ATE357475T1 - Plasma- fluorinierungsbehandlung von pörösem material - Google Patents
Plasma- fluorinierungsbehandlung von pörösem materialInfo
- Publication number
- ATE357475T1 ATE357475T1 AT02791286T AT02791286T ATE357475T1 AT E357475 T1 ATE357475 T1 AT E357475T1 AT 02791286 T AT02791286 T AT 02791286T AT 02791286 T AT02791286 T AT 02791286T AT E357475 T1 ATE357475 T1 AT E357475T1
- Authority
- AT
- Austria
- Prior art keywords
- porous material
- fluorination treatment
- plasma fluorination
- porous layer
- plasma
- Prior art date
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/50—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges
- C23C16/505—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges using radio frequency discharges
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08J—WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
- C08J9/00—Working-up of macromolecular substances to porous or cellular articles or materials; After-treatment thereof
- C08J9/36—After-treatment
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B9/00—Layered products comprising a layer of a particular substance not covered by groups B32B11/00 - B32B29/00
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F8/00—Chemical modification by after-treatment
- C08F8/18—Introducing halogen atoms or halogen-containing groups
- C08F8/20—Halogenation
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
- H10P50/00—Etching of wafers, substrates or parts of devices
- H10P50/20—Dry etching; Plasma etching; Reactive-ion etching
- H10P50/28—Dry etching; Plasma etching; Reactive-ion etching of insulating materials
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/249921—Web or sheet containing structurally defined element or component
- Y10T428/249953—Composite having voids in a component [e.g., porous, cellular, etc.]
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/249921—Web or sheet containing structurally defined element or component
- Y10T428/249953—Composite having voids in a component [e.g., porous, cellular, etc.]
- Y10T428/249955—Void-containing component partially impregnated with adjacent component
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T442/00—Fabric [woven, knitted, or nonwoven textile or cloth, etc.]
- Y10T442/20—Coated or impregnated woven, knit, or nonwoven fabric which is not [a] associated with another preformed layer or fiber layer or, [b] with respect to woven and knit, characterized, respectively, by a particular or differential weave or knit, wherein the coating or impregnation is neither a foamed material nor a free metal or alloy layer
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Organic Chemistry (AREA)
- Materials Engineering (AREA)
- Health & Medical Sciences (AREA)
- Medicinal Chemistry (AREA)
- Polymers & Plastics (AREA)
- General Chemical & Material Sciences (AREA)
- Physics & Mathematics (AREA)
- Plasma & Fusion (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Physical Or Chemical Processes And Apparatus (AREA)
- Treatments Of Macromolecular Shaped Articles (AREA)
- Manufacture Of Porous Articles, And Recovery And Treatment Of Waste Products (AREA)
- Coating Of Shaped Articles Made Of Macromolecular Substances (AREA)
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US34156401P | 2001-12-14 | 2001-12-14 | |
| US10/293,830 US7887889B2 (en) | 2001-12-14 | 2002-11-13 | Plasma fluorination treatment of porous materials |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| ATE357475T1 true ATE357475T1 (de) | 2007-04-15 |
Family
ID=26968178
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| AT02791286T ATE357475T1 (de) | 2001-12-14 | 2002-11-21 | Plasma- fluorinierungsbehandlung von pörösem material |
Country Status (12)
| Country | Link |
|---|---|
| US (4) | US7887889B2 (de) |
| EP (1) | EP1453897B1 (de) |
| JP (1) | JP4308014B2 (de) |
| KR (3) | KR20090130157A (de) |
| AT (1) | ATE357475T1 (de) |
| AU (1) | AU2002366335B2 (de) |
| BR (1) | BR0214907B1 (de) |
| CA (1) | CA2469115A1 (de) |
| DE (1) | DE60219070T2 (de) |
| ES (1) | ES2282500T3 (de) |
| MX (1) | MXPA04005626A (de) |
| WO (1) | WO2003051969A2 (de) |
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-
2002
- 2002-11-13 US US10/293,830 patent/US7887889B2/en not_active Expired - Fee Related
- 2002-11-21 ES ES02791286T patent/ES2282500T3/es not_active Expired - Lifetime
- 2002-11-21 BR BR0214907A patent/BR0214907B1/pt not_active IP Right Cessation
- 2002-11-21 KR KR1020097025492A patent/KR20090130157A/ko not_active Ceased
- 2002-11-21 KR KR1020047009154A patent/KR100903233B1/ko not_active Expired - Fee Related
- 2002-11-21 WO PCT/US2002/037372 patent/WO2003051969A2/en not_active Ceased
- 2002-11-21 CA CA 2469115 patent/CA2469115A1/en not_active Abandoned
- 2002-11-21 MX MXPA04005626A patent/MXPA04005626A/es active IP Right Grant
- 2002-11-21 KR KR1020087028717A patent/KR100946817B1/ko not_active Expired - Fee Related
- 2002-11-21 AT AT02791286T patent/ATE357475T1/de not_active IP Right Cessation
- 2002-11-21 AU AU2002366335A patent/AU2002366335B2/en not_active Ceased
- 2002-11-21 EP EP02791286A patent/EP1453897B1/de not_active Expired - Lifetime
- 2002-11-21 JP JP2003552842A patent/JP4308014B2/ja not_active Expired - Fee Related
- 2002-11-21 DE DE2002619070 patent/DE60219070T2/de not_active Expired - Lifetime
-
2011
- 2011-01-11 US US13/004,257 patent/US9127363B2/en not_active Expired - Fee Related
- 2011-01-11 US US13/004,288 patent/US20110100298A1/en not_active Abandoned
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2013
- 2013-01-21 US US13/746,077 patent/US20130125816A1/en not_active Abandoned
Also Published As
| Publication number | Publication date |
|---|---|
| US20110100298A1 (en) | 2011-05-05 |
| KR20090130157A (ko) | 2009-12-17 |
| KR100946817B1 (ko) | 2010-03-09 |
| JP2005511877A (ja) | 2005-04-28 |
| US20110100220A1 (en) | 2011-05-05 |
| AU2002366335B2 (en) | 2008-10-02 |
| WO2003051969A2 (en) | 2003-06-26 |
| MXPA04005626A (es) | 2004-12-06 |
| KR20090003361A (ko) | 2009-01-09 |
| AU2002366335A1 (en) | 2003-06-30 |
| BR0214907A (pt) | 2004-11-30 |
| US7887889B2 (en) | 2011-02-15 |
| BR0214907B1 (pt) | 2012-09-18 |
| EP1453897B1 (de) | 2007-03-21 |
| WO2003051969A3 (en) | 2004-01-22 |
| DE60219070D1 (de) | 2007-05-03 |
| DE60219070T2 (de) | 2007-12-13 |
| KR100903233B1 (ko) | 2009-06-17 |
| KR20040080438A (ko) | 2004-09-18 |
| ES2282500T3 (es) | 2007-10-16 |
| JP4308014B2 (ja) | 2009-08-05 |
| US20030134515A1 (en) | 2003-07-17 |
| EP1453897A2 (de) | 2004-09-08 |
| CA2469115A1 (en) | 2003-06-26 |
| US20130125816A1 (en) | 2013-05-23 |
| US9127363B2 (en) | 2015-09-08 |
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