ATE404708T1 - Vorrichtung zur abscheidung einer beschichtung auf der inneren fläche eines gefässes - Google Patents
Vorrichtung zur abscheidung einer beschichtung auf der inneren fläche eines gefässesInfo
- Publication number
- ATE404708T1 ATE404708T1 AT07112039T AT07112039T ATE404708T1 AT E404708 T1 ATE404708 T1 AT E404708T1 AT 07112039 T AT07112039 T AT 07112039T AT 07112039 T AT07112039 T AT 07112039T AT E404708 T1 ATE404708 T1 AT E404708T1
- Authority
- AT
- Austria
- Prior art keywords
- container
- uhf
- cavity
- tube
- length
- Prior art date
Links
- 239000011248 coating agent Substances 0.000 title abstract 3
- 238000000576 coating method Methods 0.000 title abstract 3
- 238000000151 deposition Methods 0.000 title 1
- 238000002347 injection Methods 0.000 abstract 4
- 239000007924 injection Substances 0.000 abstract 4
- 230000005284 excitation Effects 0.000 abstract 3
- 239000002243 precursor Substances 0.000 abstract 3
- 229920001169 thermoplastic Polymers 0.000 abstract 2
- 239000004416 thermosoftening plastic Substances 0.000 abstract 2
- 239000004020 conductor Substances 0.000 abstract 1
- 239000000463 material Substances 0.000 abstract 1
- 230000000644 propagated effect Effects 0.000 abstract 1
- 239000010453 quartz Substances 0.000 abstract 1
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicon dioxide Inorganic materials O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 abstract 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/50—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges
- C23C16/511—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges using microwave discharges
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/04—Coating on selected surface areas, e.g. using masks
- C23C16/045—Coating cavities or hollow spaces, e.g. interior of tubes; Infiltration of porous substrates
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
- H01J37/32192—Microwave generated discharge
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
- H01J37/32192—Microwave generated discharge
- H01J37/32211—Means for coupling power to the plasma
- H01J37/3222—Antennas
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D1/00—Processes for applying liquids or other fluent materials
- B05D1/62—Plasma-deposition of organic layers
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D7/00—Processes, other than flocking, specially adapted for applying liquids or other fluent materials to particular surfaces or for applying particular liquids or other fluent materials
- B05D7/22—Processes, other than flocking, specially adapted for applying liquids or other fluent materials to particular surfaces or for applying particular liquids or other fluent materials to internal surfaces, e.g. of tubes
- B05D7/227—Processes, other than flocking, specially adapted for applying liquids or other fluent materials to particular surfaces or for applying particular liquids or other fluent materials to internal surfaces, e.g. of tubes of containers, cans or the like
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Plasma & Fusion (AREA)
- Materials Engineering (AREA)
- Chemical Kinetics & Catalysis (AREA)
- General Chemical & Material Sciences (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Analytical Chemistry (AREA)
- Plasma Technology (AREA)
- Chemical Vapour Deposition (AREA)
- Details Of Rigid Or Semi-Rigid Containers (AREA)
- Coating Apparatus (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| FR0606480A FR2903622B1 (fr) | 2006-07-17 | 2006-07-17 | Dispositif pour le depot d'un revetement sur une face interne d'un recipient |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| ATE404708T1 true ATE404708T1 (de) | 2008-08-15 |
Family
ID=37866288
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| AT07112039T ATE404708T1 (de) | 2006-07-17 | 2007-07-09 | Vorrichtung zur abscheidung einer beschichtung auf der inneren fläche eines gefässes |
Country Status (10)
| Country | Link |
|---|---|
| US (1) | US7975646B2 (de) |
| EP (1) | EP1881088B1 (de) |
| JP (1) | JP4612020B2 (de) |
| CN (1) | CN101109076B (de) |
| AT (1) | ATE404708T1 (de) |
| DE (1) | DE602007000073D1 (de) |
| ES (1) | ES2313701T3 (de) |
| FR (1) | FR2903622B1 (de) |
| MX (1) | MX2007008639A (de) |
| PT (1) | PT1881088E (de) |
Families Citing this family (36)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US7881785B2 (en) * | 2008-03-26 | 2011-02-01 | Cardiac Science Corporation | Method and apparatus for defrosting a defibrillation electrode |
| US8316797B2 (en) | 2008-06-16 | 2012-11-27 | Board of Trustees of Michigan State University Fraunhofer USA | Microwave plasma reactors |
| WO2012158532A1 (en) | 2011-05-13 | 2012-11-22 | Board Of Trustees Michigan State University | Improved microwave plasma reactors |
| US20110174220A1 (en) * | 2008-07-25 | 2011-07-21 | Dr. Laure Plasmatechnologie Gmbh | Device for Plasma-Assisted Coating of the Inner Side of Tubular Components |
| WO2013170052A1 (en) | 2012-05-09 | 2013-11-14 | Sio2 Medical Products, Inc. | Saccharide protective coating for pharmaceutical package |
| US7985188B2 (en) | 2009-05-13 | 2011-07-26 | Cv Holdings Llc | Vessel, coating, inspection and processing apparatus |
| MX350703B (es) | 2009-05-13 | 2017-09-14 | Sio2 Medical Products Inc | Metodo de gasificacion para inspeccionar una superficie revestida. |
| US9458536B2 (en) | 2009-07-02 | 2016-10-04 | Sio2 Medical Products, Inc. | PECVD coating methods for capped syringes, cartridges and other articles |
| DE102009044496B4 (de) * | 2009-11-11 | 2023-11-02 | Muegge Gmbh | Vorrichtung zur Erzeugung von Plasma mittels Mikrowellen |
| US11624115B2 (en) | 2010-05-12 | 2023-04-11 | Sio2 Medical Products, Inc. | Syringe with PECVD lubrication |
| US9878101B2 (en) | 2010-11-12 | 2018-01-30 | Sio2 Medical Products, Inc. | Cyclic olefin polymer vessels and vessel coating methods |
| US9272095B2 (en) | 2011-04-01 | 2016-03-01 | Sio2 Medical Products, Inc. | Vessels, contact surfaces, and coating and inspection apparatus and methods |
| JP5368514B2 (ja) * | 2011-06-30 | 2013-12-18 | 東京エレクトロン株式会社 | プラズマ処理装置 |
| EP2776603B1 (de) | 2011-11-11 | 2019-03-06 | SiO2 Medical Products, Inc. | Passivierungs-, ph-schutz- oder schmierbeschichtung für arzneimittelverpackung, beschichtungsverfahren und vorrichtung |
| US11116695B2 (en) | 2011-11-11 | 2021-09-14 | Sio2 Medical Products, Inc. | Blood sample collection tube |
| NL2007809C2 (en) | 2011-11-17 | 2013-05-21 | Draka Comteq Bv | An apparatus for performing a plasma chemical vapour deposition process. |
| US20150297800A1 (en) | 2012-07-03 | 2015-10-22 | Sio2 Medical Products, Inc. | SiOx BARRIER FOR PHARMACEUTICAL PACKAGE AND COATING PROCESS |
| CA2890066C (en) | 2012-11-01 | 2021-11-09 | Sio2 Medical Products, Inc. | Coating inspection method |
| US9903782B2 (en) | 2012-11-16 | 2018-02-27 | Sio2 Medical Products, Inc. | Method and apparatus for detecting rapid barrier coating integrity characteristics |
| US9764093B2 (en) | 2012-11-30 | 2017-09-19 | Sio2 Medical Products, Inc. | Controlling the uniformity of PECVD deposition |
| JP6382830B2 (ja) | 2012-11-30 | 2018-08-29 | エスアイオーツー・メディカル・プロダクツ・インコーポレイテッド | 医療シリンジ、カートリッジ等上でのpecvd堆積の均一性制御 |
| US9662450B2 (en) | 2013-03-01 | 2017-05-30 | Sio2 Medical Products, Inc. | Plasma or CVD pre-treatment for lubricated pharmaceutical package, coating process and apparatus |
| US9937099B2 (en) | 2013-03-11 | 2018-04-10 | Sio2 Medical Products, Inc. | Trilayer coated pharmaceutical packaging with low oxygen transmission rate |
| EP2971228B1 (de) | 2013-03-11 | 2023-06-21 | Si02 Medical Products, Inc. | Beschichtete verpackung |
| US20160017490A1 (en) | 2013-03-15 | 2016-01-21 | Sio2 Medical Products, Inc. | Coating method |
| SG11201605837TA (en) * | 2014-03-03 | 2016-08-30 | Picosun Oy | Protecting an interior of a gas container with an ald coating |
| WO2015148471A1 (en) | 2014-03-28 | 2015-10-01 | Sio2 Medical Products, Inc. | Antistatic coatings for plastic vessels |
| FR3032975B1 (fr) * | 2015-02-23 | 2017-03-10 | Sidel Participations | Procede de traitement par plasma de recipients, comprenant une phase d'imagerie thermique |
| FR3035881B1 (fr) * | 2015-05-04 | 2019-09-27 | Sidel Participations | Installation pour le traitement de recipients par plasma micro-ondes, comprenant un generateur a etat solide |
| EP3337915B1 (de) | 2015-08-18 | 2021-11-03 | SiO2 Medical Products, Inc. | Pharmazeutische und andere verpackungen mit niedriger sauerstoffübertragungsrate |
| NL2017575B1 (en) | 2016-10-04 | 2018-04-13 | Draka Comteq Bv | A method and an apparatus for performing a plasma chemical vapour deposition process and a method |
| DE102017108992A1 (de) * | 2017-04-26 | 2018-10-31 | Khs Corpoplast Gmbh | Vorrichtung zur Innenbeschichtung von Behältern |
| US11469077B2 (en) * | 2018-04-24 | 2022-10-11 | FD3M, Inc. | Microwave plasma chemical vapor deposition device and application thereof |
| US11261522B2 (en) * | 2018-10-18 | 2022-03-01 | Diamond Foundry Inc. | Axisymmetric material deposition from plasma assisted by angled gas flow |
| DE102020112201A1 (de) | 2020-05-06 | 2021-11-11 | Khs Corpoplast Gmbh | Vorrichtung und Verfahren zur Beschichtung von Behältern |
| FR3119506B1 (fr) * | 2021-02-03 | 2023-03-31 | Sairem Soc Pour Lapplication Industrielle De La Recherche En Electronique Et Micro Ondes | Dispositif de production d’un plasma comprenant une unité d’allumage de plasma |
Family Cites Families (19)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH07321096A (ja) * | 1994-05-20 | 1995-12-08 | Daihen Corp | マイクロ波プラズマ処理装置 |
| FR2792854B1 (fr) * | 1999-04-29 | 2001-08-03 | Sidel Sa | Dispositif pour le depot par plasma micro-ondes d'un revetement sur un recipient en materiau thermoplastique |
| FR2812568B1 (fr) * | 2000-08-01 | 2003-08-08 | Sidel Sa | Revetement barriere depose par plasma comprenant une couche d'interface, procede d'obtention d'un tel revetement et recipient revetu d'un tel revetement |
| JP4595276B2 (ja) * | 2000-12-25 | 2010-12-08 | 東洋製罐株式会社 | マイクロ波プラズマ処理方法及び装置 |
| JP2002339074A (ja) * | 2001-05-16 | 2002-11-27 | Mitsubishi Heavy Ind Ltd | 成膜装置 |
| US20040025791A1 (en) * | 2002-08-09 | 2004-02-12 | Applied Materials, Inc. | Etch chamber with dual frequency biasing sources and a single frequency plasma generating source |
| KR20050084844A (ko) * | 2002-10-09 | 2005-08-29 | 도요 세이칸 가부시키가이샤 | 금속 산화막의 형성 방법 및 해당 방법에 사용하는마이크로파 전원 장치 |
| JP4442182B2 (ja) * | 2002-10-09 | 2010-03-31 | 東洋製罐株式会社 | 金属酸化膜の形成方法 |
| EP1572786A2 (de) * | 2002-11-12 | 2005-09-14 | Dow Global Technologies Inc. | Verfahren und apparat zur plasmabeschichtung eines behälters |
| EP1602748B1 (de) * | 2003-03-12 | 2014-07-09 | Toyo Seikan Group Holdings, Ltd. | Mikrowellenplasmaverarbeitungsvorrichtung |
| US20060172085A1 (en) * | 2003-03-12 | 2006-08-03 | Toyo Seikan Kaisha, Ltd | Method and apparatus for chemical plasma processing of plastic container |
| JP4380185B2 (ja) * | 2003-03-12 | 2009-12-09 | 東洋製罐株式会社 | プラスチックボトル内面の化学プラズマ処理方法 |
| JP4380197B2 (ja) * | 2003-03-28 | 2009-12-09 | 東洋製罐株式会社 | プラズマcvd法による化学蒸着膜の形成方法 |
| EP1630250B1 (de) * | 2003-03-28 | 2013-03-06 | Toyo Seikan Kaisha, Ltd. | Durch ein plasma-cvd-verfahren gebildeter cvd-film und verfahren zu dessen bildung |
| JP4254320B2 (ja) * | 2003-04-15 | 2009-04-15 | 東洋製罐株式会社 | マイクロ波プラズマ処理装置及び処理方法 |
| FR2871813B1 (fr) * | 2004-06-17 | 2006-09-29 | Sidel Sas | Dispositif de depot, par plasma micro-ondes, d'un revetement sur une face d'un recipient en materiau thermoplastique |
| FR2872144B1 (fr) * | 2004-06-24 | 2006-10-13 | Sidel Sas | Machine de traitement de recipients comportant des moyens de prehension commandes pour saisir les recipients par leur col |
| FR2872148B1 (fr) * | 2004-06-24 | 2006-09-22 | Sidel Sas | Machine de traitement de bouteilles equipee d'une cartouche de raccordement interchangeable |
| US8058156B2 (en) * | 2004-07-20 | 2011-11-15 | Applied Materials, Inc. | Plasma immersion ion implantation reactor having multiple ion shower grids |
-
2006
- 2006-07-17 FR FR0606480A patent/FR2903622B1/fr not_active Expired - Fee Related
-
2007
- 2007-07-09 DE DE602007000073T patent/DE602007000073D1/de active Active
- 2007-07-09 AT AT07112039T patent/ATE404708T1/de not_active IP Right Cessation
- 2007-07-09 PT PT07112039T patent/PT1881088E/pt unknown
- 2007-07-09 EP EP07112039A patent/EP1881088B1/de active Active
- 2007-07-09 ES ES07112039T patent/ES2313701T3/es active Active
- 2007-07-11 US US11/822,942 patent/US7975646B2/en not_active Expired - Fee Related
- 2007-07-13 JP JP2007184815A patent/JP4612020B2/ja not_active Expired - Fee Related
- 2007-07-16 MX MX2007008639A patent/MX2007008639A/es active IP Right Grant
- 2007-07-17 CN CN2007101379388A patent/CN101109076B/zh not_active Expired - Fee Related
Also Published As
| Publication number | Publication date |
|---|---|
| DE602007000073D1 (de) | 2008-09-25 |
| EP1881088B1 (de) | 2008-08-13 |
| JP4612020B2 (ja) | 2011-01-12 |
| MX2007008639A (es) | 2008-12-19 |
| PT1881088E (pt) | 2008-11-21 |
| JP2008025029A (ja) | 2008-02-07 |
| CN101109076A (zh) | 2008-01-23 |
| EP1881088A1 (de) | 2008-01-23 |
| US20080011232A1 (en) | 2008-01-17 |
| ES2313701T3 (es) | 2009-03-01 |
| US7975646B2 (en) | 2011-07-12 |
| FR2903622A1 (fr) | 2008-01-18 |
| CN101109076B (zh) | 2010-09-29 |
| FR2903622B1 (fr) | 2008-10-03 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| RER | Ceased as to paragraph 5 lit. 3 law introducing patent treaties |