ATE440306T1 - Verfahren zur negativ arbeitender bildaufzeichnung - Google Patents

Verfahren zur negativ arbeitender bildaufzeichnung

Info

Publication number
ATE440306T1
ATE440306T1 AT00109035T AT00109035T ATE440306T1 AT E440306 T1 ATE440306 T1 AT E440306T1 AT 00109035 T AT00109035 T AT 00109035T AT 00109035 T AT00109035 T AT 00109035T AT E440306 T1 ATE440306 T1 AT E440306T1
Authority
AT
Austria
Prior art keywords
image recording
compound
recording material
negative type
type image
Prior art date
Application number
AT00109035T
Other languages
English (en)
Inventor
Kazuto Shimada
Kazuto Kunita
Original Assignee
Fujifilm Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujifilm Corp filed Critical Fujifilm Corp
Application granted granted Critical
Publication of ATE440306T1 publication Critical patent/ATE440306T1/de

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/0045—Photosensitive materials with organic non-macromolecular light-sensitive compounds not otherwise provided for, e.g. dissolution inhibitors
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41C—PROCESSES FOR THE MANUFACTURE OR REPRODUCTION OF PRINTING SURFACES
    • B41C1/00—Forme preparation
    • B41C1/10—Forme preparation for lithographic printing; Master sheets for transferring a lithographic image to the forme
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
    • Y10S430/1055—Radiation sensitive composition or product or process of making
    • Y10S430/114—Initiator containing
    • Y10S430/115—Cationic or anionic
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/145—Infrared

Landscapes

  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Materials For Photolithography (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Manufacture Or Reproduction Of Printing Formes (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
  • Heat Sensitive Colour Forming Recording (AREA)
AT00109035T 1999-04-28 2000-04-27 Verfahren zur negativ arbeitender bildaufzeichnung ATE440306T1 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP12298499A JP2000314961A (ja) 1999-04-28 1999-04-28 ネガ型画像記録材料

Publications (1)

Publication Number Publication Date
ATE440306T1 true ATE440306T1 (de) 2009-09-15

Family

ID=14849429

Family Applications (1)

Application Number Title Priority Date Filing Date
AT00109035T ATE440306T1 (de) 1999-04-28 2000-04-27 Verfahren zur negativ arbeitender bildaufzeichnung

Country Status (5)

Country Link
US (1) US6416939B1 (de)
EP (1) EP1048981B1 (de)
JP (1) JP2000314961A (de)
AT (1) ATE440306T1 (de)
DE (1) DE60042768D1 (de)

Families Citing this family (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE69936995T2 (de) * 1998-03-20 2008-05-21 Nippon Soda Co. Ltd. Photohärtbare zusammensetzung welche ein iodoniumsalz enthält
JP2001183816A (ja) * 1999-12-27 2001-07-06 Fuji Photo Film Co Ltd ネガ型感熱性平版印刷用原板
WO2003065122A1 (en) * 2002-01-31 2003-08-07 Scandinavian Micro Biodevices A/S Method of joining a workpiece and a microstructure by light exposure
JP3850767B2 (ja) * 2002-07-25 2006-11-29 富士通株式会社 レジストパターン厚肉化材料、レジストパターン及びその製造方法、並びに、半導体装置及びその製造方法
JP3850772B2 (ja) * 2002-08-21 2006-11-29 富士通株式会社 レジストパターン厚肉化材料、レジストパターンの製造方法、及び半導体装置の製造方法
TW200506538A (en) * 2003-08-04 2005-02-16 Fujitsu Ltd Resist pattern thickening material, process for forming resist pattern using the same, and process for manufacturing semiconductor device using the same
CN105308505B (zh) 2013-06-14 2019-11-29 爱克发有限公司 平版印刷版前体
KR102324819B1 (ko) * 2014-12-12 2021-11-11 삼성전자주식회사 포토레지스트용 고분자, 포토레지스트 조성물, 패턴 형성 방법 및 반도체 장치의 제조 방법
KR101877029B1 (ko) * 2016-05-13 2018-07-11 영창케미칼 주식회사 화학증폭형 네가티브형 포토레지스트 조성물
KR101882296B1 (ko) * 2017-03-28 2018-08-02 주식회사 트리엘 비닐페닐옥시기를 가지는 화합물을 포함하는 포토레지스트 조성물
KR102103318B1 (ko) * 2018-06-07 2020-04-22 주식회사 트리엘 비닐페닐옥시기를 가지는 화합물을 포함하는 포토레지스트 조성물

Family Cites Families (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
NL129237C (de) * 1965-03-11
US4264703A (en) 1974-05-02 1981-04-28 General Electric Company Cationically polymerizable compositions containing photodecomposable aromatic iodonium salts
US4442197A (en) 1982-01-11 1984-04-10 General Electric Company Photocurable compositions
JPS59147001A (ja) 1983-02-07 1984-08-23 ゼネラル・エレクトリツク・カンパニイ 光硬化性組成物
JPS59180543A (ja) 1983-03-31 1984-10-13 Konishiroku Photo Ind Co Ltd 感光性組成物
JP2777388B2 (ja) 1988-04-15 1998-07-16 広栄化学工業株式会社 重合触媒およびそれを含有する硬化性組成物
JPH0368950A (ja) 1989-08-08 1991-03-25 Canon Inc 感光性組成物
JP3011864B2 (ja) * 1994-12-09 2000-02-21 日本ペイント株式会社 水現像性感光性樹脂組成物
US5658708A (en) 1995-02-17 1997-08-19 Fuji Photo Film Co., Ltd. Image recording material
US6068963A (en) 1997-01-20 2000-05-30 Fuji Photo Film Co., Ltd. Negative-type image recording materials
JP3819997B2 (ja) 1997-06-20 2006-09-13 富士写真フイルム株式会社 ネガ型画像記録材料
JP3810538B2 (ja) 1997-11-28 2006-08-16 富士写真フイルム株式会社 ポジ型画像形成材料
JP2000305267A (ja) * 1999-04-22 2000-11-02 Jsr Corp 感光性樹脂組成物

Also Published As

Publication number Publication date
JP2000314961A (ja) 2000-11-14
EP1048981A1 (de) 2000-11-02
EP1048981B1 (de) 2009-08-19
US6416939B1 (en) 2002-07-09
DE60042768D1 (de) 2009-10-01

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