ATE412256T1 - Verfahren zur herstellung strukturierter schichten - Google Patents

Verfahren zur herstellung strukturierter schichten

Info

Publication number
ATE412256T1
ATE412256T1 AT03012228T AT03012228T ATE412256T1 AT E412256 T1 ATE412256 T1 AT E412256T1 AT 03012228 T AT03012228 T AT 03012228T AT 03012228 T AT03012228 T AT 03012228T AT E412256 T1 ATE412256 T1 AT E412256T1
Authority
AT
Austria
Prior art keywords
transfer member
ridges
film
transfer
structured layers
Prior art date
Application number
AT03012228T
Other languages
English (en)
Inventor
Norio Shibata
Junji Nakada
Jun Fujinawa
Original Assignee
Fujifilm Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujifilm Corp filed Critical Fujifilm Corp
Application granted granted Critical
Publication of ATE412256T1 publication Critical patent/ATE412256T1/de

Links

Classifications

    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10W—GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W20/00—Interconnections in chips, wafers or substrates
    • H10W20/01—Manufacture or treatment
    • H10W20/031—Manufacture or treatment of conductive parts of the interconnections
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/0005—Separation of the coating from the substrate
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/08—Oxides
    • C23C14/086—Oxides of zinc, germanium, cadmium, indium, tin, thallium or bismuth
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K71/00—Manufacture or treatment specially adapted for the organic devices covered by this subclass
    • H10K71/10—Deposition of organic active material
    • H10K71/16—Deposition of organic active material using physical vapour deposition [PVD], e.g. vacuum deposition or sputtering
    • H10K71/164—Deposition of organic active material using physical vapour deposition [PVD], e.g. vacuum deposition or sputtering using vacuum deposition
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K71/00—Manufacture or treatment specially adapted for the organic devices covered by this subclass
    • H10K71/10—Deposition of organic active material
    • H10K71/18—Deposition of organic active material using non-liquid printing techniques, e.g. thermal transfer printing from a donor sheet
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P14/00—Formation of materials, e.g. in the shape of layers or pillars
    • H10P14/40—Formation of materials, e.g. in the shape of layers or pillars of conductive or resistive materials
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K59/00—Integrated devices, or assemblies of multiple devices, comprising at least one organic light-emitting element covered by group H10K50/00
    • H10K59/30—Devices specially adapted for multicolour light emission
    • H10K59/35—Devices specially adapted for multicolour light emission comprising red-green-blue [RGB] subpixels
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K71/00—Manufacture or treatment specially adapted for the organic devices covered by this subclass
    • H10K71/10—Deposition of organic active material
    • H10K71/12—Deposition of organic active material using liquid deposition, e.g. spin coating
    • H10K71/13—Deposition of organic active material using liquid deposition, e.g. spin coating using printing techniques, e.g. ink-jet printing or screen printing
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K71/00—Manufacture or treatment specially adapted for the organic devices covered by this subclass
    • H10K71/40—Thermal treatment, e.g. annealing in the presence of a solvent vapour
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K77/00—Constructional details of devices covered by this subclass and not covered by groups H10K10/80, H10K30/80, H10K50/80 or H10K59/80
    • H10K77/10—Substrates, e.g. flexible substrates
    • H10K77/111—Flexible substrates
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K85/00—Organic materials used in the body or electrodes of devices covered by this subclass
    • H10K85/30—Coordination compounds
    • H10K85/311—Phthalocyanine
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K85/00—Organic materials used in the body or electrodes of devices covered by this subclass
    • H10K85/30—Coordination compounds
    • H10K85/321—Metal complexes comprising a group IIIA element, e.g. Tris (8-hydroxyquinoline) gallium [Gaq3]
    • H10K85/324—Metal complexes comprising a group IIIA element, e.g. Tris (8-hydroxyquinoline) gallium [Gaq3] comprising aluminium, e.g. Alq3
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K85/00—Organic materials used in the body or electrodes of devices covered by this subclass
    • H10K85/30—Coordination compounds
    • H10K85/341—Transition metal complexes, e.g. Ru(II)polypyridine complexes
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K85/00—Organic materials used in the body or electrodes of devices covered by this subclass
    • H10K85/60—Organic compounds having low molecular weight
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K85/00—Organic materials used in the body or electrodes of devices covered by this subclass
    • H10K85/60—Organic compounds having low molecular weight
    • H10K85/611—Charge transfer complexes
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K85/00—Organic materials used in the body or electrodes of devices covered by this subclass
    • H10K85/60—Organic compounds having low molecular weight
    • H10K85/631—Amine compounds having at least two aryl rest on at least one amine-nitrogen atom, e.g. triphenylamine

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Organic Chemistry (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Manufacturing & Machinery (AREA)
  • Physical Vapour Deposition (AREA)
  • Decoration By Transfer Pictures (AREA)
  • Crystals, And After-Treatments Of Crystals (AREA)
  • Processing And Handling Of Plastics And Other Materials For Molding In General (AREA)
  • Inorganic Fibers (AREA)
AT03012228T 2002-06-07 2003-06-06 Verfahren zur herstellung strukturierter schichten ATE412256T1 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2002166533 2002-06-07

Publications (1)

Publication Number Publication Date
ATE412256T1 true ATE412256T1 (de) 2008-11-15

Family

ID=29545871

Family Applications (1)

Application Number Title Priority Date Filing Date
AT03012228T ATE412256T1 (de) 2002-06-07 2003-06-06 Verfahren zur herstellung strukturierter schichten

Country Status (4)

Country Link
US (1) US7202007B2 (de)
EP (1) EP1369255B1 (de)
AT (1) ATE412256T1 (de)
DE (1) DE60324222D1 (de)

Families Citing this family (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2005173558A (ja) * 2003-11-21 2005-06-30 Seiko Epson Corp 円周面の加工方法、現像ローラ及び感光ドラムの製造方法並びに現像ローラ及び感光ドラム
JP4601403B2 (ja) * 2004-11-25 2010-12-22 パナソニック株式会社 半導体レーザ素子の製造方法及びその製造装置
JP2006156439A (ja) 2004-11-25 2006-06-15 Nitto Denko Corp 光電気混載基板の製造方法
US8900655B2 (en) 2006-10-04 2014-12-02 Seagate Technology Llc Method for fabricating patterned magnetic recording device
US7704614B2 (en) * 2006-10-20 2010-04-27 Seagate Technology Llc Process for fabricating patterned magnetic recording media
GB0701909D0 (en) * 2007-01-31 2007-03-14 Imp Innovations Ltd Deposition Of Organic Layers
JP5018254B2 (ja) * 2007-06-06 2012-09-05 日立電線株式会社 ミラー付き光導波路及びその製造方法
GB2453766A (en) * 2007-10-18 2009-04-22 Novalia Ltd Method of fabricating an electronic device
JP5109982B2 (ja) * 2008-10-09 2012-12-26 日立電線株式会社 ミラー付き光伝送体の製造方法
KR101200674B1 (ko) * 2008-12-22 2012-11-12 파나소닉 주식회사 광배선판의 미러 반사 필름 형성 방법, 및 광배선판
KR102013315B1 (ko) * 2012-07-10 2019-08-23 삼성디스플레이 주식회사 유기 발광 디스플레이 장치의 제조 방법 및 이에 따라 제조된 유기 발광 디스플레이 장치
US10043707B2 (en) * 2012-10-16 2018-08-07 Qorvo Us, Inc. Additive conductor redistribution layer (ACRL)
JP6535816B2 (ja) * 2017-01-05 2019-06-26 株式会社アルバック 巻取式成膜装置及び巻取式成膜方法
CN112477391B (zh) * 2020-11-27 2022-05-10 浙江大学 基于双稳态结构的磁控转印印章及转印方法

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5017255A (en) * 1989-01-23 1991-05-21 Clyde D. Calhoun Method of transferring an inorganic image
US5399372A (en) * 1993-11-08 1995-03-21 Southwall Technologies, Inc. Method of patterning magnetic members
JPH08171008A (ja) 1994-12-16 1996-07-02 Toshiba Chem Corp カラーフィルタの製造方法
JP2918037B1 (ja) 1998-06-18 1999-07-12 日本電気株式会社 カラー有機ｅｌディスプレイとその製造方法
JP3694825B2 (ja) * 1999-11-18 2005-09-14 日本航空電子工業株式会社 導体パターンの形成方法及びコネクタ、フレキシブルプリント配線板、異方導電性部材
US6895667B2 (en) * 2001-04-13 2005-05-24 The Trustees Of Princeton University Transfer of patterned metal by cold-welding
US6946332B2 (en) * 2002-03-15 2005-09-20 Lucent Technologies Inc. Forming nanoscale patterned thin film metal layers

Also Published As

Publication number Publication date
EP1369255A3 (de) 2005-12-28
US20040241570A1 (en) 2004-12-02
EP1369255A2 (de) 2003-12-10
EP1369255B1 (de) 2008-10-22
DE60324222D1 (de) 2008-12-04
US7202007B2 (en) 2007-04-10

Similar Documents

Publication Publication Date Title
ATE412256T1 (de) Verfahren zur herstellung strukturierter schichten
WO2009004560A3 (en) A method for forming a patterned layer on a substrate
WO2005114719A3 (en) Method of forming a recessed structure employing a reverse tone process
WO2005062908A3 (en) Methods of making a pattern of optical element shapes on a roll for use in making optical elements on or in substrates
WO2005019503A3 (en) Sub-micron-scale patterning method and system
WO2009122373A3 (en) Patterned artificial marble slab
ATE524837T1 (de) Verfahren zur herstellung eines lichtemittierenden bauelements
WO2005113257A3 (en) Compliant hard template for uv imprinting
ATE439335T1 (de) Verfahren zur herstellung eines transparenten elements mit unsichtbaren elektroden
ATE490037T1 (de) Verfahren zur herstellung einer mikronadel oder eines mikroimplantats
ATE278636T1 (de) Verfahren zur herstellung eines thermisch biegbaren betätigungselements
WO2003031096A3 (en) Patterned structure reproduction using nonsticking mold
WO2008146869A3 (en) Pattern forming method, pattern or mold formed thereby
DE60333245D1 (de) Verfahren zur Herstellung von Dünnschichtbauelementen für Solarzellen oder SOI-Anwendungen
TW200520213A (en) Method for fabricating image sensor with inorganic microlens
ATE541320T1 (de) Beleuchter und verfahren zur herstellung eines derartigen beleuchters
ATE501464T1 (de) Nanoimprint lithographie in mehrschichtsystemem
WO2009154571A8 (en) A method of making an imprint on a polymer structure
WO2007053202A3 (en) Systems and methods for nanomaterial transfer
EP0803905A3 (de) Verfahren zur Herstellung von Halbleiteranordnungen durch Aufbringen von Mustern auf einer Scheibe mit nicht-planer Oberfläche
ATE515059T1 (de) Verfahren zur vergrösserung des gütefaktors einer induktivität in einer halbleiteranordnung
EP1507293A4 (de) Verfahren zur quanten-dot-bildung, quantenhalbleiterbauelement und verfahren zu seiner herstellung
EP1327517A3 (de) Methode zur Metallschichtbildung und auf Metallfolie basierendes Mehrschichtprodukt
TW200623948A (en) Manufacturing method for organic electronic device
WO2005015311A3 (en) Near-field exposure method and apparatus, near-field exposure mask, and device manufacturing method

Legal Events

Date Code Title Description
RER Ceased as to paragraph 5 lit. 3 law introducing patent treaties