ATE360105T1 - Verfahren und vorrichtung zur überwachung polymerisierten teos-aufbau in vakuumpumplinien - Google Patents
Verfahren und vorrichtung zur überwachung polymerisierten teos-aufbau in vakuumpumplinienInfo
- Publication number
- ATE360105T1 ATE360105T1 AT00921335T AT00921335T ATE360105T1 AT E360105 T1 ATE360105 T1 AT E360105T1 AT 00921335 T AT00921335 T AT 00921335T AT 00921335 T AT00921335 T AT 00921335T AT E360105 T1 ATE360105 T1 AT E360105T1
- Authority
- AT
- Austria
- Prior art keywords
- teos
- trap
- vacuum pump
- flow impeding
- liquid phase
- Prior art date
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/32431—Constructional details of the reactor
- H01J37/32798—Further details of plasma apparatus not provided for in groups H01J37/3244 - H01J37/32788; special provisions for cleaning or maintenance of the apparatus
- H01J37/32816—Pressure
- H01J37/32834—Exhausting
- H01J37/32844—Treating effluent gases
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/4412—Details relating to the exhausts, e.g. pumps, filters, scrubbers, particle traps
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
- H10P72/00—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof
- H10P72/04—Apparatus for manufacture or treatment
- H10P72/0402—Apparatus for fluid treatment
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D5/00—Condensation of vapours; Recovering volatile solvents by condensation
- B01D5/0033—Other features
- B01D5/0036—Multiple-effect condensation; Fractional condensation
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02C—CAPTURE, STORAGE, SEQUESTRATION OR DISPOSAL OF GREENHOUSE GASES [GHG]
- Y02C20/00—Capture or disposal of greenhouse gases
- Y02C20/30—Capture or disposal of greenhouse gases of perfluorocarbons [PFC], hydrofluorocarbons [HFC] or sulfur hexafluoride [SF6]
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S438/00—Semiconductor device manufacturing: process
- Y10S438/905—Cleaning of reaction chamber
Landscapes
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- General Chemical & Material Sciences (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Physics & Mathematics (AREA)
- Plasma & Fusion (AREA)
- Analytical Chemistry (AREA)
- Chemical Vapour Deposition (AREA)
- Polyethers (AREA)
- Filling Or Discharging Of Gas Storage Vessels (AREA)
- Solid-Sorbent Or Filter-Aiding Compositions (AREA)
- Physical Or Chemical Processes And Apparatus (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US09/250,928 US6197119B1 (en) | 1999-02-18 | 1999-02-18 | Method and apparatus for controlling polymerized teos build-up in vacuum pump lines |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| ATE360105T1 true ATE360105T1 (de) | 2007-05-15 |
Family
ID=22949758
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| AT00921335T ATE360105T1 (de) | 1999-02-18 | 2000-02-18 | Verfahren und vorrichtung zur überwachung polymerisierten teos-aufbau in vakuumpumplinien |
Country Status (7)
| Country | Link |
|---|---|
| US (2) | US6197119B1 (de) |
| EP (1) | EP1171644B1 (de) |
| JP (1) | JP4828024B2 (de) |
| KR (1) | KR100714801B1 (de) |
| AT (1) | ATE360105T1 (de) |
| DE (1) | DE60034443T2 (de) |
| WO (1) | WO2000049198A1 (de) |
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| US5800616A (en) | 1997-12-15 | 1998-09-01 | Sony Corporation | Vertical LPCVD furnace with reversible manifold collar and method of retrofitting same |
| JP5855651B2 (ja) * | 2010-07-16 | 2016-02-09 | マサチューセッツ インスティテュート オブ テクノロジー | 改変を組み込んだ自己組織化ペプチドおよびその使用方法 |
| JP5820641B2 (ja) * | 2011-06-30 | 2015-11-24 | 富士重工業株式会社 | 車体構造 |
-
1999
- 1999-02-18 US US09/250,928 patent/US6197119B1/en not_active Expired - Lifetime
-
2000
- 2000-02-18 DE DE60034443T patent/DE60034443T2/de not_active Expired - Lifetime
- 2000-02-18 WO PCT/US2000/004301 patent/WO2000049198A1/en not_active Ceased
- 2000-02-18 EP EP00921335A patent/EP1171644B1/de not_active Expired - Lifetime
- 2000-02-18 AT AT00921335T patent/ATE360105T1/de not_active IP Right Cessation
- 2000-02-18 KR KR1020017010533A patent/KR100714801B1/ko not_active Expired - Lifetime
- 2000-02-18 JP JP2000599920A patent/JP4828024B2/ja not_active Expired - Lifetime
-
2001
- 2001-02-12 US US09/782,105 patent/US6361607B2/en not_active Expired - Lifetime
Also Published As
| Publication number | Publication date |
|---|---|
| DE60034443T2 (de) | 2008-01-03 |
| US6197119B1 (en) | 2001-03-06 |
| US20010017080A1 (en) | 2001-08-30 |
| EP1171644A1 (de) | 2002-01-16 |
| EP1171644B1 (de) | 2007-04-18 |
| KR100714801B1 (ko) | 2007-05-04 |
| WO2000049198A1 (en) | 2000-08-24 |
| WO2000049198A9 (en) | 2002-03-28 |
| JP4828024B2 (ja) | 2011-11-30 |
| EP1171644A4 (de) | 2002-08-21 |
| JP2002537644A (ja) | 2002-11-05 |
| DE60034443D1 (de) | 2007-05-31 |
| US6361607B2 (en) | 2002-03-26 |
| KR20010110442A (ko) | 2001-12-13 |
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| RER | Ceased as to paragraph 5 lit. 3 law introducing patent treaties |