용한 화상표시장치
US5654090A (en) * 1994-04-08 1997-08-05 Nippon Arc Co., Ltd. Coating composition capable of yielding a cured product having a high refractive index and coated articles obtained therefrom
JP2914868B2 (ja) * 1994-04-15 1999-07-05 信越化学工業株式会社 オルガノポリシロキサンの製造方法
US5733644A (en) * 1994-04-15 1998-03-31 Mitsubishi Chemical Corporation Curable composition and method for preparing the same
AU1421597A (en) 1995-12-20 1997-07-14 E.I. Du Pont De Nemours And Company Rapid process for making silica gel and silicate polymer and low density gels made thereby
JP2001520805A (ja) * 1997-04-17 2001-10-30 アライドシグナル・インコーポレーテッド 等級化された密度を有するナノポーラス誘電体フィルム及びそのようなフィルムの製造方法
WO1999055789A1 (en) * 1998-04-24 1999-11-04 Catalysts & Chemicals Industries Co., Ltd. Coating liquid for forming silica-based film having low dielectric constant and substrate having film of low dielectric constant coated thereon
DE60021476T2 (de) * 1999-06-04 2006-05-24 Jsr Corp. Beschichtungszusammensetzung für die Filmherstellung und Material für isolierenden Schichten

Also Published As

Publication number Publication date
EP1328571A1 (de) 2003-07-23
WO2002022710A1 (en) 2002-03-21
EP1328571B1 (de) 2006-10-25
JP2004509191A (ja) 2004-03-25
KR100382702B1 (ko) 2003-05-09
KR20020021864A (ko) 2002-03-23
DE60124128D1 (de) 2006-12-07
DE60124128T2 (de) 2007-09-06
CN1458947A (zh) 2003-11-26
US7358316B2 (en) 2008-04-15
CN1246362C (zh) 2006-03-22
US20030191269A1 (en) 2003-10-09

Similar Documents

Publication Publication Date Title
ATE343608T1 (de) Verfahren zur herstellung von organischem silicatpolymer
CN109422880B (zh) 一种金属配位键与氢键杂化交联的自修复硅弹性体制备方法及弹性体
TW200506015A (en) Coating composition for insulating film production, preparation method of insulation film by using the same, insulation film for semi-conductor device prepared therefrom, and semi-conductor device comprising the same
EP1564269A1 (de) Zusammensetzung zur bildung eines porösenfilms, poröser film, verfahren zu seiner herstellung, zwischenschichtisolierfilm und halbleitervorrichtung
CN103819679B (zh) 一种单组分poss/加成型硅树脂纳米复合材料的制备方法
CN104086772A (zh) 一种脲基改性mq硅树脂及其制备方法与应用
DE60322202D1 (de) Isolierfilm
CN103694709B (zh) 加成型液体硅橡胶用耐漏电起痕剂及其制备方法和应用
CN101942201A (zh) 室温硫化阻燃单组分脱醇型硅橡胶密封剂及制备方法
WO2016082287A1 (zh) 一种mdq类型苯基乙烯基硅树脂及其制备方法
CN103554503A (zh) 一种纳米TiO2/硅树脂杂化透明复合材料的制备方法
CN106833508A (zh) 一种耐高温pcb电路板用有机硅灌封胶
NO20041546D0 (no) Fremgangsmate til fremstilling av polyforgrenet organisk/uorganisk hybridpolymer
DE602004022881D1 (de) Vernetzbare polyethylenzusammensetzung, diese enthaltendes elektrokabel und herstellungsverfahren dafür
CN116285875A (zh) 一种低密度导热有机硅灌封胶及其制备方法
CN105682936B (zh) 一种自修复环氧树脂组合物
CN113214602B (zh) 一种绝缘树脂复合料和高压绝缘套管及其制备方法和应用
JPH0386725A (ja) 絶縁物の製造方法及び半導体装置の製造方法
CN106634811A (zh) 一种抗冲击性能好的pcb电路板用有机硅电子灌封胶
CN106520064A (zh) 一种柔性好不易裂的pcb电路板用有机硅电子灌封胶
CN106634812A (zh) 一种高导热低黏度pcb电路板用有机硅树脂灌封胶
JP2001040094A (ja) エポキシ基含有シリコーン樹脂
Zhang et al. Preparation and properties of addition curable silicone resins with excellent dielectric properties and thermal resistance
CN104263278A (zh) 一种led封装胶所用的交联剂及其制备方法
CN109722033B (zh) 一种二蒽基二苯醚乙烯基硅橡胶制备方法

Legal Events

Date Code Title Description
RER Ceased as to paragraph 5 lit. 3 law introducing patent treaties