ATE72544T1 - Mehrschichtiger schutzueberzug fuer substrate, verfahren zum schuetzen eines substrats durch plasmaablagerung eines solchen ueberzugs, hergestellte ueberzuege und deren anwendungen. - Google Patents
Mehrschichtiger schutzueberzug fuer substrate, verfahren zum schuetzen eines substrats durch plasmaablagerung eines solchen ueberzugs, hergestellte ueberzuege und deren anwendungen.Info
- Publication number
- ATE72544T1 ATE72544T1 AT89401290T AT89401290T ATE72544T1 AT E72544 T1 ATE72544 T1 AT E72544T1 AT 89401290 T AT89401290 T AT 89401290T AT 89401290 T AT89401290 T AT 89401290T AT E72544 T1 ATE72544 T1 AT E72544T1
- Authority
- AT
- Austria
- Prior art keywords
- coating
- substrate
- substrates
- protecting
- applications
- Prior art date
Links
- 239000000758 substrate Substances 0.000 title abstract 5
- 238000000576 coating method Methods 0.000 title abstract 3
- 239000011248 coating agent Substances 0.000 title abstract 2
- 230000008021 deposition Effects 0.000 title abstract 2
- 238000000034 method Methods 0.000 title abstract 2
- 230000002633 protecting effect Effects 0.000 title abstract 2
- 239000011253 protective coating Substances 0.000 title abstract 2
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 abstract 2
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 abstract 1
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 abstract 1
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 abstract 1
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 abstract 1
- 229910052799 carbon Inorganic materials 0.000 abstract 1
- 239000001257 hydrogen Substances 0.000 abstract 1
- 229910052739 hydrogen Inorganic materials 0.000 abstract 1
- 229910052757 nitrogen Inorganic materials 0.000 abstract 1
- 239000001301 oxygen Substances 0.000 abstract 1
- 229910052760 oxygen Inorganic materials 0.000 abstract 1
- 229910052710 silicon Inorganic materials 0.000 abstract 1
- 239000010703 silicon Substances 0.000 abstract 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
- C23C16/30—Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
- C03C17/34—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions
- C03C17/3411—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions with at least two coatings of inorganic materials
- C03C17/3429—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions with at least two coatings of inorganic materials at least one of the coatings being a non-oxide coating
- C03C17/3435—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions with at least two coatings of inorganic materials at least one of the coatings being a non-oxide coating comprising a nitride, oxynitride, boronitride or carbonitride
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
- C03C17/34—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions
- C03C17/3411—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions with at least two coatings of inorganic materials
- C03C17/3429—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions with at least two coatings of inorganic materials at least one of the coatings being a non-oxide coating
- C03C17/3441—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions with at least two coatings of inorganic materials at least one of the coatings being a non-oxide coating comprising carbon, a carbide or oxycarbide
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
- C03C17/34—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions
- C03C17/3411—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions with at least two coatings of inorganic materials
- C03C17/3429—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions with at least two coatings of inorganic materials at least one of the coatings being a non-oxide coating
- C03C17/3482—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions with at least two coatings of inorganic materials at least one of the coatings being a non-oxide coating comprising silicon, hydrogenated silicon or a silicide
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/02—Pretreatment of the material to be coated
- C23C16/0227—Pretreatment of the material to be coated by cleaning or etching
- C23C16/0245—Pretreatment of the material to be coated by cleaning or etching by etching with a plasma
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
- C23C16/30—Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
- C23C16/308—Oxynitrides
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02T—CLIMATE CHANGE MITIGATION TECHNOLOGIES RELATED TO TRANSPORTATION
- Y02T50/00—Aeronautics or air transport
- Y02T50/60—Efficient propulsion technologies, e.g. for aircraft
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/24—Structurally defined web or sheet [e.g., overall dimension, etc.]
- Y10T428/24942—Structurally defined web or sheet [e.g., overall dimension, etc.] including components having same physical characteristic in differing degree
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/24—Structurally defined web or sheet [e.g., overall dimension, etc.]
- Y10T428/24942—Structurally defined web or sheet [e.g., overall dimension, etc.] including components having same physical characteristic in differing degree
- Y10T428/2495—Thickness [relative or absolute]
- Y10T428/24967—Absolute thicknesses specified
- Y10T428/24975—No layer or component greater than 5 mils thick
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/26—Web or sheet containing structurally defined element or component, the element or component having a specified physical dimension
- Y10T428/263—Coating layer not in excess of 5 mils thick or equivalent
- Y10T428/264—Up to 3 mils
- Y10T428/265—1 mil or less
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/31504—Composite [nonstructural laminate]
- Y10T428/31507—Of polycarbonate
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/31504—Composite [nonstructural laminate]
- Y10T428/31652—Of asbestos
- Y10T428/31663—As siloxane, silicone or silane
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- General Chemical & Material Sciences (AREA)
- Materials Engineering (AREA)
- Organic Chemistry (AREA)
- Life Sciences & Earth Sciences (AREA)
- Geochemistry & Mineralogy (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Inorganic Chemistry (AREA)
- Physics & Mathematics (AREA)
- Plasma & Fusion (AREA)
- Laminated Bodies (AREA)
- Chemical Vapour Deposition (AREA)
- Non-Metallic Protective Coatings For Printed Circuits (AREA)
- Wrappers (AREA)
- Formation Of Insulating Films (AREA)
- Medicines That Contain Protein Lipid Enzymes And Other Medicines (AREA)
- Compression Or Coding Systems Of Tv Signals (AREA)
- Magnetic Record Carriers (AREA)
- Optical Record Carriers And Manufacture Thereof (AREA)
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| FR8806369A FR2631346B1 (fr) | 1988-05-11 | 1988-05-11 | Revetement protecteur multicouche pour substrat, procede de protection de substrat par depot par plasma d'un tel revetement, revetements obtenus et leurs applications |
| EP89401290A EP0345107B1 (de) | 1988-05-11 | 1989-05-10 | Mehrschichtiger Schutzüberzug für Substrate, Verfahren zum Schützen eines Substrats durch Plasmaablagerung eines solchen Überzugs, hergestellte Überzüge und deren Anwendungen |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| ATE72544T1 true ATE72544T1 (de) | 1992-02-15 |
Family
ID=9366231
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| AT89401290T ATE72544T1 (de) | 1988-05-11 | 1989-05-10 | Mehrschichtiger schutzueberzug fuer substrate, verfahren zum schuetzen eines substrats durch plasmaablagerung eines solchen ueberzugs, hergestellte ueberzuege und deren anwendungen. |
Country Status (11)
| Country | Link |
|---|---|
| US (1) | US5116665A (de) |
| EP (1) | EP0345107B1 (de) |
| JP (1) | JPH0230764A (de) |
| KR (1) | KR890017185A (de) |
| AT (1) | ATE72544T1 (de) |
| DE (1) | DE68900824D1 (de) |
| DK (1) | DK228689A (de) |
| ES (1) | ES2038834T3 (de) |
| FI (1) | FI892268A7 (de) |
| FR (1) | FR2631346B1 (de) |
| NO (1) | NO891902L (de) |
Families Citing this family (19)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5278243A (en) * | 1992-01-14 | 1994-01-11 | Soane Technologies, Inc. | High impact resistant macromolecular networks |
| FR2661688B1 (fr) * | 1990-05-02 | 1992-07-17 | Air Liquide | Revetement multicouche pour substrat polycarbonate et procede d'elaboration d'un tel revetement. |
| FR2664294B1 (fr) * | 1990-07-06 | 1992-10-23 | Plasmametal | Procede de metallisation d'une surface. |
| JP2874298B2 (ja) * | 1990-07-24 | 1999-03-24 | 日本板硝子株式会社 | 磁気記録媒体およびその製造方法 |
| US5234748A (en) * | 1991-06-19 | 1993-08-10 | Ford Motor Company | Anti-reflective transparent coating with gradient zone |
| DE4404690A1 (de) * | 1994-02-15 | 1995-08-17 | Leybold Ag | Verfahren zur Erzeugung von Sperrschichten für Gase und Dämpfe auf Kunststoff-Substraten |
| FR2741328B1 (fr) * | 1995-11-20 | 1997-12-19 | Commissariat Energie Atomique | Boite de stockage d'un objet destine a etre protege d'une contamination physico-chimique |
| FR2756663B1 (fr) * | 1996-12-04 | 1999-02-26 | Berenguer Marc | Procede de traitement d'un substrat semi-conducteur comprenant une etape de traitement de surface |
| EP0848083A3 (de) * | 1996-12-12 | 2001-03-07 | Eastman Kodak Company | Anorganische und diamantartiger Kohlenstoff-Schutzschichten und Verfahren zu deren Herstellung bei Raumtemperatur |
| US5879775A (en) * | 1996-12-12 | 1999-03-09 | Eastman Kodak Compnay | Protective inorganic and DLC coatings for plastic media such as plastic cards |
| FR2759362B1 (fr) * | 1997-02-10 | 1999-03-12 | Saint Gobain Vitrage | Substrat transparent muni d'au moins une couche mince a base de nitrure ou d'oxynitrure de silicium et son procede d'obtention |
| US6203898B1 (en) * | 1997-08-29 | 2001-03-20 | 3M Innovatave Properties Company | Article comprising a substrate having a silicone coating |
| US6251802B1 (en) | 1998-10-19 | 2001-06-26 | Micron Technology, Inc. | Methods of forming carbon-containing layers |
| DE19958473A1 (de) * | 1999-12-04 | 2001-06-07 | Bosch Gmbh Robert | Verfahren zur Herstellung von Kompositschichten mit einer Plasmastrahlquelle |
| KR100562783B1 (ko) * | 2003-08-08 | 2006-03-20 | 남상욱 | 렌즈 가공 시의 축 이동과 표면손상을 방지하기 위하여 보호막을 형성시킨 안경렌즈의 제조방법 |
| US20050238816A1 (en) * | 2004-04-23 | 2005-10-27 | Li Hou | Method and apparatus of depositing low temperature inorganic films on plastic substrates |
| RU2007119782A (ru) * | 2004-10-29 | 2008-12-10 | Дау Глобал Текнолоджиз Инк. (Us) | Износостойкие покрытия, полученные посредством плазменного химического осаждения из паровой фазы |
| DE102005007825B4 (de) * | 2005-01-10 | 2015-09-17 | Interpane Entwicklungs-Und Beratungsgesellschaft Mbh | Verfahren zur Herstellung einer reflexionsmindernden Beschichtung, reflexionsmindernde Schicht auf einem transparenten Substrat sowie Verwendung einer derartigen Schicht |
| FR2976577B1 (fr) * | 2011-06-17 | 2014-03-28 | Saint Gobain | Procede de fabrication d'un vitrage comprenant une couche poreuse |
Family Cites Families (25)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS554040A (en) * | 1978-06-26 | 1980-01-12 | Hitachi Ltd | Photoconductive material |
| US4239819A (en) * | 1978-12-11 | 1980-12-16 | Chemetal Corporation | Deposition method and products |
| BG32652A1 (en) * | 1980-03-13 | 1982-09-15 | Kolev | Method for surface laying of metals on synthetic, natural and artificial polymers |
| DE3117037C2 (de) * | 1980-05-08 | 1987-05-14 | Takao Sakai Osaka Kawamura | Elektrophotografisches Aufzeichnungsmaterial |
| JPS57177156A (en) * | 1981-04-24 | 1982-10-30 | Canon Inc | Photoconductive material |
| EP0309000B1 (de) * | 1981-07-17 | 1992-10-14 | Kanegafuchi Kagaku Kogyo Kabushiki Kaisha | Amorpher Halbleiter und photovoltaische Vorrichtung aus amorphem Silizium |
| JPS5826052A (ja) * | 1981-08-06 | 1983-02-16 | Asahi Glass Co Ltd | アルカリ拡散防止酸化ケイ素膜付ガラス体 |
| US4460669A (en) * | 1981-11-26 | 1984-07-17 | Canon Kabushiki Kaisha | Photoconductive member with α-Si and C, U or D and dopant |
| DE3307573A1 (de) * | 1982-03-04 | 1983-09-15 | Canon K.K., Tokyo | Fotoleitfaehiges aufzeichnungselement |
| US4486521A (en) * | 1982-03-16 | 1984-12-04 | Canon Kabushiki Kaisha | Photoconductive member with doped and oxygen containing amorphous silicon layers |
| US4490454A (en) * | 1982-03-17 | 1984-12-25 | Canon Kabushiki Kaisha | Photoconductive member comprising multiple amorphous layers |
| JPS5996137A (ja) * | 1982-11-25 | 1984-06-02 | Shin Etsu Chem Co Ltd | 塩化ビニル系樹脂複合製品の製造方法 |
| US4666808A (en) * | 1983-04-01 | 1987-05-19 | Kyocera Corp. | Amorphous silicon electrophotographic sensitive member |
| JPS6014248A (ja) * | 1983-07-06 | 1985-01-24 | Fuji Photo Film Co Ltd | 電子写真用感光体 |
| JPH0616177B2 (ja) * | 1983-07-27 | 1994-03-02 | キヤノン株式会社 | 電子写真用光導電部材 |
| US4546008A (en) * | 1983-11-07 | 1985-10-08 | Canon Kabushiki Kaisha | Method for forming a deposition film |
| DE3546544C2 (de) * | 1984-02-28 | 1990-02-15 | Sharp K.K., Osaka, Jp | |
| JPH0685391B2 (ja) * | 1984-10-09 | 1994-10-26 | キヤノン株式会社 | 堆積膜形成方法 |
| US4668365A (en) * | 1984-10-25 | 1987-05-26 | Applied Materials, Inc. | Apparatus and method for magnetron-enhanced plasma-assisted chemical vapor deposition |
| US4721631A (en) * | 1985-02-14 | 1988-01-26 | Sharp Kabushiki Kaisha | Method of manufacturing thin-film electroluminescent display panel |
| JPH084071B2 (ja) * | 1985-12-28 | 1996-01-17 | キヤノン株式会社 | 堆積膜形成法 |
| US4841328A (en) * | 1986-08-04 | 1989-06-20 | Sanyo Electric Co., Ltd. | Electrostatic recording apparatus |
| US4847157A (en) * | 1986-08-28 | 1989-07-11 | Libbey-Owens-Ford Co. | Glass coating method and resulting article |
| US4777090A (en) * | 1986-11-03 | 1988-10-11 | Ovonic Synthetic Materials Company | Coated article and method of manufacturing the article |
| FR2614317B1 (fr) * | 1987-04-22 | 1989-07-13 | Air Liquide | Procede de protection de substrat polymerique par depot par plasma de composes du type oxynitrure de silicium et dispositif pour sa mise en oeuvre. |
-
1988
- 1988-05-11 FR FR8806369A patent/FR2631346B1/fr not_active Expired - Fee Related
-
1989
- 1989-05-10 FI FI892268A patent/FI892268A7/fi not_active IP Right Cessation
- 1989-05-10 DK DK228689A patent/DK228689A/da unknown
- 1989-05-10 DE DE8989401290T patent/DE68900824D1/de not_active Expired - Lifetime
- 1989-05-10 EP EP89401290A patent/EP0345107B1/de not_active Expired - Lifetime
- 1989-05-10 NO NO89891902A patent/NO891902L/no unknown
- 1989-05-10 ES ES198989401290T patent/ES2038834T3/es not_active Expired - Lifetime
- 1989-05-10 AT AT89401290T patent/ATE72544T1/de not_active IP Right Cessation
- 1989-05-11 KR KR1019890006300A patent/KR890017185A/ko not_active Withdrawn
- 1989-05-11 US US07/351,942 patent/US5116665A/en not_active Expired - Fee Related
- 1989-05-11 JP JP1116214A patent/JPH0230764A/ja active Pending
Also Published As
| Publication number | Publication date |
|---|---|
| JPH0230764A (ja) | 1990-02-01 |
| EP0345107B1 (de) | 1992-02-12 |
| NO891902L (no) | 1989-11-13 |
| FR2631346A1 (fr) | 1989-11-17 |
| FI892268L (fi) | 1989-11-12 |
| FI892268A7 (fi) | 1989-11-12 |
| ES2038834T3 (es) | 1993-08-01 |
| DE68900824D1 (de) | 1992-03-26 |
| FR2631346B1 (fr) | 1994-05-20 |
| FI892268A0 (fi) | 1989-05-10 |
| DK228689A (da) | 1989-11-13 |
| EP0345107A1 (de) | 1989-12-06 |
| KR890017185A (ko) | 1989-12-15 |
| DK228689D0 (da) | 1989-05-10 |
| NO891902D0 (no) | 1989-05-10 |
| US5116665A (en) | 1992-05-26 |
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