ATE429425T1 - Uv-durchlässige fluorpolymere und durch deren verwendung hergestellte pellikel - Google Patents

Uv-durchlässige fluorpolymere und durch deren verwendung hergestellte pellikel

Info

Publication number
ATE429425T1
ATE429425T1 AT03792778T AT03792778T ATE429425T1 AT E429425 T1 ATE429425 T1 AT E429425T1 AT 03792778 T AT03792778 T AT 03792778T AT 03792778 T AT03792778 T AT 03792778T AT E429425 T1 ATE429425 T1 AT E429425T1
Authority
AT
Austria
Prior art keywords
group
pellicle
atom
contain
fluorpolymers
Prior art date
Application number
AT03792778T
Other languages
English (en)
Inventor
Ikuo Matsukura
Hidekazu Okamoto
Eisuke Murotani
Kazuya Oharu
Original Assignee
Asahi Glass Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Asahi Glass Co Ltd filed Critical Asahi Glass Co Ltd
Application granted granted Critical
Publication of ATE429425T1 publication Critical patent/ATE429425T1/de

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C07ORGANIC CHEMISTRY
    • C07DHETEROCYCLIC COMPOUNDS
    • C07D307/00Heterocyclic compounds containing five-membered rings having one oxygen atom as the only ring hetero atom
    • C07D307/02Heterocyclic compounds containing five-membered rings having one oxygen atom as the only ring hetero atom not condensed with other rings
    • C07D307/04Heterocyclic compounds containing five-membered rings having one oxygen atom as the only ring hetero atom not condensed with other rings having no double bonds between ring members or between ring members and non-ring members
    • C07D307/10Heterocyclic compounds containing five-membered rings having one oxygen atom as the only ring hetero atom not condensed with other rings having no double bonds between ring members or between ring members and non-ring members with substituted hydrocarbon radicals attached to ring carbon atoms
    • C07D307/16Radicals substituted by carbon atoms having three bonds to hetero atoms with at the most one bond to halogen, e.g. ester or nitrile radicals
    • CCHEMISTRY; METALLURGY
    • C07ORGANIC CHEMISTRY
    • C07DHETEROCYCLIC COMPOUNDS
    • C07D307/00Heterocyclic compounds containing five-membered rings having one oxygen atom as the only ring hetero atom
    • C07D307/02Heterocyclic compounds containing five-membered rings having one oxygen atom as the only ring hetero atom not condensed with other rings
    • C07D307/04Heterocyclic compounds containing five-membered rings having one oxygen atom as the only ring hetero atom not condensed with other rings having no double bonds between ring members or between ring members and non-ring members
    • C07D307/18Heterocyclic compounds containing five-membered rings having one oxygen atom as the only ring hetero atom not condensed with other rings having no double bonds between ring members or between ring members and non-ring members with hetero atoms or with carbon atoms having three bonds to hetero atoms with at the most one bond to halogen, e.g. ester or nitrile radicals, directly attached to ring carbon atoms
    • CCHEMISTRY; METALLURGY
    • C07ORGANIC CHEMISTRY
    • C07DHETEROCYCLIC COMPOUNDS
    • C07D307/00Heterocyclic compounds containing five-membered rings having one oxygen atom as the only ring hetero atom
    • C07D307/02Heterocyclic compounds containing five-membered rings having one oxygen atom as the only ring hetero atom not condensed with other rings
    • C07D307/26Heterocyclic compounds containing five-membered rings having one oxygen atom as the only ring hetero atom not condensed with other rings having one double bond between ring members or between a ring member and a non-ring member
    • C07D307/30Heterocyclic compounds containing five-membered rings having one oxygen atom as the only ring hetero atom not condensed with other rings having one double bond between ring members or between a ring member and a non-ring member with hetero atoms or with carbon atoms having three bonds to hetero atoms with at the most one bond to halogen, e.g. ester or nitrile radicals, directly attached to ring carbon atoms
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08FMACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F34/00Homopolymers and copolymers of cyclic compounds having no unsaturated aliphatic radicals in a side chain and having one or more carbon-to-carbon double bonds in a heterocyclic ring
    • C08F34/02Homopolymers and copolymers of cyclic compounds having no unsaturated aliphatic radicals in a side chain and having one or more carbon-to-carbon double bonds in a heterocyclic ring in a ring containing oxygen
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/62Pellicles, e.g. pellicle assemblies, e.g. having membrane on support frame; Preparation thereof
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/62Pellicles, e.g. pellicle assemblies, e.g. having membrane on support frame; Preparation thereof
    • G03F1/64Pellicles, e.g. pellicle assemblies, e.g. having membrane on support frame; Preparation thereof characterised by the frames, e.g. structure or material, including bonding means therefor

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
  • Macromonomer-Based Addition Polymer (AREA)
AT03792778T 2002-08-21 2003-08-21 Uv-durchlässige fluorpolymere und durch deren verwendung hergestellte pellikel ATE429425T1 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2002240759 2002-08-21
PCT/JP2003/010588 WO2004018443A1 (ja) 2002-08-21 2003-08-21 紫外光透過性含フッ素重合体および該重合体からなるペリクル

Publications (1)

Publication Number Publication Date
ATE429425T1 true ATE429425T1 (de) 2009-05-15

Family

ID=31943944

Family Applications (1)

Application Number Title Priority Date Filing Date
AT03792778T ATE429425T1 (de) 2002-08-21 2003-08-21 Uv-durchlässige fluorpolymere und durch deren verwendung hergestellte pellikel

Country Status (9)

Country Link
US (1) US7442815B2 (de)
EP (1) EP1548014B1 (de)
CN (1) CN1315817C (de)
AT (1) ATE429425T1 (de)
AU (1) AU2003257654A1 (de)
DE (1) DE60327333D1 (de)
RU (1) RU2005107716A (de)
TW (1) TW200408665A (de)
WO (1) WO2004018443A1 (de)

Families Citing this family (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE60327333D1 (de) 2002-08-21 2009-06-04 Asahi Glass Co Ltd Uv-durchlässige fluorpolymere und durch deren verwendung hergestellte pellikel
CN1886442B (zh) * 2003-12-03 2010-09-08 旭硝子株式会社 表膜及新的含氟聚合物
JP2008108890A (ja) * 2006-10-25 2008-05-08 Three M Innovative Properties Co 回路基板の接続方法及び接続構造体
EP2738603B1 (de) * 2011-07-29 2016-07-13 Asahi Glass Company, Limited Lithographiemembran, fotomaske mit der membran und belichtungsverfahren dafür
CN106471026B (zh) * 2014-07-04 2020-08-25 Agc株式会社 电解质材料、液态组合物、固体高分子型燃料电池用膜电极接合体及含氟支链聚合物
WO2016010043A1 (ja) 2014-07-15 2016-01-21 旭硝子株式会社 紫外線発光装置用接着剤および紫外線発光装置
JP6669464B2 (ja) * 2015-10-19 2020-03-18 信越化学工業株式会社 Euv用ペリクル
JP7139133B2 (ja) * 2018-04-03 2022-09-20 信越化学工業株式会社 ペリクルフレーム、ペリクル、及びペリクルフレームの製造方法
US20230047767A1 (en) * 2019-12-12 2023-02-16 Solvay Specialty Polymers Italy S.P.A. Method for removing fluoropolymer lift-off layer
JP7196208B2 (ja) * 2020-01-08 2022-12-26 ダイキン工業株式会社 絶縁膜又は誘電膜

Family Cites Families (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3865845A (en) 1971-02-24 1975-02-11 Paul Raphael Resnick Fluorinated dioxoles
JP2951337B2 (ja) * 1989-04-17 1999-09-20 古河電気工業株式会社 ペリクル
JP2952962B2 (ja) 1989-05-31 1999-09-27 旭硝子株式会社 汚染防止保護器具
JPH1031119A (ja) * 1996-07-18 1998-02-03 Asahi Glass Co Ltd コア/クラッド型の光学樹脂材料
KR20020053083A (ko) 1999-11-17 2002-07-04 메리 이. 보울러 자외선 및 진공자외선 투명 폴리머 조성물 및 그의 용도
US6548129B2 (en) 2000-03-15 2003-04-15 Asahi Glass Company, Limited Pellicle
JP2001330943A (ja) * 2000-03-15 2001-11-30 Asahi Glass Co Ltd ペリクル
WO2002066452A1 (en) * 2001-02-21 2002-08-29 Asahi Glass Company, Limited Processes for producing fluorinated cyclic ethers and use thereof
EP1401923A2 (de) * 2001-05-14 2004-03-31 E.I. du Pont de Nemours and Company Fluorharzzusammensetzungen mit fluor-enthaltender flüssigkeit
DE60327333D1 (de) 2002-08-21 2009-06-04 Asahi Glass Co Ltd Uv-durchlässige fluorpolymere und durch deren verwendung hergestellte pellikel
JP2004085713A (ja) 2002-08-23 2004-03-18 Asahi Glass Co Ltd ペリクル

Also Published As

Publication number Publication date
EP1548014B1 (de) 2009-04-22
TW200408665A (en) 2004-06-01
RU2005107716A (ru) 2006-07-27
WO2004018443A1 (ja) 2004-03-04
US20050147897A1 (en) 2005-07-07
US7442815B2 (en) 2008-10-28
EP1548014A4 (de) 2008-04-02
DE60327333D1 (de) 2009-06-04
TWI320048B (de) 2010-02-01
CN1675191A (zh) 2005-09-28
EP1548014A1 (de) 2005-06-29
AU2003257654A1 (en) 2004-03-11
CN1315817C (zh) 2007-05-16

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