SE0000848L - Anordning för överföring av mönster till objekt - Google Patents

Anordning för överföring av mönster till objekt

Info

Publication number
SE0000848L
SE0000848L SE0000848A SE0000848A SE0000848L SE 0000848 L SE0000848 L SE 0000848L SE 0000848 A SE0000848 A SE 0000848A SE 0000848 A SE0000848 A SE 0000848A SE 0000848 L SE0000848 L SE 0000848L
Authority
SE
Sweden
Prior art keywords
stamp
contacting
objects
transferring
contacting means
Prior art date
Application number
SE0000848A
Other languages
English (en)
Other versions
SE0000848D0 (sv
SE515962C2 (sv
Inventor
Lars Montelius
Babak Heidari
Thord Stjernholm
Original Assignee
Obducat Ab
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Obducat Ab filed Critical Obducat Ab
Priority to SE0000848A priority Critical patent/SE515962C2/sv
Publication of SE0000848D0 publication Critical patent/SE0000848D0/sv
Priority to CN01806518.XA priority patent/CN1211706C/zh
Priority to JP2001568134A priority patent/JP3833537B2/ja
Priority to AT01915982T priority patent/ATE344938T1/de
Priority to DE60124377T priority patent/DE60124377T2/de
Priority to PCT/SE2001/000527 priority patent/WO2001069317A1/en
Priority to AU2001242926A priority patent/AU2001242926A1/en
Priority to US10/221,331 priority patent/US7165957B2/en
Priority to EP01915982A priority patent/EP1264215B1/en
Priority to HK04101215.3A priority patent/HK1058553B/xx
Publication of SE0000848L publication Critical patent/SE0000848L/sv
Publication of SE515962C2 publication Critical patent/SE515962C2/sv

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0002—Lithographic processes using patterning methods other than those involving the exposure to radiation, e.g. by stamping
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y10/00—Nanotechnology for information processing, storage or transmission, e.g. quantum computing or single electron logic
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y40/00—Manufacture or treatment of nanostructures
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0017—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor for the production of embossing, cutting or similar devices; for the production of casting means

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Nanotechnology (AREA)
  • Chemical & Material Sciences (AREA)
  • General Physics & Mathematics (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Mathematical Physics (AREA)
  • Manufacturing & Machinery (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Theoretical Computer Science (AREA)
  • Shaping Of Tube Ends By Bending Or Straightening (AREA)
  • Sewing Machines And Sewing (AREA)
  • Auxiliary Devices For And Details Of Packaging Control (AREA)
  • Coating Apparatus (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Measuring Fluid Pressure (AREA)
SE0000848A 2000-03-15 2000-03-15 Anordning för överföring av mönster till objekt SE515962C2 (sv)

Priority Applications (10)

Application Number Priority Date Filing Date Title
SE0000848A SE515962C2 (sv) 2000-03-15 2000-03-15 Anordning för överföring av mönster till objekt
HK04101215.3A HK1058553B (en) 2000-03-15 2001-03-14 Device for transferring a pattern to an object
DE60124377T DE60124377T2 (de) 2000-03-15 2001-03-14 Einrichtung zum transferieren eines musters auf ein objekt
JP2001568134A JP3833537B2 (ja) 2000-03-15 2001-03-14 物体へのパターン転写装置
AT01915982T ATE344938T1 (de) 2000-03-15 2001-03-14 Einrichtung zum transferieren eines musters auf ein objekt
CN01806518.XA CN1211706C (zh) 2000-03-15 2001-03-14 将图案转移到一个物体上的装置
PCT/SE2001/000527 WO2001069317A1 (en) 2000-03-15 2001-03-14 Device for transferring a pattern to an object
AU2001242926A AU2001242926A1 (en) 2000-03-15 2001-03-14 Device for transferring a pattern to an object
US10/221,331 US7165957B2 (en) 2000-03-15 2001-03-14 Device for transferring a pattern to an object
EP01915982A EP1264215B1 (en) 2000-03-15 2001-03-14 Device for transferring a pattern to an object

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
SE0000848A SE515962C2 (sv) 2000-03-15 2000-03-15 Anordning för överföring av mönster till objekt

Publications (3)

Publication Number Publication Date
SE0000848D0 SE0000848D0 (sv) 2000-03-15
SE0000848L true SE0000848L (sv) 2001-09-16
SE515962C2 SE515962C2 (sv) 2001-11-05

Family

ID=20278807

Family Applications (1)

Application Number Title Priority Date Filing Date
SE0000848A SE515962C2 (sv) 2000-03-15 2000-03-15 Anordning för överföring av mönster till objekt

Country Status (9)

Country Link
US (1) US7165957B2 (sv)
EP (1) EP1264215B1 (sv)
JP (1) JP3833537B2 (sv)
CN (1) CN1211706C (sv)
AT (1) ATE344938T1 (sv)
AU (1) AU2001242926A1 (sv)
DE (1) DE60124377T2 (sv)
SE (1) SE515962C2 (sv)
WO (1) WO2001069317A1 (sv)

Families Citing this family (92)

* Cited by examiner, † Cited by third party
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SG142150A1 (en) 2000-07-16 2008-05-28 Univ Texas High-resolution overlay alignment systems for imprint lithography
KR100827741B1 (ko) 2000-07-17 2008-05-07 보드 오브 리전츠, 더 유니버시티 오브 텍사스 시스템 임프린트 리소그래피 공정을 위한 자동 유체 분배 방법 및시스템
CN100365507C (zh) 2000-10-12 2008-01-30 德克萨斯州大学系统董事会 用于室温下低压微刻痕和毫微刻痕光刻的模板
US6964793B2 (en) 2002-05-16 2005-11-15 Board Of Regents, The University Of Texas System Method for fabricating nanoscale patterns in light curable compositions using an electric field
US20030186405A1 (en) * 2002-04-01 2003-10-02 The Ohio State University Research Foundation Micro/nano-embossing process and useful applications thereof
ATE439969T1 (de) * 2002-04-24 2009-09-15 Obducat Ab Vorrichtung und verfahren zum übertragen eines musters auf ein substrat
US7037639B2 (en) 2002-05-01 2006-05-02 Molecular Imprints, Inc. Methods of manufacturing a lithography template
AU2003241245A1 (en) * 2002-06-07 2003-12-22 Obducat Ab Method for transferring a pattern
US7252492B2 (en) 2002-06-20 2007-08-07 Obducat Ab Devices and methods for aligning a stamp and a substrate
WO2004000567A1 (en) 2002-06-20 2003-12-31 Obducat Ab Mold tool method of manufacturing a mold tool and storage medium formed by use of the mold tool
US7179079B2 (en) 2002-07-08 2007-02-20 Molecular Imprints, Inc. Conforming template for patterning liquids disposed on substrates
US7019819B2 (en) 2002-11-13 2006-03-28 Molecular Imprints, Inc. Chucking system for modulating shapes of substrates
US7077992B2 (en) 2002-07-11 2006-07-18 Molecular Imprints, Inc. Step and repeat imprint lithography processes
US6932934B2 (en) 2002-07-11 2005-08-23 Molecular Imprints, Inc. Formation of discontinuous films during an imprint lithography process
US6916584B2 (en) 2002-08-01 2005-07-12 Molecular Imprints, Inc. Alignment methods for imprint lithography
US7071088B2 (en) 2002-08-23 2006-07-04 Molecular Imprints, Inc. Method for fabricating bulbous-shaped vias
JP2005537656A (ja) * 2002-08-27 2005-12-08 オブデュキャット、アクチボラグ 対象物にパターンを転写するための装置
JP4640512B2 (ja) * 2002-08-29 2011-03-02 凸版印刷株式会社 パターン形成装置及び方法
US6936194B2 (en) 2002-09-05 2005-08-30 Molecular Imprints, Inc. Functional patterning material for imprint lithography processes
US6980282B2 (en) 2002-12-11 2005-12-27 Molecular Imprints, Inc. Method for modulating shapes of substrates
US6929762B2 (en) 2002-11-13 2005-08-16 Molecular Imprints, Inc. Method of reducing pattern distortions during imprint lithography processes
US6871558B2 (en) 2002-12-12 2005-03-29 Molecular Imprints, Inc. Method for determining characteristics of substrate employing fluid geometries
AU2003300865A1 (en) 2002-12-13 2004-07-09 Molecular Imprints, Inc. Magnification corrections employing out-of-plane distortions on a substrate
US7452574B2 (en) 2003-02-27 2008-11-18 Molecular Imprints, Inc. Method to reduce adhesion between a polymerizable layer and a substrate employing a fluorine-containing layer
US7179396B2 (en) 2003-03-25 2007-02-20 Molecular Imprints, Inc. Positive tone bi-layer imprint lithography method
US7122079B2 (en) 2004-02-27 2006-10-17 Molecular Imprints, Inc. Composition for an etching mask comprising a silicon-containing material
US7396475B2 (en) 2003-04-25 2008-07-08 Molecular Imprints, Inc. Method of forming stepped structures employing imprint lithography
TW568349U (en) 2003-05-02 2003-12-21 Ind Tech Res Inst Parallelism adjusting device for nano-transferring
US6951173B1 (en) 2003-05-14 2005-10-04 Molecular Imprints, Inc. Assembly and method for transferring imprint lithography templates
US6805054B1 (en) 2003-05-14 2004-10-19 Molecular Imprints, Inc. Method, system and holder for transferring templates during imprint lithography processes
US7157036B2 (en) 2003-06-17 2007-01-02 Molecular Imprints, Inc Method to reduce adhesion between a conformable region and a pattern of a mold
JP2005064492A (ja) * 2003-07-28 2005-03-10 Kyocera Corp 単結晶サファイア基板とその製造方法及び半導体発光素子
JP2005101201A (ja) * 2003-09-24 2005-04-14 Canon Inc ナノインプリント装置
US7136150B2 (en) 2003-09-25 2006-11-14 Molecular Imprints, Inc. Imprint lithography template having opaque alignment marks
US7090716B2 (en) 2003-10-02 2006-08-15 Molecular Imprints, Inc. Single phase fluid imprint lithography method
JP4625247B2 (ja) * 2003-10-24 2011-02-02 株式会社ナノテック マイクロコンタクトプリント方法及び装置
US7122482B2 (en) 2003-10-27 2006-10-17 Molecular Imprints, Inc. Methods for fabricating patterned features utilizing imprint lithography
JP2005153113A (ja) * 2003-11-28 2005-06-16 Ricoh Opt Ind Co Ltd ナノプリントを用いた微細３次元構造体の製造方法及び微細３次元構造体
KR20060128886A (ko) * 2003-12-11 2006-12-14 노우코우다이 티엘오 가부시키가이샤 나노임프린트를 이용하는 패턴 형성 방법 및 상기 방법을실행하는 장치
US7019835B2 (en) * 2004-02-19 2006-03-28 Molecular Imprints, Inc. Method and system to measure characteristics of a film disposed on a substrate
US7730834B2 (en) * 2004-03-04 2010-06-08 Asml Netherlands B.V. Printing apparatus and device manufacturing method
DE602005022874D1 (de) * 2004-06-03 2010-09-23 Molecular Imprints Inc Fluidausgabe und tropfenausgabe nach bedarf für die herstellung im nanobereich
JP4713102B2 (ja) * 2004-07-29 2011-06-29 Ｓｃｉｖａｘ株式会社 傾き調整機能付きプレス装置、傾き調整機能付きパターン形成装置、型の傾き調整方法
JP4718946B2 (ja) * 2004-09-27 2011-07-06 株式会社東芝 板状構造体の製造装置
US7676088B2 (en) * 2004-12-23 2010-03-09 Asml Netherlands B.V. Imprint lithography
US20060144274A1 (en) * 2004-12-30 2006-07-06 Asml Netherlands B.V. Imprint lithography
US20060144814A1 (en) * 2004-12-30 2006-07-06 Asml Netherlands B.V. Imprint lithography
US7686970B2 (en) * 2004-12-30 2010-03-30 Asml Netherlands B.V. Imprint lithography
US7490547B2 (en) * 2004-12-30 2009-02-17 Asml Netherlands B.V. Imprint lithography
US7354698B2 (en) * 2005-01-07 2008-04-08 Asml Netherlands B.V. Imprint lithography
US7922474B2 (en) * 2005-02-17 2011-04-12 Asml Netherlands B.V. Imprint lithography
US7523701B2 (en) 2005-03-07 2009-04-28 Asml Netherlands B.V. Imprint lithography method and apparatus
KR100729427B1 (ko) * 2005-03-07 2007-06-15 주식회사 디엠에스 미세패턴 형성장치
US7762186B2 (en) 2005-04-19 2010-07-27 Asml Netherlands B.V. Imprint lithography
US7611348B2 (en) * 2005-04-19 2009-11-03 Asml Netherlands B.V. Imprint lithography
US7442029B2 (en) 2005-05-16 2008-10-28 Asml Netherlands B.V. Imprint lithography
US7708924B2 (en) * 2005-07-21 2010-05-04 Asml Netherlands B.V. Imprint lithography
US7692771B2 (en) * 2005-05-27 2010-04-06 Asml Netherlands B.V. Imprint lithography
US20060267231A1 (en) * 2005-05-27 2006-11-30 Asml Netherlands B.V. Imprint lithography
US7418902B2 (en) * 2005-05-31 2008-09-02 Asml Netherlands B.V. Imprint lithography including alignment
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US7377764B2 (en) * 2005-06-13 2008-05-27 Asml Netherlands B.V. Imprint lithography
KR101264673B1 (ko) * 2005-06-24 2013-05-20 엘지디스플레이 주식회사 소프트 몰드를 이용한 미세 패턴 형성방법
US20070023976A1 (en) * 2005-07-26 2007-02-01 Asml Netherlands B.V. Imprint lithography
JP4330168B2 (ja) * 2005-09-06 2009-09-16 キヤノン株式会社 モールド、インプリント方法、及びチップの製造方法
JP4533358B2 (ja) * 2005-10-18 2010-09-01 キヤノン株式会社 インプリント方法、インプリント装置およびチップの製造方法
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US7878791B2 (en) * 2005-11-04 2011-02-01 Asml Netherlands B.V. Imprint lithography
JP4923924B2 (ja) * 2005-11-22 2012-04-25 コニカミノルタホールディングス株式会社 インプリント装置及びインプリント方法
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US8015939B2 (en) * 2006-06-30 2011-09-13 Asml Netherlands B.V. Imprintable medium dispenser
JP4745177B2 (ja) * 2006-09-05 2011-08-10 株式会社ナノテック マイクロコンタクトプリントにおけるプリント圧力検出方法及び装置
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JP5205866B2 (ja) * 2007-08-23 2013-06-05 住友電気工業株式会社 モールドの形成方法、回折格子の形成方法、および分布帰還型半導体レーザの製造方法
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JP5297266B2 (ja) * 2009-05-19 2013-09-25 東芝機械株式会社 転写装置および転写方法
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FR2965495B1 (fr) * 2010-10-01 2013-08-02 Commissariat Energie Atomique Dispositif d'estampage et/ou de percage comprenant une tete support de substrat dont l'orientation est commandee en continu
JPWO2012147958A1 (ja) * 2011-04-28 2014-07-28 Ｓｃｉｖａｘ株式会社 流体圧インプリント装置および加圧装置
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Also Published As

Publication number Publication date
JP3833537B2 (ja) 2006-10-11
JP2003527248A (ja) 2003-09-16
DE60124377D1 (de) 2006-12-21
US7165957B2 (en) 2007-01-23
SE0000848D0 (sv) 2000-03-15
US20030170053A1 (en) 2003-09-11
ATE344938T1 (de) 2006-11-15
WO2001069317A1 (en) 2001-09-20
HK1058553A1 (en) 2004-05-21
SE515962C2 (sv) 2001-11-05
AU2001242926A1 (en) 2001-09-24
EP1264215B1 (en) 2006-11-08
CN1437714A (zh) 2003-08-20
CN1211706C (zh) 2005-07-20
EP1264215A1 (en) 2002-12-11
DE60124377T2 (de) 2007-09-06

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