ATE506635T1 - Imprint-lithografie - Google Patents

Imprint-lithografie

Info

Publication number
ATE506635T1
ATE506635T1 AT06255420T AT06255420T ATE506635T1 AT E506635 T1 ATE506635 T1 AT E506635T1 AT 06255420 T AT06255420 T AT 06255420T AT 06255420 T AT06255420 T AT 06255420T AT E506635 T1 ATE506635 T1 AT E506635T1
Authority
AT
Austria
Prior art keywords
substrate
hold
substrate table
imprint template
imprint lithography
Prior art date
Application number
AT06255420T
Other languages
English (en)
Inventor
Klaus Simon
Original Assignee
Asml Netherlands Bv
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Asml Netherlands Bv filed Critical Asml Netherlands Bv
Application granted granted Critical
Publication of ATE506635T1 publication Critical patent/ATE506635T1/de

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
    • G03F9/7003—Alignment type or strategy, e.g. leveling, global alignment
    • G03F9/7042—Alignment for lithographic apparatus using patterning methods other than those involving the exposure to radiation, e.g. by stamping or imprinting
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y10/00—Nanotechnology for information processing, storage or transmission, e.g. quantum computing or single electron logic
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y40/00—Manufacture or treatment of nanostructures
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0002—Lithographic processes using patterning methods other than those involving the exposure to radiation, e.g. by stamping

Landscapes

  • Engineering & Computer Science (AREA)
  • Nanotechnology (AREA)
  • Chemical & Material Sciences (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Theoretical Computer Science (AREA)
  • Mathematical Physics (AREA)
  • Manufacturing & Machinery (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Shaping Of Tube Ends By Bending Or Straightening (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
  • Low-Molecular Organic Synthesis Reactions Using Catalysts (AREA)
  • Micromachines (AREA)
  • Saccharide Compounds (AREA)
AT06255420T 2005-11-04 2006-10-21 Imprint-lithografie ATE506635T1 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US73317505P 2005-11-04 2005-11-04
US11/364,497 US8011915B2 (en) 2005-11-04 2006-03-01 Imprint lithography

Publications (1)

Publication Number Publication Date
ATE506635T1 true ATE506635T1 (de) 2011-05-15

Family

ID=37670937

Family Applications (1)

Application Number Title Priority Date Filing Date
AT06255420T ATE506635T1 (de) 2005-11-04 2006-10-21 Imprint-lithografie

Country Status (5)

Country Link
US (4) US8011915B2 (de)
EP (1) EP1783547B1 (de)
JP (2) JP4604012B2 (de)
AT (1) ATE506635T1 (de)
DE (1) DE602006021380D1 (de)

Families Citing this family (31)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7676088B2 (en) 2004-12-23 2010-03-09 Asml Netherlands B.V. Imprint lithography
US7517211B2 (en) * 2005-12-21 2009-04-14 Asml Netherlands B.V. Imprint lithography
JP5082262B2 (ja) * 2006-03-03 2012-11-28 コニカミノルタホールディングス株式会社 樹脂膜の製造方法
US8142702B2 (en) * 2007-06-18 2012-03-27 Molecular Imprints, Inc. Solvent-assisted layer formation for imprint lithography
JP5361309B2 (ja) * 2008-09-25 2013-12-04 キヤノン株式会社 インプリント装置およびインプリント方法
JPWO2010082300A1 (ja) * 2009-01-13 2012-06-28 パイオニア株式会社 転写装置
EP2384875A4 (de) * 2009-01-30 2014-03-12 Konica Minolta Opto Inc Vorrichtung zur herstellung einer wafer-linse und verfahren zur herstellung einer wafer-linse
JP5404140B2 (ja) * 2009-04-01 2014-01-29 株式会社東芝 テンプレート及び半導体装置の製造方法
JP5443070B2 (ja) * 2009-06-19 2014-03-19 東京エレクトロン株式会社 インプリントシステム
JP5495767B2 (ja) * 2009-12-21 2014-05-21 キヤノン株式会社 インプリント装置及び方法、並びに物品の製造方法
NL2005975A (en) * 2010-03-03 2011-09-06 Asml Netherlands Bv Imprint lithography.
JP5539011B2 (ja) 2010-05-14 2014-07-02 キヤノン株式会社 インプリント装置、検出装置、位置合わせ装置、及び物品の製造方法
JP2012009831A (ja) * 2010-05-21 2012-01-12 Tokyo Electron Ltd インプリントシステム、インプリント方法、プログラム及びコンピュータ記憶媒体
JP5611112B2 (ja) * 2010-05-21 2014-10-22 東京エレクトロン株式会社 インプリントシステム、インプリント方法、プログラム及びコンピュータ記憶媒体
JP5411201B2 (ja) * 2010-05-21 2014-02-12 東京エレクトロン株式会社 インプリントシステム、インプリント方法、プログラム及びコンピュータ記憶媒体
NL2006929A (en) 2010-08-05 2012-02-13 Asml Netherlands Bv Imprint lithography.
FR2974194B1 (fr) * 2011-04-12 2013-11-15 Commissariat Energie Atomique Procede de lithographie
JP6028602B2 (ja) * 2013-02-06 2016-11-16 大日本印刷株式会社 インプリント方法およびインプリント装置
JP6123321B2 (ja) * 2013-02-06 2017-05-10 大日本印刷株式会社 インプリント方法およびインプリント装置
JP6032036B2 (ja) * 2013-02-06 2016-11-24 大日本印刷株式会社 インプリント方法およびインプリント装置
JP5611399B2 (ja) * 2013-03-25 2014-10-22 キヤノン株式会社 加工装置
KR102292465B1 (ko) * 2013-08-19 2021-08-20 보드 오브 레젼츠, 더 유니버시티 오브 텍사스 시스템 나노미터 스케일 정확도를 갖는 사용자 정의 프로파일의 프로그램 가능한 박막 적층 방법
JP6497849B2 (ja) * 2014-04-15 2019-04-10 キヤノン株式会社 インプリント装置、および物品の製造方法
JP6399839B2 (ja) * 2014-07-15 2018-10-03 キヤノン株式会社 インプリント装置、および物品の製造方法
JP6512840B2 (ja) * 2015-01-22 2019-05-15 キヤノン株式会社 インプリント装置及び方法、並びに物品の製造方法
CN108026330B (zh) * 2015-09-08 2020-12-22 佳能株式会社 在纳米压印光刻中的基材预处理和蚀刻均匀性
CN121551242A (zh) * 2015-10-15 2026-02-24 德克萨斯大学系统董事会 用于精密纳米尺度制造的通用过程
KR102215539B1 (ko) 2015-11-20 2021-02-16 에이에스엠엘 네델란즈 비.브이. 리소그래피 장치 및 리소그래피 장치를 작동시키는 방법
JP6365619B2 (ja) * 2016-10-17 2018-08-01 大日本印刷株式会社 インプリント方法およびインプリント装置
JP6365620B2 (ja) * 2016-10-17 2018-08-01 大日本印刷株式会社 インプリント方法およびインプリント装置
CN120669473B (zh) * 2025-08-20 2025-10-21 普雨科技(苏州)有限公司 一种纳米压印设备及压印方法

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US6518189B1 (en) * 1995-11-15 2003-02-11 Regents Of The University Of Minnesota Method and apparatus for high density nanostructures
US6482742B1 (en) * 2000-07-18 2002-11-19 Stephen Y. Chou Fluid pressure imprint lithography
US6309580B1 (en) * 1995-11-15 2001-10-30 Regents Of The University Of Minnesota Release surfaces, particularly for use in nanoimprint lithography
JPH09192573A (ja) * 1996-01-22 1997-07-29 Matsushita Electric Ind Co Ltd 薄膜形成方法及び薄膜形成装置
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JPH11340129A (ja) 1998-05-28 1999-12-10 Seiko Epson Corp パターン製造方法およびパターン製造装置
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Also Published As

Publication number Publication date
US20180095361A1 (en) 2018-04-05
JP2007182063A (ja) 2007-07-19
JP2010016405A (ja) 2010-01-21
DE602006021380D1 (de) 2011-06-01
US9864271B2 (en) 2018-01-09
US10025206B2 (en) 2018-07-17
EP1783547A2 (de) 2007-05-09
EP1783547A3 (de) 2007-05-30
JP4604012B2 (ja) 2010-12-22
EP1783547B1 (de) 2011-04-20
US8011915B2 (en) 2011-09-06
US9778563B2 (en) 2017-10-03
US20070102838A1 (en) 2007-05-10
US20110283937A1 (en) 2011-11-24
JP4629147B2 (ja) 2011-02-09
US20170329218A1 (en) 2017-11-16

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