ATE439969T1 - Vorrichtung und verfahren zum übertragen eines musters auf ein substrat - Google Patents

Vorrichtung und verfahren zum übertragen eines musters auf ein substrat

Info

Publication number
ATE439969T1
ATE439969T1 AT03723553T AT03723553T ATE439969T1 AT E439969 T1 ATE439969 T1 AT E439969T1 AT 03723553 T AT03723553 T AT 03723553T AT 03723553 T AT03723553 T AT 03723553T AT E439969 T1 ATE439969 T1 AT E439969T1
Authority
AT
Austria
Prior art keywords
substrate
pattern
stamping
patterned
transferring
Prior art date
Application number
AT03723553T
Other languages
English (en)
Inventor
Lennart Olsson
Original Assignee
Obducat Ab
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from SE0201239A external-priority patent/SE524563C2/sv
Application filed by Obducat Ab filed Critical Obducat Ab
Application granted granted Critical
Publication of ATE439969T1 publication Critical patent/ATE439969T1/de

Links

Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B81—MICROSTRUCTURAL TECHNOLOGY
    • B81C—PROCESSES OR APPARATUS SPECIALLY ADAPTED FOR THE MANUFACTURE OR TREATMENT OF MICROSTRUCTURAL DEVICES OR SYSTEMS
    • B81C1/00—Manufacture or treatment of devices or systems in or on a substrate
    • B81C1/00436—Shaping materials, i.e. techniques for structuring the substrate or the layers on the substrate
    • B81C1/00444—Surface micromachining, i.e. structuring layers on the substrate
    • B81C1/0046—Surface micromachining, i.e. structuring layers on the substrate using stamping, e.g. imprinting
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y10/00—Nanotechnology for information processing, storage or transmission, e.g. quantum computing or single electron logic
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y40/00—Manufacture or treatment of nanostructures
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0002—Lithographic processes using patterning methods other than those involving the exposure to radiation, e.g. by stamping

Landscapes

  • Engineering & Computer Science (AREA)
  • Nanotechnology (AREA)
  • Chemical & Material Sciences (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Manufacturing & Machinery (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Mathematical Physics (AREA)
  • Theoretical Computer Science (AREA)
  • Shaping Of Tube Ends By Bending Or Straightening (AREA)
  • Manufacturing Of Printed Circuit Boards (AREA)
  • Printing Methods (AREA)
  • Manufacturing Of Printed Wiring (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
AT03723553T 2002-04-24 2003-04-23 Vorrichtung und verfahren zum übertragen eines musters auf ein substrat ATE439969T1 (de)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US37482702P 2002-04-24 2002-04-24
SE0201239A SE524563C2 (sv) 2002-04-24 2002-04-24 Anordning och metod för överföring av ett mönster till ett substrat
PCT/SE2003/000640 WO2003090985A1 (en) 2002-04-24 2003-04-23 Device and method for transferring a pattern to a substrate

Publications (1)

Publication Number Publication Date
ATE439969T1 true ATE439969T1 (de) 2009-09-15

Family

ID=29272465

Family Applications (1)

Application Number Title Priority Date Filing Date
AT03723553T ATE439969T1 (de) 2002-04-24 2003-04-23 Vorrichtung und verfahren zum übertragen eines musters auf ein substrat

Country Status (6)

Country Link
US (1) US20050172848A1 (de)
EP (1) EP1497102B1 (de)
AT (1) ATE439969T1 (de)
AU (1) AU2003230483A1 (de)
DE (1) DE60328879D1 (de)
WO (1) WO2003090985A1 (de)

Families Citing this family (29)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20080164638A1 (en) * 2006-11-28 2008-07-10 Wei Zhang Method and apparatus for rapid imprint lithography
US7686606B2 (en) * 2004-01-20 2010-03-30 Wd Media, Inc. Imprint embossing alignment system
US7320584B1 (en) 2004-07-07 2008-01-22 Komag, Inc. Die set having sealed compliant member
US20060027036A1 (en) * 2004-08-05 2006-02-09 Biggs Todd L Methods and apparatuses for imprinting substrates
US7331283B2 (en) * 2004-12-16 2008-02-19 Asml Holding N.V. Method and apparatus for imprint pattern replication
US7409759B2 (en) * 2004-12-16 2008-08-12 Asml Holding N.V. Method for making a computer hard drive platen using a nano-plate
US7410591B2 (en) * 2004-12-16 2008-08-12 Asml Holding N.V. Method and system for making a nano-plate for imprint lithography
US7399422B2 (en) * 2005-11-29 2008-07-15 Asml Holding N.V. System and method for forming nanodisks used in imprint lithography and nanodisk and memory disk formed thereby
US7363854B2 (en) 2004-12-16 2008-04-29 Asml Holding N.V. System and method for patterning both sides of a substrate utilizing imprint lithography
KR100729427B1 (ko) * 2005-03-07 2007-06-15 주식회사 디엠에스 미세패턴 형성장치
US7281920B2 (en) * 2005-03-28 2007-10-16 Komag, Inc. Die set utilizing compliant gasket
US7670530B2 (en) * 2006-01-20 2010-03-02 Molecular Imprints, Inc. Patterning substrates employing multiple chucks
KR101324549B1 (ko) * 2005-12-08 2013-11-01 몰레큘러 임프린츠 인코퍼레이티드 기판의 양면 패턴화를 위한 방법 및 시스템
US7695667B2 (en) * 2006-03-01 2010-04-13 Hitachi Global Storage Technologies Netherlands B.V. Method and apparatus for separating a stamper from a patterned substrate
US8377361B2 (en) * 2006-11-28 2013-02-19 Wei Zhang Imprint lithography with improved substrate/mold separation
TW200846278A (en) * 2007-05-24 2008-12-01 Contrel Technology Co Ltd Method for producing viscous micro-structure
KR101289337B1 (ko) * 2007-08-29 2013-07-29 시게이트 테크놀로지 엘엘씨 양면 임프린트 리소그래피 장치
TW200932502A (en) * 2008-01-18 2009-08-01 Univ Nat Taiwan An improved embossing apparatus
JP5164589B2 (ja) * 2008-01-30 2013-03-21 株式会社日立ハイテクノロジーズ インプリント装置
US8402638B1 (en) 2009-11-06 2013-03-26 Wd Media, Inc. Press system with embossing foil free to expand for nano-imprinting of recording media
US8496466B1 (en) 2009-11-06 2013-07-30 WD Media, LLC Press system with interleaved embossing foil holders for nano-imprinting of recording media
US9330685B1 (en) 2009-11-06 2016-05-03 WD Media, LLC Press system for nano-imprinting of recording media with a two step pressing method
US8747092B2 (en) 2010-01-22 2014-06-10 Nanonex Corporation Fast nanoimprinting apparatus using deformale mold
KR20140102705A (ko) * 2011-11-25 2014-08-22 에스씨아이브이에이엑스 가부시키가이샤 임프린트 장치 및 임프린트 방법
US20150042013A1 (en) * 2012-02-14 2015-02-12 Scivax Corporation Imprint device and imprint method
JP6291687B2 (ja) * 2012-08-27 2018-03-14 Ｓｃｉｖａｘ株式会社 インプリント装置およびインプリント方法
US10108086B2 (en) 2013-03-15 2018-10-23 Nanonex Corporation System and methods of mold/substrate separation for imprint lithography
US10105883B2 (en) 2013-03-15 2018-10-23 Nanonex Corporation Imprint lithography system and method for manufacturing
CN114101381B (zh) * 2021-11-10 2024-05-10 南京泰翔机械科技服务有限公司 一种用于装饰铁薄板冲压图案设备

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2430057A1 (fr) * 1978-06-29 1980-01-25 Thomson Csf Dispositif de pressage de disques souples et procede de pressage mettant en oeuvre un tel dispositif
DE3932039A1 (de) * 1989-09-26 1991-04-11 Werner & Pfleiderer Gummi-spritz-presse
US5425977A (en) * 1993-08-16 1995-06-20 Monsanto Company Rough-surfaced interlayer
US5772905A (en) * 1995-11-15 1998-06-30 Regents Of The University Of Minnesota Nanoimprint lithography
US5778774A (en) * 1996-12-18 1998-07-14 Framatome Connectors Usa Inc. Articulating embossing die
SE515607C2 (sv) * 1999-12-10 2001-09-10 Obducat Ab Anordning och metod vid tillverkning av strukturer
SE515962C2 (sv) * 2000-03-15 2001-11-05 Obducat Ab Anordning för överföring av mönster till objekt

Also Published As

Publication number Publication date
DE60328879D1 (de) 2009-10-01
EP1497102A1 (de) 2005-01-19
EP1497102B1 (de) 2009-08-19
AU2003230483A8 (en) 2003-11-10
AU2003230483A1 (en) 2003-11-10
WO2003090985A8 (en) 2004-04-22
US20050172848A1 (en) 2005-08-11
WO2003090985A1 (en) 2003-11-06

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