ATE344938T1 - Einrichtung zum transferieren eines musters auf ein objekt - Google Patents

Einrichtung zum transferieren eines musters auf ein objekt

Info

Publication number
ATE344938T1
ATE344938T1 AT01915982T AT01915982T ATE344938T1 AT E344938 T1 ATE344938 T1 AT E344938T1 AT 01915982 T AT01915982 T AT 01915982T AT 01915982 T AT01915982 T AT 01915982T AT E344938 T1 ATE344938 T1 AT E344938T1
Authority
AT
Austria
Prior art keywords
stamp
contacting
transferring
pattern
contacting means
Prior art date
Application number
AT01915982T
Other languages
English (en)
Inventor
Lars Montelius
Babak Heidari
Thord Stjernholm
Original Assignee
Obducat Ab
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Obducat Ab filed Critical Obducat Ab
Application granted granted Critical
Publication of ATE344938T1 publication Critical patent/ATE344938T1/de

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0002—Lithographic processes using patterning methods other than those involving the exposure to radiation, e.g. by stamping
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y10/00—Nanotechnology for information processing, storage or transmission, e.g. quantum computing or single electron logic
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y40/00—Manufacture or treatment of nanostructures
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0017—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor for the production of embossing, cutting or similar devices; for the production of casting means

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Nanotechnology (AREA)
  • Chemical & Material Sciences (AREA)
  • General Physics & Mathematics (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Mathematical Physics (AREA)
  • Manufacturing & Machinery (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Theoretical Computer Science (AREA)
  • Shaping Of Tube Ends By Bending Or Straightening (AREA)
  • Sewing Machines And Sewing (AREA)
  • Auxiliary Devices For And Details Of Packaging Control (AREA)
  • Coating Apparatus (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Measuring Fluid Pressure (AREA)
AT01915982T 2000-03-15 2001-03-14 Einrichtung zum transferieren eines musters auf ein objekt ATE344938T1 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
SE0000848A SE515962C2 (sv) 2000-03-15 2000-03-15 Anordning för överföring av mönster till objekt

Publications (1)

Publication Number Publication Date
ATE344938T1 true ATE344938T1 (de) 2006-11-15

Family

ID=20278807

Family Applications (1)

Application Number Title Priority Date Filing Date
AT01915982T ATE344938T1 (de) 2000-03-15 2001-03-14 Einrichtung zum transferieren eines musters auf ein objekt

Country Status (9)

Country Link
US (1) US7165957B2 (de)
EP (1) EP1264215B1 (de)
JP (1) JP3833537B2 (de)
CN (1) CN1211706C (de)
AT (1) ATE344938T1 (de)
AU (1) AU2001242926A1 (de)
DE (1) DE60124377T2 (de)
SE (1) SE515962C2 (de)
WO (1) WO2001069317A1 (de)

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SG142150A1 (en) 2000-07-16 2008-05-28 Univ Texas High-resolution overlay alignment systems for imprint lithography
KR100827741B1 (ko) 2000-07-17 2008-05-07 보드 오브 리전츠, 더 유니버시티 오브 텍사스 시스템 임프린트 리소그래피 공정을 위한 자동 유체 분배 방법 및시스템
CN100365507C (zh) 2000-10-12 2008-01-30 德克萨斯州大学系统董事会 用于室温下低压微刻痕和毫微刻痕光刻的模板
US6964793B2 (en) 2002-05-16 2005-11-15 Board Of Regents, The University Of Texas System Method for fabricating nanoscale patterns in light curable compositions using an electric field
US20030186405A1 (en) * 2002-04-01 2003-10-02 The Ohio State University Research Foundation Micro/nano-embossing process and useful applications thereof
ATE439969T1 (de) * 2002-04-24 2009-09-15 Obducat Ab Vorrichtung und verfahren zum übertragen eines musters auf ein substrat
US7037639B2 (en) 2002-05-01 2006-05-02 Molecular Imprints, Inc. Methods of manufacturing a lithography template
AU2003241245A1 (en) * 2002-06-07 2003-12-22 Obducat Ab Method for transferring a pattern
US7252492B2 (en) 2002-06-20 2007-08-07 Obducat Ab Devices and methods for aligning a stamp and a substrate
WO2004000567A1 (en) 2002-06-20 2003-12-31 Obducat Ab Mold tool method of manufacturing a mold tool and storage medium formed by use of the mold tool
US7179079B2 (en) 2002-07-08 2007-02-20 Molecular Imprints, Inc. Conforming template for patterning liquids disposed on substrates
US7019819B2 (en) 2002-11-13 2006-03-28 Molecular Imprints, Inc. Chucking system for modulating shapes of substrates
US7077992B2 (en) 2002-07-11 2006-07-18 Molecular Imprints, Inc. Step and repeat imprint lithography processes
US6932934B2 (en) 2002-07-11 2005-08-23 Molecular Imprints, Inc. Formation of discontinuous films during an imprint lithography process
US6916584B2 (en) 2002-08-01 2005-07-12 Molecular Imprints, Inc. Alignment methods for imprint lithography
US7071088B2 (en) 2002-08-23 2006-07-04 Molecular Imprints, Inc. Method for fabricating bulbous-shaped vias
JP2005537656A (ja) * 2002-08-27 2005-12-08 オブデュキャット、アクチボラグ 対象物にパターンを転写するための装置
JP4640512B2 (ja) * 2002-08-29 2011-03-02 凸版印刷株式会社 パターン形成装置及び方法
US6936194B2 (en) 2002-09-05 2005-08-30 Molecular Imprints, Inc. Functional patterning material for imprint lithography processes
US6980282B2 (en) 2002-12-11 2005-12-27 Molecular Imprints, Inc. Method for modulating shapes of substrates
US6929762B2 (en) 2002-11-13 2005-08-16 Molecular Imprints, Inc. Method of reducing pattern distortions during imprint lithography processes
US6871558B2 (en) 2002-12-12 2005-03-29 Molecular Imprints, Inc. Method for determining characteristics of substrate employing fluid geometries
AU2003300865A1 (en) 2002-12-13 2004-07-09 Molecular Imprints, Inc. Magnification corrections employing out-of-plane distortions on a substrate
US7452574B2 (en) 2003-02-27 2008-11-18 Molecular Imprints, Inc. Method to reduce adhesion between a polymerizable layer and a substrate employing a fluorine-containing layer
US7179396B2 (en) 2003-03-25 2007-02-20 Molecular Imprints, Inc. Positive tone bi-layer imprint lithography method
US7122079B2 (en) 2004-02-27 2006-10-17 Molecular Imprints, Inc. Composition for an etching mask comprising a silicon-containing material
US7396475B2 (en) 2003-04-25 2008-07-08 Molecular Imprints, Inc. Method of forming stepped structures employing imprint lithography
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US6805054B1 (en) 2003-05-14 2004-10-19 Molecular Imprints, Inc. Method, system and holder for transferring templates during imprint lithography processes
US7157036B2 (en) 2003-06-17 2007-01-02 Molecular Imprints, Inc Method to reduce adhesion between a conformable region and a pattern of a mold
JP2005064492A (ja) * 2003-07-28 2005-03-10 Kyocera Corp 単結晶サファイア基板とその製造方法及び半導体発光素子
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JP4625247B2 (ja) * 2003-10-24 2011-02-02 株式会社ナノテック マイクロコンタクトプリント方法及び装置
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US7019835B2 (en) * 2004-02-19 2006-03-28 Molecular Imprints, Inc. Method and system to measure characteristics of a film disposed on a substrate
US7730834B2 (en) * 2004-03-04 2010-06-08 Asml Netherlands B.V. Printing apparatus and device manufacturing method
DE602005022874D1 (de) * 2004-06-03 2010-09-23 Molecular Imprints Inc Fluidausgabe und tropfenausgabe nach bedarf für die herstellung im nanobereich
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KR101264673B1 (ko) * 2005-06-24 2013-05-20 엘지디스플레이 주식회사 소프트 몰드를 이용한 미세 패턴 형성방법
US20070023976A1 (en) * 2005-07-26 2007-02-01 Asml Netherlands B.V. Imprint lithography
JP4330168B2 (ja) * 2005-09-06 2009-09-16 キヤノン株式会社 モールド、インプリント方法、及びチップの製造方法
JP4533358B2 (ja) * 2005-10-18 2010-09-01 キヤノン株式会社 インプリント方法、インプリント装置およびチップの製造方法
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US7878791B2 (en) * 2005-11-04 2011-02-01 Asml Netherlands B.V. Imprint lithography
JP4923924B2 (ja) * 2005-11-22 2012-04-25 コニカミノルタホールディングス株式会社 インプリント装置及びインプリント方法
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Also Published As

Publication number Publication date
JP3833537B2 (ja) 2006-10-11
JP2003527248A (ja) 2003-09-16
DE60124377D1 (de) 2006-12-21
US7165957B2 (en) 2007-01-23
SE0000848D0 (sv) 2000-03-15
US20030170053A1 (en) 2003-09-11
WO2001069317A1 (en) 2001-09-20
HK1058553A1 (en) 2004-05-21
SE515962C2 (sv) 2001-11-05
AU2001242926A1 (en) 2001-09-24
EP1264215B1 (de) 2006-11-08
CN1437714A (zh) 2003-08-20
CN1211706C (zh) 2005-07-20
EP1264215A1 (de) 2002-12-11
SE0000848L (sv) 2001-09-16
DE60124377T2 (de) 2007-09-06

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