ATE404907T1 - Verfahren zur erzeugung optischer bilder, vorrichtung zum ausführen des verfahrens und prozess zur herstellung eines bauelements unter verwendung des verfahrens - Google Patents

Verfahren zur erzeugung optischer bilder, vorrichtung zum ausführen des verfahrens und prozess zur herstellung eines bauelements unter verwendung des verfahrens

Info

Publication number
ATE404907T1
ATE404907T1 AT04769800T AT04769800T ATE404907T1 AT E404907 T1 ATE404907 T1 AT E404907T1 AT 04769800 T AT04769800 T AT 04769800T AT 04769800 T AT04769800 T AT 04769800T AT E404907 T1 ATE404907 T1 AT E404907T1
Authority
AT
Austria
Prior art keywords
scale
resist layer
producing
carrying
component
Prior art date
Application number
AT04769800T
Other languages
English (en)
Inventor
De Rijdt Johannes Van
Roger Timmermans
Original Assignee
Koninkl Philips Electronics Nv
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Koninkl Philips Electronics Nv filed Critical Koninkl Philips Electronics Nv
Application granted granted Critical
Publication of ATE404907T1 publication Critical patent/ATE404907T1/de

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03G—ELECTROGRAPHY; ELECTROPHOTOGRAPHY; MAGNETOGRAPHY
    • G03G15/00—Apparatus for electrographic processes using a charge pattern
    • G03G15/04—Apparatus for electrographic processes using a charge pattern for exposing, i.e. imagewise exposure by optically projecting the original image on a photoconductive recording material
    • G03G15/04036—Details of illuminating systems, e.g. lamps, reflectors
    • G03G15/04045—Details of illuminating systems, e.g. lamps, reflectors for exposing image information provided otherwise than by directly projecting the original image onto the photoconductive recording material, e.g. digital copiers
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70258—Projection system adjustments, e.g. adjustments during exposure or alignment during assembly of projection system
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70275—Multiple projection paths, e.g. array of projection systems, microlens projection systems or tandem projection systems
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70283—Mask effects on the imaging process
    • G03F7/70291—Addressable masks, e.g. spatial light modulators [SLMs], digital micro-mirror devices [DMDs] or liquid crystal display [LCD] patterning devices
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70358—Scanning exposure, i.e. relative movement of patterned beam and workpiece during imaging
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03G—ELECTROGRAPHY; ELECTROPHOTOGRAPHY; MAGNETOGRAPHY
    • G03G15/00—Apparatus for electrographic processes using a charge pattern
    • G03G15/22—Apparatus for electrographic processes using a charge pattern involving the combination of more than one step according to groups G03G13/02 - G03G13/20
    • G03G15/32—Apparatus for electrographic processes using a charge pattern involving the combination of more than one step according to groups G03G13/02 - G03G13/20 in which the charge pattern is formed dotwise, e.g. by a thermal head
    • G03G15/326—Apparatus for electrographic processes using a charge pattern involving the combination of more than one step according to groups G03G13/02 - G03G13/20 in which the charge pattern is formed dotwise, e.g. by a thermal head by application of light, e.g. using a LED array
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03G—ELECTROGRAPHY; ELECTROPHOTOGRAPHY; MAGNETOGRAPHY
    • G03G2215/00—Apparatus for electrophotographic processes
    • G03G2215/04—Arrangements for exposing and producing an image
    • G03G2215/0402—Exposure devices
    • G03G2215/0407—Light-emitting array or panel
    • G03G2215/0414—Liquid-crystal display elements, i.e. LCD-shutter array

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Optical Record Carriers And Manufacture Thereof (AREA)
  • Light Sources And Details Of Projection-Printing Devices (AREA)
  • Holo Graphy (AREA)
  • Liquid Crystal (AREA)
AT04769800T 2003-08-27 2004-08-10 Verfahren zur erzeugung optischer bilder, vorrichtung zum ausführen des verfahrens und prozess zur herstellung eines bauelements unter verwendung des verfahrens ATE404907T1 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
EP03103225 2003-08-27

Publications (1)

Publication Number Publication Date
ATE404907T1 true ATE404907T1 (de) 2008-08-15

Family

ID=34259212

Family Applications (1)

Application Number Title Priority Date Filing Date
AT04769800T ATE404907T1 (de) 2003-08-27 2004-08-10 Verfahren zur erzeugung optischer bilder, vorrichtung zum ausführen des verfahrens und prozess zur herstellung eines bauelements unter verwendung des verfahrens

Country Status (9)

Country Link
US (1) US7405807B2 (de)
EP (1) EP1660944B1 (de)
JP (1) JP2007503613A (de)
KR (1) KR20060120608A (de)
CN (1) CN1842747A (de)
AT (1) ATE404907T1 (de)
DE (1) DE602004015806D1 (de)
TW (1) TW200528939A (de)
WO (1) WO2005022265A2 (de)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20060119873A (ko) * 2003-08-27 2006-11-24 코닌클리케 필립스 일렉트로닉스 엔.브이. 광 밸브 배열 및 광 수렴 배열을 이용한 광학 이미지 형성
US8605256B2 (en) * 2008-02-26 2013-12-10 3M Innovative Properties Company Multi-photon exposure system
US9507271B1 (en) * 2008-12-17 2016-11-29 Applied Materials, Inc. System and method for manufacturing multiple light emitting diodes in parallel
JP2011203678A (ja) * 2010-03-26 2011-10-13 Fuji Xerox Co Ltd 露光装置、露光装置の信号伝達機構、及び画像形成装置

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6133986A (en) * 1996-02-28 2000-10-17 Johnson; Kenneth C. Microlens scanner for microlithography and wide-field confocal microscopy
JPH11320968A (ja) 1998-05-13 1999-11-24 Ricoh Microelectronics Co Ltd 光像形成方法及びその装置、画像形成装置並びにリソグラフィ用露光装置
US6424404B1 (en) * 1999-01-11 2002-07-23 Kenneth C. Johnson Multi-stage microlens array
US6537738B1 (en) 2000-08-08 2003-03-25 Ball Semiconductor, Inc. System and method for making smooth diagonal components with a digital photolithography system
JP2006502558A (ja) 2001-11-07 2006-01-19 アプライド　マテリアルズ　インコーポレイテッド 光学式スポット格子アレイ印刷装置
WO2003052515A1 (en) 2001-12-17 2003-06-26 Koninklijke Philips Electronics N.V. Method of forming optical images, diffraction element for use with this method, apparatus for carrying out this method
AU2003219359A1 (en) * 2002-04-15 2003-10-27 Koninklijke Philips Electronics N.V. Imaging method

Also Published As

Publication number Publication date
EP1660944A2 (de) 2006-05-31
US20060256310A1 (en) 2006-11-16
DE602004015806D1 (de) 2008-09-25
EP1660944B1 (de) 2008-08-13
US7405807B2 (en) 2008-07-29
JP2007503613A (ja) 2007-02-22
WO2005022265A2 (en) 2005-03-10
CN1842747A (zh) 2006-10-04
TW200528939A (en) 2005-09-01
WO2005022265A3 (en) 2006-02-23
KR20060120608A (ko) 2006-11-27

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